Works matching IS 00084034 AND DT 2001 AND VI 79 AND IP 4
1
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 536, doi. 10.1002/cjce.5450790410
- Kato, Yukitaka;
- Minakami, Atsushi;
- Li, Guangzhe;
- Yoshizawa, Yoshio
- Article
2
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 612, doi. 10.1002/cjce.5450790421
- Filion, Julie;
- Munz, Richard J.;
- Salin, Eric D.
- Article
3
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 688, doi. 10.1002/cjce.5450790432
- Article
4
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 481, doi. 10.1002/cjce.5450790403
- de Lasa, Hugo;
- Paris, Jean;
- Buschmann, Michael
- Article
5
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 564, doi. 10.1002/cjce.5450790414
- Article
6
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 643, doi. 10.1002/cjce.5450790425
- Article
7
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 512, doi. 10.1002/cjce.5450790407
- Article
8
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 595, doi. 10.1002/cjce.5450790418
- Shaharuzzaman, Mohammad;
- Bennington, Chad P. J.
- Article
9
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 678, doi. 10.1002/cjce.5450790429
- Ghotbi, Cyrus;
- Vera, Juan H.
- Article
10
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 608, doi. 10.1002/cjce.5450790420
- Cerpa, Arisbel;
- García-González, Maria T.;
- Serna, Carlos J.;
- Tartaj, Pedro
- Article
11
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 687, doi. 10.1002/cjce.5450790431
- Lan, Qlng duo;
- Zhu, J.-X;
- Bassi, Amarjeet S.;
- Margaritis, Argydos;
- Zheng, Ying;
- Row, Gerald E.
- Article
12
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 481, doi. 10.1002/cjce.5450790402
- Guy, Christophe;
- Stuart, Paul R.
- Article
13
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 557, doi. 10.1002/cjce.5450790413
- Song, Jiasen;
- Hyndman, Caroline L.;
- Kantzas, Apostolos
- Article
14
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 633, doi. 10.1002/cjce.5450790424
- Bagajewicz, Miguel;
- Rodera, Hernàn
- Article
15
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 507, doi. 10.1002/cjce.5450790406
- Birchal, V. S.;
- Rocha, S. D. F.;
- Mansur, M. B.;
- Ciminelli, V. S. T.
- Article
16
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 584, doi. 10.1002/cjce.5450790417
- Piché, Simon R.;
- Larachi, Faïcal;
- Grandjean, Bernard P. A.
- Article
17
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 491, doi. 10.1002/cjce.5450790405
- Liu, Benlin;
- Checkel, M. David;
- Hayes, Robert E.
- Article
18
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 687, doi. 10.1002/cjce.5450790430
- Article
19
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 481, doi. 10.1002/cjce.5450790401
- Guy, Christophe;
- Stuart, Paul R.
- Article
20
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 548, doi. 10.1002/cjce.5450790412
- Malcus, Stefan;
- Pugsley, Todd
- Article
21
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 626, doi. 10.1002/cjce.5450790423
- Seon, Hongsun;
- Munz, Richard J.
- Article
22
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 668, doi. 10.1002/cjce.5450790428
- Méthot, Stéphane;
- Moulin, Véronique;
- Rancourt, Denis;
- Bourdages, Michel;
- Goulet, Daniel;
- Plante, Michel;
- Auger, Francois A.;
- Germain, Lucie
- Article
23
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 579, doi. 10.1002/cjce.5450790416
- Lee, Donghyun;
- Macchi, Arturo;
- Epstein, Norman;
- Grace, John R.
- Article
24
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 663, doi. 10.1002/cjce.5450790427
- Rochon, Marie-Hélène;
- Gauthier, Marie-Josée;
- Auger, Francois A.;
- Germain, Lucie
- Article
25
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 524, doi. 10.1002/cjce.5450790409
- Bruzzanese, Adriana;
- Galiasso, Roberto
- Article
26
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 542, doi. 10.1002/cjce.5450790411
- Luus, Rein;
- Woo, Stephen S.
- Article
27
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 618, doi. 10.1002/cjce.5450790422
- Filion, Julie;
- Munz, Richard J.;
- Salin, Eric D.
- Article
28
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 482, doi. 10.1002/cjce.5450790404
- Chin, Hilton S. F.;
- Karan, Kunal;
- Mehrotra, Anil K.;
- Behie, Leo A.
- Article
29
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 570, doi. 10.1002/cjce.5450790415
- Macchi, Arturo;
- Grace, John R.;
- Bi, Hsiaotao
- Article
30
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 655, doi. 10.1002/cjce.5450790426
- Nordman, Roger;
- Berntsson, Thore
- Article
31
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 517, doi. 10.1002/cjce.5450790408
- Rivard, Jean-Marc;
- Zhang, Qinglin;
- Chuang, Karl T.
- Article
32
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 4, p. 602, doi. 10.1002/cjce.5450790419
- Li, Meisen;
- Bando, Yoshiyuki;
- Tanigawara, Ryo;
- Kamiya, Toru;
- Yasuda, Keiji;
- Nakamura, Masaaki
- Article