Works matching DE "SEMICONDUCTOR etching"

Results: 126

Implementation of extended temperature range etching.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 76

By:

McKibben, James D.

Publication type:

Article

New capabilities with 3-D laser etching.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 72

By:

Ehrlich, Daniel J.

Publication type:

Article

Etch and CVD process improvements via heated vacuum throttle valves.

Published in:

Solid State Technology, 2000, v. 43, n. 12, p. 80

By:

Goodman, Dan;
Pewsey, Shaun

Publication type:

Article

An integrated wet chemical etch-strip-clean sequence.

Published in:

Solid State Technology, 2000, v. 43, n. 10, p. 146

By:

Coze, Arnaud;
Philit, Gaelle

Publication type:

Article

A new concept for etch and deposition chamber pressure control.

Published in:

Solid State Technology, 2000, v. 43, n. 9, p. 149

By:

Caldwell, Kenneth

Publication type:

Article

An integrated etch approach as STI evolves for the 100nm regime.

Published in:

Solid State Technology, 2000, v. 43, n. 7, p. 157

By:

Lassig, Steve;
Xu, C. Shan;
Miller, Alan J.;
Kamath, Sanjay;
Romano, Andy;
Kudo, Takanori

Publication type:

Article

Thickness measurement of submonolayer native oxide films on silicon wafers.

Published in:

Solid State Technology, 2000, v. 43, n. 2, p. 87

By:

Li, Fuhe;
Balazs, Marjorie K.;
Deal, Bruce E.

Publication type:

Article

Curbing plasma-induced gate oxide damage.

Published in:

Solid State Technology, 1999, v. 42, n. 3, p. 49

By:

Gabriel, Calvin T.

Publication type:

Article

Eliminating backgrind defects with wet chemical etching.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 85

By:

McHatton, Cheryl;
Gumbert, Cynthia M.

Publication type:

Article

Etching new IC materials for memory devices.

Published in:

Solid State Technology, 1998, v. 41, n. 8, p. 53

By:

DeOrnellas, Stephen P.;
Cofer, Alferd

Publication type:

Article

Maskmakers and lithographers need to `just do it.'

Published in:

Solid State Technology, 1998, v. 41, n. 8, p. 36

By:

Burggraaf, Pieter

Publication type:

Article

Wet-etch process improvements through SPC.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 119

By:

Taylor, Donald S.

Publication type:

Article

Reactive Ion Beam Etching of PZT Thin Films.

Published in:

Ferroelectrics, 2003, v. 288, n. 1, p. 253, doi. 10.1080/00150190390211530

By:

Soyer, C.;
Cattan, E.;
Remiens, D.

Publication type:

Article

Three-Dimensional Simulations of the Anisotropic Etching Profile Evolution for Producing Nanoscale Devices.

Published in:

Acta Physica Polonica: A, 2011, v. 119, n. 3, p. 447

By:

Radjenović, B.;
Radmilović-Radjenović, M.

Publication type:

Article

Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2015, v. 212, n. 10, p. 2341, doi. 10.1002/pssa.201532223

By:

Li, Wanyong;
Luo, Yi;
Xiong, Bing;
Sun, Changzheng;
Wang, Lai;
Wang, Jian;
Han, Yanjun;
Yan, Jianchang;
Wei, Tongbo;
Lu, Hongxi

Publication type:

Article

Influence of etching parameters on optoelectronic properties of c-Si/porous silicon heterojunction – application to solar cells.

Published in:

European Physical Journal - Applied Physics, 2013, v. 61, n. 3, p. 00, doi. 10.1051/epjap/2013120152

By:

Bechiri, Fatiha;
Zerdali, Mokhtar;
Rahmoun, Ilham;
Hamzaoui, Saad;
Adnane, Mohamed;
Sahraoui, Taoufik

Publication type:

Article

Electrochemical characteristics of the n +-type GaAs substrate in HCl electrolyte and the morphology of the obtained structure

Published in:

Arabian Journal of Chemistry, 2011, v. 4, n. 4, p. 473, doi. 10.1016/j.arabjc.2010.07.011

By:

Mazouz, Z.;
Beji, L.;
Meddeb, J.;
Ben Ouada, H.

Publication type:

Article

Low mechanical pressure during electrochemical etching: induced modification in optical and structural properties of n-type porous silicon.

