Works about SEMICONDUCTORS

Results: 5000

Computational discovery of metallic MBenes for two-dimensional semiconductor contacts approaching the quantum limit.

Published in:

NPJ Computational Materials, 2025, v. 11, n. 1, p. 1, doi. 10.1038/s41524-025-01640-3

By:

Li, Meng;
Cao, Dan;
Xie, Dabao;
Gong, Meiying;
Zhang, Congmin;
You, Tao;
Zhou, Jing;
Chen, Xiaoshuang;
Shu, Haibo

Publication type:

Article

Data-driven clustering learning modeling for semiconductor silicon single crystal growth process based on fuzzy C-means and DBN.

Published in:

Transactions of the Institute of Measurement & Control, 2025, v. 47, n. 9, p. 1748, doi. 10.1177/01423312241265281

By:

Liu, Yuyu;
Liu, Ding;
Song, Zezhong

Publication type:

Article

A novel high-performance wide-range vacuum sensor based on a weak-coupling resonator.

Published in:

Microsystems & Nanoengineering, 2025, v. 11, n. 1, p. 1, doi. 10.1038/s41378-025-00937-z

By:

Qin, Jiaxin;
Xia, Wenliang;
Wang, Junbo;
Chen, Deyong;
Lu, Yulan;
Huo, Xiaoye;
Xie, Bo;
Chen, Jian

Publication type:

Article

Synthesis of Conjugated Polymers with Controlled Terminal Structures by Direct Arylation Polycondensation and Correlation Between Terminal Structures and Emission Properties.

Published in:

Macromolecular Chemistry & Physics, 2025, v. 226, n. 10, p. 1, doi. 10.1002/macp.202400506

By:

Hu, Ziwei;
Yasuda, Takeshi;
Kanbara, Takaki;
Kuwabara, Junpei

Publication type:

Article

Graphene Nanoribbon Core Thermotropic Liquid Crystal with a Well‐Defined Molecular Structure.

Published in:

Angewandte Chemie, 2025, v. 137, n. 21, p. 1, doi. 10.1002/ange.202501161

By:

Hu, Jun;
Yu, Zhen;
Yang, Yong;
Huang, Jiaxiang;
Liu, Zhiyang;
Huang, Shuai;
Wang, Meng;
Yang, Hong

Publication type:

Article

SEMICONDUCTOR INVESTMENT REVISITED: THE USMCA, MEXICO, AND MAQUILADORAS.

Published in:: Boston College Law Review, 2025, v. 66, n. 4, p. 1485, doi. 10.70167/pgbl7651
Publication type:: Article

Characterization and Optimization of Si0.75Ge0.25-FinFETs Based on Operating Temperature and Gate Length.

Published in:

Journal of Nano- & Electronic Physics, 2025, v. 17, n. 2, p. 1, doi. 10.21272/jnep.17(2).02011

By:

Atalla, Yousif;
Mamat, Mohamad Hafiz;
Hashim, Yasir

Publication type:

Article

Bi2Se3/ZnSe heterojunction on flexible Mo metal foil for photo electrolysis water splitting application.

Published in:

Zeitschrift für Physikalische Chemie, 2025, v. 239, n. 5, p. 697, doi. 10.1515/zpch-2024-0818

By:

Singh, Bheem;
Dhiman, Vinay Kumar;
Chandra Behera, Govinda;
Gautam, Sudhanshu;
Kumar, Rahul;
Senthil Kumar, Muthusamy;
Roy, Somnath C.;
Kushvaha, Sunil Singh

Publication type:

Article

A Glimpse of the Initial Semiconductor and Transistor Research in Independent India.

Published in:

IETE Technical Review, 2025, v. 42, n. 1, p. 162, doi. 10.1080/02564602.2025.2485901

By:

Basu, Prasanta Kumar

Publication type:

Article

Two-Dimensional Materials, the Ultimate Solution for Future Electronics and Very-Large-Scale Integrated Circuits.

Published in:

Nano-Micro Letters, 2025, v. 17, n. 1, p. 1, doi. 10.1007/s40820-025-01769-2

By:

Qin, Laixiang;
Wang, Li

Publication type:

Article

Fibre-based organic electrochemical transistors: principle, evaluation, and application.

Published in:

NPJ Flexible Electronics, 2025, v. 9, n. 1, p. 1, doi. 10.1038/s41528-025-00417-4

By:

Huang, Yingying;
Hu, Zhijun;
Zhu, Shouwen;
Fang, Bo

Publication type:

Article

Propriedades elétricas da hexaferrita do tipo M BaFe12O19 investigadas por espectroscopia de impedância à baixa temperatura.

