Works matching DE "PLASMA-enhanced chemical vapor deposition"

Results: 840

3D-Printed Boron-Nitrogen Doped Carbon Electrodes for Sustainable Wastewater Treatment via MPECVD.

Published in:

Nano-Micro Letters, 2025, p. 1, doi. 10.1007/s40820-025-01827-9

By:

Kaczmarzyk, Iwona;
Szopińska, Malgorzata;
Sokołowski, Patryk;
Sabbatini, Simona;
Strugala, Gabriel;
Ryl, Jacek;
Barucca, Gianni;
Falås, Per;
Bogdanowicz, Robert;
Pierpaoli, Mattia

Publication type:

Article

Single-photon emitters in PECVD-grown silicon nitride films: from material growth to photophysical properties.

Published in:

Nanophotonics (21928606), 2025, v. 14, n. 11, p. 1783, doi. 10.1515/nanoph-2024-0506

By:

Martin, Zachariah O.;
Senichev, Alexander;
Maan, Pranshu;
Ozlu, Mustafa G.;
Marinova, Miroslava;
Shang, Zhongxia;
Lagutchev, Alexei;
Boltasseva, Alexandra;
Shalaev, Vladimir M.

Publication type:

Article

Understanding the Chamber Wall-Deposited Thin Film of Plasma Deposition Equipment for the Efficiency of In Situ Dry-Cleaning.

Published in:

Coatings (2079-6412), 2025, v. 15, n. 5, p. 563, doi. 10.3390/coatings15050563

By:

Lee, Jiseok;
Jang, Jiwon;
Hong, Sang Jeen

Publication type:

Article

Low-energy plasma-enhanced CVD facilities high mobility SiGe.

Published in:

Solid State Technology, 2000, v. 43, n. 12, p. 30

By:

Demmin, Jeffrey C.

Publication type:

Article

Surface treatment of coins.

Published in:

Surface Engineering, 2025, v. 41, n. 1, p. 3, doi. 10.1177/02670844251315209

By:

Gopal, Lakshmi;
Sudarshan, Tirumalai

Publication type:

Article

PECVD barrier coating systems on post-consumer recyclates for food contact applications.

Published in:

Surface Engineering, 2022, v. 38, n. 10-12, p. 968, doi. 10.1080/02670844.2023.2181258

By:

Kleines, Lara;
Blasius, Thomas;
Dahlmann, Rainer

Publication type:

Article

Tribological behaviour of titanium alloy modified by carbon-DLC composite film.

Published in:

Surface Engineering, 2015, v. 31, n. 12, p. 934, doi. 10.1179/1743294414Y.0000000452

By:

Wang, S.;
Wang, F.;
Liao, Z.;
Wang, Q.;
Tyagi, R.;
Liu, W.

Publication type:

Article

Growth of three-dimensional graphene layers using plasma enhanced CVD.

Published in:

Surface Engineering, 2015, v. 31, n. 2, p. 140, doi. 10.1179/1743294414Y.0000000362

By:

Qu, B.;
Huang, M.-L.;
Wu, Q.-H.

Publication type:

Article

Effect of duty cycle on residual stress and tribology behaviour of TiCx nanostructure coating deposited by PACVD method.

Published in:

Surface Engineering, 2012, v. 28, n. 5, p. 364, doi. 10.1179/1743294411Y.0000000073

By:

Shanaghi, A;
Rouhaghdam, A R Sabour;
Ahangarani, S

Publication type:

Article

Deposition of carbon based materials by continuous and pulsed discharges.

Published in:

Surface Engineering, 2012, v. 28, n. 2, p. 141, doi. 10.1179/1743294411Y.0000000080

By:

Cicala, G

Publication type:

Article

Control of Hydrogenation Patterning for CVD Diamond Substrates by AFM Local Anodic Oxidation.

Published in:

Surface Engineering, 2003, v. 19, n. 6, p. 441, doi. 10.1179/026708403225010091

By:

Manfredotti, C.;
Vittone, E.;
Paolini, C.;
Bianco, L.;
Fizzotti, F.;
Giudice, A. Lo;
Olivero, P.

