Works matching DE "PLASMA etching"

Results: 799

ROLE OF ETCHING PROCESSES IN MEMS FABRICATION.

Published in:

i-Manager's Journal on Communication Engineering & Systems, 2025, v. 14, n. 1, p. 34, doi. 10.26634/jcs.14.1.21952

By:

REDDY, VENKATRAMANA

Publication type:

Article

Modulated Ar/CH4 Plasma by Metal Shield for Enhancing the PECVD Growth of Vertical Graphene.

Published in:

International Journal of Nanoscience, 2022, v. 21, n. 4, p. 1, doi. 10.1142/S0219581X22500235

By:

Abdullah, Mohd Faizol;
Bulya Nazim, Nur Julia Nazim;
Mat Hussin, Mohd Rofei;
Ismail, Muhamad Amri;
Mohd Zaini, Khairil Mazwan

Publication type:

Article

NANOSCALE ARRAYS IN LITHIUM NIOBATE FABRICATED BY INTERFERENCE LITHOGRAPHY AND DRY ETCHING.

Published in:

International Journal of Nanoscience, 2010, v. 9, n. 4, p. 311, doi. 10.1142/S0219581X10006867

By:

SI, G. Y.;
DANNER, A. J.;
TENG, J. H.;
ANG, S. S.;
CHEW, A. B.;
DOGHECHE, E.

Publication type:

Article

DIRECT IMPRINTING OF SiO2 WAVEGUIDE STRUCTURES ON GaAs AND ITS APPLICATION IN InAs/GaAs QUANTUM DOT INTERMIXING.

Published in:

International Journal of Nanoscience, 2009, v. 8, n. 1/2, p. 107, doi. 10.1142/S0219581X09005839

By:

CHIA, C. K.;
SURYANA, M.;
ZHAO, W.;
LOW, H. Y.;
HOPKINSON, M.

Publication type:

Article

NANOTIPS COLD-END CONTACT FOR MICROCOOLING SYSTEMS.

Published in:

International Journal of Nanoscience, 2005, v. 4, n. 4, p. 701, doi. 10.1142/S0219581X05003723

By:

KWONG-LUCK TAN;
ILIESCU, CIPRIAN;
TAY, FRANCIS;
HUI-TONG CHUA;
JIANMIN MIAO

Publication type:

Article

Internal Structure Tailoring in 3D Nanoplasmonic Metasurface for Surface‐Enhanced Raman Spectroscopy.

Published in:

Particle & Particle Systems Characterization, 2020, v. 37, n. 1, p. N.PAG, doi. 10.1002/ppsc.201900345

By:

Jiang, Tao;
Goel, Pratibha;
Zhao, Hui;
Ma, Rui;
Zhu, Linghua;
Liu, Xiangjiang;
Tang, Longhua

Publication type:

Article

A High-Reliability Kevlar Fiber-ZnO Nanowires Hybrid Nanogenerator and its Application on Self-Powered UV Detection.

Published in:

Advanced Functional Materials, 2015, v. 25, n. 36, p. 5794, doi. 10.1002/adfm.201502646

By:

Zhang, Lu;
Bai, Suo;
Su, Chen;
Zheng, Youbin;
Qin, Yong;
Xu, Chen;
Wang, Zhong Lin

Publication type:

Article

Significant Enhancement of Triboelectric Charge Density by Fluorinated Surface Modification in Nanoscale for Converting Mechanical Energy.

Published in:

Advanced Functional Materials, 2015, v. 25, n. 35, p. 5691, doi. 10.1002/adfm.201502318

By:

Li, Hua Yang;
Su, Li;
Kuang, Shuang Yang;
Pan, Cao Feng;
Zhu, Guang;
Wang, Zhong Lin

Publication type:

Article

Impact of plasma etching on fabrication technology of liquid crystal polymer printed circuit board.

Published in:

Journal of Materials Science: Materials in Electronics, 2010, v. 21, n. 9, p. 954, doi. 10.1007/s10854-009-0024-z

By:

Yung, K. C.;
Liem, H.;
Choy, H. S.;
Yue, T. M.

