Works about PHOTORESISTS

Results: 558

FABRICATION OF SU-8 RIDGE WAVEGUIDES BY OPTICAL LITHOGRAPHY AND THEIR CHARACTERIZATION.

Published in:

International Journal of Nanoscience, 2011, v. 10, n. 4/5, p. 771, doi. 10.1142/S0219581X11008873

By:

MAKWANI, DIKSHA;
VIJAYA, R.

Publication type:

Article

NANOSCALE OPTICAL PATTERNING USING EVANESCENT FIELDS AND SURFACE PLASMONS.

Published in:

International Journal of Nanoscience, 2004, v. 3, n. 4/5, p. 405, doi. 10.1142/S0219581X0400219X

By:

Blaikie, Richard J.;
Alkaisi, Maan M.;
McNab, Sharee J.;
Melville, David O. S.

Publication type:

Article

NANOSCALE PERIODICAL STRUCTURES FABRICATED BY INTERFERENCE PHOTOLITHOGRAPHY.

Published in:

International Journal of Nanoscience, 2004, v. 3, n. 1/2, p. 59, doi. 10.1142/S0219581X0400181X

By:

Nesterov, S. I.;
Myagkov, D. V.;
Portnoi, E. L.

Publication type:

Article

Novel Nanostructured Electrodes Obtained by Pyrolysis of Composite Polymeric Materials.

Published in:

Electroanalysis, 2015, v. 27, n. 7, p. 1544, doi. 10.1002/elan.201400430

By:

Amato, Letizia;
Schulte, Lars;
Heiskanen, Arto;
Keller, Stephan S.;
Ndoni, Sokol;
Emnéus, Jenny

Publication type:

Article

Bismuth Film Voltammetric Sensor on Pyrolyzed Photoresist/Alumina Support for Determination of Heavy Metals.

Published in:

Electroanalysis, 2014, v. 26, n. 5, p. 898, doi. 10.1002/elan.201400020

By:

Rehacek, Vlastimil;
Hotovy, Ivan;
Vojs, Marian

Publication type:

Article

Rational and Facile Construction of 3D Annular Nanostructures with Tunable Layers by Exploiting the Diffraction and Interference of Light.

Published in:

Advanced Functional Materials, 2016, v. 26, n. 29, p. 5203, doi. 10.1002/adfm.201505614

By:

Choe, Jong‐Ho;
Park, Q‐Han;
You, Eun‐Ah

Publication type:

Article

Designing Multicolored Photonic Micropatterns through the Regioselective Thermal Compression of Inverse Opals.

Published in:

Advanced Functional Materials, 2016, v. 26, n. 25, p. 4587, doi. 10.1002/adfm.201601095

By:

Lee, Joon‐Seok;
Je, Kwanghwi;
Kim, Shin‐Hyun

Publication type:

Article

Contents: (Adv. Funct. Mater. 24/2015).

Published in:: Advanced Functional Materials, 2015, v. 25, n. 24, p. 3619, doi. 10.1002/adfm.201570160
Publication type:: Article

Two-Photon Nanolithography Enhances the Performance of an Ionic Liquid-Polymer Composite Sensor.

Published in:

Advanced Functional Materials, 2015, v. 25, n. 11, p. 1683, doi. 10.1002/adfm.201404370

By:

Bakhtina, Natalia A.;
Loeffelmann, Ute;
MacKinnon, Neil;
Korvink, Jan G.

Publication type:

Article

Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes.

Published in:

Advanced Functional Materials, 2014, v. 24, n. 45, p. 7078, doi. 10.1002/adfm.201470295

By:

He, Chunlin;
Stoykovich, Mark P.

Publication type:

Article

Controlled Planar Alignment of Discotic Liquid Crystals in Microchannels Made Using SU8 Photoresist.

