Works matching Extreme ultraviolet lithography

Results: 258

Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review.

Published in:

High Power Laser Science & Engineering, 2023, v. 11, p. 1, doi. 10.1017/hpl.2023.53

By:

Nan Lin;
Yunyi Chen;
Xin Wei;
Wenhe Yang;
Yuxin Leng

Publication type:

Article

Development of Photoresist Resins and Their Synthesis Methods for Extreme Ultraviolet Lithography.

Published in:

Imaging Science & Photochemistry, 2021, n. 4, p. 504, doi. 10.7517/issn.1674-0475.210122

By:

WEN Shuai;
LIU Qiang

Publication type:

Article

Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.

Published in:

International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107

By:

Kang, Soojin;
Yook, Se-Jin;
Lee, Kwan-Soo

Publication type:

Article

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair.

Published in:

Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 1705, doi. 10.1007/s00339-014-8745-0

By:

Noh, J.;
Stanford, M.;
Lewis, B.;
Fowlkes, J.;
Plank, H.;
Rack, P.

Publication type:

Article

Photoresists in extreme ultraviolet lithography (EUVL).

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 163, doi. 10.1515/aot-2017-0021

By:

De Simone, Danilo;
Vesters, Yannick;
Vandenberghe, Geert

Publication type:

Article

Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens.

Published in:

Shock & Vibration, 2024, v. 2024, p. 1, doi. 10.1155/2024/6168723

By:

Li, Shiyu;
Liu, Junbo;
Zhou, Ji;
Sun, Haifeng;
Jin, Chuan;
Kang, Xia;
Hu, Song;
Gan, Jinqiang

Publication type:

Article

Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks.

Published in:

Journal of Adhesion Science & Technology, 2011, v. 25, n. 8, p. 781, doi. 10.1163/016942410X511123

By:

Jaiswal, Ravi P.;
Beaudoin, Stephen P.

Publication type:

Article

Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study.

Published in:

Micromachines, 2021, v. 12, n. 12, p. 1493, doi. 10.3390/mi12121493

By:

Kim, Sang-Kon

Publication type:

Article

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 187, doi. 10.1515/aot-2017-0019

By:

Erdmann, Andreas;
Dongbo Xu;
Evanschitzky, Peter;
Philipsen, Vicky;
Vu Luong;
Hendrickx, Eric

Publication type:

Article

Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography.

Published in:

Chinese Journal of Chemistry, 2025, v. 43, n. 13, p. 1513, doi. 10.1002/cjoc.202500041

By:

Peng, Rongrong;
Chen, Jinping;
Yu, Tianjun;
Zeng, Yi;
Wang, Shuangqing;
Guo, Xudong;
Hu, Rui;
Tian, Peng;
Vockenhuber, Michaela;
Kazazis, Dimitrios;
Zhao, Jun;
Wu, Yanqin;
Ekinci, Yasin;
Yang, Guoqiang;
Li, Yi

Publication type:

Article

Resist material options for extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2015, v. 4, n. 4, p. 311, doi. 10.1515/aot-2015-0028

By:

Kozawa, Takahiro

Publication type:

Article

Vapor‐Phase Infiltrated Organic–Inorganic Positive‐Tone Hybrid Photoresist for Extreme UV Lithography.

Published in:

Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300420

By:

Subramanian, Ashwanth;
Tiwale, Nikhil;
Lee, Won‐Il;
Kisslinger, Kim;
Lu, Ming;
Stein, Aaron;
Kim, Jiyoung;
Nam, Chang‐Yong

Publication type:

Article

Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations.

Published in:

Journal of Synchrotron Radiation, 2024, v. 31, n. 3, p. 485, doi. 10.1107/S1600577524002534

By:

Knappett, Jerome B. M.;
Haydon, Blair;
Cowie, Bruce C. C.;
Kewish, Cameron M.;
van Riessen, Grant A.

Publication type:

Article

Analysis of partially coherent light propagation through the soft X‐ray interference lithography beamline at SSRF.

