Works matching DE "MASKS (Electronics)"

Results: 22

Plasma etch rates: The impact of mask transmittance.

Published in:

Solid State Technology, 2001, v. 44, n. 8, p. 55

By:

Pindo, Massimiliano

Publication type:

Article

Focused ion beam mask repair.

Published in:

Solid State Technology, 1998, v. 41, n. 3, p. 61

By:

Morgan, John C.

Publication type:

Article

Vertical nanopatterning of 6H-SiC(0001) surfaces using gold-metal nanotube membrane lithography.

Published in:

Applied Physics A: Materials Science & Processing, 2006, v. 83, n. 3, p. 361, doi. 10.1007/s00339-006-3566-4

By:

Lee, W.;
Moyen, E.;
Wulfhekel, W.;
Leycuras, A.;
Nielsch, K.;
Gösele, U.;
Hanbücken, M.

Publication type:

Article

Single-step patterning and the fabrication of contact masks by laser-induced forward transfer.

Published in:

Applied Physics A: Materials Science & Processing, 2004, v. 78, n. 4, p. 537, doi. 10.1007/s00339-003-2375-2

By:

Landström, L.;
Klimstein, J.;
Schrems, G.;
Piglmayer, K.;
Bäuerle, D.

Publication type:

Article

A very low-cost system for photoresist coating of microwave substrate boards for educational purposes.

Published in:

International Journal of Electrical Engineering Education, 2006, v. 43, n. 2, p. 93

By:

Márquez-Segura, E.;
Otero, P.;
Camacho-Peñalosa, C.;
Zürcher, J.-F.

Publication type:

Article

Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.

Published in:

Electronics & Electrical Engineering, 2011, n. 116, p. 45

By:

Bahadorimehr, A.;
Majlis, B. Y.

Publication type:

Article

Removal of Photoresist Masks with the Use of Rapid Heat Treatment.

Published in:

Journal of Engineering Physics & Thermophysics, 2003, v. 76, n. 5, p. 1080, doi. 10.1023/B:JOEP.0000003223.10856.31

By:

Pilipenko, V. A.;
Ponomar, V. N.;
Gorushko, V. A.

Publication type:

Article

TiN/PECVD-Si<sub>3</sub>N<sub>4</sub>/TiN diaphragm-based capacitive-type MEMS acoustic sensor.

Published in:

Electronics Letters (Wiley-Blackwell), 2016, v. 52, n. 6, p. 468, doi. 10.1049/el.2015.3856

By:

Lee, J.;
Jeon, J. H.;
Kim, Y.-G.;
Lee, S. Q.;
Yang, W. S.;
Lee, J. S.;
Lee, S.-G.

Publication type:

Article

Challenges of anamorphic high-NA lithography and mask making.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 293, doi. 10.1515/aot-2017-0024

By:

Hsu, Stephen D.;
Jingjing Liu

Publication type:

Article

Development and performance of EUV pellicles.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 221, doi. 10.1515/aot-2017-0023

By:

Brouns, Derk

Publication type:

Article

EUV mask defectivity – a process of increasing control toward HVM.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 203, doi. 10.1515/aot-2017-0017

By:

Jonckheere, Rik

Publication type:

Article

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 187, doi. 10.1515/aot-2017-0019

By:

Erdmann, Andreas;
Dongbo Xu;
Evanschitzky, Peter;
Philipsen, Vicky;
Vu Luong;
Hendrickx, Eric

Publication type:

Article

Etch Defect Characterization and Reduction in Hard-Mask-Based Al Interconnect Etching.

Published in:

International Journal of Plasma Science & Engineering, 2008, p. 1, doi. 10.1155/2008/154035

By:

Hong-Ji Lee;
Che-Lun Hung;
Chia-Hao Leng;
Nan-Tzu Lian;
Ling-Wu Young;
Tahone Yang;
Kuang-Chao Chen;
Chih-Yuan Lu

Publication type:

Article

Layered Mask Stretching.

Published in:

Journal of the Royal Astronomical Society of Canada, 2012, v. 106, n. 2, p. 86

By:

MacDonald, Blair

Publication type:

Article

Realization of III-V Semiconductor Periodic Nanostructures by Laser Direct Writing Technique.

Published in:

Nanoscale Research Letters, 2017, v. 12, n. 1, p. 1, doi. 10.1186/s11671-016-1780-3

By:

Huang, Yuan-qing;
Huang, Rong;
Liu, Qing-lu;
Zheng, Chang-cheng;
Ning, Ji-qiang;
Peng, Yong;
Zhang, Zi-yang

Publication type:

Article

Fabrication of silicon grating structures using interference lithography and chalcogenide inorganic photoresist.

Published in:

Semiconductor Physics, Quantum Electronics & Optoelectronics, 2007, v. 10, n. 1, p. 40, doi. 10.15407/spqeo10.01.040

By:

Min'ko, V. I.;
Shepeliavyi, P. E.;
Indutnyy, I. Z.;
Litvin, O. S.

Publication type:

Article

Carbon based conductive photoresist.

Published in:

Journal of Materials Science, 2009, v. 44, n. 17, p. 4625, doi. 10.1007/s10853-009-3706-2

By:

Hauptman, Nina;
Žveglič, Maša;
Maček, Marijan;
Gunde, Marta Klanjšek

Publication type:

Article

On-the-fly writing of a long grating phase mask.

Published in:

Optical Engineering, 2011, v. 50, n. 3, p. 038001, doi. 10.1117/1.3549254

By:

Philipp Mu¨ller;
Yves Jourlin;
Colette Veillas;
Ge´rard Bernaud;
Yannick Bourgin;
Svetlen Tonchev;
Olivier Dellea

Publication type:

Article

Constructing optimized binary masks for reservoir computing with delay systems.

Published in:

Scientific Reports, 2014, p. 1, doi. 10.1038/srep03629

By:

Appeltant, Lennert;
Van der Sande, Guy;
Danckaert, Jan;
Fischer, Ingo

Publication type:

Article

Feasibility of the 248 nm Excimer laser in the laser structuring of fine circuit lines on printed circuit board.

Published in:

International Journal of Advanced Manufacturing Technology, 2007, v. 33, n. 11/12, p. 1149, doi. 10.1007/s00170-006-0564-9

By:

Bin Zhang;
Yung, K. C.

Publication type:

Article

Vacuum suction aid for microlens array formation using LIGA-like process.

Published in:

International Journal of Advanced Manufacturing Technology, 2006, v. 29, n. 5/6, p. 518, doi. 10.1007/s00170-005-2549-5

By:

Ruey Fang Shyu;
Hsiharng Yang

Publication type:

Article

Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography.

Published in:

Nanoscale Research Letters, 2008, v. 3, n. 10, p. 351, doi. 10.1007/s11671-008-9164-y

By:

Wei Wu;
Dey, Dibyendu;
Memis, Omer G.;
Katsnelson, Alex;
Mohseni, Hooman

Publication type:

Article