Publication type:

Article

Tailored Si[sub 3]N[sub 4] Ceramic Substrates for CVD Diamond Coating.

Published in:

Surface Engineering, 2003, v. 19, n. 6, p. 410, doi. 10.1179/026708403225010136

By:

Amaral, M.;
Oliveira, F. J.;
Belmonte, M.;
Fernandes, A. J. S.;
Costa, F. M.;
Silva, R. F.

Publication type:

Article

Average power handling capability on SiON thin film coplanar waveguide interconnections for MMICs.

Published in:

Journal of Materials Science: Materials in Electronics, 2019, v. 30, n. 16, p. 15599, doi. 10.1007/s10854-019-01938-1

By:

Tai, Tzu-Chun;
Wu, Hung-Wei;
Wang, Sin-Pei;
Hung, Cheng-Yuan;
Tien, Wei-Chen;
Wang, Yeong-Her

Publication type:

Article

Study of indium catalyst thickness effect on PECVD-grown silicon nanowires properties.

Published in:

Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 13, p. 9717, doi. 10.1007/s10854-017-6722-z

By:

Tabassi, M.;
Zaghouani, R.;
Khelil, M.;
Khirouni, K.;
Dimassi, W.

Publication type:

Article

Nanocrystalline silicon thin film prepared by e-beam evaporation for display application.

Published in:

Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 4, p. 3891, doi. 10.1007/s10854-016-6002-3

By:

Sharma, Prachi;
Tripathi, Nishant;
Gupta, Navneet

Publication type:

Article

Development of ultra-smooth ballas diamond incorporated nano-composite carbon thin films using PECVD technique.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 8, p. 8188, doi. 10.1007/s10854-016-4823-8

By:

Dayal, Saurabh;
Sasikumar, C.;
Srivastava, Sanjay

Publication type:

Article

Hydrogen-free synthesis of few-layer graphene film on different substrates by plasma enhanced chemical vapor deposition.

Published in:

Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 9, p. 6961, doi. 10.1007/s10854-015-3315-6

By:

Chen, Shumin;
Gao, Ming;
Zhao, Lei;
Ma, Zhongquan

Publication type:

Article

Hydrogen-free synthesis of graphene-graphitic films directly on Si substrate by plasma enhanced chemical vapor deposition.

Published in:

Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 3, p. 1485, doi. 10.1007/s10854-014-2565-z

By:

Chen, Shumin;
Gao, Ming;
Cao, Runan;
Du, Huiwei;
Yang, Jie;
Zhao, Lei;
Ma, Zhongquan

Publication type:

Article

Fabrication of single junction amorphous silicon solar cell/mini module using novel n-type nanocrystalline SiO:F:H back reflector.

Published in:

Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 1, p. 331, doi. 10.1007/s10854-014-2404-2

By:

Mandal, Sourav;
Das, Gourab;
Dhar, Sukanta;
Tomy, Rajive;
Mukhopadhyay, Sumita;
Banerjee, Chandan;
Barua, A.

Publication type:

Article

Structural and optical properties of nc-Si:H thin films deposited by layer-by-layer technique.

Published in:

Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 1, p. 286, doi. 10.1007/s10854-013-1584-5

By:

Goh, Boon;
Wah, Chan;
Aspanut, Zarina;
Rahman, Saadah

Publication type:

Article

Deposition and characteristics of GaN films on Ni metal substrate by ECR-PEMOCVD.

Published in:

Journal of Materials Science: Materials in Electronics, 2013, v. 24, n. 12, p. 5069, doi. 10.1007/s10854-013-1525-3

By:

Qin, Fuwen;
Zhong, Miaomiao;
Wang, Chong;
Liu, Yuemei;
Bian, Jiming;
Wang, Enping;
Wang, Hui;
Zhang, Dong

Publication type:

Article

Reducing the effects of mismatch between zinc oxide and silicon by silane plasma modification.

Published in:

Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 9, p. 1621, doi. 10.1007/s10854-012-0639-3

By:

Lin, Chiung;
Chen, Yi

Publication type:

Article

Induced NH bonding of carbon nanotubes using NH plasma-enhanced chemical vapor deposition.