Published in:

Journal of Synchrotron Radiation, 2021, v. 28, n. 3, p. 902, doi. 10.1107/S1600577521003398

By:

Meng, Xiangyu;
Yu, Huaina;
Wang, Yong;
Ren, Junchao;
Xue, Chaofan;
Yang, Shuimin;
Guo, Zhi;
Zhao, Jun;
Wu, Yanqing;
Tai, Renzhong

Publication type:

Article

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types.

Published in:

Photonics, 2025, v. 12, n. 3, p. 266, doi. 10.3390/photonics12030266

By:

Moon, Seungchan;
Lee, Dong Gi;
Choi, Jinhyuk;
Hong, Junho;
Lee, Taeho;
Ekinci, Yasin;
Ahn, Jinho

Publication type:

Article

Recent Advances in Positive Photoresists: Mechanisms and Fabrication.

Published in:

Materials (1996-1944), 2024, v. 17, n. 11, p. 2552, doi. 10.3390/ma17112552

By:

Hassaan, Muhammad;
Saleem, Umama;
Singh, Akash;
Haque, Abrar Jawad;
Wang, Kaiying

Publication type:

Article

Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy‐Based Hybrid Materials.

Published in:

ChemPhotoChem, 2018, v. 2, n. 5, p. 425, doi. 10.1002/cptc.201700232

By:

Torti, Edoardo;
Protti, Stefano;
Bollanti, Sarah;
Flora, Francesco;
Torre, Amalia;
Brusatin, Giovanna;
Gerardino, Annamaria;
Businaro, Luca;
Fagnoni, Maurizio;
Della Giustina, Gioia;
Mezi, Luca

Publication type:

Article

Depth‐resolved compositional analysis of W/B<sub>4</sub>C multilayers using resonant soft X‐ray reflectivity.

Published in:

Journal of Synchrotron Radiation, 2019, v. 26, n. 3, p. 793, doi. 10.1107/S1600577519002339

By:

Rao, P. N.;
Goutam, U. K.;
Kumar, Prabhat;
Gupta, Mukul;
Ganguli, Tapas;
Rai, S. K.

Publication type:

Article

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.

Published in:

Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102

By:

Yan Liu;
Yanqiu Li;
Zhen Cao

Publication type:

Article

Optical and EUV Lithography: A Modeling Perspective.

Published in:

2021

By:

Melvin, Lawrence S.

Publication type:

Book Review

Cover Picture.

Published in:: Chinese Journal of Chemistry, 2025, v. 43, n. 13, p. 1469, doi. 10.1002/cjoc.70137
Publication type:: Article

EUCLIDES: European EUV lithography milestones.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 43

By:

Benschop, Jos P.H.;
van Dijsseldonk, Anton J.J.

Publication type:

Article

Japan's ASET researches EUV litho.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 22

By:

DUNN, PETER N.

Publication type:

Article

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source.

Published in:

Photonics, 2023, v. 10, n. 12, p. 1339, doi. 10.3390/photonics10121339

By:

Chen, Yiyi;
Zhao, Chongxiao;
Pan, Qikun;
Zhang, Ranran;
Gao, Yang;
Li, Xiaoxi;
Guo, Jin;
Chen, Fei

Publication type:

Article

Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings.

Published in:

Photonics, 2023, v. 10, n. 11, p. 1272, doi. 10.3390/photonics10111272

By:

Xiong, Yingfan;
Gou, Jinming;
Tang, Zhaohui;
Xiao, Guangxu;
Lei, Lihua;
Song, Song;
Deng, Xiao;
Cheng, Xinbin

Publication type:

Article

CO laser drives extreme ultraviolet nano-lithography - second life of mature laser technology.

Published in:

Opto-Electronics Review, 2013, v. 21, n. 4, p. 345, doi. 10.2478/s11772-013-0109-3

By:

Nowak, K.;
Ohta, T.;
Suganuma, T.;
Fujimoto, J.;
Mizoguchi, H.;
Sumitani, A.;
Endo, A.

Publication type:

Article

Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication.

