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Thermal Stability of Nanocrystalline Ag–Cu–Al Alloy Films with Densely Dispersed Alumina Particles Prepared via Reactive Sputtering Using Ar–O<sub>2</sub> Mixed Gas.
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- Metallurgical & Materials Transactions. Part A, 2024, v. 55, n. 7, p. 2264, doi. 10.1007/s11661-024-07392-x
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- Article
Tailoring the mechanical and high‐temperature tribological properties of Si‐DLC films by controlling the Si content.
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- Surface & Interface Analysis: SIA, 2024, v. 56, n. 7, p. 498, doi. 10.1002/sia.7308
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- Article
Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.
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- Bulletin of Materials Science, 2024, v. 47, n. 2, p. 1, doi. 10.1007/s12034-023-03136-6
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PtO<sub>x</sub> Schottky Contacts on Degenerately Doped 2¯01β-Ga<sub>2</sub>O<sub>3</sub> Substrates.
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- Journal of Electronic Materials, 2024, v. 53, n. 6, p. 2798, doi. 10.1007/s11664-024-10966-5
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- Article
Performance Improvement of a-In-Ga-Sn-O Thin-Film Transistor with Oxygen Doping by Reactive Sputtering Method.
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- Journal of Electronic Materials, 2024, v. 53, n. 6, p. 3063, doi. 10.1007/s11664-024-11035-7
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- Article
Reactive Magnetron Sputtering for Y-Doped Barium Zirconate Electrolyte Deposition in a Complete Protonic Ceramic Fuel Cell.
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- Crystals (2073-4352), 2024, v. 14, n. 5, p. 475, doi. 10.3390/cryst14050475
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FURTHER IMPROVING THE MECHANICAL AND HIGH-TEMPERATURE TRIBOLOGICAL PROPERTIES OF SILICON-DOPED DIAMOND-LIKE CARBON FILM BY TUNGSTEN INCORPORATION.
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- Surface Review & Letters, 2024, v. 31, n. 5, p. 1, doi. 10.1142/S0218625X24500355
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- Article
Characterization of ZrBSiTaN x Films.
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- Coatings (2079-6412), 2024, v. 14, n. 4, p. 487, doi. 10.3390/coatings14040487
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Low‐Temperature Sputtered Ultralow‐Loss Silicon Nitride for Hybrid Photonic Integration.
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- Laser & Photonics Reviews, 2024, v. 18, n. 4, p. 1, doi. 10.1002/lpor.202300642
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- Article
Gas pressure dependence of optical and mechanical properties in a SiCO thin film for optical waveguide by reactive sputtering method.
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- Electronics & Communications in Japan, 2024, v. 107, n. 1, p. 1, doi. 10.1002/ecj.12435
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- Article
Compositional Optimization of Sputtered WO 3 /MoO 3 Films for High Coloration Efficiency.
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- Materials (1996-1944), 2024, v. 17, n. 5, p. 1000, doi. 10.3390/ma17051000
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- Article
Reliable Accessibility of Intermediate Polarization States in Textured Ferroelectric Al<sub>0.66</sub>Sc<sub>0.34</sub>N Thin Film.
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- Advanced Electronic Materials, 2024, v. 10, n. 2, p. 1, doi. 10.1002/aelm.202300591
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- Article
Structure and Electrical Conductivity of Thin AlN Films on Si.
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- Crystallography Reports, 2024, v. 69, n. 1, p. 65, doi. 10.1134/S1063774523601260
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- Article
Magnesium Hydride: Investigating Its Capability to Maintain Stable Vapor Film.
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- Energies (19961073), 2024, v. 17, n. 3, p. 661, doi. 10.3390/en17030661
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Synthesis and study of photoelectrochromic and photocatalytic behavior of double-layer N-doped TiO<sub>2</sub>/Co<sub>3</sub>O<sub>4</sub> configuration via DC reactive magnetron sputtering.
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- Optical & Quantum Electronics, 2024, v. 56, n. 2, p. 1, doi. 10.1007/s11082-023-05696-7
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- Article
Influence of the Annealing Environment on the Structure and Ferroelectric Properties of Lead Titanate Thin Films.