Published in:

Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 4, p. 889, doi. 10.1007/s10854-011-0514-7

By:

Chiou, Ai-Huei;
Chang, Yu-Ming;
Wu, Wen-Fa;
Chou, Chang-Ping;
Hsu, Chun-Yao

Publication type:

Article

Enhancement of thermal conductivity of hydrogenated silicon film by microcrystalline structure growth.

Published in:

Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 1, p. 224, doi. 10.1007/s10854-011-0390-1

By:

Li, Shibin;
Jiang, Yadong;
Wu, Zhiming;
Wu, Jiang;
Ying, Zhihua;
Wang, Zhiming;
Li, Wei;
Salamo, Gregory

Publication type:

Article

Influence of thickness on nanomechanical behavior of Black Diamond™ low dielectric thin films for interconnect and packaging applications.

Published in:

Journal of Materials Science: Materials in Electronics, 2009, v. 20, n. 1, p. 74, doi. 10.1007/s10854-008-9610-8

By:

Sekhar, V. N.;
Chai, T. C.;
Balakumar, S.;
Lu Shen;
Sinha, S. K.;
Tay, A. A. O.;
Seung Wook Yoon

Publication type:

Article

Atomic layer deposition of hafnium oxide dielectrics on silicon and germanium substrates.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 2, p. 119, doi. 10.1007/s10854-007-9337-y

By:

McNeill, D. W.;
Bhattacharya, S.;
Wadsworth, H.;
Ruddell, F. H.;
Mitchell, S. J. N.;
Armstrong, B. M.;
Gamble, H. S.

Publication type:

Article

Optical properties of nanocrystalline silicon deposited by PECVD.

Published in:

Journal of Materials Science: Materials in Electronics, 2007, v. 18, p. 405, doi. 10.1007/s10854-007-9230-8

By:

Esmaeili-Rad, M. R.;
Sazonov, A.;
Kazanskii, A. G.;
Khomich, A. A.;
Nathan, A.

Publication type:

Article

Facile preparation of graphene nanowalls/EVA hybrid film for ultraflexible transparent electrodes.

Published in:

Journal of Solid State Electrochemistry, 2019, v. 23, n. 5, p. 1473, doi. 10.1007/s10008-019-04231-7

By:

Chen, Zhongtao;
Guo, Xinli;
Liu, Yuanyuan;
Zhang, Weijie;
Tang, Xuan;
Zheng, Yanmei;
Wang, Yixuan;
Li, Long;
Wang, Zengmei;
Zhao, Yuhong

Publication type:

Article

Enhanced lithium ionic intercalation and conduction performance of flexible iron oxide films using an atmospheric pressure plasma jet.

Published in:

Journal of Solid State Electrochemistry, 2017, v. 21, n. 8, p. 2185, doi. 10.1007/s10008-017-3551-1

By:

Lin, Yung-Sen;
Lin, Sheng-Wei;
Chen, Pin-Cheng;
Wang, Yin-Li;
Liao, Min-Chin

Publication type:

Article

Oxygen addition effects on electrochromic properties of PECVD-synthesized WO xC y films for flexible electrochromic devices.

Published in:

Journal of Solid State Electrochemistry, 2010, v. 14, n. 10, p. 1885, doi. 10.1007/s10008-010-1015-y

By:

Lin, Yung-Sen;
Chen, Hsuan-Ta;
Wu, Siang-Syuan

Publication type:

Article

基于 Logistic 回归的数据富裕环境下制造过程质量动态监控.

Published in:

Machine Tool & Hydraulics, 2023, v. 51, n. 11, p. 104, doi. 10.3969/j.issn.1001-3881.2023.11.017

By:

张帅;
吕晨;
杨剑锋

Publication type:

Article

PECVD synthesis of hexagonal boron nitride nanowalls from a borazine + ammonia mixture.

Published in:

Inorganic Materials, 2015, v. 51, n. 11, p. 1097, doi. 10.1134/S0020168515100118

By:

Merenkov, I.;
Kosinova, M.;
Ermakova, E.;
Maksimovskii, E.;
Rumyantsev, Yu.

Publication type:

Article

Growth of aluminum nitride films by plasma-enhanced atomic layer deposition.

