Works matching DE "METAL-insulator-semiconductor structures"
Results: 33
Radiation Sensitivity Modeling Technique of Sensors' Mis-Transistor Elements.
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- Automation & Remote Control, 2018, v. 79, n. 1, p. 180, doi. 10.1134/S0005117918010150
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A novel GaN MIS‐HEMT with a floating clamp electrode for suppressing short‐channel effect.
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- Electronics Letters (Wiley-Blackwell), 2021, v. 57, n. 19, p. 747, doi. 10.1049/ell2.12246
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Quasi-stationary electron and ion processes in dielectric films and diagnostics of films.
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- Journal of Communications Technology & Electronics, 2013, v. 58, n. 9, p. 956, doi. 10.1134/S1064226913090027
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Diode Polarization and Resistive Switching in Metal/TlGaSe<sub>2</sub> Semiconductor/Metal Devices.
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- Semiconductors, 2018, v. 52, n. 16, p. 2007, doi. 10.1134/S1063782618160273
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Modulation of the Charge of Germanium MIS Structures with Fluorine-Containing Insulators.
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- Semiconductors, 2018, v. 52, n. 8, p. 1068, doi. 10.1134/S1063782618080201
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The forming process in resistive-memory elements based on metal-insulator-semiconductor structures.
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- Technical Physics Letters, 2014, v. 40, n. 10, p. 837, doi. 10.1134/S1063785014100137
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Analysis of the electroluminescence features of silicon metal-insulator-semiconductor structures as a tool for diagnostics of the injection properties of a dielectric layer.
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- Technical Physics Letters, 2013, v. 39, n. 10, p. 878, doi. 10.1134/S1063785013100040
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Reduced Contact Resistance Between Metal and n-Ge by Insertion of ZnO with Argon Plasma Treatment.
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- Nanoscale Research Letters, 2018, v. 13, n. 1, p. 1, doi. 10.1186/s11671-018-2650-y
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An electrodeposited inhomogeneous metal-insulator-semiconductor junction for efficient photoelectrochemical water oxidation.
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- Nature Materials, 2015, v. 14, n. 11, p. 1150, doi. 10.1038/nmat4408
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Influence of Si3N4 layer on the electrical properties of Au/n-4H SiC diodes.
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- Bulletin of Materials Science, 2018, v. 41, n. 3, p. 1, doi. 10.1007/s12034-018-1586-2
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Single-Walled Carbon-Nanotubes-Based Organic Memory Structures.
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- Molecules, 2016, v. 21, n. 9, p. 1166, doi. 10.3390/molecules21091166
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- Article
Dopant in Near-Surface Semiconductor Layers of Metal-Insulator-Semiconductor Structures Based on Graded-Gap p-HgCdTe Grown by Molecular-Beam Epitaxy.
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- Journal of Electronic Materials, 2016, v. 45, n. 2, p. 881, doi. 10.1007/s11664-015-4239-x
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Electrical Characteristics of Hybrid-Organic Memory Devices Based on Au Nanoparticles.
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- Journal of Electronic Materials, 2015, v. 44, n. 8, p. 2835, doi. 10.1007/s11664-015-3692-x
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Finite Element Analysis of Optically Controlled MIS Slow Wave Line using High Frequency Structure Simulator.
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- International Journal of Microwave & Optical Technology, 2015, v. 10, n. 3, p. 211
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Admittance Investigation of MIS Structures with HgTe-Based Single Quantum Wells.
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- Nanoscale Research Letters, 2016, v. 11, n. 1, p. 1, doi. 10.1186/s11671-016-1276-1
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Study of CBD-CdS/CZTGSe solar cells using different Cd sources: behavior of devices as a MIS structure.
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- Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 24, p. 18706, doi. 10.1007/s10854-017-7820-7
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Peculiarities of Determining the Dopant Concentration in the Near-Surface Layer of a Semiconductor by Measuring the Admittance of MIS Structures Based on P-HgCdTe Grown by Molecular Beam Epitaxy.
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- Russian Physics Journal, 2016, v. 59, n. 2, p. 284, doi. 10.1007/s11182-016-0769-9
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Effect of Pulse Nanosecond Volume Discharge in Air at Atmospheric Pressure on Electrical Properties of Mis Structures Based on p-HgCdTe Grown by Molecular Beam Epitaxy.