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- Coatings (2079-6412), 2024, v. 14, n. 1, p. 58, doi. 10.3390/coatings14010058
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Preparation of Alumina Thin Films by Reactive Modulated Pulsed Power Magnetron Sputtering with Millisecond Pulses.
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- Coatings (2079-6412), 2024, v. 14, n. 1, p. 82, doi. 10.3390/coatings14010082
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- Article
Study of High Transmittance of SiO 2 /Nb 2 O 5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering.
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- Applied Sciences (2076-3417), 2023, v. 13, n. 24, p. 13271, doi. 10.3390/app132413271
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WO<sub>x</sub> channel engineering of Cu-ion-driven synaptic transistor array for low-power neuromorphic computing.
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- Scientific Reports, 2023, p. 1, doi. 10.1038/s41598-023-49251-6
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- Article
NO<sub>2</sub> gas sensing performance of Ag−WO<sub>3−x</sub> thin films prepared by reactive magnetron sputtering process.
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- Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 12, p. 1, doi. 10.1007/s00339-023-07134-7
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- Article
CMOS-Compatible Ultrathin Superconducting NbN Thin Films Deposited by Reactive Ion Sputtering on 300 mm Si Wafer.
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- Materials (1996-1944), 2023, v. 16, n. 23, p. 7468, doi. 10.3390/ma16237468
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Reactive magnetron sputtered aluminum titanate high-к dielectric films for MIM devices.
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- Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 11, p. 1, doi. 10.1007/s00339-023-07065-3
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Defect structure of high-resistance CdTe:Cl single crystals and MoOx/CdTe:Cl/MoOx heterostructures according to the data of high-resolution X-ray diffractometry.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2023, v. 26, n. 4, p. 415, doi. 10.15407/spqeo26.04.415
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SnO 2 -Based Memory Device with Filamentary Switching Mechanism for Advanced Data Storage and Computing.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 18, p. 2603, doi. 10.3390/nano13182603
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Reactive Sputter Deposition of Ga 2 O 3 Thin Films Using Liquid Ga Target.
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- Coatings (2079-6412), 2023, v. 13, n. 9, p. 1550, doi. 10.3390/coatings13091550
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- Article
Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO 2 Thin Films Grown by DC Reactive Magnetron Sputtering.
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- Micromachines, 2023, v. 14, n. 9, p. 1800, doi. 10.3390/mi14091800
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Combinatorial Sputter Synthesis of Single-Phase La(XYZ)O<sub>3 ± σ</sub> Perovskite Thin-Film Libraries: A New Platform for Materials Discovery.
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- Advanced Engineering Materials, 2023, v. 25, n. 16, p. 1, doi. 10.1002/adem.202300437
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- Article
Effects of Oxygen Flow during Fabrication by Magnetron Sputtering on Structure and Performance of Zr-Doped HfO 2 Thin Films.
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- Materials (1996-1944), 2023, v. 16, n. 16, p. 5559, doi. 10.3390/ma16165559
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- Article
Corrosion Resistance in Artificial Perspiration of Cr-Based Decorative Coatings.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 16, p. 2346, doi. 10.3390/nano13162346
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DC sputtered ZrO<sub>2</sub>/Zn<sub>(1−x)</sub>Sn<sub>(x)</sub>O thin-film transistors and their property evaluation.
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- Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 8, p. 1, doi. 10.1007/s00339-023-06839-z
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Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)N X Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity.
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- Coatings (2079-6412), 2023, v. 13, n. 8, p. 1424, doi. 10.3390/coatings13081424
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Investigation of Structural and Tribological Characteristics of TiN Composite Ceramic Coatings with Pb Additives.
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- Coatings (2079-6412), 2023, v. 13, n. 8, p. 1463, doi. 10.3390/coatings13081463
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Preparation Process and Performance of Thin Film Thermopile ( Cu/Cu55Ni45) Heat Flux Sensor.