Published in:

Inorganic Materials, 2015, v. 51, n. 7, p. 728, doi. 10.1134/S0020168515070158

By:

Tarala, V.;
Altakhov, A.;
Shevchenko, M.;
Valyukhov, D.;
Lisitsyn, S.;
Martens, V.

Publication type:

Article

RF plasma chemical vapor deposition of SiN:H films.

Published in:

Inorganic Materials, 2012, v. 48, n. 8, p. 808, doi. 10.1134/S0020168512070151

By:

Semenova, O.;
Devyatova, S.

Publication type:

Article

Properties of BC xN y films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures.

Published in:

Inorganic Materials, 2010, v. 46, n. 5, p. 487, doi. 10.1134/S0020168510050092

By:

Sulyaeva, V. S.;
Kosinova, M. L.;
Rumyantsev, Yu. M.;
Golubenko, A. N.;
Fainer, N. I.;
Alferova, N. I.;
Ayupov, B. M.;
Gevko, P. N.;
Kesler, V. G.;
Kolesov, B. A.;
Maksimovskii, E. A.;
Myakishev, K. G.;
Yushina, I. V.;
Kuznetsov, F. A.

Publication type:

Article

Dear authors and readers!

Published in:

Eurasian Physical Technical Journal, 2024, v. 21, n. 4, p. 4

By:

S. E., Sakipova

Publication type:

Article

Development of directly grown‐graphene–silicon Schottky barrier solar cell using co‐doping technique.

Published in:

International Journal of Energy Research, 2022, v. 46, n. 8, p. 11510, doi. 10.1002/er.7924

By:

Rehman, Malik Abdul;
Park, Sewon;
Khan, Muhammad Farooq;
Bhopal, Muhammad Fahad;
Nazir, Ghazanfar;
Kim, Minjae;
Farooq, Ayesha;
Ha, Jisang;
Rehman, Shania;
Jun, Seong Chan;
Park, Hyung‐Ho

Publication type:

Article

Electrocatalytic hydrogen evolution properties of anionic NiS2‐Ni(OH)2 nanosheets produced on the surface of nickel foam.

Published in:

International Journal of Energy Research, 2020, v. 44, n. 6, p. 4827, doi. 10.1002/er.5275

By:

Sun, Mojie;
Wang, Zhao;
Gao, Bixue;
Wang, Shijie;
Wang, Chi;
Song, Xiaochen;
Lin, Dongyao

Publication type:

Article

Enhanced Electrical Properties of Metal‐Organic Chemical Vapor Deposition‐Grown MoS2 Thin Films through Oxygen‐Assisted Defect Control.

Published in:

Advanced Electronic Materials, 2022, v. 8, n. 7, p. 1, doi. 10.1002/aelm.202101325

By:

Hong, Woonggi;
Park, Cheolmin;
Shim, Gi Woong;
Yang, Sang Yoon;
Choi, Sung‐Yool

Publication type:

Article

Ultrahigh Sensitivity of Flexible Thermistors Based on 3D Porous Graphene Characterized by Imbedded Microheaters.

Published in:

Advanced Electronic Materials, 2020, v. 6, n. 8, p. 1, doi. 10.1002/aelm.202000451

By:

Wu, Jin;
Yang, Xing;
Ding, Haojun;
Wei, Yaoming;
Wu, Zixuan;
Tao, Kai;
Yang, Bo‐Ru;
Liu, Chuan;
Wang, Xiaotian;
Feng, Shuanglong;
Xie, Xi

Publication type:

Article

Graphene Field‐Effect Transistors on Hexagonal‐Boron Nitride for Enhanced Interfacial Thermal Dissipation.

Published in:

Advanced Electronic Materials, 2020, v. 6, n. 7, p. 1, doi. 10.1002/aelm.202000059

By:

Liu, Donghua;
Chen, Xiaosong;
Zhang, Ying;
Wang, Dingguan;
Zhao, Yan;
Peng, Huisheng;
Liu, Yunqi;
Xu, Xiangfan;
Wee, Andrew Thye Shen;
Wei, Dacheng

Publication type:

Article

Flexible a‐IGZO Phototransistor for Instantaneous and Cumulative UV‐Exposure Monitoring for Skin Health.