Publication type:

Article

The kinetics of conductivity type conversion in HgCdTe by ion beam milling.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 10, p. 965, doi. 10.1007/s10854-007-9428-9

By:

Shaw, Derek;
Capper, Peter

Publication type:

Article

Hydrophobisation of lignocellulosic materials part I: physical modification.

Published in:

Cellulose, 2022, v. 29, n. 10, p. 5375, doi. 10.1007/s10570-022-04620-8

By:

Rodríguez-Fabià, Sandra;
Torstensen, Jonathan;
Johansson, Lars;
Syverud, Kristin

Publication type:

Article

High-Aspect-Ratio Shape Replica Mold Fabrication Using Nanoimprinting and Silver Ink as Etching Mask.

Published in:

Nanomanufacturing, 2025, v. 5, n. 1, p. 2, doi. 10.3390/nanomanufacturing5010002

By:

Enomoto, Keisuke;
Taniguchi, Jun

Publication type:

Article

Towards practical quantum computers: transmon qubit with a lifetime approaching 0.5 milliseconds.

Published in:

NPJ Quantum Information, 2022, v. 8, n. 1, p. 1, doi. 10.1038/s41534-021-00510-2

By:

Wang, Chenlu;
Li, Xuegang;
Xu, Huikai;
Li, Zhiyuan;
Wang, Junhua;
Yang, Zhen;
Mi, Zhenyu;
Liang, Xuehui;
Su, Tang;
Yang, Chuhong;
Wang, Guangyue;
Wang, Wenyan;
Li, Yongchao;
Chen, Mo;
Li, Chengyao;
Linghu, Kehuan;
Han, Jiaxiu;
Zhang, Yingshan;
Feng, Yulong;
Song, Yu

Publication type:

Article

Imaging of Ferroelectric Micro-Domains in X-Cut Lithium Niobate by Confocal Second Harmonic Microscopy.

Published in:

Ferroelectrics, 2009, v. 389, n. 1, p. 132, doi. 10.1080/00150190902993267

By:

BERTH, GERHARD;
WIEDEMEIER, VOLKER;
HUSCH, KLAUS-PETER;
LI GUI;
HUI HU;
SOHLER, WOLFGANG;
ZRENNER, ARTUR

Publication type:

Article

Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma.

Published in:

Ferroelectrics, 2009, v. 384, n. 1, p. 17, doi. 10.1080/00150190902892691

By:

DOO-SEUNG UM;
DONG-PYO KIM;
JONG-CHANG WOO;
CHANG-IL KIM

Publication type:

Article

Dry Etching Mechanisms of ZrO2 Thin Films in BCl3/Cl2/Ar Plasma.

Published in:

Ferroelectrics, 2009, v. 384, n. 1, p. 32, doi. 10.1080/00150190902892725

By:

CHEOL-IN LEE;
GWAN-HA KIM;
DONG-PYO KIM;
JONG-CHANG WOO;
CHANG-IL KIM

Publication type:

Article

Etching Characteristics of (Na0.5K0.5)NbO3 Thin Films in an Inductively Coupled Cl2/Ar Plasma.

Published in:

Ferroelectrics, 2007, v. 357, n. 1, p. 179, doi. 10.1080/00150190701542877

By:

Chan Min Kang;
Gwan-Ha Kim;
Kyoung-Tae Kim;
Chang-Il Kim

Publication type:

Article

Pyroelectric Arrays Using Ceramics and Thin Films Integrated Radiation Collectors: Design Fabrication and Testing.

Published in:

Ferroelectrics, 2005, v. 318, n. 1, p. 11, doi. 10.1080/00150190590965956

By:

Whatmore, R. W.;
Landi, S.;
Shaw, C. P.;
Kirby, P. B.

Publication type:

Article

Effect of ECR Plasma Treatment on Lithium Niobate Surface State.

Published in:

Ferroelectrics, 2004, v. 300, n. 1, p. 147, doi. 10.1080/00150190490445972

By:

Kokhanchik, L.;
Yakimov, E.;
Shapoval, S.

Publication type:

Article

A Study on the Improvement of Etch Uniformity in an Ion Beam Etcher with a Magnetized Inductively Coupled Plasma Source.

