Works matching DE "JSR Microelectronics Inc."

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    1

    STUDY OF COPPER DIFFUSION IN LOW-k THIN FILM USING SIMS.

    Published in:
    International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2006, v. 20, n. 25-27, p. 4165, doi. 10.1142/S0217979206041033
    By:
    • AW, K. C.;
    • SALIM, N. T.;
    • WEI GAO;
    • PRINCE, K.
    Publication type:
    Article