Works matching DE "SILICON nitride films"

Results: 254

Single-photon emitters in PECVD-grown silicon nitride films: from material growth to photophysical properties.

Published in:

Nanophotonics (21928606), 2025, v. 14, n. 11, p. 1783, doi. 10.1515/nanoph-2024-0506

By:

Martin, Zachariah O.;
Senichev, Alexander;
Maan, Pranshu;
Ozlu, Mustafa G.;
Marinova, Miroslava;
Shang, Zhongxia;
Lagutchev, Alexei;
Boltasseva, Alexandra;
Shalaev, Vladimir M.

Publication type:

Article

Hybrid Thin Film Coating Performance and Functional Characteristics of Silicon Nitride (SiNx) Layer for Solar Cell Application.

Published in:

Journal of Electronic Materials, 2025, v. 54, n. 6, p. 4518, doi. 10.1007/s11664-025-11888-6

By:

Venkatesh, R.;
Singh, Ravindra Pratap;
Nagarajan, Nagabhooshanam;
Mohanavel, Vinayagam;
Prabagaran, S.;
Subramoniam, Muthurajan;
Soudagar, Manzoore Elahi M.;
Al Obaid, Sami;
Salmen, Saleh Hussein

Publication type:

Article

Structural investigation of ZrN+Si3N4 thin films co-deposited by magnetron sputtering.

Published in:

Surface Engineering, 2022, v. 38, n. 7-9, p. 761, doi. 10.1080/02670844.2022.2154965

By:

Dias, I.L.;
Terto, A.R.;
Silva Neto, P.C.;
Ramirez, D.A.;
Tentardini, E.K.

Publication type:

Article

Delamination of diamond-like carbon films on rough Si3N4 surfaces.

Published in:

Surface Engineering, 2020, v. 36, n. 7, p. 770, doi. 10.1080/02670844.2019.1688015

By:

Shu, Kun;
Zhang, Chuanwei;
Zheng, Dezhi;
Gu, Le;
Wang, Liqin

Publication type:

Article

Rapid Thermal Process for Crystallization Silicon Nitride Films.

Published in:

Surface Engineering, 2020, v. 36, n. 5, p. 456, doi. 10.1080/02670844.2018.1564199

By:

Meziani, Samir;
Moussi, Aberrahmane;
Mahiou, Linda;
Antoni, Frederic;
Outemzabet, Ratiba

Publication type:

Article

Density improvement of Si quantum dots embedded in Si-rich silicon nitride films by light-filtering rapid thermal processing.

Published in:

Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 12, p. 5410, doi. 10.1007/s10854-014-2321-4

By:

Chen, Xiaobo;
Yang, Peizhi

Publication type:

Article

Preparation of nanostructured silicon oxide and silicon nitride films using nanotechnologies.

Published in:

Inorganic Materials, 2013, v. 49, n. 9, p. 904, doi. 10.1134/S0020168513080050

By:

Ezhovskii, Yu.

Publication type:

Article

RF plasma chemical vapor deposition of SiN:H films.

Published in:

Inorganic Materials, 2012, v. 48, n. 8, p. 808, doi. 10.1134/S0020168512070151

By:

Semenova, O.;
Devyatova, S.

Publication type:

Article

Development of directly grown‐graphene–silicon Schottky barrier solar cell using co‐doping technique.

Published in:

International Journal of Energy Research, 2022, v. 46, n. 8, p. 11510, doi. 10.1002/er.7924

By:

Rehman, Malik Abdul;
Park, Sewon;
Khan, Muhammad Farooq;
Bhopal, Muhammad Fahad;
Nazir, Ghazanfar;
Kim, Minjae;
Farooq, Ayesha;
Ha, Jisang;
Rehman, Shania;
Jun, Seong Chan;
Park, Hyung‐Ho

Publication type:

Article

Growth of SiC, AlN, and GaN Films on Silicon Parts of Arbitrary Geometry for Microelectromechanical Applications.

Published in:

Technical Physics Letters, 2023, v. 49, p. S319, doi. 10.1134/S1063785023010182

By:

Kondratenko, T. T.;
Grashchenko, A. S.;
Osipov, A. V.;
Redkov, A. V.;
Ubyivovk, E. V.;
Sharofidinov, Sh. Sh.;
Kukushkin, S. A.

