Works matching DE "SILICON nitride films"
Results: 246
Frontispiz: Chemical Vapor Deposition of Ionic Liquids for the Fabrication of Ionogel Films and Patterns.
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- Angewandte Chemie, 2021, v. 133, n. 49, p. 1, doi. 10.1002/ange.202184961
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CW-diode laser crystallization of sputtered amorphous silicon on glass, SiN<sub>x</sub>, and SiO<sub>2</sub> intermediate layers.
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- Journal of Materials Science, 2013, v. 48, n. 12, p. 4177, doi. 10.1007/s10853-013-7230-z
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Detecting Chemical Shifts with Energy Dispersive Spectroscopy.
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- Microscopy & Microanalysis, 2024, v. 30, p. 1, doi. 10.1093/mam/ozae044.143
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Growth Features and Phase Composition of Hf–Sc–O thin Films Synthesized by Atomic Layer Deposition.
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- Journal of Structural Chemistry, 2023, v. 64, n. 3, p. 424, doi. 10.1134/S0022476623030083
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COMPOSITION, STRUCTURE, AND FUNCTIONAL PROPERTIES OF THIN SILICON NITRIDE FILMS GROWN BY ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS (REVIEW OF 25 YEARS OF RESEARCH).
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- Journal of Structural Chemistry, 2022, v. 63, n. 7, p. 1019, doi. 10.1134/S0022476622070022
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DIELECTRIC LAYERS BC<sub>x</sub>N<sub>y</sub>: SYNTHESIS BY THE DECOMPOSITION OF VAPORS OF ORGANOBORON COMPOUNDS, COMPOSITION AND CHEMICAL STRUCTURE.
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- Journal of Structural Chemistry, 2021, v. 62, n. 10, p. 1631, doi. 10.1134/S0022476621100188
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MICROSTRUCTURE OF IRIDIUM ENRICHED Pt<sub>x</sub>Ir<sub>(1–x)</sub> FILMS PREPARED BY CHEMICAL VAPOR DEPOSITION.
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- Journal of Structural Chemistry, 2021, v. 62, n. 9, p. 1447, doi. 10.1134/S0022476621090146
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CHEMICAL STRUCTURE AND FUNCTIONAL PROPERTIES OF AMORPHOUS BORON CARBONITRIDE FILMS.
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- Journal of Structural Chemistry, 2021, v. 62, n. 8, p. 1309, doi. 10.1134/S0022476621080187
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Focusing surface phonon-polaritons for tunable thermal radiation.
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- Discover Nano, 2025, v. 20, n. 1, p. 1, doi. 10.1186/s11671-025-04191-0
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Laser‐Induced Reversible and Irreversible Surface Nanostructuring.
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- Advanced Materials Interfaces, 2021, v. 8, n. 7, p. 1, doi. 10.1002/admi.202001945
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In Situ Liquid Cell TEM Studies on Etching and Growth Mechanisms of Gold Nanoparticles at a Solid–Liquid–Gas Interface.
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- Advanced Materials Interfaces, 2019, v. 6, n. 20, p. N.PAG, doi. 10.1002/admi.201901027
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Atomic and Electronic Structures of a-SiNx:H.
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- Journal of Experimental & Theoretical Physics, 2019, v. 129, n. 5, p. 924, doi. 10.1134/S1063776119080132
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Properties of phosphorus-boron co-doped c-Si quantum dots/SiNx:H thin film prepared by PECVD in-situ deposition.
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- Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-72560-3
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Features of Structure of Magnetron Films Si<sub>3</sub>N<sub>4</sub> and SiC.
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- Journal of Nano- & Electronic Physics, 2013, v. 5, n. 4, p. 04025-1
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Hetero-Epitaxial Growth of AlN Deposited by DC Magnetron Sputtering on Si(111) Using a AlN Buffer Layer.
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- Coatings (2079-6412), 2021, v. 11, n. 9, p. 1063, doi. 10.3390/coatings11091063
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Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization.
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- Coatings (2079-6412), 2021, v. 11, n. 1, p. 22, doi. 10.3390/coatings11010022
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Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects.
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- Coatings (2079-6412), 2019, v. 9, n. 7, p. 416, doi. 10.3390/coatings9070416
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Microfluidic Liquid Cell with Silicon Nitride Super-Thin Membrane for Electron Microscopy of Samples in Liquid.
