Works matching IS 00084034 AND DT 2000 AND VI 78 AND IP 6
1
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1175, doi. 10.1002/cjce.5450780620
- Tang, Joseph S.;
- Zhang, Pei Xin
- Article
2
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1032, doi. 10.1002/cjce.5450780602
- Oshinowo, Lanre;
- Kuhn, David C. S.
- Article
3
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1127, doi. 10.1002/cjce.5450780613
- Hjorth, Sven;
- Karlsson, Lennart;
- Friberg, Paal;
- Boon, Lotte
- Article
4
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1065, doi. 10.1002/cjce.5450780606
- Turner, Carl W.;
- Klimas, Stan J.
- Article
5
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1151, doi. 10.1002/cjce.5450780617
- Akimoto, Masamichi;
- Tanaka, Hideharu;
- Watanabe, Akiko
- Article
6
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1025, doi. 10.1002/cjce.5450780601
- Namkung, Won;
- Guy, Christophe;
- Boisselle, Fréadéaric;
- Legros, Robert
- Article
7
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1120, doi. 10.1002/cjce.5450780612
- Moolman, Francis Sean;
- Heydenrych, Michael David
- Article
8
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1056, doi. 10.1002/cjce.5450780605
- Rao, Nadella V. Rama;
- Baird, Malcolm H. I.
- Article
9
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1145, doi. 10.1002/cjce.5450780616
- Sujith, Raman I.;
- Zinn, Ben T.
- Article
10
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1096, doi. 10.1002/cjce.5450780609
- Zaki, M. M.;
- Nirdosh, I.;
- Sedahmed, G. H.
- Article
11
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1111, doi. 10.1002/cjce.5450780611
- Nasrifar, Kh.;
- Ayatollahi, Sh.;
- Moshfeghian, M.
- Article
12
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1182, doi. 10.1002/cjce.5450780622
- Article
13
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1046, doi. 10.1002/cjce.5450780604
- Wan, M. H.;
- Bara, B.;
- Hackman, L.;
- Czarnecki, J.;
- Afacan, A.;
- Nandakumar, K.;
- Masliyah, J. H.
- Article
14
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1138, doi. 10.1002/cjce.5450780615
- Fernández, Maríaa Joséa;
- Kassman, Håkan;
- Lyngfelt, Anders
- Article
15
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1087, doi. 10.1002/cjce.5450780608
- Sadhankar, Ramakant R.;
- Aelick, Christopher R.;
- Burns, Deborah L.;
- Marcinkowska, Krystyna
- Article
16
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1168, doi. 10.1002/cjce.5450780619
- Hansen, Henrik K.;
- Riverol, Carmen;
- Acree, William E.
- Article
17
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1102, doi. 10.1002/cjce.5450780610
- Khan, Wasi Z.;
- Gibbs, Bernard M.
- Article
18
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1181, doi. 10.1002/cjce.5450780621
- Article
19
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1040, doi. 10.1002/cjce.5450780603
- Article
20
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1133, doi. 10.1002/cjce.5450780614
- Mariani, Nestor J.;
- Mazza, German D.;
- Martinez, Osvaldo M.;
- Barreto, Guillermo F.
- Article
21
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1076, doi. 10.1002/cjce.5450780607
- Pen, Shi-Wen;
- Besant, Robert W.;
- Strathdee, Graeme
- Article
22
- Canadian Journal of Chemical Engineering, 2000, v. 78, n. 6, p. 1157, doi. 10.1002/cjce.5450780618
- Lotfollahi, Mohammad Nader;
- Modarress, Hamid;
- Mansoori, G. Ali
- Article