Publication type:

Article

Silica Waveguide Four-Mode Multiplexer Based on Cascaded Directional Couplers.

Published in:

Photonics, 2023, v. 10, n. 9, p. 983, doi. 10.3390/photonics10090983

By:

Wang, Manzhuo;
Sun, Xiaoqiang;
Liu, Tingyu;
Yue, Jianbo;
Sun, Chaoyang;
Li, Dehui;
Wu, Yuanda;
Zhang, Daming

Publication type:

Article

Experimental simulation of bending damage of silicon nitride yarn during 3D orthogonal fabric forming process.

Published in:

Journal of Industrial Textiles, 2022, v. 51, p. 3811S, doi. 10.1177/15280837211010681

By:

Wu, Ning;
Li, Shuai;
Han, Meiyue;
Zhu, Chao;
Jiao, Yanan;
Chen, Li

Publication type:

Article

Transition Metals in a Cast‐Monocrystalline Silicon Ingot Studied by Silicon Nitride Gettering.

Published in:

Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 12, p. N.PAG, doi. 10.1002/pssr.201900456

By:

Sun, Chang;
Liu, AnYao;
Samadi, Aref;
Chan, Catherine;
Ciesla, Alison;
Macdonald, Daniel

Publication type:

Article

Bacterial community in peanut soils in various cropping systems.

Published in:

Allelopathy Journal, 2017, v. 42, n. 1, p. 93, doi. 10.26651/2017-42-1-1108

By:

Huang, Y. Q.;
Han, L. S.;
Tao, T. T.;
Yao, Y. C.;
Yang, J. F.;
Liang, C. H.;
Xie, J. H.;
Han, X. R.

Publication type:

Article

Effect of doping on the formation of silicon nanocrystal in silicon nitride films.

Published in:

Modern Physics Letters B, 2015, v. 29, n. 8, p. -1, doi. 10.1142/S0217984915500268

By:

Chen, Xiaobo;
Zhang, Li

Publication type:

Article

Performance investigation of silicon nitride (SiNx) layer doped with twin thin films of gallium and zinc oxide for solar cell.

Published in:

Optical & Quantum Electronics, 2024, v. 56, n. 7, p. 1, doi. 10.1007/s11082-024-07100-4

By:

Venkatesh, R.;
Logesh, K.;
Kumar, Rakesh;
Singh, Satyendra;
Singh, Pradeep Kumar;
Vijay, S. N. S. Maruthy;
Kaliappan, Seeniappan;
Soudagar, Manzoore Elahi Mohammad;
Ifseisi, Ahmad A.

Publication type:

Article

Plasma-enhanced chemical vapor deposition of GaxS1−x thin films: structural and optical properties.

Published in:

Optical & Quantum Electronics, 2023, v. 55, n. 10, p. 1, doi. 10.1007/s11082-023-05165-1

By:

Mochalov, Leonid;
Kudryashov, Mikhail;
Vshivtsev, Maksim;
Prokhorov, Igor;
Kudryashova, Yuliya;
Mosyagin, Pavel;
Slapovskaya, Ekaterina

Publication type:

Article

Ellipsometry study on silicon nitride film with uneven thickness distribution by plasma-enhanced chemical vapor deposition.

Published in:

Optical & Quantum Electronics, 2023, v. 55, n. 3, p. 1, doi. 10.1007/s11082-022-04270-x

By:

Zhong, Zhiqin;
Luo, Xiang;
Zhou, Li;
Hu, Sifu;
Dai, Liping;
Wang, Shuya;
Yang, Shaopeng

Publication type:

Article

Structural Characteristics and Photocatalytic Activity of TiO2/Si3N4 Nanocomposite Synthesized via Plasma Sputtering Technique.

Published in:

Iraqi Journal of Physics, 2024, v. 22, n. 4, p. 99, doi. 10.30723/ijp.v22i4.1301

By:

Munif, Ali N.;
Kadhim, Firas J.

Publication type:

Article

Employment of Silicon Nitride Films Prepared by DC Reactive Sputtering Technique for Ion Release Applications.

Published in:

Iraqi Journal of Physics, 2023, v. 21, n. 3, p. 33, doi. 10.30723/ijp.v21i3.1141

By:

Taher, Diyar A.;
Hameed, Mohammed A.