Published in:

Ceramica, 2024, v. 70, p. 1, doi. 10.1590/UNGD5290

By:

e Silva Júnior, Flávio Moura;
Costa Cruz, Felipe;
Castro Junior, Manoel Carvalho;
Costa dos Santos, Clenilton

Publication type:

Article

High‐Density Post‐Perovskite for Ultra‐Sensitive Hard X‐Ray Detection.

Published in:

Angewandte Chemie, 2025, v. 137, n. 19, p. 1, doi. 10.1002/ange.202425448

By:

Xia, Mengling;
Li, Yuzhu;
Li, Chenxing;
Xu, Yinsheng;
Niu, Guangda

Publication type:

Article

Effect of SiC Particle Size on the Properties of TiSi2/SiC Composites Semiconductor Fabricated by Liquid Infiltration of Ti–Si Eutectic Alloy.

Published in:

Advanced Engineering Materials, 2025, v. 27, n. 9, p. 1, doi. 10.1002/adem.202402449

By:

Zhao, Ziyan;
Qi, Qian;
Liu, Xuejian;
Huang, Zhengren;
Liu, Yan

Publication type:

Article

Förster valley-orbit coupling and topological lattice of hybrid moiré excitons.

Published in:

Communications Physics, 2025, v. 8, n. 1, p. 1, doi. 10.1038/s42005-025-02114-0

By:

Zheng, Huiyuan;
Li, Ci;
Yu, Hongyi;
Yao, Wang

Publication type:

Article

장거리 드론 통신을 위한 저전력 협대역 433 MHz 송수신IC.

Published in:

Journal of Korean Institute of Electromagnetic Engineering & Science / Han-Guk Jeonjapa Hakoe Nonmunji, 2025, v. 36, n. 3, p. 254, doi. 10.5515/KJKIEES.2025.36.3.254

By:

이기성;
박동욱;
변기륜;
오태현;
오혁준;
어윤성

Publication type:

Article

Imec und ZEISS bündeln Kräfte für Halbleitertechnologien.

Published in:: Elektronik Industrie, 2025, p. 9
Publication type:: Article

Chiplets für Automotive-Anwendungen.

Published in:: Elektronik Industrie, 2025, p. 6
Publication type:: Article

Power-Management-IC.

Published in:: Elektronik Industrie, 2025, p. 16
Publication type:: Article

Flexibilität für Embedded-Software-Entwickler.

Published in:: Elektronik Industrie, 2025, p. 62
Publication type:: Article

Low Band Gap Furan‐Flanked Diketopyrrolopyrrole‐Naphthobisthiadiazole Based Conjugated Polymer/Stretchable Blend for Organic Field Effect Transistors.

Published in:

Advanced Electronic Materials, 2025, v. 11, n. 6, p. 1, doi. 10.1002/aelm.202400614

By:

Kranthiraja, Kakaraparthi;
Sethumadhavan, Vithyasaahar;
Kumagai, Shohei;
Xu, Yanan;
Erhardt, Andreas;
McNeill, Christopher R.;
Manzhos, Sergei;
Takeya, Jun;
Sonar, Prashant

Publication type:

Article

Improving Charge Transport and Environmental Stability of Carbohydrate‐Bearing Semiconducting Polymers in Organic Field‐Effect Transistors.

Published in:

Advanced Electronic Materials, 2025, v. 11, n. 6, p. 1, doi. 10.1002/aelm.202400537

By:

Mooney, Madison;
Pandolfi, Lauren;
Wang, Yunfei;
Zhu, Chenhui;
Garg, Garima;
Kraft, Ulrike;
Gu, Xiaodan;
Rondeau‐Gagné, Simon

Publication type:

Article

Giant Nonlinear Hall Effect Induced Ultrahigh Rectification in a Weyl Semiconductor.

Published in:

Advanced Electronic Materials, 2025, v. 11, n. 6, p. 1, doi. 10.1002/aelm.202400648

By:

Liu, Hao;
Lim, Ting Yong;
Tian, Shijia;
Zhai, Jinfeng;
Xiang, Du;
Liu, Tao;
Chang, Tay‐Rong;
He, Pan;
Shen, Jian

Publication type:

Article

Uncovering the doping mechanism of nitric oxide in high-performance P-type WSe2 transistors.

Published in:

Nature Communications, 2025, v. 16, n. 1, p. 1, doi. 10.1038/s41467-025-59423-9

By:

Lan, Hao-Yu;
Lin, Chih-Pin;
Liu, Lina;
Cai, Jun;
Sun, Zheng;
Wu, Peng;
Tan, Yuanqiu;
Yang, Shao-Heng;
Hou, Tuo-Hung;
Appenzeller, Joerg;
Chen, Zhihong

Publication type:

Article

Computers in the human services.