Published in:

Advanced Electronic Materials, 2016, v. 2, n. 10, p. 1, doi. 10.1002/aelm.201600273

By:

Knobelspies, Stefan;
Daus, Alwin;
Cantarella, Giuseppe;
Petti, Luisa;
Münzenrieder, Niko;
Tröster, Gerhard;
Salvatore, Giovanni Antonio

Publication type:

Article

Silica Waveguide Four-Mode Multiplexer Based on Cascaded Directional Couplers.

Published in:

Photonics, 2023, v. 10, n. 9, p. 983, doi. 10.3390/photonics10090983

By:

Wang, Manzhuo;
Sun, Xiaoqiang;
Liu, Tingyu;
Yue, Jianbo;
Sun, Chaoyang;
Li, Dehui;
Wu, Yuanda;
Zhang, Daming

Publication type:

Article

Ultra-Thin Gas-Barrier Films Deposited by PECVD using a Novel Precursor, TG-4E, for OLED Devices.

Published in:

SID Symposium Digest of Technical Papers, 2016, v. 47, n. 1, p. 1532, doi. 10.1002/sdtp.10992

By:

Chiba, Hirokazu;
Tokuhisa, Kenji

Publication type:

Article

P-6: Impact of Buffer Layers on the Self-Aligned Top-Gate a-IGZO TFT Characteristics.

Published in:

SID Symposium Digest of Technical Papers, 2015, v. 46, n. 1, p. 1139, doi. 10.1002/sdtp.10031

By:

Nag, Manoj;
Smout, Steve;
Bhoolokam, Ajay;
Muller, Robert;
Ameys, Marc;
Myny, Kris;
Schols, Sarah;
Cobb, Brian;
Kumar, Abhishek;
Gelinck, Gerwin;
Murata, Mitsuhiro;
Groeseneken, Guido;
Heremans, Paul;
Steudel, Soeren

Publication type:

Article

6.1: Invited Paper: Handling Technology of Plastic Substrates in Flexible Display Manufacturing.

Published in:

SID Symposium Digest of Technical Papers, 2014, v. 45, n. 1, p. 46, doi. 10.1002/j.2168-0159.2014.tb00013.x

By:

Chiang, Min‐Feng;
Cheng, Chun‐Cheng;
Tu, Chun‐Hao;
Liu, Chu‐Yu;
Huang, Tai‐Hsiang;
Lu, Jen‐Kuei;
Sugiura, Norio;
Lin, Yu‐Chieh

Publication type:

Article

UpcyclingWaste Lard Oil into Vertical Graphene Sheets by Inductively Coupled Plasma Assisted Chemical Vapor Deposition.

Published in:

Nanomaterials (2079-4991), 2017, v. 7, n. 10, p. 318, doi. 10.3390/nano7100318

By:

Angjian Wu;
Xiaodong Li;
Jian Yang;
Changming Du;
Wangjun Shen;
Jianhua Yan

Publication type:

Article

Formation of polymer-based nanoparticles and nanocomposites by plasma-assisted deposition methods.

Published in:

European Physical Journal D (EPJ D), 2018, v. 72, n. 5, p. 1, doi. 10.1140/epjd/e2017-80426-9

By:

Abraham, Jan Willem;
Hinz, Alexander;
Strunskus, Thomas;
Faupel, Franz;
Bonitz, Michael

Publication type:

Article

On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films.

Published in:

European Physical Journal D (EPJ D), 2018, v. 72, n. 5, p. 1, doi. 10.1140/epjd/e2017-80364-6

By:

Schäfer, Jan;
Sigeneger, Florian;
Foest, Rüdiger;
Loffhagen, Detlef;
Weltmann, Klaus-Dieter

Publication type:

Article

Selective growth of nanodiamond films in microwave plasma.

Published in:

Composite Interfaces, 2012, v. 19, n. 3/4, p. 179, doi. 10.1080/15685543.2012.698961

By:

Albin, Sacharia;
Williams, FrancesR.;
Zhou, Xi;
Xiao, Weican

Publication type:

Article