Published in:

Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 12, p. 2173, doi. 10.1007/s10854-012-0738-1

By:

Naddaf, M.

Publication type:

Article

Plasma Surface Modification of PMMA for Optical Applications.

Published in:

Journal of Adhesion Science & Technology, 2010, v. 24, n. 7, p. 1283, doi. 10.1163/016942409X12561252292026

By:

Schulz, U.;
Munzert, P.;
Kaiser, N.

Publication type:

Article

High Shear Speed Characteristics of Sub-100 μm Low Alpha SAC105 Solder Bump Directly Fabricated on Cu Filled Through Si Via for 3D Integration.

Published in:

Journal of Microelectronic & Electronic Packaging, 2015, v. 12, n. 3, p. 161, doi. 10.4071/imaps.416

By:

Do Hyun Jung;
Agarwal, Shalu;
Kumar, Santosh;
Jae Pil Jung

Publication type:

Article

Development and Characterization of Tapered Silicon Etch Process by Topography Modeling for TSV Application.

Published in:

Journal of Microelectronic & Electronic Packaging, 2010, v. 7, n. 1, p. 58, doi. 10.4071/1551-4897-7.1.58

By:

Ranganathan, N.;
Malar, A.;
Lee, D. Y.;
Prasad, K.;
Pey, K. L.

Publication type:

Article

Design and Fabrication of MEMS Micropumps using Double Sided Etching.

Published in:

Journal of Microelectronic & Electronic Packaging, 2010, v. 7, n. 1, p. 44, doi. 10.4071/1551-4897-7.1.44

By:

Yunas, Jumril;
Johari, Juliana;
Hamzah, A. A.;
Gebeshuber, Ille C.;
Majlis, Burhanuddin Yeop

Publication type:

Article

Etch Defect Characterization and Reduction in Hard-Mask-Based Al Interconnect Etching.

Published in:

International Journal of Plasma Science & Engineering, 2008, p. 1, doi. 10.1155/2008/154035

By:

Hong-Ji Lee;
Che-Lun Hung;
Chia-Hao Leng;
Nan-Tzu Lian;
Ling-Wu Young;
Tahone Yang;
Kuang-Chao Chen;
Chih-Yuan Lu

Publication type:

Article

High performance a-IGZO thin-film transistors with mf-PVD SiO2 as an etch-stop-layer.

Published in:

Journal of the Society for Information Display, 2014, v. 22, n. 1, p. 23, doi. 10.1002/jsid.212

By:

Nag, Manoj;
Steudel, Soeren;
Bhoolokam, Ajay;
Chasin, Adrian;
Rockele, Maarten;
Myny, Kris;
Maas, Joris;
Fritz, Thomas;
Trube, Jutta;
Groeseneken, Guido;
Heremans, Paul

Publication type:

Article

Modeling, Simulation and Calibration of Silicon Wet Etching.

Published in:

Journal of Telecommunications & Information Technology, 2009, v. 2009, n. 4, p. 65, doi. 10.26636/jtit.2009.4.974

By:

Kociubiński, Andrzej;
Duk, Mariusz;
Bieniek, Tomasz;
Janus, Paweł

Publication type:

Article

Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH.

Published in:

Sensors (14248220), 2009, v. 9, n. 4, p. 2470, doi. 10.3390/s90402470

By:

Rong Lu;
Yanhong Wu;
Haitao Cheng;
Heng Yang;
Xinxin Li;
Yuelin Wang

Publication type:

Article

Immobilization of Metal Ions on Porous Silicon for Gas Sensor.

Published in:

Integrated Ferroelectrics, 2012, v. 138, n. 1, p. 85, doi. 10.1080/10584587.2012.687280

By:

Li, Shaoyuan;
Ma, Wenhui;
Chen, Xiuhua;
Zhou, Yang;
Wang, Yanfeng;
Wu, Xinghui

Publication type:

Article

Nanostructured graded-index antireflection layer formation on GaN for enhancing light extraction from light-emitting diodes.

Published in:

Applied Physics B: Lasers & Optics, 2012, v. 107, n. 2, p. 393, doi. 10.1007/s00340-012-5017-6

By:

Dylewicz, R.;
Khokhar, A.;
Wasielewski, R.;
Mazur, P.;
Rahman, F.

