Works matching DE "PHOTORESISTS"
Results: 526
Single‐Component High‐Resolution Dual‐Tone EUV Photoresists Based on Precision Self‐Immolative Polymers.
- Published in:
- Angewandte Chemie, 2025, v. 137, n. 3, p. 1, doi. 10.1002/ange.202415588
- By:
- Publication type:
- Article
Developments in materials for 157nm photoresists.
- Published in:
- Solid State Technology, 2001, v. 44, n. 10, p. 63
- Publication type:
- Article
The impact of airborne molecular bases on DUV photoresists.
- Published in:
- Solid State Technology, 2001, v. 44, n. 8, p. 63
- By:
- Publication type:
- Article
Characterizing resists and films with VUV spectroscopic ellipsometry.
- Published in:
- Solid State Technology, 2001, v. 44, n. 7, p. 165
- By:
- Publication type:
- Article
Low-temperature annealing system for 300mm thermal processing.
- Published in:
- Solid State Technology, 2001, v. 44, n. 6, p. 152
- By:
- Publication type:
- Article
Analyzing and characterizing 193nm resist shrinkage.
- Published in:
- Solid State Technology, 2001, v. 44, n. 5, p. 52
- By:
- Publication type:
- Article
Direct temperature metrology helps minimize CA-resist CD variation.
- Published in:
- Solid State Technology, 2000, v. 43, n. 9, p. 139
- By:
- Publication type:
- Article
Substrates with topography.
- Published in:
- Solid State Technology, 2000, v. 43, n. 8, p. 127
- By:
- Publication type:
- Article
PEB process in a CA resist.
- Published in:
- Solid State Technology, 2000, v. 43, n. 8, p. 95
- By:
- Publication type:
- Article
The effect of sub-0.1Mu m filtration on 248nm photoresist performance.
- Published in:
- Solid State Technology, 2000, v. 43, n. 7, p. 202
- By:
- Publication type:
- Article
Successful ellipsometry at 157nm.
- Published in:
- Solid State Technology, 2000, v. 43, n. 5, p. 36
- By:
- Publication type:
- Article
The challenges in materials design for 157nm photoresists.
- Published in:
- Solid State Technology, 2000, v. 43, n. 3, p. 41
- By:
- Publication type:
- Article
A novel resist and post-etch residue removal process using ozonated chemistry.
- Published in:
- Solid State Technology, 1998, v. 41, n. 12, p. 57
- By:
- Publication type:
- Article
Supercritical CO2 blasts photoresist.
- Published in:
- Solid State Technology, 1998, v. 41, n. 9, p. 32
- By:
- Publication type:
- Article
Silicon-rich-methacrylate bilayer resist for 193-nm...
- Published in:
- Solid State Technology, 1998, v. 41, n. 6, p. 69
- By:
- Publication type:
- Article
New 193-nm resist, resolution to 60 nm without phase shift.
- Published in:
- Solid State Technology, 1998, v. 41, n. 6, p. 44
- By:
- Publication type:
- Article
Synthesis of N‐Substituted Maleimides and Poly(styrene‐co‐N‐maleimide) Copolymers and Their Potential Application as Photoresists.
- Published in:
- Macromolecular Chemistry & Physics, 2023, v. 224, n. 1, p. 1, doi. 10.1002/macp.202200256
- By:
- Publication type:
- Article
9,10‐Dithio/oxo‐Anthracene as a Novel Photosensitizer for Photoinitiator Systems in Photoresists.
- Published in:
- Macromolecular Chemistry & Physics, 2019, v. 220, n. 15, p. N.PAG, doi. 10.1002/macp.201900152
- By:
- Publication type:
- Article
Facile Preparation of Light Refractive Poly(aroxycarbonyltriazole)s by Metal-Free Click Polymerization.
- Published in:
- Macromolecular Chemistry & Physics, 2014, v. 215, n. 10, p. 1036, doi. 10.1002/macp.201400108
- By:
- Publication type:
- Article
Contents: (Adv. Funct. Mater. 24/2015).