Published in:

Plasma Physics Reports, 2021, v. 47, n. 3, p. 289, doi. 10.1134/S1063780X21030053

By:

Cheong, H.-W.;
Kim, J.-W.;
Kim, K.;
Lee, H.

Publication type:

Article

Dry Etching Characteristics of 16-nm Amorphous Carbon Layer in a Dual-Frequency Plasma Etcher.

Published in:

Plasma Physics Reports, 2020, v. 46, n. 7, p. 732, doi. 10.1134/S1063780X2007003X

By:

Cheong, Hee-Woon;
Kim, Ji-Won;
Kim, Kyungji;
Lee, Hwally

Publication type:

Article

Study of Gallium Arsenide Etching in a DC Discharge in Low-Pressure HCl-Containing Mixtures.

Published in:

Plasma Physics Reports, 2018, v. 44, n. 4, p. 438, doi. 10.1134/S1063780X18040037

By:

Dunaev, A. V.;
Murin, D. B.

Publication type:

Article

Control of power characteristics of ion flow in plasma-etching reactor based on beam-plasma discharge.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 13, p. 1104, doi. 10.1134/S1063780X11070087

By:

Isaev, N.;
Klykov, I.;
Shustin, E.

Publication type:

Article

Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning.

Published in:

Electronics (2079-9292), 2024, v. 13, n. 17, p. 3577, doi. 10.3390/electronics13173577

By:

Kim, Ye Jin;
Song, Jung Ho;
Cho, Ki Hwan;
Shin, Jong Hyeon;
Kim, Jong Sik;
Yoon, Jung Sik;
Hong, Sang Jeen

Publication type:

Article

Optimization of Ohmic Contact to Ultrathin-Barrier AlGaN/GaN Heterostructure via an 'Ohmic-Before-Passivation' Process.

Published in:

Electronics (2079-9292), 2023, v. 12, n. 8, p. 1767, doi. 10.3390/electronics12081767

By:

Ji, Yuan;
Huang, Sen;
Jiang, Qimeng;
Zhang, Ruizhe;
Fan, Jie;
Yin, Haibo;
Zheng, Yingkui;
Wang, Xinhua;
Wei, Ke;
Liu, Xinyu

Publication type:

Article

Use of Optical Emission Spectroscopy Data for Fault Detection of Mass Flow Controller in Plasma Etch Equipment.

Published in:

Electronics (2079-9292), 2022, v. 11, n. 2, p. 253, doi. 10.3390/electronics11020253

By:

Kwon, Hyukjoon;
Hong, Sang Jeen

Publication type:

Article

Fabrication of Superconducting Nb–AlN–NbN Tunnel Junctions Using Electron-Beam Lithography.

Published in:

Electronics (2079-9292), 2021, v. 10, n. 23, p. 2944, doi. 10.3390/electronics10232944

By:

Fominsky, Mikhail Yu.;
Filippenko, Lyudmila V.;
Chekushkin, Artem M.;
Dmitriev, Pavel N.;
Koshelets, Valery P.

Publication type:

Article

Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask.

Published in:

Electronics (2079-9292), 2021, v. 10, n. 20, p. 2512, doi. 10.3390/electronics10202512

By:

Jiang, Zheng;
Zhu, Hao;
Sun, Qingqing;
Zhang, Davidwei

Publication type:

Article

Dual-Frequency RF Impedance Matching Circuits for Semiconductor Plasma Etch Equipment.

Published in:

Electronics (2079-9292), 2021, v. 10, n. 17, p. 2074, doi. 10.3390/electronics10172074

By:

Lee, Jeongsu;
Hong, Sangjeen

Publication type:

Article

Process Optimization of Amorphous Carbon Hard Mask in Advanced 3D-NAND Flash Memory Applications.

Published in:

Electronics (2079-9292), 2021, v. 10, n. 12, p. 1374, doi. 10.3390/electronics10121374

By:

Jiang, Zheng;
Zhu, Hao;
Sun, Qingqing

Publication type:

Article

Performance Evaluation of CNN-Based End-Point Detection Using In-Situ Plasma Etching Data.