Published in:

Advanced Functional Materials, 2014, v. 23, n. 48, p. 5997, doi. 10.1002/adfm.201301613

By:

Cattle, James;
Bao, Peng;
Bramble, Jonathan P.;
Bushby, Richard J.;
Evans, Stephen D.;
Lydon, John E.;
Tate, Daniel J.

Publication type:

Article

Profile of the wafer level ECD gold bumps under variable parameters.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 6, p. 563, doi. 10.1007/s10854-007-9387-1

By:

Jing, X. M.;
Engelmann, G.;
Chen, D.;
Wolf, J.;
Ehrmann, O.;
Reichl, H.

Publication type:

Article

Behavior of frozen soils under pressure impulse action.

Published in:

Soil Mechanics & Foundation Engineering, 1991, v. 28, n. 3, p. 116, doi. 10.1007/BF02716913

By:

Mikhalyuk, A.;
Pisarev, Yu.;
Tokarchuk, A.;
Demchenko, L.

Publication type:

Article

A chip for catching, separating, and transporting bio-particles with dielectrophoresis.

Published in:

Journal of Industrial Microbiology & Biotechnology, 2008, v. 35, n. 11, p. 1551, doi. 10.1007/s10295-008-0459-x

By:

Jung-Tang Huang;
Guo-Chen Wang;
Kuang-Ming Tseng;
Shiuh-Bin Fang

Publication type:

Article

A Study on Uniformity Characteristics of a Magnetized Inductively Coupled Plasma.

Published in:

Plasma Physics Reports, 2020, v. 46, n. 3, p. 328, doi. 10.1134/S1063780X20030034

By:

Hee-Woon Cheong;
Lee, Woohyun;
Kim, Ji-Won;
Cha, Sujin;
Kim, Kyoungji;
Lee, Hwally

Publication type:

Article

Fine Cone-shaped Bumps for Three-dimensional LSI Package-- An Optimization of Thermocompression Bonding Process.

Published in:

Sensors & Materials, 2018, v. 30, n. 12, Part 2, p. 2905, doi. 10.18494/SAM.2018.2009

By:

Shunsuke Nemoto;
Ying Ying Lim;
Hiroshi Nakagawa;
Katsuya Kikuchi;
Masahiro Aoyagi

Publication type:

Article

Photosensitive acrylate copolymer for electrodeposition photoresist.

Published in:

Polymer Science -- Series A, 2013, v. 55, n. 4, p. 225, doi. 10.1134/S0965545X13040093

By:

Liu, Ren;
An, Fenlei;
Zhang, Shengwen;
Luo, Jing;
Liu, Xiaoya

Publication type:

Article

Pushing the resolution of photolithography down to 15nm by surface plasmon interference.

Published in:

Scientific Reports, 2014, p. 1, doi. 10.1038/srep05618

By:

Jianjie Dong;
Juan Liu;
Guoguo Kang;
Jinghui Xie;
Yongtian Wang

Publication type:

Article

Photoresist-Free Fully Self-Patterned Transparent Amorphous Oxide Thin-Film Transistors Obtained by Sol-Gel Process.

Published in:

Scientific Reports, 2014, p. 1, doi. 10.1038/srep04544

By:

Hyun Soo Lim;
You Seung Rim;
Hyun Jae Kim

Publication type:

Article

GaInN‐Based Blue LED with a PEDOT/PSS Hole Transport Layer.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 21, p. 1, doi. 10.1002/pssa.202400090

By:

Kato, Yuma;
Iwaya, Motoaki;
Takeuchi, Tetsuya;
Kamiyama, Satoshi

Publication type:

Article

Development and Fabrication of Microdosimeter Arrays Based on Single‐Crystal Diamond Schottky Diodes.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2024, v. 221, n. 14, p. 1, doi. 10.1002/pssa.202300987

By:

Verona, Claudio;
Verona Rinati, Gianluca;
Schettino, Giuseppe;
Parisi, Gabriele

Publication type:

Article

Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time.

