Works matching DE "PLASMA power sources"
Results: 10
Elevation of the Wear Resistance of Low-Alloy Structural Steel by Plasma-Powder Surfacing with Alloys Based on Iron, Chromium, and Nickel.
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- Materials Science, 2018, v. 54, n. 3, p. 378, doi. 10.1007/s11003-018-0195-y
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- Article
Characteristics of Mineral Oil-based Nanofluids for Power Transformer Application.
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- International Journal of Electrical & Computer Engineering (2088-8708), 2017, v. 7, n. 3, p. 1530, doi. 10.11591/ijece.v7i3.pp1530-1537
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- Article
Automatisierte Vermessung der Sichtliniencharakteristik von Bolometerkameras für die Fusionsforschung Automated measurement of bolometer line of sight characteristics for fusion research.
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- Technisches Messen, 2015, v. 82, n. 10, p. 517, doi. 10.1515/teme-2014-0011
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On the relation between plasma power and aging treatment in the production of thin aluminum zirconium foils by magnetron sputtering.
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- Materialwissenschaft und Werkstoffechnik, 2016, v. 47, n. 11, p. 989, doi. 10.1002/mawe.201600625
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Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II - Characterization of the Films.
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- Plasma Processes & Polymers, 2016, v. 13, n. 8, p. 766, doi. 10.1002/ppap.201600047
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Optimizing Humic Acid Removal by Modifying the Surface Chemistry of Plasma Polymerized Allylamine Coated Particles.
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- Plasma Processes & Polymers, 2016, v. 13, n. 8, p. 802, doi. 10.1002/ppap.201500205
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Atmospheric Pressure Plasma Polymer of Ethyl Lactate: In Vitro Degradation and Cell Viability Studies.
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- Plasma Processes & Polymers, 2016, v. 13, n. 7, p. 711, doi. 10.1002/ppap.201500211
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The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer.
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- Physica Status Solidi. A: Applications & Materials Science, 2015, v. 212, n. 12, p. 2785, doi. 10.1002/pssa.201532274
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Evaluation of the effect of heat input in superduplex stainless steel deposition by the plasma powder process.
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- Welding International, 2017, v. 31, n. 3, p. 173, doi. 10.1080/09507116.2016.1218616
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Paper No S12.4: Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors.
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- SID Symposium Digest of Technical Papers, 2015, v. 46, p. 54, doi. 10.1002/sdtp.10531
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- Article