Micropatterning of TiO<sub>2</sub> Thin Films by MOCVD and Study of Their Growth Tendency.
- Published in:
- Scientific Reports, 2015, p. 9319, doi. 10.1038/srep09319
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- Publication type:
- Article
Works matching DE "METAL organic chemical vapor deposition coatings"
Results: 5
1
2
TiCl<sub>4</sub> Barrier Process Engineering in Semiconductor Manufacturing.
- Published in:
- Coatings (2079-6412), 2016, v. 6, n. 1, p. 2, doi. 10.3390/coatings6010002
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- Publication type:
- Article
3
Effect of CMAS Deposits on MOCVD Coatings in the System Y<sub>2</sub> O<sub>3</sub>- ZrO<sub>2</sub>: Phase Relationships.
- Published in:
- Journal of the American Ceramic Society, 2013, v. 96, n. 10, p. 3333, doi. 10.1111/jace.12502
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- Publication type:
- Article
4
Growth of oriented GaN nanowires by controlling nucleation conditions.
- Published in:
- Crystal Research & Technology, 2016, v. 51, n. 12, p. 757, doi. 10.1002/crat.201600263
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- Publication type:
- Article
5
Uniform growth of III-nitrides on 200 mm silicon substrates using a single wafer rotating disk MOCVD reactor.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2016, v. 213, n. 4, p. 856, doi. 10.1002/pssa.201532708
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- Publication type:
- Article