Published in:

Nature Chemistry, 2011, v. 3, n. 3, p. 225, doi. 10.1038/nchem.965

By:

Stocker, Michael P.;
Linjie Li;
Gattass, Rafael R.;
Fourkas, John T.

Publication type:

Article

Fabrication of a Two-Dimensional Diffraction Grating with Isolated Photoresist Pattern Structures.

Published in:

International Journal of Automation Technology, 2020, v. 14, n. 4, p. 546, doi. 10.20965/ijat.2020.p0546

By:

Matsukuma, Hiraku;
Matsunaga, Masanori;
Zhang, Kai;
Shimizu, Yuki;
Gao, Wei

Publication type:

Article

Integrated growth of Si-O-C nanosheets on the surface of carbon microstructure with the aid of carbon nanotubes.

Published in:

Journal of Composite & Advanced Materials / Revue des Composites et des Matériaux Avancés, 2018, v. 28, n. 2, p. 289, doi. 10.3166/RCMA.28.289-298

By:

Shuang Xi;
Yuzhou Zhang;
Yan Ji;
Yinlong Zhu;
Ying Liu;
Yutu Yang;
Maolin Yu

Publication type:

Article

Coupled micromechanical resonator for mass detection.

Published in:

Modern Physics Letters B, 2022, v. 36, n. 6, p. 1, doi. 10.1142/S0217984921506016

By:

Yu, Hong;
Wang, Min;
Mao, Shihan;
Chen, Ying;
Lei, Shuangying

Publication type:

Article

Plasma Characteristics of a Ni–Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz.

Published in:

Plasma Chemistry & Plasma Processing, 2010, v. 30, n. 1, p. 183, doi. 10.1007/s11090-009-9203-1

By:

Kyong Nam Kim;
Jong Hyeuk Lim;
Geun Young Yeom

Publication type:

Article

Contrast Enhancement in Image Transfer via Interaction of UV Radiation with Inorganic Photoresist Films.

Published in:

Semiconductors, 2001, v. 35, n. 2, p. 226, doi. 10.1134/1.1349937

By:

Kaliteevskaya, N. A.;
Seısyan, R. P.

Publication type:

Article

Photoresistance of Si/Ge/Si Structures with Germanium Quantum Dots.

Published in:

Semiconductors, 2000, v. 34, n. 11, p. 1311, doi. 10.1134/1.1325429

By:

Shegaı, O. A.;
Zhuravlev, K. S.;
Markov, V. A.;
Nikiforov, A. I.;
Pchelyakov, O. P.

Publication type:

Article

Simulation of Photochemical Transformations and Photodarkening in Photoresist Films Exposed to Pulsed Vacuum-Ultraviolet Radiation.

Published in:

Semiconductors, 2000, v. 34, n. 7, p. 825, doi. 10.1134/1.1188082

By:

Kaliteevskaya, N. A.;
Seısyan, R. P.

Publication type:

Article

A Facile Size-control Method of CdS Nanoparticles In-situ Synthesized in Polymer Matrix by Adjusting Ratio of Acidic Acid with Metallic Complex in Acrylate Photoresist Resin.

Published in:

Chemistry Letters, 2007, v. 36, n. 1, p. 70, doi. 10.1246/cl.2007.156

By:

Zheng-Bin Sun;
Wei-Qiang Chen;
Xian-Zi Dong;
Xuan-Ming Duan

Publication type:

Article

Cr-Photocrosslinked Polyvinylpyrrolidone Memristor: A Flexible, Rapid Manufacturing and Disposable Polymeric Electronic Memory Device.

Published in:

Journal of Electronic Materials, 2023, v. 52, n. 8, p. 5256, doi. 10.1007/s11664-023-10472-0

By:

Ghasemi, Pejman;
Sharifi, Mohammad Javad;
Javanbakht, Siamak

Publication type:

Article

Optimization of Thick Photoresist for Uniform Thickness in RF MEMS Applications.

