Works matching DE "PHOTOMASKS"

Results: 35

Rigidity-Patterned Polyelectrolyte Films to Control Myoblast Cell Adhesion and Spatial Organization.

Published in:

Advanced Functional Materials, 2013, v. 23, n. 27, p. 3432, doi. 10.1002/adfm.201203580

By:

Monge, Claire;
Saha, Naresh;
Boudou, Thomas;
Pózos‐Vásquez, Cuauhtemoc;
Dulong, Virginie;
Glinel, Karine;
Picart, Catherine

Publication type:

Article

Rapid & low-cost prototyping of metallic patterns in limited facilities condition.

Published in:

Journal of Materials Science: Materials in Electronics, 2018, v. 29, n. 16, p. 14328, doi. 10.1007/s10854-018-9567-1

By:

Abidov, Amir;
Kim, Sungjin;
Kim, Yong Bae;
Gomez-Solis, Christian

Publication type:

Article

A study of mask planning in projection-based stereolithography using digital image correlation.

Published in:

International Journal of Advanced Manufacturing Technology, 2019, v. 104, n. 1-4, p. 451, doi. 10.1007/s00170-019-03778-z

By:

Liu, Wangyu;
Deng, Tao;
Sun, Dong;
Jia, Zhikang;
Li, Mingke;
Tang, Aimin

Publication type:

Article

Calibrating the pupil fill balance for hypernumerical aperture lithographic objective.

Published in:

Optical Engineering, 2015, v. 54, n. 9, p. 1, doi. 10.1117/1.OE.54.9.095103

By:

Dawei Rui;
Wei Zhang;
Huaijiang Yang

Publication type:

Article

Holographically encoded volume phase masks.

Published in:

Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.076104

By:

SeGall, Marc;
Divliansky, Ivan;
Jollivet, Clémence;
Schülzgen, Axel;
Glebov, Leonid B.

Publication type:

Article

Extreme ultraviolet microscope characterization using photomask surface roughness.

Published in:

Scientific Reports, 2020, v. 10, n. 1, p. 1, doi. 10.1038/s41598-020-68588-w

By:

Gunjala, Gautam;
Wojdyla, Antoine;
Sherwin, Stuart;
Shanker, Aamod;
Benk, Markus P.;
Goldberg, Kenneth A.;
Naulleau, Patrick P.;
Waller, Laura

Publication type:

Article

PHOTOLITHOGRAPHIC MASK FABRICATION PROCESS USING CR/SAPPHIRE CARRIERS.

Published in:

Advances in Electrical & Electronic Engineering, 2019, v. 17, n. 3, p. 374, doi. 10.15598/aeee.v17i3.3357

By:

ZAWADZKA, Agnieszka;
PRAZMOWSKA, Joanna;
PASZKIEWICZ, Regina

Publication type:

Article

Fabrication of biocompatible monolithic microchannels with high pressure-resistance using direct polymerization of PEG-modified PMMA.

Published in:

Journal of Applied Polymer Science, 2014, v. 131, n. 21, p. n/a, doi. 10.1002/app.41031

By:

De Marco, Carmela;
Credi, Caterina;
Briatico‐Vangosa, Francesco;
Bianchi, Elena;
Ciftlik, Ata Tuna;
Gijs, Martin;
Dubini, Gabriele;
Levi, Marinella;
Turri, Stefano

Publication type:

Article

Multi-Compartmental Hydrogel Microparticles Fabricated by Combination of Sequential Electrospinning and Photopatterning.

Published in:

Angewandte Chemie International Edition, 2015, v. 54, n. 39, p. 11511, doi. 10.1002/anie.201504317

By:

Cho, Kanghee;
Lee, Hyun Jong;
Han, Sang Won;
Min, Ji Hong;
Park, Hansoo;
Koh, Won-Gun

Publication type:

Article

Dynamic Photocontrol of the Coffee-Ring Effect with Optically Tunable Particle Stickiness.

Published in:

Angewandte Chemie International Edition, 2014, v. 53, n. 51, p. 14077, doi. 10.1002/anie.201406903

By:

Anyfantakis, Manos;
Baigl, Damien

Publication type:

Article

ZEISS launches next generation AIMS™ system.

Published in:: infocus Magazine, 2014, n. 35, p. 91
Publication type:: Article

Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography.

Published in:

Entropy, 2020, v. 22, n. 3, p. 295, doi. 10.3390/e22030295

By:

Wang, Yingzhi;
Han, Tailin;
Jiang, Xu;
Yan, Yuhan;
Liu, Hong

Publication type:

Article

Creating Metal Figures in the Surface Layer of Glass.