Published in:

International Journal of Molecular Sciences, 2025, v. 26, n. 7, p. 3027, doi. 10.3390/ijms26073027

By:

Basu, Prithvi;
Verma, Jyoti;
Abhinav, Vishnuram;
Ratnesh, Ratneshwar Kumar;
Singla, Yogesh Kumar;
Kumar, Vibhor

Publication type:

Article

纳米流体通道的制备及其应用研究进展.

Published in:

Journal of Materials Engineering / Cailiao Gongcheng, 2022, v. 50, n. 12, p. 13, doi. 10.11868/j.issn.1001-4381.2022.000153

By:

宋光辉;
吴忠旋;
陈阁谷;
彭锋

Publication type:

Article

Velocity map imaging and cross sections of Fe(CO)<sub>5</sub> for FEBIP applications.

Published in:

European Physical Journal D (EPJ D), 2022, v. 76, n. 9, p. 1, doi. 10.1140/epjd/s10053-022-00476-6

By:

Pintea, Maria;
Mason, Nigel;
Tudorovskaya, Maria

Publication type:

Article

Removal of Tin from Extreme Ultraviolet Collector Optics by In- Situ Hydrogen Plasma Etching.

Published in:

Plasma Chemistry & Plasma Processing, 2018, v. 38, n. 1, p. 223, doi. 10.1007/s11090-017-9852-4

By:

Elg, Daniel T.;
Panici, Gianluca A.;
Liu, Sumeng;
Girolami, Gregory;
Srivastava, Shailendra N.;
Ruzic, David N.

Publication type:

Article

Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning.

Published in:

Journal of Applied Polymer Science, 2025, v. 142, n. 12, p. 1, doi. 10.1002/app.56622

By:

Zhuang, Changchang;
Chen, Jiao;
Wang, Tao;
Zhao, Jun;
Li, Haoyuan;
Xin, Hanshen;
Zhang, Jianhua

Publication type:

Article

从极紫外光刻发展看全球范围内的技术合作.

Published in:

Laser Technology, 2023, v. 47, n. 1, p. 1, doi. 10.7510/jgjs.issn.1001-3806.2023.01.001

By:

曾海峰;
郭磊;
李世光;
钟志坚;
李琛毅;
余江;
李显杰

Publication type:

Article

Loss of hydrogen atoms in H plasma on the surfaces of materials used in EUV lithography.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 10, p. 881, doi. 10.1134/S1063780X11090157

By:

Zyryanov, S.;
Kovalev, A.;
Lopaev, D.;
Malykhin, E.;
Rakhimov, A.;
Rakhimova, T.;
Koshelev, K.;
Krivtsun, V.

Publication type:

Article

Hollow laser self-confined plasma for extreme ultraviolet lithography and other applications.

Published in:

Laser & Particle Beams, 2007, v. 25, n. 1, p. 143, doi. 10.1017/S026303460707019X

By:

V. SIZYUK;
A. HASSANEIN;
T. SIZYUK

Publication type:

Article

Beyond EUV lithography: a comparative study of efficient photoresists' performance.

Published in:

Scientific Reports, 2015, p. 9235, doi. 10.1038/srep09235

By:

Mojarad, Nassir;
Gobrecht, Jens;
Ekinci, Yasin

Publication type:

Article

Evolution in Lithography Techniques: Microlithography to Nanolithography.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754

By:

Sharma, Ekta;
Rathi, Reena;
Misharwal, Jaya;
Sinhmar, Bhavya;
Kumari, Suman;
Dalal, Jasvir;
Kumar, Anand

Publication type:

Article

Ptychographic imaging with partially coherent plasma EUV sources.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 6, p. 459, doi. 10.1515/aot-2017-0050

By:

Bußmann, Jan;
Odstrčil, Michal;
Yusuke Teramoto;
Juschkin, Larissa

Publication type:

Article

Coherent diffractive imaging methods for semiconductor manufacturing.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 6, p. 439, doi. 10.1515/aot-2017-0052

By:

Helfenstein, Patrick;
Mochi, Iacopo;
Rajeev, Rajendran;
Fernandez, Sara;
Ekinci, Yasin

Publication type:

Article

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 173, doi. 10.1515/aot-2017-0029

By:

Fomenkov, Igor;
Brandt, David;
Ershov, Alex;
Schafgans, Alexander;
Yezheng Tao;
Vaschenko, Georgiy;
Rokitski, Slava;
Kats, Michael;
Vargas, Michael;
Purvis, Michael;
Rafac, Rob;
La Fontaine, Bruno;
De Dea, Silvia;
LaForge, Andrew;
Stewart, Jayson;
Chang, Steven;
Graham, Matthew;
Riggs, Daniel;
Taylor, Ted;
Abraham, Mathew

Publication type:

Article

Next-generation lithography – an outlook on EUV projection and nanoimprint.

Published in:

2017

By:

van Schoot, Jan;
Schift, Helmut

Publication type:

Editorial

Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method.

Published in:

European Journal of Inorganic Chemistry, 2019, v. 2019, n. 38, p. 4136, doi. 10.1002/ejic.201900745

By:

Wu, Lianjia;
Liu, Jeremy;
Vockenhuber, Michaela;
Ekinci, Yasin;
Castellanos, Sonia

Publication type:

Article

Light sources: More efficient plasmas.

Published in:

Nature Photonics, 2014, v. 8, n. 10, p. 747, doi. 10.1038/nphoton.2014.232

By:

Pile, David

Publication type:

Article

Cheating physics.

Published in:: Nature Photonics, 2010, v. 4, n. 1, p. 19, doi. 10.1038/nphoton.2009.248
Publication type:: Article

EUV lithography: Lithography gets extreme.

Published in:

Nature Photonics, 2010, v. 4, n. 1, p. 24, doi. 10.1038/nphoton.2009.251

By:

Wagner, Christian;
Harned, Noreen

Publication type:

Article

The shrinking chip.

Published in:: 2009
Publication type:: Editorial

Single‐Component High‐Resolution Dual‐Tone EUV Photoresists Based on Precision Self‐Immolative Polymers.

Published in:

Angewandte Chemie, 2025, v. 137, n. 3, p. 1, doi. 10.1002/ange.202415588

By:

Cen, Jie;
Liu, Wen;
Xu, Jie;
Wang, Xiuxia;
Zhang, Jialin;
Zhang, Jin;
Deng, Zhengyu;
Zhou, Chenggang;
Hu, Jinming;
Liu, Shiyong

Publication type:

Article

A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments.

Published in:

IET Circuits, Devices & Systems (Wiley-Blackwell), 2021, v. 15, n. 4, p. 310, doi. 10.1049/cds2.12028

By:

Paul, Sudipta;
Banerjee, Pritha;
Sur‐Kolay, Susmita

Publication type:

Article

Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology.

Published in:

Advanced Materials Interfaces, 2023, v. 10, n. 10, p. 1, doi. 10.1002/admi.202202489

By:

Choi, Hyung Woo;
Nam, Ki‐Bong;
Shin, Dong‐Wook

Publication type:

Article

The 100 mm × 100 mm Extreme Ultraviolet Graphite Pellicle: Nano‐Pellicle Production Using the Lowest Free Energy at the Graphite–Water Interface.

Published in:

Advanced Materials Interfaces, 2020, v. 7, n. 24, p. 1, doi. 10.1002/admi.202001141

By:

Kim, Soo‐Young;
Shin, Dong‐Wook;
Kim, Seul‐Gi;
Nam, Ki‐Bong;
Hu, Qicheng;
Kim, Taesung;
Gim, Yeong‐Hyeon;
Ko, Han Seo;
Kim, Mun Ja;
Yoo, Ji‐Beom

Publication type:

Article

Atomic Simulation of Wear and Slip Behavior Between Monocrystalline Silicon and 6H-SiC Friction Pair.

Published in:

Lubricants (2075-4442), 2025, v. 13, n. 4, p. 147, doi. 10.3390/lubricants13040147

By:

Pan, Jiansheng;
Wu, Jianwei;
Lei, Daiyi;
Liu, Huan;
Zhao, Pengyue;
Zhao, Bo;
Liu, Jiang;
Yang, Qingshan

Publication type:

Article