Published in:

Journal of Electronic Materials, 2021, v. 50, n. 12, p. 7143, doi. 10.1007/s11664-021-09225-8

By:

Bajpai, Anuroop;
Rangra, Kamaljit;
Bansal, Deepak

Publication type:

Article

9,10‐Dithio/oxo‐Anthracene as a Novel Photosensitizer for Photoinitiator Systems in Photoresists.

Published in:

Macromolecular Chemistry & Physics, 2019, v. 220, n. 15, p. N.PAG, doi. 10.1002/macp.201900152

By:

Lei, Jing;
Akitoshi, Tanimoto;
Katou, Sadaki;
Murakami, Yasuharu;
Yin, Jie;
Jiang, Xuesong

Publication type:

Article

Facile Preparation of Light Refractive Poly(aroxycarbonyltriazole)s by Metal-Free Click Polymerization.

Published in:

Macromolecular Chemistry & Physics, 2014, v. 215, n. 10, p. 1036, doi. 10.1002/macp.201400108

By:

Li, Hongkun;
Wang, Zhe;
Li, Jie;
Zhao, Engui;
Sun, Jing Zhi;
Lam, Jacky W. Y.;
Qin, Anjun;
Tang, Ben Zhong

Publication type:

Article

Multiscale micro-patterned polymeric and carbon substrates derived from buckled photoresist films: fabrication and cytocompatibility.

Published in:

Journal of Materials Science, 2012, v. 47, n. 8, p. 3867, doi. 10.1007/s10853-011-6242-9

By:

Kulkarni, Manish;
Sharma, Chandra;
Sharma, Ashutosh;
Kalmodia, Sushma;
Basu, Bikramjit

Publication type:

Article

Carbon based conductive photoresist.

Published in:

Journal of Materials Science, 2009, v. 44, n. 17, p. 4625, doi. 10.1007/s10853-009-3706-2

By:

Hauptman, Nina;
Žveglič, Maša;
Maček, Marijan;
Gunde, Marta Klanjšek

Publication type:

Article

Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process.

Published in:

2006

By:

Hyoun Woo Kim;
Ju Hyun Myung;
Jong Woo Lee;
Hyung-Sun Kim;
Keeho Kim;
Jeong-Yeol Jang;
Tae-Ho Yoon;
Sung Kim;
Dae-Kyu Choi;
Chin-Wook Chung;
Geun Yeom;
Jae-Min Myoung;
Hyoung-June Kim

Publication type:

Letter

Application of N2/Ar inductively coupled plasma → the photoresist ashing for low- k dielectrics.

Published in:

Journal of Materials Science, 2005, v. 40, n. 13, p. 3543, doi. 10.1007/s10853-005-2877-8

By:

Hyoun Kim;
Ju Myung;
Nam Kim;
Chung-Gon Yoo;
Kee Suh;
Sung Kim;
Dae-Kyu Choi;
Chin-Wook Chung;
Chang-Jin Kang;
Wan Park;
Se-Geun Park;
Jae-Gab Lee

Publication type:

Article

Sensitivity search for the rescheduling of semiconductor photolithography operations.

Published in:

International Journal of Advanced Manufacturing Technology, 2013, v. 67, n. 1-4, p. 73, doi. 10.1007/s00170-013-4754-y

By:

Hung, Yi-Feng;
Liang, Chao-Hsiang;
Chen, James

Publication type:

Article

Vacuum suction aid for microlens array formation using LIGA-like process.

Published in:

International Journal of Advanced Manufacturing Technology, 2006, v. 29, n. 5/6, p. 518, doi. 10.1007/s00170-005-2549-5

By:

Ruey Fang Shyu;
Hsiharng Yang

Publication type:

Article

Towards molecular electronics with large-area molecular junctions.