Published in:

Electronics (2079-9292), 2021, v. 10, n. 1, p. 49, doi. 10.3390/electronics10010049

By:

Kim, Bobae;
Im, Sungbin;
Yoo, Geonwook

Publication type:

Article

Contact Resistance Parallel Model for Edge-Contacted 2D Material Back-Gate FET.

Published in:

Electronics (2079-9292), 2020, v. 9, n. 12, p. 2110, doi. 10.3390/electronics9122110

By:

Cai, Fei;
Deng, Guangsheng;
Li, Xiangxiang;
Lin, Fujiang

Publication type:

Article

Fabrication and application of 3D Terahertz metamaterials with vertical multinanogaps for spectroscopic sensing.

Published in:

Scientific Reports, 2025, v. 15, n. 1, p. 1, doi. 10.1038/s41598-025-98611-x

By:

Inomata, Naoki;
Takahashi, Tomotsugu;
Sakai, Yuki;
Okatani, Taiyu;
Kanamori, Yoshiaki

Publication type:

Article

Biomimetic Transferable Surface for a Real Time Control over Wettability and Photoerasable Writing with Water Drop Lens.

Published in:

Scientific Reports, 2014, p. 1, doi. 10.1038/srep07407

By:

Zillohu, Ahnaf Usman;
Abdelaziz, Ramzy;
Homaeigohar, Shahin;
Krasnov, Igor;
Muller, Martin;
Strunskus, Thomas;
Elbahri, Mady

Publication type:

Article

Extended Infrared Absorption in Nanostructured Si Through Se Implantation and Flash Lamp Annealing.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 24, p. 1, doi. 10.1002/pssa.202400133

By:

Radfar, Behrad;
Liu, Xiaolong;
Berencén, Yonder;
Shaikh, Mohd Saif;
Prucnal, Slawomir;
Kentsch, Ulrich;
Vähänissi, Ville;
Zhou, Shengqiang;
Savin, Hele

Publication type:

Article

Fabrication of Ultralow‐Bevel Angle Mesa Structures for Vertical GaN Devices.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 21, p. 1, doi. 10.1002/pssa.202400079

By:

Tarenko, Jarosław;
Kamiński, Maciej;
Taube, Andrzej;
Ekielski, Marek;
Kruszka, Renata;
Zadura, Magdalena;
Szerling, Anna;
Prystawko, Paweł;
Boćkowski, Michał;
Król, Krystian;
Jankowska‐Śliwińska, Joanna;
Komorowska, Katarzyna;
Grzegory, Izabella

Publication type:

Article

Performance Enhancement of Multiple Quantum Shell Nanowire‐Based Micro‐Light Emitting Diodes with Underlying GaInN/GaN Superlattices.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 21, p. 1, doi. 10.1002/pssa.202400029

By:

Inaba, Soma;
Lu, Weifang;
Shima, Ayaka;
Ii, Shiori;
Takahashi, Mizuki;
Yamanaka, Yuki;
Hattori, Yuta;
Kubota, Kosei;
Huang, Kai;
Iwaya, Motoaki;
Takeuchi, Tetsuya;
Kamiyama, Satoshi

Publication type:

Article

Etching Characteristics of Hydrogen Environment Anisotropic Thermal Etching for GaN‐Based Functional Photonic Devices.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 13, p. 1, doi. 10.1002/pssa.202300688

By:

Honda, Takuto;
Akimoto, Mirai;
Kurabe, Umito;
Takano, Yamato;
Kikuchi, Akihiko

Publication type:

Article

Room‐Temperature Continuous Wave Lasing of Circular Defect in 2D Photonic Crystal (CirD) Laser with AlOx Cladding Layers Fabricated by One‐Step Dry Etching.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 13, p. 1, doi. 10.1002/pssa.202300576

By:

Zuo, Rubing;
Kinoshita, Ryosei;
Ye, Hanqiao;
Kajii, Hirotake;
Maruta, Akihiro;
Kondow, Masahiko

Publication type:

Article

Vertical GaN Transistor with Semi‐Insulating Channel.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2023, v. 220, n. 16, p. 1, doi. 10.1002/pssa.202200776

By:

Šichman, Peter;
Stoklas, Roman;
Hasenöhrl, Stanislav;
Gregušová, Dagmar;
Ťapajna, Milan;
Hudec, Boris;
Haščík, Štefan;
Hashizume, Tamotsu;
Chvála, Aleš;
Šatka, Alexander;
Kuzmík, Ján

Publication type:

Article

Ultratransparent Polymer/Semitransparent Silver Grid Hybrid Electrodes for Small-Molecule Organic Solar Cells.

