Works matching DE "SILICON oxidation"

Results: 36

Microstructure and oxidation resistance of Si modified aluminide coating on TiAl based alloys.

Published in:

Surface Engineering, 2015, v. 31, n. 12, p. 930, doi. 10.1179/1743294414Y.0000000411

By:

Nouri, S.;
Rastegari, S.;
Mirdamadi, Sh.;
Hadavi, M.

Publication type:

Article

Synthesis of core-shell FeCo@SiO particles coated with the reduced graphene oxide as an efficient broadband electromagnetic wave absorber.

Published in:

Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 21, p. 15782, doi. 10.1007/s10854-017-7472-7

By:

Li, Suping;
Huang, Ying;
Ding, Xiao;
Zhang, Na;
Zong, Meng;
Wang, Mingyue;
Liu, Jun

Publication type:

Article

Growth and optical properties of nano-textured (110) Pb(ZrTi)O/(001) ZnO hetero-structure on oxidized silicon substrate.

Published in:

Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 6, p. 5058, doi. 10.1007/s10854-016-6163-0

By:

Sharma, Govind;
Dutta, Shankar;
Singh, Sushil;
Chatterjee, Ratnamala

Publication type:

Article

Controlling A-center concentration in silicon through isovalent doping: mass action analysis.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 5, p. 4385, doi. 10.1007/s10854-016-4308-9

By:

Christopoulos, S.-R.;
Parfitt, D.;
Sgourou, E.;
Londos, C.;
Vovk, R.;
Chroneos, A.

Publication type:

Article

The oxidation process of NiSi film at high temperature in air and the antioxidant effect of SiON/NiSi film.

Published in:

Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 5, p. 3291, doi. 10.1007/s10854-015-2830-9

By:

Zhang, Qixiang;
Liu, Jindong;
Cui, Yunxian;
Ding, Wanyu

Publication type:

Article

Early oxidation stages of the strained Ge/Si(105) surface: A reflectance anisotropy spectroscopy study.

Published in:

Physica Status Solidi (B), 2015, v. 252, n. 1, p. 87, doi. 10.1002/pssb.201350398

By:

Goletti, Claudio;
Fazi, Laura;
Hogan, Conor;
Persichetti, Luca;
Sgarlata, Anna;
Palummo, Maurizia;
Balzarotti, Adalberto

Publication type:

Article

Molecular dynamics simulations on the oxidation of Si(100)/SiO2 interface: Emissions and incorporations of Si-related species into the SiO2 and substrate.

Published in:

Physica Status Solidi (B), 2014, v. 251, n. 11, p. 2169, doi. 10.1002/pssb.201400068

By:

Takahashi, Norihiko;
Yamasaki, Takahiro;
Kaneta, Chioko

Publication type:

Article

Oxidation Behavior at 1600 ° C of Si- Si C- Zr B2 Composites Produced by Si Reactive Infiltration.

Published in:

Advanced Engineering Materials, 2014, v. 16, n. 2, p. 176, doi. 10.1002/adem.201300261

By:

D'Amico, Giuseppe Claudio;
Ortona, Alberto;
Biamino, Sara;
Fino, Paolo;
Badini, Claudio;
D'Angelo, Claudio

Publication type:

Article

Oxidation behavior of metallurgical silicon slag under non-isothermal and isothermal conditions.

Published in:

Journal of Thermal Analysis & Calorimetry, 2016, v. 124, n. 2, p. 593, doi. 10.1007/s10973-015-5157-0

By:

Cao, Jianwei;
Lu, Jinshan;
Jiang, Longxiang;
Wang, Zhi

Publication type:

Article

Alkoxy(tetraaryl)silicates bearing 9,10‐disilatriptycene skeleton.

Published in:

Heteroatom Chemistry, 2018, v. 29, n. 5/6, p. N.PAG, doi. 10.1002/hc.21481

By:

Ishida, Shintaro;
Takiguchi, Minori;
Iwamoto, Takeaki

Publication type:

Article

Nitroselenation of carbon‐carbon triple bond by PhSeSePh and NO/O2 or NO2.

Published in:

Heteroatom Chemistry, 2018, v. 29, n. 5/6, p. N.PAG, doi. 10.1002/hc.21480

By:

Nishiyama, Yutaka;
Sumida, Mari;
Sonoda, Noboru

Publication type:

Article

Synthesis, structures, and reactivity of 9,9‐dialkoxy‐9‐silafluorenes.