Publication type:

Article

Fabrication of black multicrystalline silicon surface by nanosecond laser ablation.

Published in:

Applied Physics B: Lasers & Optics, 2011, v. 105, n. 3, p. 545, doi. 10.1007/s00340-011-4625-x

By:

Zuev, D.;
Novodvorsky, O.;
Khaydukov, E.;
Khramova, O.;
Lotin, A.;
Parshina, L.;
Rocheva, V.;
Panchenko, V.;
Dvorkin, V.;
Poroykov, A.;
Untila, G.;
Chebotareva, A.;
Kost, T.;
Timofeyev, M.

Publication type:

Article

Luminescent silicon nanoparticles with magnetic properties - production and investigation.

Published in:

Applied Physics B: Lasers & Optics, 2011, v. 105, n. 3, p. 599, doi. 10.1007/s00340-011-4676-z

By:

Kelm, E.;
Korovin, S.;
Pustovoy, V.;
Surkov, A.;
Vladimirov, A.

Publication type:

Article

Post-growth tailoring of quantum-dot saturable absorber mirrors by chemical etching.

Published in:

Applied Physics B: Lasers & Optics, 2009, v. 94, n. 3, p. 393, doi. 10.1007/s00340-008-3319-5

By:

Lumb, M.;
Farrell, D.;
Clarke, E.;
Damzen, M.;
Murray, R.

Publication type:

Article

Influence of plasma chemistry on oxygen triplets.

Published in:

European Physical Journal D (EPJ D), 2011, v. 64, n. 2/3, p. 437, doi. 10.1140/epjd/e2011-20213-2

By:

Milosavljević, V.;
Ellingboe, A.;
Daniels, S.

Publication type:

Article

OPTOELECTRONIC PROPERTIES OF ZnO NANOPARTICLES DEPOSITION ON POROUS SILICON.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2011, v. 25, n. 2, p. 277, doi. 10.1142/S0217979211054744

By:

KHASHAN, KHAWLA S.

Publication type:

Article

ICP Etching and Structure Study of PECVD SiC Films.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2002, v. 16, n. 28/29, p. 4318, doi. 10.1142/S0217979202015340

By:

Shi, J.;
Choi, W. K.;
Chor, E. F.

Publication type:

Article

Identify of the Micro-Defects in Semi-Insulating GaAs.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2002, v. 16, n. 28/29, p. 4484, doi. 10.1142/S0217979202015662

By:

Xu, Yuesheng;
Zhang, Chunling;
Tang, Lei;
Liu, Caichi;
Hao, Jingchen

Publication type:

Article

The effect of sub-band gap photon illumination on the properties of GaN layers grown on Si(111) by MBE.

Published in:

Journal of Nanoparticle Research, 2011, v. 13, n. 12, p. 7139, doi. 10.1007/s11051-011-0625-3

By:

Ramizy, Asmiet;
Omar, Khalid;
Hassan, Z.;
Alattas, Omar

Publication type:

Article

Nonlinear laser-induced regime of surface-electromagnetic-wave generation and submicron periodic relief during liquid-phase photochemical etching of n-III–V semiconductors.

Published in:

Journal of Experimental & Theoretical Physics, 1997, v. 84, n. 1, p. 96, doi. 10.1134/1.558157

By:

Seminogov, V. N.;
Panchenko, V. Ya.;
Khudobenko, A. I.

Publication type:

Article

Fabrication of resonator--quantum well infrared photodetector focal plane array by inductively coupled plasma etching.

Published in:

Optical Engineering, 2016, v. 55, n. 2, p. 1, doi. 10.1117/1.OE.55.2.026119

By:

Sun, Jason;
Kwong-Kit Choi

Publication type:

Article

Laser-assisted etching of diamonds in air and in liquid media.

Published in:

Applied Physics A: Materials Science & Processing, 1997, v. 65, n. 1, p. 29, doi. 10.1007/s003390050536

By:

Shafeev, G.A.;
Obraztsova, E.D.;
Pimenov, S.M.

Publication type:

Article

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method.