Published in:

Social Work, 1979, v. 24, n. 2, p. 96

By:

Schoech, Dick;
Arangio, Tony

Publication type:

Article

Developments in materials for 157nm photoresists.

Published in:: Solid State Technology, 2001, v. 44, n. 10, p. 63
Publication type:: Article

The race is on: CVD and spin-on vie for the low-k dielectric market.

Published in:

Solid State Technology, 2001, v. 44, n. 10, p. 40

By:

Corbett, Michael A.;
Davis, John C.

Publication type:

Article

Chemistry and treatment of III-V semiconductor wastewater.

Published in:

Solid State Technology, 2001, v. 44, n. 8, p. 79

By:

Golden, Josh H.;
Olds, Andrew;
Hannan, William

Publication type:

Article

An alternative to solid polyurethane for CMP.

Published in:

Solid State Technology, 2001, v. 44, n. 8, p. 30

By:

Dejule, Ruth

Publication type:

Article

WORLDWIDE HIGHLIGHTS.

Published in:: Solid State Technology, 2001, v. 44, n. 8, p. 18
Publication type:: Article

Characterizing resists and films with VUV spectroscopic ellipsometry.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 165

By:

Boher, Pierre;
Evrard, Patrick;
Piel, Jean Philippe;
Defranoux, Christophe;
Stehle, Jean Louis

Publication type:

Article

Safety solutions for high-pressure gas cylinders.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 153

By:

Dubois, Ray;
Mayer, James

Publication type:

Article

Spin-on stacked films for low-k[sub eff] dielectrics.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 105

By:

Thomas, Michael E.

Publication type:

Article

Floating 3-D display seemingly out of sci-fi.

Published in:: Solid State Technology, 2001, v. 44, n. 6, p. 28
Publication type:: Article

Adapting to the economics of SOC.

Published in:

Solid State Technology, 2001, v. 44, n. 6, p. 14

By:

Haavind, Robert

Publication type:

Article

WORLDWIDE HIGHLIGHTS.

Published in:: Solid State Technology, 2001, v. 44, n. 5, p. 18
Publication type:: Article

Navigating yield through the maze of copper CMP defects.

Published in:

Solid State Technology, 2001, v. 44, n. 4, p. 63

By:

Guha, Sumit;
Sethuraman, Anantha;
Gotkis, Yehiel;
Kistler, Rodney;
Steckenrider, Scott

Publication type:

Article

Process and environmental benefits with solvent-free stripping.

Published in:

Solid State Technology, 2001, v. 44, n. 4, p. 52

By:

Bersin, Richard;
Horn, Amanda;
Xu, Han;
Dopp, Douglas;
Boumerzoug, Mohamed

Publication type:

Article

Eliminating the effects of gas-system pressure transients.

Published in:

Solid State Technology, 2001, v. 44, n. 2, p. 115

By:

Urdaneta, Nelson

Publication type:

Article

Part Two of Two--Operation: How to make a sensor smarter.

Published in:

Solid State Technology, 2001, v. 44, n. 2, p. 105

By:

McCafferty, Robert H.

Publication type:

Article

Ultrasonic technologies enable ultra-fine-pitch low-temperature bonding.

Published in:

Solid State Technology, 2001, v. 44, n. 2, p. 97

By:

Parrini, Lorenzo

Publication type:

Article

At long last, SOI wafer market on the move.

Published in:

Solid State Technology, 2001, v. 44, n. 2, p. 62

By:

Ogawa, Takashi

Publication type:

Article

Advanced lithography needs rigorously tested fused silica glass.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 111

By:

Smith, Charlene;
Ackerman, Bradford G.

Publication type:

Article

Strong phase shift mask designs with lower cost.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 104

By:

Levenson, M. D.

Publication type:

Article

Low-k integration issues.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 78

By:

Hsueh, Gary

Publication type:

Article

Equipment and process considerations for ALD.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 70

By:

Xi, Ming

Publication type:

Article

Nodal predictions.

Published in:: Solid State Technology, 2001, v. 44, n. 1, p. 62
Publication type:: Article

The lithography equipment marketplace.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 58

By:

Castellano, Robert N.

Publication type:

Article

Welcome to the REAL New Millennium.

Published in:

2001

By:

Haavind, Robert

Publication type:

Editorial

M is for Manufacturing.

Published in:

Solid State Technology, 2000, v. 43, n. 12, p. 44

By:

Lunday, Christine

Publication type:

Article