Publication type:

Article

Surface Polaritons in Silicon-Doped Aluminum and Gallium Nitride Films.

Published in:

Optics & Spectroscopy, 2019, v. 127, n. 1, p. 36, doi. 10.1134/S0030400X19070208

By:

Novikova, N. N.;
Yakovlev, V. A.;
Klimin, S. A.;
Malin, T. V.;
Gilinsky, A. M.;
Zhuravlev, K. S.

Publication type:

Article

High-Performance Electro-Optical Mach–Zehnder Modulators in a Silicon Nitride–Lithium Niobate Thin-Film Hybrid Platform.

Published in:

Photonics, 2022, v. 9, n. 7, p. N.PAG, doi. 10.3390/photonics9070500

By:

Han, Huangpu;
Yang, Fan;
Liu, Chenghao;
Wang, Zhengfang;
Jiang, Yunpeng;
Chai, Guangyue;
Ruan, Shuangchen;
Xiang, Bingxi

Publication type:

Article

Investigation of the Plasma-Chemical Synthesis of Thin Ga2O3 Films Doped with Zn in One Step in Plasma.

Published in:

High Energy Chemistry, 2023, v. 57, n. 6, p. 509, doi. 10.1134/S0018143923060115

By:

Mochalov, L. A.;
Kudryashov, M. A.;
Prokhorov, I. O.;
Vshivtsev, M. A.;
Kudryashova, Yu. P.;
Slapovskaya, E. A.;
Knyazev, A.V.

Publication type:

Article

Nitride Coatings Based on a High-Entropy Alloy Formed by the Ion-Plasma Method.

Published in:

High Energy Chemistry, 2023, v. 57, p. S77, doi. 10.1134/S0018143923070172

By:

Ivanov, Yu. F.;
Akhmadeev, Yu. H.;
Koval, N. N.;
Shugurov, V. V.;
Petrikova, E. A.;
Krysina, O. V.;
Prokopenko, N. A.;
Tolkachev, O. S.

Publication type:

Article

Phase Composition and Surface Morphology of Thin AlN Films Obtained trough Magnetron Sputtering.

Published in:

High Energy Chemistry, 2023, v. 57, p. S7, doi. 10.1134/S0018143923070056

By:

Baranova, L. V.;
Strunin, V. I.;
Baysova, B. T.;
Chirikov, N. A.

Publication type:

Article

A Study on the Process of Plasma-Enhanced Chemical Vapor Deposition of (AlxGa1 –x)2O3 Thin Films.

Published in:

High Energy Chemistry, 2023, v. 57, n. 5, p. 430, doi. 10.1134/S0018143923050065

By:

Mochalov, L. A.;
Kudryashov, M. A.;
Prokhorov, I. O.;
Vshivtsev, M. A.;
Kudryashova, Yu. P.;
Knyazev, A. V.

Publication type:

Article

Raman scattering enhancement of dielectric microspheres on silicon nitride film.

Published in:

Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-09315-5

By:

Ogura, Toshihiko

Publication type:

Article

Raman scattering enhancement of dielectric microspheres on silicon nitride film.

Published in:

Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-09315-5

By:

Ogura, Toshihiko

Publication type:

Article

Enhanced photonics devices based on low temperature plasma-deposited dichlorosilane-based ultra-silicon-rich nitride (Si8N).

Published in:

Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-09227-4

By:

Ng, Doris K. T.;
Gao, Hongwei;
Xing, Peng;
Chen, George F. R.;
Chia, Xavier X.;
Cao, Yanmei;
Ong, Kenny Y. K.;
Tan, Dawn T. H.

Publication type:

Article

Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition.

Published in:

Plasma Chemistry & Plasma Processing, 2024, v. 44, n. 3, p. 1343, doi. 10.1007/s11090-024-10455-x

By:

Carnide, G.;
Simonnet, C.;
Parmar, D.;
Zavvou, Z.;
Klein, H.;
Conan, R.;
Pozsgay, V.;
Verdier, T.;
Villeneuve-Faure, C.;
Kahn, M. L.;
Stafford, L.;
Clergereaux, R.

Publication type:

Article

Modified Si3N4 filler enhancing the energy storage performance and thermal stability of a P(VDF‐HFP) based composite.

