Works matching Extreme ultraviolet lithography

Results: 270

Research progress on infrared laser driven extreme ultraviolet lithography source.

Published in:

Laser Technology, 2025, v. 49, n. 3, p. 328, doi. 10.7510/jgjs.issn.1001-3806.2025.03.003

By:

LYU Tianhao;
SONG Yanjie;
ZONG Nan;
ZHANG Shenjin;
BO Yong;
PENG Qinjun

Publication type:

Article

Development of Photoresist Resins and Their Synthesis Methods for Extreme Ultraviolet Lithography.

Published in:

Imaging Science & Photochemistry, 2021, n. 4, p. 504, doi. 10.7517/issn.1674-0475.210122

By:

WEN Shuai;
LIU Qiang

Publication type:

Article

Key Challenges and Opportunities for Advanced Extreme Ultraviolet Lithography Photoresist Materials.

Published in:

Advanced Functional Materials, 2025, v. 35, n. 24, p. 1, doi. 10.1002/adfm.202420962

By:

Li, Mingqi;
Aqad, Emad

Publication type:

Article

Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review.

Published in:

High Power Laser Science & Engineering, 2023, v. 11, p. 1, doi. 10.1017/hpl.2023.53

By:

Nan Lin;
Yunyi Chen;
Xin Wei;
Wenhe Yang;
Yuxin Leng

Publication type:

Article

Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks.

Published in:

Journal of Adhesion Science & Technology, 2011, v. 25, n. 8, p. 781, doi. 10.1163/016942410X511123

By:

Jaiswal, Ravi P.;
Beaudoin, Stephen P.

Publication type:

Article

Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.

Published in:

International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107

By:

Kang, Soojin;
Yook, Se-Jin;
Lee, Kwan-Soo

Publication type:

Article

Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study.

Published in:

Micromachines, 2021, v. 12, n. 12, p. 1493, doi. 10.3390/mi12121493

By:

Kim, Sang-Kon

Publication type:

Article

Photoresists in extreme ultraviolet lithography (EUVL).

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 163, doi. 10.1515/aot-2017-0021

By:

De Simone, Danilo;
Vesters, Yannick;
Vandenberghe, Geert

Publication type:

Article

Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens.

Published in:

Shock & Vibration, 2024, v. 2024, p. 1, doi. 10.1155/2024/6168723

By:

Li, Shiyu;
Liu, Junbo;
Zhou, Ji;
Sun, Haifeng;
Jin, Chuan;
Kang, Xia;
Hu, Song;
Gan, Jinqiang

Publication type:

Article

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair.

Published in:

Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 1705, doi. 10.1007/s00339-014-8745-0

By:

Noh, J.;
Stanford, M.;
Lewis, B.;
Fowlkes, J.;
Plank, H.;
Rack, P.

Publication type:

Article

Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography.

Published in:

Journal of Polymer Research, 2025, v. 32, n. 6, p. 1, doi. 10.1007/s10965-025-04435-8

By:

Gan, Jingyi;
Li, Yuanzhuang;
Yang, Lei;
Wang, Rui;
Zheng, Chenyu;
Xiao, Guomin

Publication type:

Article

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 187, doi. 10.1515/aot-2017-0019

By:

Erdmann, Andreas;
Dongbo Xu;
Evanschitzky, Peter;
Philipsen, Vicky;
Vu Luong;
Hendrickx, Eric

Publication type:

Article

Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations.

Published in:

Journal of Synchrotron Radiation, 2024, v. 31, n. 3, p. 485, doi. 10.1107/S1600577524002534

By:

Knappett, Jerome B. M.;
Haydon, Blair;
Cowie, Bruce C. C.;
Kewish, Cameron M.;
van Riessen, Grant A.

Publication type:

Article

Analysis of partially coherent light propagation through the soft X‐ray interference lithography beamline at SSRF.

Published in:

Journal of Synchrotron Radiation, 2021, v. 28, n. 3, p. 902, doi. 10.1107/S1600577521003398

By:

Meng, Xiangyu;
Yu, Huaina;
Wang, Yong;
Ren, Junchao;
Xue, Chaofan;
Yang, Shuimin;
Guo, Zhi;
Zhao, Jun;
Wu, Yanqing;
Tai, Renzhong

Publication type:

Article

Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography.

Published in:

Chinese Journal of Chemistry, 2025, v. 43, n. 13, p. 1513, doi. 10.1002/cjoc.202500041

By:

Peng, Rongrong;
Chen, Jinping;
Yu, Tianjun;
Zeng, Yi;
Wang, Shuangqing;
Guo, Xudong;
Hu, Rui;
Tian, Peng;
Vockenhuber, Michaela;
Kazazis, Dimitrios;
Zhao, Jun;
Wu, Yanqin;
Ekinci, Yasin;
Yang, Guoqiang;
Li, Yi

Publication type:

Article

Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance.

Published in:

2025

By:

Wu, Yurui;
Zhang, Siliang;
Cui, Xuewen;
Cong, Xue;
Liu, Shuang;
Wang, Lei;
Guo, Xudong;
Hu, Rui;
Wang, Shuangqing;
Chen, Jinping;
Li, Yi;
Zhao, Jun;
Yang, Shumin;
Wu, Yanqing;
Yang, Guoqiang

Publication type:

Conference Paper/Materials

Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography.

