Works matching DE "SPUTTERING (Physics)"
Results: 1448
Cluster tool sputtering for compound semiconductors.
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- Solid State Technology, 2001, v. 44, n. 7, p. 145
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Defects from substrate particles depend on the sputter deposition process.
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- Solid State Technology, 2000, v. 43, n. 11, p. 95
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Growth predicted for sputtering target and sputtered film markets.
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- Solid State Technology, 2000, v. 43, n. 1, p. 24
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New concept in long throw sputtering.
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- Solid State Technology, 1999, v. 42, n. 9, p. 26
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- Article
Tailoring sputtered Cr films on large wafers.
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- Solid State Technology, 1999, v. 42, n. 7, p. 135
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- Article
Influence of ion bombardment on structure and tribological performance of nanoscale multilayer C/Cr PVD coatings.
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- Surface Engineering, 2006, v. 22, n. 2, p. 92, doi. 10.1179/174329406X98377
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- Article
Process–microstructure–properties relationship during formation of AlN layers by physical vapour deposition.
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- Surface Engineering, 2006, v. 22, n. 2, p. 109, doi. 10.1179/174329406X98449
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High deposition rate magnetrons: key elements and advantages.
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- Surface Engineering, 2006, v. 22, n. 1, p. 5, doi. 10.1179/174329406X85038
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Characterisation of PVD TiCN layers by physical and electrochemical methods.
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- Surface Engineering, 2005, v. 21, n. 2, p. 144, doi. 10.1179/174329405X40876
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Studies on nickel electrodeposits on dc magnetron sputtered copper substrates.
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- Surface Engineering, 2005, v. 21, n. 2, p. 151, doi. 10.1179/174329405X40858
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Erratum.
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- 2004
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- Correction Notice
Abstracts.
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- Surface Engineering, 2004, v. 20, n. 5, p. 396, doi. 10.1179/sur.2004.20.5.396
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- Article
Industrial Application of Pulsed Dc Bias Power Supplies in Closed Field Unbalanced Magnetron Sputter Ion Plating.
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- Surface Engineering, 2004, v. 20, n. 3, p. 189, doi. 10.1179/026708404225016373
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- Article
Effect of Pulsed Plasma Processing on Controlling Nanostructure And Properties of Thin Film/Coatings.
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- Surface Engineering, 2004, v. 20, n. 3, p. 196, doi. 10.1179/026708404225016382
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Guest Editorial.
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- Surface Engineering, 2004, v. 20, n. 3, p. 153, doi. 10.1179/026708404225015059
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Advanced Coatings Through Pulsed Magnetron Sputtering.
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- Surface Engineering, 2004, v. 20, n. 3, p. 157, doi. 10.1179/026708404225010702
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- Article
Time Resolved Langmuir Probe Characterisation of Reactive Pulse Magnetron Sputtering of MgO Thin Films.
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- Surface Engineering, 2004, v. 20, n. 3, p. 163, doi. 10.1179/026708404225015013
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Pulsed Plasmas For Sputtering Applications.
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- Surface Engineering, 2004, v. 20, n. 3, p. 174, doi. 10.1179/026708404225010711
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- Article
Novel Enhanced Magnetron Sputtering System.
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- Surface Engineering, 2004, v. 20, n. 3, p. 177, doi. 10.1179/026708404225016364
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- Article
Corrigendum.
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- 2004
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- Erratum
Effect of Presputtering on Plasma Ion Nitriding of Aluminium Substrates.
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- Surface Engineering, 2003, v. 19, n. 5, p. 337, doi. 10.1179/026708403225007527
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- Article
Influence of Bias Voltage on Copper Nitride Films Deposited by Reactive Sputtering.
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- Surface Engineering, 2003, v. 19, n. 1, p. 67, doi. 10.1179/026708403225002441
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A Breakthrough in the Production of Flexible Thin Film Solar Cells.
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- Innovation, 2009, v. 9, n. 1, p. 7
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- Article
Glass meets flexibility.
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- Vakuum in Forschung und Praxis, 2014, v. 26, n. 5, p. 35, doi. 10.1002/vipr.201400562
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- Article
An all-sputtering process and equipment for CIGS solar cells.
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- Vakuum in Forschung und Praxis, 2013, v. 25, n. 5, p. 43, doi. 10.1002/vipr.201300534
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- Article
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide.
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- Journal of Materials Science, 2016, v. 51, n. 7, p. 3329, doi. 10.1007/s10853-015-9648-y
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- Article
Characterization of superconducting Fe(SeTe) thin films deposited on MgO substrates by sputtering.
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- Journal of Materials Science, 2015, v. 50, n. 21, p. 6970, doi. 10.1007/s10853-015-9248-x
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Processing of rf-sputtered lead zirconate titanate thin films on copper foil substrates.
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- Journal of Materials Science, 2015, v. 50, n. 19, p. 6420, doi. 10.1007/s10853-015-9196-5
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Formation of GeSn layers on Si (001) substrates at high growth temperature and high deposition rate by sputter epitaxy method.
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- Journal of Materials Science, 2015, v. 50, n. 12, p. 4366, doi. 10.1007/s10853-015-8990-4
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Influence of ion-beam sputtering deposition parameters on highly photosensitive and transparent CdZnO thin films.