Published in:

Heteroatom Chemistry, 2018, v. 29, n. 5/6, p. N.PAG, doi. 10.1002/hc.21478

By:

Kanno, Ken‐ichiro;
Hirose, Satoshi;
Kyushin, Soichiro

Publication type:

Article

PROPAGATION OF PERTURBATIONS FOR A SIXTH-ORDER THIN FILM EQUATION.

Published in:

Electronic Journal of Differential Equations, 2012, v. 2012, p. 1

By:

ZHENBANG LI;
CHANGCHUN LIU

Publication type:

Article

Oxide Liner, Barrier and Seed Layers, and Cu Plating of Blind Through Silicon Vias (TSVs) on 300 mm Wafers for 3D IC Integration.

Published in:

Journal of Microelectronic & Electronic Packaging, 2012, v. 9, n. 1, p. 31, doi. 10.4071/imaps.308

By:

Chien-Ying Wu;
Shang-Chun Chen;
Pei-Jer Tzeng;
Lau, John H.;
Yi-Feng Hsu;
Jui-Chin Chen;
Yu-Chen Hsin;
Chien-Chou Chen;
Shang-Hung Shen;
Cha-Hsin Lin;
Tzu-Kun Ku;
Ming-Jer Kao

Publication type:

Article

Sn-adopted fullerene (C60) nanocage as acceptable catalyst for silicon monoxide oxidation.

Published in:

Bulletin of Materials Science, 2018, v. 41, n. 6, p. 1, doi. 10.1007/s12034-018-1652-9

By:

Razavi, Razieh;
Abrishamifar, Seyyed Milad;
Kahkha, Mohammad Reza Rezaei;
Vojood, Arash;
Najafi, Meysam

Publication type:

Article

Facile synthesis of SiO2@TiO2 hybrid NPs with improved photocatalytic performance.

Published in:

Micro & Nano Letters (Wiley-Blackwell), 2018, v. 13, n. 5, p. 666, doi. 10.1049/mnl.2017.0519

By:

Hongguang Zhang;
Guowei Wang;
Ge Sun;
Feng Xu;
Hongmei Li;
Shuang Li;
Shuang Fu

Publication type:

Article

New insight to the oxidation kinetics of silicon-containing steel at high temperature.

Published in:

Materials at High Temperatures, 2018, v. 35, n. 6, p. 552, doi. 10.1080/09603409.2018.1439682

By:

He, Bei;
Xu, Guang;
Yuan, Qing;
Zhou, Mingxing;
Liang, Weicheng

Publication type:

Article

Extended fine structure of auger spectra of thermally oxidized silicon surface.

Published in:

Colloid Journal, 2015, v. 77, n. 5, p. 635, doi. 10.1134/S1061933X1505018X

By:

Troyan, V.;
Loginov, V.;
Borisyuk, P.;
Vasil'ev, O.

Publication type:

Article

COMBINED INFLUENCE OF SILICON CONTENT AND OXYGEN CONCENTRATION ON THE OXIDATION PROCESS OF SILICON-CONTAINING STEELS.

Published in:

Archives of Metallurgy & Materials, 2018, v. 63, n. 1, p. 445, doi. 10.24425/118959

By:

YUAN, Q.;
XU, G.;
ZHOU, M.;
HE, B.;
HU, H.

Publication type:

Article

Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.

Published in:

Plasma Chemistry & Plasma Processing, 2017, v. 37, n. 3, p. 857, doi. 10.1007/s11090-017-9803-0

By:

Tial, Mai;
Tanaka, Yasunori;
Maruyama, Yuji;
Tsuchiya, Takumi;
Uesugi, Yoshihiko;
Ishijima, Tatsuo

Publication type:

Article

Wetting of ceramics by molten silicon and silicon alloys: a review.

Published in:

Journal of Materials Science, 2012, v. 47, n. 24, p. 8247, doi. 10.1007/s10853-012-6663-0

By:

Drevet, Béatrice;
Eustathopoulos, Nicolas

Publication type:

Article

Effect of Oxidation Temperature on the Oxidation Process of Silicon-Containing Steel.

Published in:

Metals (2075-4701), 2016, v. 6, n. 6, p. 137, doi. 10.3390/met6060137

By:

Bei He;
Guang Xu;
Mingxing Zhou;
Qing Yuan

Publication type:

Article

Investigation of interface property in Al/SiO/ n-SiC structure with thin gate oxide by illumination.

Published in:

Applied Physics A: Materials Science & Processing, 2017, v. 123, n. 4, p. 1, doi. 10.1007/s00339-017-0897-2

By:

Chang, P.;
Hwu, J.