Published in:

Glass & Ceramics, 2015, v. 72, n. 1/2, p. 10, doi. 10.1007/s10717-015-9711-9

By:

Gudymovich, E.

Publication type:

Article

5.4: Sub-pixel Rendering for a High Resolution OLED Display with Low Resolution Photomasks.

Published in:

SID Symposium Digest of Technical Papers, 2015, v. 46, n. 1, p. 33, doi. 10.1002/sdtp.10197

By:

Lin, Hui‐Chun;
Sun, Pei‐Li;
Wen, Chao‐Hua;
Wang, Sheng‐Po

Publication type:

Article

P-9: Study of the Origin of Major Donor States in Oxide Semiconductor.

Published in:

SID Symposium Digest of Technical Papers, 2014, v. 45, n. 1, p. 975, doi. 10.1002/j.2168-0159.2014.tb00253.x

By:

Oota, Masashi;
Ishihara, Noritaka;
Nakashima, Motoki;
Kurosawa, Yoichi;
Hirohashi, Takuya;
Takahashi, Masahiro;
Yamazaki, Shunpei;
Obonai, Toshimitsu;
Hosaka, Yasuharu;
Koezuka, Junichi;
Kanzaki, Yohsuke;
Matsukizono, Hiroshi;
Kaneko, Seiji;
Matsuo, Takuya

Publication type:

Article

Facile Fabrication of Concentrated Polymer Brushes with Complex Patterning by Photocontrolled Organocatalyzed Living Radical Polymerization.

Published in:

Angewandte Chemie, 2018, v. 130, n. 41, p. 13692, doi. 10.1002/ange.201807207

By:

Wang, Chen‐Gang;
Chen, Chen;
Sakakibara, Keita;
Tsujii, Yoshinobu;
Goto, Atsushi

Publication type:

Article

Dynamic Photocontrol of the Coffee-Ring Effect with Optically Tunable Particle Stickiness.

Published in:

Angewandte Chemie, 2014, v. 126, n. 51, p. 14301, doi. 10.1002/ange.201406903

By:

Anyfantakis, Manos;
Baigl, Damien

Publication type:

Article

Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist.

Published in:

Optical Engineering, 2012, v. 51, n. 5, p. 1, doi. 10.1117/1.OE.51.5.054303

By:

Yan-Dong Du;
Wei-Hua Han;
Wei Yan;
Xiao-Na Xu;
Yan-Bo Zhang;
Xiao-dong Wang;
Fu-Hua Yang;
Hong-Zhong Cao;
Feng Jin;
Xian-Zi Dong;
Zhen-Sheng Zhao;
Xuan-Ming Duan;
Yang Liu

Publication type:

Article

Characterization and reduction of pellicle degradation due to haze formation on leading edge technology photomasks.

Published in:

Surface & Interface Analysis: SIA, 2017, v. 49, n. 10, p. 985, doi. 10.1002/sia.6258

By:

Penley, C.;
Bekka, S.

Publication type:

Article

A chemical analysis method to identify the source of pellicle adhesive contaminants.

Published in:

Surface & Interface Analysis: SIA, 2014, v. 46, p. 294, doi. 10.1002/sia.5469

By:

Penley, C.;
Guenther, T.;
Walker, M.

Publication type:

Article

Rapid and Large‐Scale Fabrication of Full Color Woodpile Photonic Crystals via Interference from a Conformal Multilevel Phase Mask.

Published in:

Advanced Functional Materials, 2019, v. 29, n. 44, p. N.PAG, doi. 10.1002/adfm.201904971

By:

Nam, Sang‐Hyeon;
Park, Junyong;
Jeon, Seokwoo

Publication type:

Article

The application of elastic auxiliary air bag imprinting technology to the development of linear gradient micro-structure replication processes.

Published in:

Polymers for Advanced Technologies, 2013, v. 24, n. 1, p. 1, doi. 10.1002/pat.3037

By:

Weng, Y.‐C.;
Weng, Y.‐J.;
Yang, S.‐Y.

Publication type:

Article

Teflon/SiO<sub>2</sub> Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.

Published in:

Materials (1996-1944), 2015, v. 8, n. 4, p. 1704, doi. 10.3390/ma8041704

By:

Ching-Lin Fan;
Ming-Chi Shang;
Bo-Jyun Li;
Yu-Zuo Lin;
Shea-Jue Wang;
Win-Der Lee;
Bohr-Ran Hung

Publication type:

Article

A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme.