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- Journal of Materials Science, 2014, v. 49, n. 20, p. 6917, doi. 10.1007/s10853-014-8396-8
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- Article
Influence of laser annealing on the structural properties of sputtered AlN:Ag plasmonic nanocomposites.
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- Journal of Materials Science, 2014, v. 49, n. 11, p. 3996, doi. 10.1007/s10853-014-8044-3
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High performance three-dimensional Ge/cyclized-polyacrylonitrile thin film anodes prepared by RF magnetron sputtering for lithium ion batteries.
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- Journal of Materials Science, 2014, v. 49, n. 5, p. 2279, doi. 10.1007/s10853-013-7924-2
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Nitrogen doping of ZnTe for the preparation of ZnTe/ZnO light-emitting diode.
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- Journal of Materials Science, 2013, v. 48, n. 18, p. 6386, doi. 10.1007/s10853-013-7438-y
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Threshold behavior of phase transition characteristics in germanium telluride glasses doped with Ag.
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- Journal of Materials Science, 2013, v. 48, n. 18, p. 6167, doi. 10.1007/s10853-013-7413-7
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Influence of annealing on the structural and electrical transport properties of Bi<sub>0.5</sub>Sb<sub>1.5</sub>Te<sub>3.0</sub> thin films deposited by co-sputtering.
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- Journal of Materials Science, 2013, v. 48, n. 12, p. 4408, doi. 10.1007/s10853-013-7259-z
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CW-diode laser crystallization of sputtered amorphous silicon on glass, SiN<sub>x</sub>, and SiO<sub>2</sub> intermediate layers.
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- Journal of Materials Science, 2013, v. 48, n. 12, p. 4177, doi. 10.1007/s10853-013-7230-z
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Copper and iron based thin film nanocomposites prepared by radio frequency sputtering. Part I: elaboration and characterization of metal/oxide thin film nanocomposites using controlled in situ reduction process.
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- Journal of Materials Science, 2013, v. 48, n. 9, p. 3386, doi. 10.1007/s10853-012-7123-6
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Correlation of interlayer diffusion with the stoichiometric composition of RF sputtered Pt/Co/Pt sandwiched structures.
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- Journal of Materials Science, 2013, v. 48, n. 8, p. 3192, doi. 10.1007/s10853-012-7099-2
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Copper and iron based thin film nanocomposites prepared by radio-frequency sputtering. Part II: elaboration and characterization of oxide/oxide thin film nanocomposites using controlled ex-situ oxidation process.
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- Journal of Materials Science, 2013, v. 48, n. 8, p. 3304, doi. 10.1007/s10853-012-7116-5
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Influence of oxygen partial pressure on structural, electrical, and optical properties of Al-doped ZnO film prepared by the ion beam co-sputtering method.
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- Journal of Materials Science, 2013, v. 48, n. 3, p. 1225, doi. 10.1007/s10853-012-6863-7
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Fabrication conditions and transformation behavior of epitaxial Ni-Mn-Ga thin films.
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- Journal of Materials Science, 2012, v. 47, n. 8, p. 3658, doi. 10.1007/s10853-011-6212-2
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Influences of film composition and annealing on the mechanical and electrical properties of W-Mo thin films.
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- Journal of Materials Science, 2012, v. 47, n. 6, p. 2725, doi. 10.1007/s10853-011-6098-z
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- Article
Growth of highly oriented iridium oxide bottom electrode for Pb(Zr,Ti)O thin films using titanium oxide seed layer.
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- Journal of Materials Science, 2011, v. 46, n. 21, p. 6830, doi. 10.1007/s10853-011-5642-1
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SrYSbO as a buffer layer for YBaCuO superconducting films.
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- Journal of Materials Science, 2011, v. 46, n. 3, p. 688, doi. 10.1007/s10853-010-4794-8
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- Article
High-density gas aggregation nanoparticle gun applied to the production of SmCo clusters.
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- Journal of Materials Science, 2010, v. 45, n. 18, p. 4906, doi. 10.1007/s10853-010-4271-4
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- Article
Piezoresistive response of ITO films deposited at room temperature by magnetron sputtering.
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- Journal of Materials Science, 2010, v. 45, n. 15, p. 4224, doi. 10.1007/s10853-010-4517-1
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Binary semiconductor In<sub>2</sub>Te<sub>3</sub> for the application of phase-change memory device.
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- Journal of Materials Science, 2010, v. 45, n. 13, p. 3569, doi. 10.1007/s10853-010-4401-z
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A single phase semiconducting Ca-silicide film growth by sputtering conditions, annealing temperature and annealing time.
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- Journal of Materials Science, 2009, v. 44, n. 14, p. 3877, doi. 10.1007/s10853-009-3529-1
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Depth profile XPS analysis of polymeric materials by C<sub>60</sub><sup>+</sup> ion sputtering.
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- Journal of Materials Science, 2009, v. 44, n. 7, p. 1800, doi. 10.1007/s10853-009-3274-5
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Microstructure and mechanical properties of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering on AISI H13 steel.
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- Journal of Materials Science, 2009, v. 44, n. 1, p. 300, doi. 10.1007/s10853-008-3066-3
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- Article