Works matching DE "LITHOGRAPHY"

Results: 1996

机械复制时代的闲章新艺术——以《点石斋画报》为中心.

Published in:

Journal of Aesthetic Education / Meiyu Xuekan, 2025, v. 16, n. 2, p. 109, doi. 10.20073/j.cnki.2095-0012.2025.02.014

By:

黄艺兰

Publication type:

Article

Preparation of 7-azidocarbonyl-2,4,9-trithiaadamantane by a new thioacetal crown synthetic method.

Published in:

Journal of Sulfur Chemistry, 2005, v. 26, n. 2, p. 105, doi. 10.1080/17415990500150045

By:

Khemtong, Chalermchai;
Hu, Jun

Publication type:

Article

The status of 193nm technology.

Published in:

Solid State Technology, 2001, v. 44, n. 11, p. 54

By:

Beach, James;
Satyanarayana, Sri;
Ford, Arnie;
Bakshi, Vivek

Publication type:

Article

New technology tackles maskmaking challenges.

Published in:: Solid State Technology, 2001, v. 44, n. 8, p. 26
Publication type:: Article

Mask gate CD variations reduced with double-step maskmaking*.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 203

By:

Lee, Il-Ho;
Kozuma, Makoto

Publication type:

Article

Analyzing issues for 300mm "backend" lithography.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 138

By:

Kay, Stephen;
Anberg, Doug;
Goodman, Thomas;
Elenius, Peter

Publication type:

Article

Development and advantages of step-and-flash lithography.

Published in:

Solid State Technology, 2001, v. 44, n. 7, p. 67

By:

Colburn, M.;
Bailey, T.;
Choi, B.J.;
Sreenivasan, S.V.;
Ekerdt, J.G.;
Willson, C.G.

Publication type:

Article

Industry's problems, solutions exposed at lithography's annual showcase.

Published in:: Solid State Technology, 2001, v. 44, n. 5, p. 33
Publication type:: Article

Top surface imaging improves copper process resolution.

Published in:

Solid State Technology, 2001, v. 44, n. 3, p. 71

By:

Gadson, Bill;
Lassig, Steve;
Tran, Nancy;
Ni, Tom

Publication type:

Article

Plastic LEDs deliver more light, applications about to boom.

Published in:: Solid State Technology, 2001, v. 44, n. 3, p. 32
Publication type:: Article

Next-generation litho progress, innovative technologies at MRS.

Published in:: Solid State Technology, 2001, v. 44, n. 2, p. 32
Publication type:: Article

Advanced lithography needs rigorously tested fused silica glass.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 111

By:

Smith, Charlene;
Ackerman, Bradford G.

Publication type:

Article

Strong phase shift mask designs with lower cost.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 104

By:

Levenson, M. D.

Publication type:

Article

Nodal predictions.

Published in:: Solid State Technology, 2001, v. 44, n. 1, p. 62
Publication type:: Article

The lithography equipment marketplace.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 58

By:

Castellano, Robert N.

Publication type:

Article

Interface conference shows optical lithography's milestones.

Published in:

Solid State Technology, 2001, v. 44, n. 1, p. 42

By:

Levenson, M. David;
Burggraaf, Pieter

Publication type:

Article

Improve yields, enhance CDs with integrated DUV resist track.

Published in:

Solid State Technology, 2000, v. 43, n. 10, p. 135

By:

Krishna, Murthy

Publication type:

Article

Direct temperature metrology helps minimize CA-resist CD variation.

Published in:

Solid State Technology, 2000, v. 43, n. 9, p. 139

By:

Parker, Jeffrey M.;
Dean, Kim R.;
Miller, Daniel A.

Publication type:

Article

The technical considerations of extending optical lithography.

Published in:

Solid State Technology, 2000, v. 43, n. 9, p. 97

By:

Wagner, Christian;
Kaiser, Winfried;
Mulkens, Jan;
Flagello, Donis G.

Publication type:

Article

Moore's Law switching to a subwavelength track.

Published in:

Solid State Technology, 2000, v. 43, n. 8, p. 184

By:

Pati, Y. C. (Buno)

Publication type:

Article

Lithography.

Published in:: Solid State Technology, 2000, v. 43, n. 8, p. 152
Publication type:: Article

Substrates with topography.

Published in:

Solid State Technology, 2000, v. 43, n. 8, p. 127

By:

Neisser, M.;
Grozev, G.;
Maenhoudt, M.;
Lepage, M.;
Struyf, H.

Publication type:

Article

Beneath the MEEF.

Published in:

Solid State Technology, 2000, v. 43, n. 8, p. 107

By:

Kim, Byung-Gook;
Choi, Seong Woon;
Han, Woo Sung;
Sohn, Jung Min

Publication type:

Article

Excimer lasers for future lithography light sources.