Publication type:

Article

Near-IR photoluminescence from Si/Ge nanowire-grown silicon wafers: effect of HF treatment.

Published in:

Applied Physics A: Materials Science & Processing, 2013, v. 112, n. 3, p. 561, doi. 10.1007/s00339-013-7783-3

By:

Kalem, Seref;
Werner, Peter;
Talalaev, Vadim

Publication type:

Article

Finite-length mask effects in the isolation oxidation of silicon.

Published in:

IMA Journal of Applied Mathematics, 1997, v. 58, n. 2, p. 121, doi. 10.1093/imamat/58.2.121

By:

EVANS, J. D.;
TAYLER, A. B.;
KING, J. R.

Publication type:

Article

Deciphering Molecular Mechanisms of Interface Buildup and Stability in Porous Si/Eumelanin Hybrids.

Published in:

International Journal of Molecular Sciences, 2017, v. 18, n. 7, p. 1567, doi. 10.3390/ijms18071567

By:

Pinna, Elisa;
Melis, Claudio;
Antidormi, Aleandro;
Cardia, Roberto;
Sechi, Elisa;
Cappellini, Giancarlo;
d'Ischia, Marco;
Colombo, Luciano;
Mula, Guido

Publication type:

Article

Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon.

Published in:

Journal of Materials Science, 2017, v. 52, n. 17, p. 10387, doi. 10.1007/s10853-017-1196-1

By:

Martin, Thomas;
Jones, K.;
Camillo-Castillo, Renata;
Hatem, Christopher;
Xin, Yan;
Elliman, Robert

Publication type:

Article

One-Electron Oxidation of a Disilicon(0) Compound: An Experimental and Theoretical Study of [Si2]+ Trapped by N-Heterocyclic Carbenes.

Published in:

Chemistry - A European Journal, 2015, v. 21, n. 35, p. 12509, doi. 10.1002/chem.201502199

By:

Arz, Marius I.;
Straßmann, Martin;
Meyer, Andreas;
Schnakenburg, Gregor;
Schiemann, Olav;
Filippou, Alexander C.

Publication type:

Article

Macromesoporous silicon Bragg and microcavity structures.

Published in:

Materials Research Innovations, 2014, v. 18, n. S2, p. 424, doi. 10.1179/1432891714Z.000000000451

By:

Wang, J.;
Li, P.;
Lv, X.;
Lv, C.;
Jia, Z.

Publication type:

Article

Magnetic effects in the oxidation of silicon.

Published in:

JETP Letters, 2012, v. 96, n. 2, p. 102, doi. 10.1134/S002136401214007X

By:

Koplak, O.;
Morgunov, R.;
Buchachenko, A.

Publication type:

Article

THE ROLE OF PRESSURE TO QUANTIFY THE DEFECTS AND ITS EFFECT ON THE MORPHOLOGY OF GRAPHENE LAYERS.

Published in:

Surface Review & Letters, 2018, v. 25, n. 2, p. -1, doi. 10.1142/S0218625X18500555

By:

AMIT, KUMAR;
SHARMA, RISHI

Publication type:

Article

FIRST-PRINCIPLES STUDY OF THE ADSORPTION AND DIFFUSION OF O2 ON A Si(001) SURFACE.

Published in:

Surface Review & Letters, 2011, v. 18, n. 6, p. 315, doi. 10.1142/S0218625X11014692

By:

YANG, CHUN;
YANG, CHONG;
HUANG, PING;
LIANG, XIAO QIN

Publication type:

Article

Surface texture of single-crystal silicon oxidized under a thin VO layer.

Published in:

Semiconductors, 2017, v. 51, n. 1, p. 104, doi. 10.1134/S106378261701016X

By:

Nikitin, S.;
Verbitskiy, V.;
Nashchekin, A.;
Trapeznikova, I.;
Bobyl, A.;
Terukova, E.

Publication type:

Article

Amide (A)-thioamide (T) interconversions using Ph3SiSH (A to T) and Ph3SnOH (T to A) reagents.

Published in:

Applied Organometallic Chemistry, 2016, v. 30, n. 7, p. 510, doi. 10.1002/aoc.3462

By:

Arias ‐ Ugarte, Renzo N;
Sharma, Hemant K;
Pannell, Keith H

Publication type:

Article

Oxidation of Epitaxial Silicene on Ag(111).