Published in:

Materials (1996-1944), 2014, v. 7, n. 8, p. 5761, doi. 10.3390/ma7085761

By:

Ching-Lin Fan;
Ming-Chi Shang;
Bo-Jyun Li;
Yu-Zuo Lin;
Shea-Jue Wang;
Win-Der Lee

Publication type:

Article

A Low-Cost Strain Gauge Displacement Sensor Fabricated via Shadow Mask Printing.

Published in:

Sensors (14248220), 2019, v. 19, n. 21, p. 4713, doi. 10.3390/s19214713

By:

Yi, Ying;
Wang, Bo;
Bermak, Amine

Publication type:

Article

Photoswitchable Hydrogel Surface Topographies by Polymerisation-Induced Diffusion.

Published in:

Chemistry - A European Journal, 2013, v. 19, n. 33, p. 10922, doi. 10.1002/chem.201300852

By:

Stumpel, Jelle E.;
Liu, Danqing;
Broer, Dirk J.;
Schenning, Albertus P. H. J.

Publication type:

Article

UV-curable positive photoresists for screen printing plate.

Published in:

Polymer International, 2016, v. 65, n. 4, p. 362, doi. 10.1002/pi.5065

By:

Shirai, Masamitsu;
Okamura, Haruyuki

Publication type:

Article

Lithographically Designed Conical Microcarriers for Programed Release of Multiple Actives.

Published in:

Advanced Materials Interfaces, 2018, v. 5, n. 1, p. 1, doi. 10.1002/admi.201701163

By:

Je, Kwanghwi;
Kim, Ju Hyeon;
Shim, Tae Soup;
Ku, Minhee;
Yang, Jaemoon;
Kim, Shin‐Hyun

Publication type:

Article

Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns.

Published in:

Macromolecular Rapid Communications, 2017, v. 38, n. 2, p. n/a, doi. 10.1002/marc.201600564

By:

Carroll, Gregory T.;
Lancaster, Jeffrey R.;
Turro, Nicholas J.;
Koberstein, Jeffrey T.;
Mammana, Angela

Publication type:

Article

Photoactive Self-Shaping Hydrogels as Noncontact 3D Macro/Microscopic Photoprinting Platforms.

Published in:

Macromolecular Rapid Communications, 2015, v. 36, n. 24, p. 2129, doi. 10.1002/marc.201500390

By:

Liao, Yue;
An, Ning;
Wang, Ning;
Zhang, Yinyu;
Song, Junfei;
Zhou, Jinxiong;
Liu, Wenguang

Publication type:

Article

Removal Processing inside PDMS by Short Pulse Laser.

Published in:

Journal of Laser Micro / Nanoengineering, 2017, v. 12, n. 2, p. 141, doi. 10.2961/jlmn.2017.02.0016

By:

Katsuyuki Hayashi;
Shigeki Matsuo

Publication type:

Article

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities.

Published in:

Micromachines, 2014, v. 5, n. 3, p. 738, doi. 10.3390/mi5030738

By:

Pinto, Vânia C.;
Sousa, Paulo J.;
Cardoso, Vanessa F.;
Minas, Graça

Publication type:

Article

Stop-flow Lithography to Continuously Fabricate Microlens Structures Utilizing an Adjustable Three-Dimensional Mask.

Published in:

Micromachines, 2014, v. 5, n. 3, p. 667, doi. 10.3390/mi5030667

By:

Shih-Hao Huang;
Chia-Kai Lin

Publication type:

Article

Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications.

Published in:

Micromachines, 2013, v. 4, n. 2, p. 206, doi. 10.3390/mi4020206

By:

Orabona, Emanuele;
Caliò, Alessandro;
Rendina, Ivo;
De Stefano, Luca;
Medugno, Mario

Publication type:

Article

Soft X‐ray varied‐line‐spacing gratings fabricated by near‐field holography using an electron beam lithography‐written phase mask.

Published in:

Journal of Synchrotron Radiation, 2019, v. 26, n. 5, p. 1782, doi. 10.1107/S1600577519008245

By:

Lin, Dakui;
Liu, Zhengkun;
Dietrich, Kay;
Sokolov, Andréy;
Sertsu, Mewael Giday;
Zhou, Hongjun;
Huo, Tonglin;
Kroker, Stefanie;
Chen, Huoyao;
Qiu, Keqiang;
Xu, Xiangdong;
Schäfers, Franz;
Liu, Ying;
Kley, Ernst-Bernhard;
Hong, Yilin

Publication type:

Article