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- Biosensors (2079-6374), 2022, v. 12, n. 12, p. 1138, doi. 10.3390/bios12121138
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Luminescence and Crystalline Properties of InGaN-based LED on Si Substrate with AlN/GaN Superlattice Structure.
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- Journal of Physical Science, 2021, v. 32, n. 3, p. 1, doi. 10.21315/jps2021.32.3.1
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BUCKLING MORPHOLOGIES AND INTERFACIAL PROPERTIES OF SILICON NITRIDE FILMS DEPOSITED ON FLOAT GLASS SUBSTRATES.
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- Surface Review & Letters, 2015, v. 22, n. 4, p. -1, doi. 10.1142/S0218625X15500468
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Quality Improvement of GaN Epi-layers Grown with a Strain-Releasing Scheme on Suspended Ultrathin Si Nanofilm Substrate.
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- Nanoscale Research Letters, 2022, v. 17, n. 1, p. 1, doi. 10.1186/s11671-022-03732-1
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Structural Characteristics and Photocatalytic Activity of TiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub> Nanocomposite Synthesized via Plasma Sputtering Technique.
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- Iraqi Journal of Physics, 2024, v. 22, n. 4, p. 99, doi. 10.30723/ijp.v22i4.1301
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Employment of Silicon Nitride Films Prepared by DC Reactive Sputtering Technique for Ion Release Applications.
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- Iraqi Journal of Physics, 2023, v. 21, n. 3, p. 33, doi. 10.30723/ijp.v21i3.1141
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Multiparametric Guided-Mode Resonance Biosensor Monitoring Bulk and Surface-Film Variations.
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- Chemosensors, 2022, v. 10, n. 12, p. 541, doi. 10.3390/chemosensors10120541
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薄膜晶体管平坦化层干法刻蚀工艺的研究.
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- Chinese Journal of Liquid Crystal & Displays, 2019, v. 34, n. 11, p. 1055, doi. 10.3788/YJYXS20193411.1055
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Modified Si<sub>3</sub>N<sub>4</sub> filler enhancing the energy storage performance and thermal stability of a P(VDF‐HFP) based composite.
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- Journal of Applied Polymer Science, 2025, v. 142, n. 6, p. 1, doi. 10.1002/app.56472
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Preparation of SiO<sub>2</sub>/Si<sub>3</sub>N<sub>4</sub>ws/PU reinforced coating and its reinforcement mechanism for SLS‐molded TPU materials.
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- Journal of Applied Polymer Science, 2023, v. 140, n. 35, p. 1, doi. 10.1002/app.54355
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Silicon Nitride Film by Inline PECVD for Black Silicon Solar Cells.
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- International Journal of Photoenergy, 2012, p. 1, doi. 10.1155/2012/971093
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Performance investigation of silicon nitride (SiNx) layer doped with twin thin films of gallium and zinc oxide for solar cell.
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- Optical & Quantum Electronics, 2024, v. 56, n. 7, p. 1, doi. 10.1007/s11082-024-07100-4
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Plasma-enhanced chemical vapor deposition of Ga<sub>x</sub>S<sub>1−x</sub> thin films: structural and optical properties.
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- Optical & Quantum Electronics, 2023, v. 55, n. 10, p. 1, doi. 10.1007/s11082-023-05165-1
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Ellipsometry study on silicon nitride film with uneven thickness distribution by plasma-enhanced chemical vapor deposition.
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- Optical & Quantum Electronics, 2023, v. 55, n. 3, p. 1, doi. 10.1007/s11082-022-04270-x
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24.2% efficient POLO back junction solar cell with an AlO<sub>x</sub>/SiN<sub>y</sub> dielectric stack from an industrial‐scale direct plasma‐enhanced chemical vapor deposition system.
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- Progress in Photovoltaics, 2025, v. 33, n. 1, p. 236, doi. 10.1002/pip.3828
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Optically modified second harmonic generation in silicon oxynitride thin films via local layer heating.
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- Scientific Reports, 2023, v. 13, n. 1, p. 1, doi. 10.1038/s41598-023-35593-8
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Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation.