- Published in:
- Advanced Functional Materials, 2015, v. 25, n. 24, p. 3619, doi. 10.1002/adfm.201570160
- Publication type:
- Article
Two-Photon Nanolithography Enhances the Performance of an Ionic Liquid-Polymer Composite Sensor.
- Published in:
- Advanced Functional Materials, 2015, v. 25, n. 11, p. 1683, doi. 10.1002/adfm.201404370
- By:
- Publication type:
- Article
Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes.
- Published in:
- Advanced Functional Materials, 2014, v. 24, n. 45, p. 7078, doi. 10.1002/adfm.201470295
- By:
- Publication type:
- Article
Controlled Planar Alignment of Discotic Liquid Crystals in Microchannels Made Using SU8 Photoresist.
- Published in:
- Advanced Functional Materials, 2014, v. 23, n. 48, p. 5997, doi. 10.1002/adfm.201301613
- By:
- Publication type:
- Article
Multiscale micro-patterned polymeric and carbon substrates derived from buckled photoresist films: fabrication and cytocompatibility.
- Published in:
- Journal of Materials Science, 2012, v. 47, n. 8, p. 3867, doi. 10.1007/s10853-011-6242-9
- By:
- Publication type:
- Article
Carbon based conductive photoresist.
- Published in:
- Journal of Materials Science, 2009, v. 44, n. 17, p. 4625, doi. 10.1007/s10853-009-3706-2
- By:
- Publication type:
- Article
Photoresist ashing technology using N<sub>2</sub>/O<sub>2</sub> ferrite-core ICP in the dual damascene process.
- Published in:
- 2006
- By:
- Publication type:
- Letter
Application of N<sub>2</sub>/Ar inductively coupled plasma → the photoresist ashing for low- k dielectrics.
- Published in:
- Journal of Materials Science, 2005, v. 40, n. 13, p. 3543, doi. 10.1007/s10853-005-2877-8
- By:
- Publication type:
- Article
Removal of Photoresist Masks with the Use of Rapid Heat Treatment.
- Published in:
- Journal of Engineering Physics & Thermophysics, 2003, v. 76, n. 5, p. 1080, doi. 10.1023/B:JOEP.0000003223.10856.31
- By:
- Publication type:
- Article
A chip for catching, separating, and transporting bio-particles with dielectrophoresis.
- Published in:
- Journal of Industrial Microbiology & Biotechnology, 2008, v. 35, n. 11, p. 1551, doi. 10.1007/s10295-008-0459-x
- By:
- Publication type:
- Article
Dual Patterning of Self‐Assembling Spider Silk Protein Nanofibrillar Networks.
- Published in:
- Advanced Materials Interfaces, 2022, v. 9, n. 31, p. 1, doi. 10.1002/admi.202201173
- By:
- Publication type:
- Article
Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO.
- Published in:
- Advanced Materials Interfaces, 2022, v. 9, n. 22, p. 1, doi. 10.1002/admi.202200835
- By:
- Publication type:
- Article
Resist‐ and Etching‐Free Patterning Mediated by Predefined Photosensitive Polyimide for Two‐Dimensional Semiconductor‐Based Photodetectors.
- Published in:
- Advanced Materials Interfaces, 2021, v. 8, n. 5, p. 1, doi. 10.1002/admi.202001817
- By:
- Publication type:
- Article
Development of a process for the manufacturing of SU-8 100 for the use in cell culture.
- Published in:
- Journal of Bioactive & Compatible Polymers, 2018, v. 33, n. 4, p. 349, doi. 10.1177/0883911518765216
- By:
- Publication type:
- Article
Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C<sub>4</sub>H<sub>2</sub>F<sub>6</sub>-based gas.
- Published in:
- Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-74107-y
- By:
- Publication type:
- Article
Microfabrication of VO 2 Thin Films via a Photosensitive Sol-Gel Method.
- Published in:
- Coatings (2079-6412), 2021, v. 11, n. 10, p. 1264, doi. 10.3390/coatings11101264
- By:
- Publication type:
- Article
Effects of O 2 Plasma Treatments on the Photolithographic Patterning of PEDOT:PSS.