Published in:

Advanced Energy Materials, 2015, v. 5, n. 9, p. n/a, doi. 10.1002/aenm.201570044

By:

Kim, Yong Hyun;
Müller-Meskamp, Lars;
Leo, Karl

Publication type:

Article

Efficiency Enhancement of Organic Solar Cells Using Hydrophobic Antireflective Inverted Moth-Eye Nanopatterned PDMS Films.

Published in:

Advanced Energy Materials, 2014, v. 4, n. 8, p. n/a, doi. 10.1002/aenm.201301315

By:

Leem, Jung Woo;
Kim, Sehwan;
Lee, Soo Hyun;
Rogers, John A.;
Kim, Eunkyoung;
Yu, Jae Su

Publication type:

Article

A Study on Enhancement of Boiling Heat Transfer by Mixed-Wettability Surface.

Published in:

Heat Transfer Engineering, 2018, v. 39, n. 17/18, p. 1555, doi. 10.1080/01457632.2017.1369845

By:

Kong, Xin;
Wei, Jinjia;
Deng, Yueping;
Zhang, Yonghai

Publication type:

Article

Application of Notched Long-Period Fiber Grating Based Sensor for CO 2 Gas Sensing.

Published in:

Fiber & Integrated Optics, 2016, v. 35, n. 1, p. 22, doi. 10.1080/01468030.2015.1122115

By:

Wu, Chao-Wei;
Chiang, Chia-Chin

Publication type:

Article

Demonstration of using HF-etchant mixed into CO2 to lift-off thin-film GaAs layers by supercritical fluid technology.

Published in:

Modern Physics Letters B, 2022, v. 36, n. 10, p. 1, doi. 10.1142/S0217984921410189

By:

Feng, David Jui-Yang;
Kuo, Heng;
Yang, Cheng-Fu

Publication type:

Article

Simulation of SiO2 etching in an inductively coupled CF4 plasma.

Published in:

Modern Physics Letters B, 2017, v. 31, n. 6, p. -1, doi. 10.1142/S0217984917500427

By:

Xu, Qing;
Li, Yu-Xing;
Li, Xiao-Ning;
Wang, Jia-Bin;
Yang, Fan;
Yang, Yi;
Ren, Tian-Ling

Publication type:

Article

High density plasma etching of ultrananocrystalline diamond films in 2/4 and 2/6 inductively coupled plasmas.

Published in:

Modern Physics Letters B, 2015, v. 29, n. 6/7, p. -1, doi. 10.1142/S0217984915400229

By:

Park, Jong Cheon;
Kim, Seong Hak;
Kim, Tae Gyu;
Kim, Jin Kon;
Cho, Hyun;
Lee, Byeong Woo

Publication type:

Article

Mechanisms for plasma etching of RRAM 2 with diblock copolymer selectivity.

Published in:

Modern Physics Letters B, 2014, v. 28, n. 18, p. -1, doi. 10.1142/S0217984914501498

By:

Ge, Jie;
Yang, Yi;
Li, Xiao-Ning;
Ren, Tianling

Publication type:

Article

Optimizations of inductively coupled plasma etching and design for sensing window of Mach--Zehnder interferometer sensor in polymer technology.

Published in:

Modern Physics Letters B, 2014, v. 28, n. 6, p. 1, doi. 10.1142/S0217984914500444

By:

Tianfu Yang;
Tianjiao Wang;
Chuantao Zheng;
Xibin Wang;
Darning Zhang

Publication type:

Article

Optimizations of inductively coupled plasma etching and design for sensing window of Mach-Zehnder interferometer sensor in polymer technology.

Published in:

Modern Physics Letters B, 2014, v. 28, n. 6, p. -1, doi. 10.1142/S0217984914500444

By:

Yang, Tianfu;
Wang, Tianjiao;
Zheng, Chuantao;
Wang, Xibin;
Zhang, Daming

Publication type:

Article