Published in:

Solid State Technology, 2000, v. 43, n. 7, p. 255

By:

Semprez, Olivier

Publication type:

Article

Accurate metrology of epi pattern shift.

Published in:

Solid State Technology, 2000, v. 43, n. 6, p. 187

By:

Cheang, Peter;
Best, Keith

Publication type:

Article

Expanding capabilities in existing fabs with lithography tool-matching.

Published in:

Solid State Technology, 2000, v. 43, n. 6, p. 97

By:

Goodwin, Frank;
Bodine, Ted;
Sager, Craig;
Lift, Lloyd C.

Publication type:

Article

French EUV development program under way.

Published in:

Solid State Technology, 2000, v. 43, n. 6, p. 56

By:

Lunday, Christine

Publication type:

Article

SC300 finds DUV problems.

Published in:: Solid State Technology, 2000, v. 43, n. 6, p. 46
Publication type:: Article

Industry Roadmap likely to be overtaken.

Published in:

Solid State Technology, 2000, v. 43, n. 6, p. 36

By:

Demmin, Jeffrey

Publication type:

Article

So many options, so little time: Why optics is forever in lithography.

Published in:

Solid State Technology, 2000, v. 43, n. 5, p. 192

By:

Ware, Phillip M.

Publication type:

Article

Is there light at the end of the NGL tunnel?

Published in:

Solid State Technology, 2000, v. 43, n. 5, p. 51

By:

Levenson, M. David;
Haavind, Bob

Publication type:

Article

NIST's Potzick plans neolithography consortium.

Published in:

Solid State Technology, 2000, v. 43, n. 5, p. 34

By:

Lunday, Christine

Publication type:

Article

Lithography's nemesis exposed.

Published in:

Solid State Technology, 2000, v. 43, n. 3, p. 18

By:

Burggraaf, Pieter

Publication type:

Article

Interface `99: Focus on future litho costs.

Published in:: Solid State Technology, 2000, v. 43, n. 2, p. 25
Publication type:: Article

EUV & EPL: Int'l SEMATECH says two NGL options may co-exist.

Published in:

Solid State Technology, 2000, v. 43, n. 2, p. 23

By:

Lunday, Christine

Publication type:

Article

A `breakthrough' in x-ray lithography.

Published in:

Solid State Technology, 2000, v. 43, n. 2, p. 18

By:

Burggraaf, Pieter "Pete"

Publication type:

Article

SVGL puts up fight for 130nm node.

Published in:

Solid State Technology, 1999, v. 42, n. 12, p. 22

By:

Levenson, M. David;
Lunday, Christine

Publication type:

Article

Significant progress with pilot-line 300mm lithography.

Published in:

Solid State Technology, 1999, v. 42, n. 12, p. 18

By:

Burggraaf, Pieter

Publication type:

Article

Lithography's need for partnerships.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 122

By:

Preil, Moshe;
Harrell, Sam

Publication type:

Article

Thin-film head lithography overtaking silicon.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 89

By:

Biche, Michael R.

Publication type:

Article

Litho meeting: 4x reduction ratio to stay, for now.

Published in:

Solid State Technology, 1999, v. 42, n. 8, p. 26

By:

Dunn, Peter N.

Publication type:

Article

157nm optical lithography: The accomplishments and the challenges.

Published in:

Solid State Technology, 1999, v. 42, n. 6, p. 57

By:

McClay, James A.;
McIntyre, Angela S. L.

Publication type:

Article

Single-layer resist design for 193nm lithography.

Published in:

Solid State Technology, 1999, v. 42, n. 5, p. 29

By:

Nalamasu, Om;
Houlihan, Francis M.;
Cirelli, Raymond A.;
Watson, George P.;
Reichmanis, Eisa

Publication type:

Article

Full speed ahead on 157-nm lithography.

Published in:

Solid State Technology, 1999, v. 42, n. 4, p. 26

By:

Burggraaf, Pieter "Pete";
Dunn, Peter N.

Publication type:

Article

1999's `big bang' of NGL activity.

Published in:

Solid State Technology, 1999, v. 42, n. 4, p. 22

By:

Dunn, Peter N.

Publication type:

Article

100-nm contact holes with KrF lithography.

Published in:: Solid State Technology, 1999, v. 42, n. 3, p. 22
Publication type:: Article

Worldwide highlights.

Published in:: Solid State Technology, 1999, v. 42, n. 3, p. 16
Publication type:: Article

Lithography: The road ahead.

Published in:

Solid State Technology, 1999, v. 42, n. 2, p. 84

By:

Marke, David A.

Publication type:

Article

Optical lithography to 2000 and beyond.

Published in:

Solid State Technology, 1999, v. 42, n. 2, p. 31

By:

Burggraaf, Pieter

Publication type:

Article

Is the roadmap losing its effectiveness?

Published in:

1999

By:

Haavind, Robert

Publication type:

Editorial