Published in:

Micromachines, 2018, v. 9, n. 2, p. 74, doi. 10.3390/mi9020074

By:

Yu, Jia-Cheng;
Zhou, Zai-Fa;
Su, Jia-Le;
Xia, Chang-Feng;
Zhang, Xin-Wei;
Wu, Zong-Ze;
Huang, Qing-An

Publication type:

Article

Fault Detection and Diagnosis Based on Modified Independent Component Analysis. .

Published in:

AIChE Journal, 2006, v. 52, n. 10, p. 3501, doi. 10.1002/aic.10978

By:

Jong-Min Lee;
Qin, S. Joe;
In-Beum Lee

Publication type:

Article

Using nanoscale thermocapillary flows to create arrays of purely semiconducting single-walled carbon nanotubes.

Published in:

Nature Nanotechnology, 2013, v. 8, n. 5, p. 347, doi. 10.1038/nnano.2013.56

By:

Jin, Sung Hun;
Dunham, Simon N.;
Song, Jizhou;
Xie, Xu;
Kim, Ji-hun;
Lu, Chaofeng;
Islam, Ahmad;
Du, Frank;
Kim, Jaeseong;
Felts, Johnny;
Li, Yuhang;
Xiong, Feng;
Wahab, Muhammad A.;
Menon, Monisha;
Cho, Eugene;
Grosse, Kyle L.;
Lee, Dong Joon;
Chung, Ha Uk;
Pop, Eric;
Alam, Muhammad A.

Publication type:

Article

Photogalvanic Etching of n-GaN for Three-Dimensional Electronics.

Published in:

Journal of Electronic Materials, 2019, v. 48, n. 5, p. 3345, doi. 10.1007/s11664-019-06982-5

By:

Dryden, Daniel M.;
Nikolic, Rebecca J.;
Islam, M. Saif

Publication type:

Article

Microstructural Characterization of Defects and Chemical Etching for HgCdSe/ZnTe/Si (211) Heterostructures.

Published in:

Journal of Electronic Materials, 2019, v. 48, n. 1, p. 571, doi. 10.1007/s11664-018-6737-0

By:

Vaghayenegar, M.;
Doyle, K. J.;
Trivedi, S.;
Wijewarnasuriya, P.;
Smith, David J.

Publication type:

Article

The Effect of Wet Etching on Surface Properties of HgCdTe.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 8, p. 1781, doi. 10.1007/s11664-009-0844-x

By:

Sporken, R.;
Kiran, R.;
Casselman, T.;
Aqariden, F.;
Velicu, S.;
Chang, Yong;
Sivananthan, S.

Publication type:

Article

GaN MOS Capacitors and FETs on Plasma-Etched GaN Surfaces.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 4, p. 523, doi. 10.1007/s11664-008-0617-y

By:

Tang, K.;
Huang, W.;
Chow, T. Paul

Publication type:

Article

Defect Analysis of Barrier Height Inhomogeneity in Titanium 4H-SiC Schottky Barrier Diodes.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 4, p. 574, doi. 10.1007/s11664-008-0647-5

By:

Bolen, M. L.;
Capano, M. A.

Publication type:

Article

Wet-Chemical Etching of (1120) ZnO Films.

Published in:

Journal of Electronic Materials, 2004, v. 33, n. 6, p. 556, doi. 10.1007/s11664-004-0046-5

By:

Zhu, J.;
Emanetoglu, N. W.;
Chen, Y.;
Yakshinskiy, B. V.;
Lu, Y.

Publication type:

Article

Etching of As- and P-Based III-V Semiconductors in a Planar Inductively Coupled BCl3/Ar Plasma.

Published in:

Journal of Electronic Materials, 2004, v. 33, n. 4, p. 358, doi. 10.1007/s11664-004-0143-5

By:

Lee, J. W.;
Lim, W. T.;
Baek, I. K.;
Yoo, S. R.;
Jeon, M. H.;
Cho, G. S.;
PEARTON, S. J.

Publication type:

Article

FABRICATION OF NEARFIELD OPTICAL PROBE ARRAY USING VARIOUS NANOFABRICATION PROCEDURES.

Published in:

International Journal of Nanoscience, 2003, v. 2, n. 4/5, p. 283, doi. 10.1142/S0219581X03001309

By:

Choi, S.S.;
Jung, M.Y.;
Kim, J.W.;
Boo, J.H.;
Yang, J.S.

Publication type:

Article