Published in:

2006

By:

Akkerman, Hylke B.;
Blom, Paul W. M.;
de Leeuw, Dago M.;
de Boer, Bert

Publication type:

Letter

Automated alignment in mask‐free photolithography enabled by micro‐LED arrays.

Published in:

Electronics Letters (Wiley-Blackwell), 2021, v. 57, n. 19, p. 721, doi. 10.1049/ell2.12244

By:

Stonehouse, M.;
Blanchard, A.;
Guilhabert, B.;
Zhang, Y.;
Gu, E.;
Watson, I. M.;
Herrnsdorf, J.;
Dawson, M. D.

Publication type:

Article

曝光方式对负性光敏聚酰亚胺图形化的影响.

Published in:

Journal of Functional Polymers, 2022, v. 35, n. 6, p. 554, doi. 10.14133/j.cnki.1008-9357.20220328001

By:

张配荧;
尹玄文;
李珍;
陆学民1，;
路庆华

Publication type:

Article

Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist.

Published in:

Nano Convergence, 2022, v. 9, n. 1, p. 1, doi. 10.1186/s40580-022-00345-3

By:

Kim, Jiho;
Lee, Jin-Kyun;
Chae, Boknam;
Ahn, Jinho;
Lee, Sangsul

Publication type:

Article

1,3,5,7-Tetrasubstituted adamantanes as frameworks in the design of assemblies of porphyrin macrocycles.

Published in:

Doklady Chemistry, 2017, v. 474, n. 2, p. 129, doi. 10.1134/S0012500817060039

By:

Vainer, A.;
Dyumaev, K.;
Kovalenko, A.;
Berenshtein, L.;
Krichevskaya, S.;
Fridzon, R.

Publication type:

Article

Polyphenol derivatives of porphyrins containing fluorene units: Synthesis and positive-tone photoresists for 22-nanometer lithography.

Published in:

Doklady Chemistry, 2016, v. 468, n. 2, p. 174, doi. 10.1134/S0012500816060045

By:

Vainer, A.;
Dyumaev, K.;
Kovalenko, A.;
Babuskin, Ya.;
Krichevskaya, S.;
Lubenskii, G.

Publication type:

Article

Bis(porphyrin)-3,4:9,10-perylenetetracarboxydiimide triads as new building blocks for the synthesis of aromatic polyethers.

Published in:

Doklady Chemistry, 2016, v. 466, n. 1, p. 3, doi. 10.1134/S0012500816010031

By:

Vainer, A.;
Dyumaev, K.;
Kovalenko, A.;
Dragunskaya, R.;
Bel'skii, T.;
Khait, I.

Publication type:

Article

Aromatic polyethers with 2,6-bis(4-azidotetrafluorobenzylidene)cyclohexanone side fragments and styryl groups in the backbone.

Published in:

Doklady Chemistry, 2011, v. 438, n. 1, p. 140, doi. 10.1134/S0012500811050041

By:

Vainer, A. Ya.;
Dyumaev, K. M.;
Mareeva, S. A.;
Alekseev, V. D.;
Bruskina, M. B.;
Glagolev, A. A.

Publication type:

Article

An experimental study of photoresist material etching by an atmospheric-pressure plasma jet with Ar/air mixed gas.

Published in:

Journal of Plasma Physics, 2013, v. 79, n. 5, p. 683, doi. 10.1017/S0022377813000263

By:

WANG, LIJUN;
NING, WENJUN;
FU, MINGZHENG;
WU, CHEN;
JIA, SHENLI

Publication type:

Article

Direktes Laserschreiben auf Basis von Zwei-Photonen-Absorption mit metrologisch rückführbarer Positionierung.

Published in:

Technisches Messen, 2021, v. 88, p. s22, doi. 10.1515/teme-2021-0052

By:

Mohr-Weidenfeller, Laura;
Hofmann, Martin;
Birli, Oliver;
Häcker, Annika-Verena;
Reinhardt, Carsten;
Manske, Eberhard

Publication type:

Article