Published in:

Journal of Applied Polymer Science, 2025, v. 142, n. 6, p. 1, doi. 10.1002/app.56472

By:

Yang, Zi;
Xia, Weimin;
Zhang, Shiyu;
Zhang, Xiaofang;
Zhang, Xinyi

Publication type:

Article

Preparation of SiO2/Si3N4ws/PU reinforced coating and its reinforcement mechanism for SLS‐molded TPU materials.

Published in:

Journal of Applied Polymer Science, 2023, v. 140, n. 35, p. 1, doi. 10.1002/app.54355

By:

Zhang, Cheng;
Wu, Wei;
Hu, Huanbo;
Rui, Zhengguo;
Ye, Junjian;
Wang, Zhengyi;
Wang, Yi;
Shen, Hui

Publication type:

Article

Electronic Structure of SiN Layers on Si(111) and SiC/Si(111) Substrates.

Published in:

Semiconductors, 2019, v. 53, n. 14, p. 1935, doi. 10.1134/S1063782619140239

By:

Timoshnev, S. N.;
Mizerov, A. M.;
Lapushkin, M. N.;
Kukushkin, S. A.;
Bouravleuv, A. D.

Publication type:

Article

Dependence of Mechanical Stresses in Silicon Nitride Films on the Mode of Plasma-Enhanced Chemical Vapor Deposition.

Published in:

Semiconductors, 2018, v. 52, n. 15, p. 1953, doi. 10.1134/S1063782618150095

By:

Novak, A. V.;
Novak, V. R.;
Dedkova, A. A.;
Gusev, E. E.

Publication type:

Article

A study of the effect of the structure of plasma-chemical silicon nitride on its masking properties.

Published in:

Semiconductors, 2015, v. 49, n. 13, p. 1727, doi. 10.1134/S1063782615130084

By:

Garmash, V.;
Egorkin, V.;
Zemlyakov, V.;
Kovalchuk, A.;
Shapoval, S.

Publication type:

Article

SPECTROSCOPIC DIAGNOSTICS OF OVERSTRESSED NANOSECOND DISCHARGE PLASMA BETWEEN ZINC ELECTRODES IN AIR AND NITROGEN.

Published in:

Journal of Physical Studies, 2022, v. 26, n. 2, p. 2501-1, doi. 10.30970/jps.26.2501

By:

Shuaibov, O. K.;
Hrytsak, R. V.;
Minya, O. I.;
Malinina, A. A.;
Bilak, Yu. Yu.;
Gomoki, Z. T.

Publication type:

Article

Plasma-Assisted Epitaxy of Piezoelectric ScxAl1-xN Films on Sapphire for Use in Harsh-Environment Microwave Acoustic Sensors.

Published in:

Journal of Electronic Materials, 2022, v. 51, n. 4, p. 1473, doi. 10.1007/s11664-021-09425-2

By:

Greenslit, Morton;
da Cunha, Mauricio Pereira;
Lad, Robert J.

Publication type:

Article

Characteristics of Crack-Free Silicon Nitride Films Deposited by LPCVD for Photonic Applications.

Published in:

Journal of Electronic Materials, 2021, v. 50, n. 12, p. 6862, doi. 10.1007/s11664-021-09190-2

By:

Li, Donghao;
Li, Bin;
Tang, Bo;
Zhang, Peng;
Yang, Yan;
Liu, Ruonan;
Xie, Ling;
Li, Zhihua

Publication type:

Article

Growth Mechanisms and Structural Properties of Lead Chalcogenide Films Grown by Pulsed Laser Deposition.

Published in:

Journal of Electronic Materials, 2017, v. 46, n. 1, p. 175, doi. 10.1007/s11664-016-4903-9

By:

Virt, I.;
Rudyi, I.;
Lopatynskyi, I.;
Dubov, Yu.;
Tur, Y.;
Lusakowska, E.;
Luka, G.

Publication type:

Article

Broadband Absorption Enhancement in Thin Film Solar Cells Using Asymmetric Double-Sided Pyramid Gratings.

Published in:

Journal of Electronic Materials, 2016, v. 45, n. 11, p. 5685, doi. 10.1007/s11664-016-4735-7

By:

Alshal, Mohamed;
Allam, Nageh

Publication type:

Article

Investigation of ICPECVD Silicon Nitride Films for HgCdTe Surface Passivation.