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- Russian Physics Journal, 2015, v. 58, n. 7, p. 970, doi. 10.1007/s11182-015-0597-3
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Hysteresis Phenomena in mis Structures Based on Graded-Gap MBE Hgcdte with a Two-Layer Plasma-Chemical Insulator SIO/SIN.
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- Russian Physics Journal, 2015, v. 58, n. 4, p. 540, doi. 10.1007/s11182-015-0532-7
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Admittance in MIS Structures Based on Graded-GAP MBE p-HgCdTe ( x = 0.22-0.23) in the Strong Inversion Mode.
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- Russian Physics Journal, 2014, v. 57, n. 8, p. 1070, doi. 10.1007/s11182-014-0345-0
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Special Features of Admittance in Mis Structures Based on Graded-Gap MBE n-HgCdTe ( x = 0.31-0.32) in a Temperature Range OF 8-300 K.
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- Russian Physics Journal, 2014, v. 57, n. 5, p. 633, doi. 10.1007/s11182-014-0286-7
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Differential Resistance of Space Charge Region in MIS Structures Based on Graded-Gap MBE n-HgCdTe ( x = 0.23) in a Wide Temperature Range.
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- Russian Physics Journal, 2014, v. 57, n. 4, p. 536, doi. 10.1007/s11182-014-0272-0
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Stress‐and‐Sense Investigation of Memory Effect in Si‐NCs MIS Structures.
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- Physica Status Solidi (B), 2018, v. 255, n. 10, p. N.PAG, doi. 10.1002/pssb.201700634
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EVOLUTION OF COPPER(II) OXIDE NANOSTRUCTURES IN POROUS GLASS MATRIX.
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- Smart Nanocomposites, 2015, v. 6, n. 2, p. 236
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Fabrication and characterization of AlN metal-insulator-semiconductor grown Si substrate.
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- Modern Physics Letters B, 2017, v. 31, n. 33, p. -1, doi. 10.1142/S0217984917503134
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A General Strategy to Achieve Colossal Permittivity and Low Dielectric Loss Through Constructing Insulator/Semiconductor/Insulator Multilayer Structures.
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- Journal of Low Temperature Physics, 2018, v. 192, n. 5/6, p. 346, doi. 10.1007/s10909-018-1985-1
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Decoupling of epitaxy-related trapping effects in AlGaN/GaN metal-insulator semiconductor high-electron-mobility transistors.
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- Physica Status Solidi. A: Applications & Materials Science, 2016, v. 213, n. 5, p. 1222, doi. 10.1002/pssa.201532752
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High‐Performance and Stable Silicon Photoanode Modified by Crystalline Ni@ Amorphous Co Core‐Shell Nanoparticles.
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- ChemCatChem, 2018, v. 10, n. 21, p. 5039, doi. 10.1002/cctc.201801417
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Analysis of interface states and series resistance for Al/PVA:n-CdS nanocomposite metal-semiconductor and metal-insulator-semiconductor diode structures.
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- Applied Physics A: Materials Science & Processing, 2013, v. 113, n. 2, p. 491, doi. 10.1007/s00339-013-7552-3
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Passivation of aluminium-n<sup>+</sup> silicon contacts for solar cells by ultrathin Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub> dielectric layers.
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- Physica Status Solidi - Rapid Research Letters, 2013, v. 7, n. 11, p. 946, doi. 10.1002/pssr.201308115
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Specific features of the capacitance-voltage characteristics of a Cu-SiO- p-InSb MIS structure.
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- Semiconductors, 2017, v. 51, n. 3, p. 367, doi. 10.1134/S1063782617030022
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Features of high-frequency measurements of the impedance of metal-insulator-semiconductor structures with an ultrathin oxide.
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- Semiconductors, 2015, v. 49, n. 4, p. 472, doi. 10.1134/S1063782615040120
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Determination of the diffusion length of minority charge carriers in a semiconductor from the dynamic nonequilibrium I- V characteristics of MIS structures.
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- Semiconductors, 2014, v. 48, n. 7, p. 875, doi. 10.1134/S1063782614070161
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