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- Micromachines, 2020, v. 11, n. 1, p. 88, doi. 10.3390/mi11010088
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MODIFICATION OF THE STRUCTURE OF SILICON NITRIDE LAYERS BY THE LOW-TEMPERATURE ANNEAL OF ALGAN/SIC-BASED HIGH ELECTRON MOBILITY TRANSISTORS.
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- Smart Nanocomposites, 2018, v. 8, n. 2, p. 235
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SPECTROSCOPIC DIAGNOSTICS OF OVERSTRESSED NANOSECOND DISCHARGE PLASMA BETWEEN ZINC ELECTRODES IN AIR AND NITROGEN.
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- Journal of Physical Studies, 2022, v. 26, n. 2, p. 2501-1, doi. 10.30970/jps.26.2501
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SiN<sub>x</sub>:H Films for Efficient Bulk Passivation of Nonconventional Wafers for Silicon Heterojunction Solar Cells.
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- JOM: The Journal of The Minerals, Metals & Materials Society (TMS), 2021, v. 73, n. 9, p. 2781, doi. 10.1007/s11837-021-04761-4
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Enhancement of silicon nitride layer performance by Gallium–Copper–Zinc tri-layer thin films structure via plasma featured chemical vapour deposition route.
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- Journal of Materials Science: Materials in Electronics, 2025, v. 36, n. 4, p. 1, doi. 10.1007/s10854-025-14326-9
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Growing Cu<sub>2</sub>ZnSnS<sub>4</sub> Thin Film at Low Temperature Using a New Improved Configuration of Close‐Distance CVD Technique.
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- Crystal Research & Technology, 2023, v. 58, n. 6, p. 1, doi. 10.1002/crat.202300003
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Effects of Nitrogen Content on the Structural, Mechanical, and Corrosion Properties of ZrN Thin Films Grown on AISI 316L by Radiofrequency Magnetron Sputtering.
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- Crystal Research & Technology, 2021, v. 56, n. 12, p. 1, doi. 10.1002/crat.202100096
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Poly‐SiO<sub>x</sub> Passivating Contacts with Plasma‐Assisted N<sub>2</sub>O Oxidation of Silicon (PANO‐SiO<sub>x</sub>).
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- Solar RRL, 2023, v. 7, n. 18, p. 1, doi. 10.1002/solr.202300186
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Structure and Electrical Conductivity of Thin AlN Films on Si.
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- Crystallography Reports, 2024, v. 69, n. 1, p. 65, doi. 10.1134/S1063774523601260
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Investigation of the Plasma-Chemical Synthesis of Thin Ga<sub>2</sub>O<sub>3</sub> Films Doped with Zn in One Step in Plasma.
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- High Energy Chemistry, 2023, v. 57, n. 6, p. 509, doi. 10.1134/S0018143923060115
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Nitride Coatings Based on a High-Entropy Alloy Formed by the Ion-Plasma Method.
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- High Energy Chemistry, 2023, v. 57, p. S77, doi. 10.1134/S0018143923070172
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Phase Composition and Surface Morphology of Thin AlN Films Obtained trough Magnetron Sputtering.
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- High Energy Chemistry, 2023, v. 57, p. S7, doi. 10.1134/S0018143923070056
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A Study on the Process of Plasma-Enhanced Chemical Vapor Deposition of (Al<sub>x</sub>Ga<sub>1 –</sub><sub>x</sub>)<sub>2</sub>O<sub>3</sub> Thin Films.
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- High Energy Chemistry, 2023, v. 57, n. 5, p. 430, doi. 10.1134/S0018143923050065
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Advanced Carbon Nanostructures: Synthesis, Properties, and Applications II.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 24, p. 2026, doi. 10.3390/nano14242026
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Fine-Tuning Intrinsic and Doped Hydrogenated Amorphous Silicon Thin-Film Anodes Deposited by PECVD to Enhance Capacity and Stability in Lithium-Ion Batteries.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 2, p. 204, doi. 10.3390/nano14020204
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Hybrid Silicon Nitride Photonic Integrated Circuits Covered by Single-Walled Carbon Nanotube Films.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 16, p. 2307, doi. 10.3390/nano13162307
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Over- and Undercoordinated Atoms as a Source of Electron and Hole Traps in Amorphous Silicon Nitride (a-Si 3 N 4).
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- Nanomaterials (2079-4991), 2023, v. 13, n. 16, p. 2286, doi. 10.3390/nano13162286
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