Published in:

Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300420

By:

Subramanian, Ashwanth;
Tiwale, Nikhil;
Lee, Won‐Il;
Kisslinger, Kim;
Lu, Ming;
Stein, Aaron;
Kim, Jiyoung;
Nam, Chang‐Yong

Publication type:

Article

Resist material options for extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2015, v. 4, n. 4, p. 311, doi. 10.1515/aot-2015-0028

By:

Kozawa, Takahiro

Publication type:

Article

Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy‐Based Hybrid Materials.

Published in:

ChemPhotoChem, 2018, v. 2, n. 5, p. 425, doi. 10.1002/cptc.201700232

By:

Torti, Edoardo;
Protti, Stefano;
Bollanti, Sarah;
Flora, Francesco;
Torre, Amalia;
Brusatin, Giovanna;
Gerardino, Annamaria;
Businaro, Luca;
Fagnoni, Maurizio;
Della Giustina, Gioia;
Mezi, Luca

Publication type:

Article

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types.

Published in:

Photonics, 2025, v. 12, n. 3, p. 266, doi. 10.3390/photonics12030266

By:

Moon, Seungchan;
Lee, Dong Gi;
Choi, Jinhyuk;
Hong, Junho;
Lee, Taeho;
Ekinci, Yasin;
Ahn, Jinho

Publication type:

Article

Depth‐resolved compositional analysis of W/B4C multilayers using resonant soft X‐ray reflectivity.

Published in:

Journal of Synchrotron Radiation, 2019, v. 26, n. 3, p. 793, doi. 10.1107/S1600577519002339

By:

Rao, P. N.;
Goutam, U. K.;
Kumar, Prabhat;
Gupta, Mukul;
Ganguli, Tapas;
Rai, S. K.

Publication type:

Article

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.

Published in:

Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102

By:

Yan Liu;
Yanqiu Li;
Zhen Cao

Publication type:

Article

Recent Advances in Positive Photoresists: Mechanisms and Fabrication.

Published in:

Materials (1996-1944), 2024, v. 17, n. 11, p. 2552, doi. 10.3390/ma17112552

By:

Hassaan, Muhammad;
Saleem, Umama;
Singh, Akash;
Haque, Abrar Jawad;
Wang, Kaiying

Publication type:

Article

Optical and EUV Lithography: A Modeling Perspective.

Published in:

2021

By:

Melvin, Lawrence S.

Publication type:

Book Review

EUCLIDES: European EUV lithography milestones.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 43

By:

Benschop, Jos P.H.;
van Dijsseldonk, Anton J.J.

Publication type:

Article

Japan's ASET researches EUV litho.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 22

By:

DUNN, PETER N.

Publication type:

Article

New venture to commercialize EUV litho technology.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 58

By:

Dunn, Peter N.

Publication type:

Article

A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments.

Published in:

IET Circuits, Devices & Systems (Wiley-Blackwell), 2021, v. 15, n. 4, p. 310, doi. 10.1049/cds2.12028

By:

Paul, Sudipta;
Banerjee, Pritha;
Sur‐Kolay, Susmita

Publication type:

Article

Loss of hydrogen atoms in H plasma on the surfaces of materials used in EUV lithography.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 10, p. 881, doi. 10.1134/S1063780X11090157

By:

Zyryanov, S.;
Kovalev, A.;
Lopaev, D.;
Malykhin, E.;
Rakhimov, A.;
Rakhimova, T.;
Koshelev, K.;
Krivtsun, V.

Publication type:

Article

Beyond EUV lithography: a comparative study of efficient photoresists' performance.

Published in:

Scientific Reports, 2015, p. 9235, doi. 10.1038/srep09235

By:

Mojarad, Nassir;
Gobrecht, Jens;
Ekinci, Yasin

Publication type:

Article

Single‐Component High‐Resolution Dual‐Tone EUV Photoresists Based on Precision Self‐Immolative Polymers.

Published in:

Angewandte Chemie, 2025, v. 137, n. 3, p. 1, doi. 10.1002/ange.202415588

By:

Cen, Jie;
Liu, Wen;
Xu, Jie;
Wang, Xiuxia;
Zhang, Jialin;
Zhang, Jin;
Deng, Zhengyu;
Zhou, Chenggang;
Hu, Jinming;
Liu, Shiyong

Publication type:

Article

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source.

Published in:

Photonics, 2023, v. 10, n. 12, p. 1339, doi. 10.3390/photonics10121339

By:

Chen, Yiyi;
Zhao, Chongxiao;
Pan, Qikun;
Zhang, Ranran;
Gao, Yang;
Li, Xiaoxi;
Guo, Jin;
Chen, Fei

Publication type:

Article

Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings.