Published in:

Physica Status Solidi (B), 2019, v. 256, n. 2, p. N.PAG, doi. 10.1002/pssb.201800432

By:

Solonenko, Dmytro;
Selyshchev, Oleksandr;
Zahn, Dietrich R. T.;
Vogt, Patrick

Publication type:

Article

An Empirical Rate Constant Based Model to Study Capacity Fading in Lithium Ion Batteries.

Published in:

International Journal of Electrochemistry, 2015, v. 2015, p. 1, doi. 10.1155/2015/439015

By:

Ramesh, Srivatsan;
Ratnam, K. Venkata;
Krishnamurthy, Balaji

Publication type:

Article

Works matching DE "SILICON oxidation"

Microstructure and oxidation resistance of Si modified aluminide coating on TiAl based alloys.

Synthesis of core-shell FeCo@SiO particles coated with the reduced graphene oxide as an efficient broadband electromagnetic wave absorber.

Growth and optical properties of nano-textured (110) Pb(ZrTi)O/(001) ZnO hetero-structure on oxidized silicon substrate.

Controlling A-center concentration in silicon through isovalent doping: mass action analysis.

The oxidation process of NiSi film at high temperature in air and the antioxidant effect of SiON/NiSi film.

Early oxidation stages of the strained Ge/Si(105) surface: A reflectance anisotropy spectroscopy study.

Molecular dynamics simulations on the oxidation of Si(100)/SiO<sub>2</sub> interface: Emissions and incorporations of Si-related species into the SiO<sub>2</sub> and substrate.

Oxidation Behavior at 1600 ° C of Si- Si C- Zr B<sub>2</sub> Composites Produced by Si Reactive Infiltration.

Oxidation behavior of metallurgical silicon slag under non-isothermal and isothermal conditions.

Alkoxy(tetraaryl)silicates bearing 9,10‐disilatriptycene skeleton.

Nitroselenation of carbon‐carbon triple bond by PhSeSePh and NO/O<sub>2</sub> or NO<sub>2</sub>.

Synthesis, structures, and reactivity of 9,9‐dialkoxy‐9‐silafluorenes.

PROPAGATION OF PERTURBATIONS FOR A SIXTH-ORDER THIN FILM EQUATION.

Oxide Liner, Barrier and Seed Layers, and Cu Plating of Blind Through Silicon Vias (TSVs) on 300 mm Wafers for 3D IC Integration.

Sn-adopted fullerene (C60) nanocage as acceptable catalyst for silicon monoxide oxidation.

Facile synthesis of SiO<sub>2</sub>@TiO<sub>2</sub> hybrid NPs with improved photocatalytic performance.

New insight to the oxidation kinetics of silicon-containing steel at high temperature.

Extended fine structure of auger spectra of thermally oxidized silicon surface.

COMBINED INFLUENCE OF SILICON CONTENT AND OXYGEN CONCENTRATION ON THE OXIDATION PROCESS OF SILICON-CONTAINING STEELS.

Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.

Wetting of ceramics by molten silicon and silicon alloys: a review.

Effect of Oxidation Temperature on the Oxidation Process of Silicon-Containing Steel.

Investigation of interface property in Al/SiO/ n-SiC structure with thin gate oxide by illumination.

Near-IR photoluminescence from Si/Ge nanowire-grown silicon wafers: effect of HF treatment.

Finite-length mask effects in the isolation oxidation of silicon.

Deciphering Molecular Mechanisms of Interface Buildup and Stability in Porous Si/Eumelanin Hybrids.

Quantification of germanium-induced suppression of interstitial injection during oxidation of silicon.

One-Electron Oxidation of a Disilicon(0) Compound: An Experimental and Theoretical Study of [Si<sub>2</sub>]<sup>+</sup> Trapped by N-Heterocyclic Carbenes.

Macromesoporous silicon Bragg and microcavity structures.

Magnetic effects in the oxidation of silicon.

THE ROLE OF PRESSURE TO QUANTIFY THE DEFECTS AND ITS EFFECT ON THE MORPHOLOGY OF GRAPHENE LAYERS.

FIRST-PRINCIPLES STUDY OF THE ADSORPTION AND DIFFUSION OF O<sub>2</sub> ON A Si(001) SURFACE.

Surface texture of single-crystal silicon oxidized under a thin VO layer.

Amide (A)-thioamide (T) interconversions using Ph<sub>3</sub>SiSH (A to T) and Ph<sub>3</sub>SnOH (T to A) reagents.

Oxidation of Epitaxial Silicene on Ag(111).

An Empirical Rate Constant Based Model to Study Capacity Fading in Lithium Ion Batteries.