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- Journal of Synthetic Crystals, 2023, v. 52, n. 8, p. 1523
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- Article
Growth of Nanocolumnar TiO 2 Bilayer by Direct Current Reactive Magnetron Sputtering in Glancing-Angle Deposition Configuration for High-Quality Electron Transport Layer.
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- Micromachines, 2023, v. 14, n. 8, p. 1483, doi. 10.3390/mi14081483
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- Article
Antimony Selenide Solar Cells Fabricated by Hybrid Reactive Magnetron Sputtering.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 15, p. 2257, doi. 10.3390/nano13152257
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- Article
Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO 2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering.
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- Materials (1996-1944), 2023, v. 16, n. 14, p. 5005, doi. 10.3390/ma16145005
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- Article
W/W - SiCH/TaO<sub>x</sub>N<sub>y</sub> Multinanolayers for Concentrated Solar Power.
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- CET Journal - Chemical Engineering Transactions, 2023, v. 101, p. 7, doi. 10.3303/CET23101002
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- Article
Effect of Substrate Bias Voltage on Microstructure and Mechanical Properties of Cr-Nb-Ti-Zr-N-O Ceramic Thin Films Produced by Reactive Sputtering.
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- Coatings (2079-6412), 2023, v. 13, n. 7, p. 1141, doi. 10.3390/coatings13071141
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- Article
Influence of Ag Doping on the Microstructural, Optical, and Electrical Properties of ZrSiN Coatings Deposited through Pulsed-DC Reactive Magnetron Sputtering.
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- Coatings (2079-6412), 2023, v. 13, n. 7, p. 1154, doi. 10.3390/coatings13071154
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Structural and Thermal Stability of CrZrON Coatings Synthesized via Reactive Magnetron Sputtering.
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- Coatings (2079-6412), 2023, v. 13, n. 7, p. 1254, doi. 10.3390/coatings13071254
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Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering.
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- Coatings (2079-6412), 2023, v. 13, n. 7, p. 1281, doi. 10.3390/coatings13071281
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Employment of Silicon Nitride Films Prepared by DC Reactive Sputtering Technique for Ion Release Applications.
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- Iraqi Journal of Physics, 2023, v. 21, n. 3, p. 33, doi. 10.30723/ijp.v21i3.1141
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- Article
Synthesis and characterization of some Cr-Zr and Cr-Zr-O nanostructures.
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- Journal of Ovonic Research, 2023, v. 19, n. 4, p. 439, doi. 10.15251/JOR.2023.194.439
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- Article
Electrospun Poly-L-Lactic Acid Scaffolds Surface-Modified via Reactive Magnetron Sputtering Using Different Mixing Ratios of Nitrogen and Xenon.
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- Polymers (20734360), 2023, v. 15, n. 13, p. 2969, doi. 10.3390/polym15132969
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Investigation of Electrochromic, Combinatorial TiO 2 -SnO 2 Mixed Layers by Spectroscopic Ellipsometry Using Different Optical Models.
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- Materials (1996-1944), 2023, v. 16, n. 12, p. 4204, doi. 10.3390/ma16124204
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- Article
Direct Fabrication of a Copper RTD over a Ceramic-Coated Stainless-Steel Tube by Combination of Magnetron Sputtering and Sol–Gel Techniques.
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- Sensors (14248220), 2023, v. 23, n. 12, p. 5442, doi. 10.3390/s23125442
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- Article
The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology.
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- Journal of Nanotechnology, 2023, p. 1, doi. 10.1155/2023/8638512
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A fluid model of pulsed direct current planar magnetron discharge.
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- Scientific Reports, 2023, p. 1, doi. 10.1038/s41598-023-36231-z
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- Article
Morphological Evolution of La 2 NiO 4 Coatings Synthesized by Reactive Magnetron Sputtering (RMS) at High Pressure as Cathode for Intermediate Temperature Solid Oxide Fuel Cell (IT-SOFC).
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- Coatings (2079-6412), 2023, v. 13, n. 6, p. 1113, doi. 10.3390/coatings13061113
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Role of nitrogen partial pressure, deposition rate and annealing on stability of β-W phase.
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- Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 5, p. 1, doi. 10.1007/s00339-023-06552-x
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- Article