Published in:

Journal of Electronic Materials, 2015, v. 44, n. 9, p. 2990, doi. 10.1007/s11664-015-3703-y

By:

Zhang, J.;
Umana-Membreno, G.A.;
Gu, R.;
Lei, W.;
Antoszewski, J.;
Dell, J.M.;
Faraone, L.

Publication type:

Article

Characteristics and Charge Storage of Silicon Quantum Dots Embedded in Silicon Nitride Film.

Published in:

Journal of Electronic Materials, 2015, v. 44, n. 3, p. 1015, doi. 10.1007/s11664-014-3614-3

By:

Liao, Wugang;
Zeng, Xiangbin;
Wen, Xixing;
Zheng, Wenjun;
Wen, Yangyang;
Yao, Wei

Publication type:

Article

Specific heat capacity of chromium aluminum based nitride and oxynitride hard coatings.

Published in:

Materialwissenschaft und Werkstoffechnik, 2024, v. 55, n. 2, p. 240, doi. 10.1002/mawe.202300147

By:

Bobzin, K.;
Kalscheuer, C.;
Carlet, M.;
Janowitz, J.

Publication type:

Article

Enhancement of silicon nitride layer performance by Gallium–Copper–Zinc tri-layer thin films structure via plasma featured chemical vapour deposition route.

Published in:

Journal of Materials Science: Materials in Electronics, 2025, v. 36, n. 4, p. 1, doi. 10.1007/s10854-025-14326-9

By:

Venkatesh, R.;
Singh, Pradeep Kumar;
Venkatasubramanian, R.;
Vaidyanathan, Ishwarya Mayiladuthurai;
Deshwal, Deepti;
Soudagar, Manzoore Elahi M.;
Mohanavel, Vinayagam;
Al Obaid, Sami;
Alharbi, Sulaiman Ali

Publication type:

Article

Electroless deposition of palladium films on gallium nitride for Schottky diodes.

Published in:

Journal of Materials Science: Materials in Electronics, 2022, v. 33, n. 10, p. 7598, doi. 10.1007/s10854-022-07907-5

By:

Dail, Steven P.;
Molina, Alex;
Campbell, Ian E.;
Mughal, Asad J.;
Mohney, Suzanne E.

Publication type:

Article

Plasmonic performance, electrical and optical properties of titanium nitride nanostructured thin films for optoelectronic applications.

Published in:

Journal of Materials Science: Materials in Electronics, 2021, v. 32, n. 24, p. 28204, doi. 10.1007/s10854-021-07197-3

By:

El-Rahman, A. M. Abd;
Mohamed, S. H.;
Khan, Mohd Taukeer;
Awad, M. A.

Publication type:

Article

Growth of hexagonal boron nitride films on silicon substrates by low-pressure chemical vapor deposition.

Published in:

Journal of Materials Science: Materials in Electronics, 2021, v. 32, n. 3, p. 3713, doi. 10.1007/s10854-020-05116-6

By:

Chen, Xi;
Tan, Chunbo;
Liu, Xiaohang;
Luan, Kairan;
Guan, Yufeng;
Liu, Xiuhuan;
Zhao, Jihong;
Hou, Lixin;
Gao, Yanjun;
Chen, Zhanguo

Publication type:

Article

Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate.

Published in:

Technical Physics, 2022, v. 66, n. 4, p. 1111, doi. 10.1134/S1063784221080089

By:

Grenadyorov, A. S.;
Solovyev, A. A.;
Oskomov, K. V.;
Zhulkov, M. O.

Publication type:

Article

Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate.

Published in:

Technical Physics, 2021, v. 66, n. 10, p. 1111, doi. 10.1134/S1063784221080089

By:

Grenadyorov, A. S.;
Solovyev, A. A.;
Oskomov, K. V.;
Zhulkov, M. O.

Publication type:

Article

A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition.

Published in:

Technical Physics, 2021, v. 66, n. 5, p. 658, doi. 10.1134/S1063784221040174

By:

Shibalov, M. V.;
Porokhov, N. V.;
Mumlyakov, A. M.;
Trofimov, I. V.;
Dyud'bin, G. D.;
Timofeeva, E. R.;
Tagachenkov, A. M.;
Anufriev, Yu. V.;
Zenova, E. V.;
Tarkhov, M. A.

Publication type:

Article