Published in:

Photonics, 2023, v. 10, n. 11, p. 1272, doi. 10.3390/photonics10111272

By:

Xiong, Yingfan;
Gou, Jinming;
Tang, Zhaohui;
Xiao, Guangxu;
Lei, Lihua;
Song, Song;
Deng, Xiao;
Cheng, Xinbin

Publication type:

Article

Evolution in Lithography Techniques: Microlithography to Nanolithography.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754

By:

Sharma, Ekta;
Rathi, Reena;
Misharwal, Jaya;
Sinhmar, Bhavya;
Kumari, Suman;
Dalal, Jasvir;
Kumar, Anand

Publication type:

Article

High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 8, p. 1593, doi. 10.3390/nano10081593

By:

Manouras, Theodore;
Argitis, Panagiotis

Publication type:

Article

CO laser drives extreme ultraviolet nano-lithography - second life of mature laser technology.

Published in:

Opto-Electronics Review, 2013, v. 21, n. 4, p. 345, doi. 10.2478/s11772-013-0109-3

By:

Nowak, K.;
Ohta, T.;
Suganuma, T.;
Fujimoto, J.;
Mizoguchi, H.;
Sumitani, A.;
Endo, A.

Publication type:

Article

Light sources: More efficient plasmas.

Published in:

Nature Photonics, 2014, v. 8, n. 10, p. 747, doi. 10.1038/nphoton.2014.232

By:

Pile, David

Publication type:

Article

Cheating physics.

Published in:: Nature Photonics, 2010, v. 4, n. 1, p. 19, doi. 10.1038/nphoton.2009.248
Publication type:: Article

EUV lithography: Lithography gets extreme.

Published in:

Nature Photonics, 2010, v. 4, n. 1, p. 24, doi. 10.1038/nphoton.2009.251

By:

Wagner, Christian;
Harned, Noreen

Publication type:

Article

The shrinking chip.

Published in:: 2009
Publication type:: Editorial

Laser-plasma extreme ultraviolet source at 6.7 nm using a rotating cryogenic Xe target.

Published in:

Applied Physics B: Lasers & Optics, 2012, v. 108, n. 4, p. 743, doi. 10.1007/s00340-012-5215-2

By:

Amano, Sho;
Inoue, Tomoaki

Publication type:

Article

Laser–plasma–source debris-related investigations: an aspect of the ENEA micro-exposure tool.

Published in:

Applied Physics B: Lasers & Optics, 2009, v. 96, n. 2/3, p. 479, doi. 10.1007/s00340-009-3583-z

By:

Bollanti, S.;
Di Lazzaro, P.;
Flora, F.;
Mezi, L.;
Murra, D.;
Torre, A.

Publication type:

Article

Emission characteristics of debris from CO2 and Nd:YAG laser-produced tin plasmas for extreme ultraviolet lithography light source.

Published in:

Applied Physics B: Lasers & Optics, 2008, v. 92, n. 1, p. 73, doi. 10.1007/s00340-008-3068-5

By:

Takahashi, A.;
Nakamura, D.;
Tamaru, K.;
Akiyama, T.;
Okada, T.

Publication type:

Article

Velocity map imaging and cross sections of Fe(CO)5 for FEBIP applications.

Published in:

European Physical Journal D (EPJ D), 2022, v. 76, n. 9, p. 1, doi. 10.1140/epjd/s10053-022-00476-6

By:

Pintea, Maria;
Mason, Nigel;
Tudorovskaya, Maria

Publication type:

Article

Digital, intelligent, and all-round optical manufacturing method-magnetorheological finishing (wheel type): a review.

Published in:

International Journal of Advanced Manufacturing Technology, 2025, v. 138, n. 11, p. 5057, doi. 10.1007/s00170-025-15810-6

By:

Wang, Bo;
Zhang, Wanli;
Wang, Zhanyang;
Song, Ci;
Shi, Feng;
Tie, Guipeng;
Peng, Xing;
Qiao, Shuo;
Hao, Qun

Publication type:

Article

High-Power Lasers.

Published in:

Encyclopedia, 2024, v. 4, n. 3, p. 1236, doi. 10.3390/encyclopedia4030080

By:

Chvykov, Vladimir

Publication type:

Article

Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration.

Published in:

Optical Engineering, 2016, v. 55, n. 9, p. 095108-1, doi. 10.1117/1.OE.55.9.095108

By:

Yan Liu;
Yanqiu Li

Publication type:

Article

Effectiveness of Mo–Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics.

Published in:

Optical Engineering, 2009, v. 48, n. 5, p. 056501, doi. 10.1117/1.3126002

By:

Huatan Qiu;
Shailendra N. Srivastava;
Keith C. Thompson;
Martin J. Neumann;
David N. Ruzic

Publication type:

Article

Hollow laser self-confined plasma for extreme ultraviolet lithography and other applications.

Published in:

Laser & Particle Beams, 2007, v. 25, n. 1, p. 143, doi. 10.1017/S026303460707019X

By:

V. SIZYUK;
A. HASSANEIN;
T. SIZYUK

Publication type:

Article

Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography.

Published in:

Micromachines, 2024, v. 15, n. 9, p. 1122, doi. 10.3390/mi15091122

By:

Hasan, Muhammad Waleed;
Deeb, Laura;
Kumaniaev, Sergei;
Wei, Chenglu;
Wang, Kaiying

Publication type:

Article