- Published in:
- Coatings (2079-6412), 2021, v. 11, n. 1, p. 31, doi. 10.3390/coatings11010031
- By:
- Publication type:
- Article
Highly confined and continuous single-mode operation of self-align photonic crystal oxide VCSEL.
- Published in:
- Applied Physics B: Lasers & Optics, 2010, v. 100, n. 3, p. 453, doi. 10.1007/s00340-010-4062-2
- By:
- Publication type:
- Article
Evaluation of the dynamic range and spatial resolution of nonadiabatic optical near-field lithography through fabrication of Fresnel zone plates.
- Published in:
- Applied Physics B: Lasers & Optics, 2010, v. 98, n. 1, p. 5, doi. 10.1007/s00340-009-3680-z
- By:
- Publication type:
- Article
Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography.
- Published in:
- Applied Physics B: Lasers & Optics, 2007, v. 86, n. 3, p. 491, doi. 10.1007/s00340-006-2497-2
- By:
- Publication type:
- Article
Lasing action in two-dimensional organic photonic crystal lasers with hexagonal symmetry.
- Published in:
- Applied Physics B: Lasers & Optics, 2006, v. 82, n. 4, p. 539, doi. 10.1007/s00340-005-2120-y
- By:
- Publication type:
- Article
Synthesis and Characterization of N,N-Bis(2-hydroxyethyl) Cinnamamide as a Photo-Responsive Monomer.
- Published in:
- Designed Monomers & Polymers, 2011, v. 14, n. 1, p. 47, doi. 10.1163/138577210X541196
- By:
- Publication type:
- Article
Dot Line Pattern Formation in Photoresist Films by Mask-Guided LIPSS Formation Due to Excimer Laser Irradiation.
- Published in:
- Journal of Laser Micro / Nanoengineering, 2019, v. 14, n. 2, p. 124, doi. 10.2961/jlmn.2019.02.0002
- By:
- Publication type:
- Article
Realization of Structural Color by Direct Laser Write Technique in Photoresist.
- Published in:
- Journal of Laser Micro / Nanoengineering, 2014, v. 9, n. 1, p. 42, doi. 10.2961/jlmn.2014.01.0009
- By:
- Publication type:
- Article
X-ray-induced Cu deposition and patterning on insulators at room temperature.
- Published in:
- Journal of Synchrotron Radiation, 2015, v. 22, n. 6, p. 1524, doi. 10.1107/S1600577515015234
- By:
- Publication type:
- Article
Direct-write X-ray lithography using a hard X-ray Fresnel zone plate.
- Published in:
- Journal of Synchrotron Radiation, 2015, v. 22, n. 3, p. 781, doi. 10.1107/S1600577515003306
- By:
- Publication type:
- Article
NEW WAVES: MICROWAVE MATERIALS.
- Published in:
- Microwave Journal, 2004, v. 47, n. 7, p. 140
- Publication type:
- Article
Characterization of Fractionated Phenolic Resins Used in Photoresists.
- Published in:
- Polymer Engineering & Science, 2003, v. 43, n. 10, p. 1675, doi. 10.1002/pen.10141
- By:
- Publication type:
- Article
Novel Strategies for Novolak Resin Fractionation: Consequences for Advanced Photoresist Applications.
- Published in:
- Polymer Engineering & Science, 2000, v. 40, n. 10, p. 2251, doi. 10.1002/pen.11357
- By:
- Publication type:
- Article
Two-Component Photoresists Containing Thermally Crosslinkable Photoacid Generators.
- Published in:
- Polymer Engineering & Science, 2000, v. 40, n. 5, p. 1248, doi. 10.1002/pen.11252
- By:
- Publication type:
- Article
Magnetically-actuated bending-mode microactuators with excimer laser ablation.
- Published in:
- Plastics, Rubber & Composites, 2004, v. 33, n. 8, p. 338, doi. 10.1179/174328904X22332
- By:
- Publication type:
- Article