Works about ION implantation

Results: 1412

Ion Implantation‐Induced Bandgap Modifications in the ALD TiO2 Thin Films.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2025, v. 222, n. 12, p. 1, doi. 10.1002/pssa.202400205

By:

Afzal, Shahbaz;
Usman, Muhammad;
Siddiqui, Aamenah;
Khosa, Rabia Yasmin;
Hallén, Anders

Publication type:

Article

Highly integrated color center creation with cooled hydrogenated molecules irradiation.

Published in:

EPJ Quantum Technology, 2025, v. 12, n. 1, p. 1, doi. 10.1140/epjqt/s40507-025-00379-6

By:

Iizawa, Masatomi;
Narita, Yasuhito

Publication type:

Article

Programmable WSe2 2D Lateral p‐n Junctions Controlled by Dual Floating Gates.

Published in:

Advanced Functional Materials, 2025, v. 35, n. 27, p. 1, doi. 10.1002/adfm.202423196

By:

Jiazila, Nuertai;
Song, Peng;
Wei, Chijun;
Liu, Xuanye;
Gao, Hui;
Sun, Jiequn;
Du, Chengze;
Guo, Hui;
Yang, Haitao;
Bao, Lihong;
Gao, Hong‐Jun

Publication type:

Article

Study on planar junction infrared detectors based on InAs/GaSb type-II superlattices.

Published in:

Optical & Quantum Electronics, 2025, v. 57, n. 6, p. 1, doi. 10.1007/s11082-025-08231-y

By:

Wang, Zhifang;
Zhou, Yi;
Huang, Min;
Xu, Zhicheng;
Liao, Kecai;
Liang, Zhaoming;
Sun, Cheng;
Chen, Yijie;
Chen, Jianxin

Publication type:

Article

Optical and Surface Structure Modification of Gallium Arsenide.

Published in:

International Journal of Nanoscience, 2024, v. 23, n. 2, p. 1, doi. 10.1142/S0219581X23500680

By:

Yadav, A. R.;
Dubey, S. K.;
Karande, A.;
Dubey, R. L.;
Sulania, I.

Publication type:

Article

Raman and RBS Analysis of Silicon Ion Implanted Gallium Arsenide.

Published in:

International Journal of Nanoscience, 2022, v. 21, n. 1, p. 1, doi. 10.1142/S0219581X22500028

By:

Yadav, A. R.;
Dubey, S. K.;
Sulania, I.

Publication type:

Article

On Approach to Increase Integration Rate of Double-Gate Heterotransistors.

Published in:

International Journal of Nanoscience, 2017, v. 16, n. 4, p. -1, doi. 10.1142/S0219581X16500393

By:

Pankratov, E. L.;
Bulaeva, E. A.

Publication type:

Article

PULSED LASER ANNEALING OF ULTRA-SHALLOW JUNCTIONS IN SILICON-GERMANIUM.

Published in:

International Journal of Nanoscience, 2010, v. 9, n. 4, p. 341, doi. 10.1142/S0219581X10006922

By:

TAN, L. S.;
TAN, J. Y.;
BEGUM, A.;
HONG, M. H.;
DU, A. Y.;
BHAT, M.;
WANG, X. C.

Publication type:

Article

SYNTHESIS OF ALLOY METAL NANOCLUSTERS IN SILICA GLASS BY SEQUENTIAL ION IMPLANTATION.

Published in:

International Journal of Nanoscience, 2007, v. 6, n. 6, p. 423, doi. 10.1142/S0219581X07005000

By:

JOSEPH, B.;
LENKA, H. P.;
KUIRI, P. K.;
MAHAPATRA, D. P.;
KESAVAMOORTHY, R.

Publication type:

Article

An Antibacterial Nonenzymatic Glucose Sensor Composed of Carbon Nanotubes Decorated with Silver Nanoparticles.

Published in:

Electroanalysis, 2015, v. 27, n. 5, p. 1138, doi. 10.1002/elan.201400568

By:

Liu, Yingzhu;
Liu, Shan;
Chen, Rongsheng;
Zhan, Weiting;
Ni, Hongwei;
Liang, Feng

Publication type:

Article

A Novel Non-Enzymatic Glucose Sensor Based on Cobalt Nanoparticles Implantation-Modified Indium Tin Oxide Electrode.

Published in:

Electroanalysis, 2014, v. 26, n. 12, p. 2693, doi. 10.1002/elan.201400347

By:

Wang, Tong;
Yu, Yanan;
Tian, Huifeng;
Hu, Jingbo

Publication type:

Article

Synthesis of Layer-Tunable Graphene: A Combined Kinetic Implantation and Thermal Ejection Approach.

Published in:

Advanced Functional Materials, 2015, v. 25, n. 24, p. 3666, doi. 10.1002/adfm.201500981

By:

Wang, Gang;
Zhang, Miao;
Liu, Su;
Xie, Xiaoming;
Ding, Guqiao;
Wang, Yongqiang;
Chu, Paul K.;
Gao, Heng;
Ren, Wei;
Yuan, Qinghong;
Zhang, Peihong;
Wang, Xi;
Di, Zengfeng

Publication type:

Article

Study of nanopipes formed in silicon wafers using helium implantation by SEM, RBS and SIMS methods.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, p. 239, doi. 10.1007/s10854-008-9654-9

By:

Frantskevich, A. V.;
Saad, A. M.;
Mazanik, A. V.;
Frantskevich, N. V.;
Fedotov, A. K.;
Kulinkauskas, V. S.;
Patryn, A. A.

Publication type:

Article

The evolution of the ion implantation damage in device processing.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, p. 182, doi. 10.1007/s10854-008-9630-4

By:

Polignano, M. L.;
Mica, I.;
Bontempo, V.;
Cazzaniga, F.;
Mariani, M.;
Mauri, A.;
Pavia, G.;
Sammiceli, F.;
Spoldi, G.

Publication type:

Article

Gettering of iron in silicon by boron implantation.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, p. 41, doi. 10.1007/s10854-008-9640-2

By:

Haarahiltunen, A.;
Talvitie, H.;
Savin, H.;
Anttila, O.;
Yli-Koski, M.;
Asghar, M.;
Sinkkonen, J.

Publication type:

Article

Early stage donor-vacancy clusters in germanium.

Published in:

Journal of Materials Science: Materials in Electronics, 2007, v. 18, n. 7, p. 769, doi. 10.1007/s10854-006-9069-4

By:

Coutinho, José;
Torres, Vitor;
Öberg, Sven;
Carvalho, Alexandra;
Janke, Colin;
Jones, Robert;
Briddon, Patrick

Publication type:

Article

Enhanced corrosion resistance of austenitic stainless steel by plasma immersion ion implantation of nitrogen.

Published in:

Journal of Materials Science Letters, 2003, v. 22, n. 15, p. 1099, doi. 10.1023/A:1024943109696

By:

Pham, M. T.;
Rao, K. R. M.;
Manna, I.;
Richter, E.

Publication type:

Article

Investigating Implantation Damage in Silicon Carbide Using ADF STEM and Multislice Ptychography.

Published in:

Microscopy & Microanalysis, 2024, v. 30, p. 1, doi. 10.1093/mam/ozae044.773

By:

Bhat, Aaditya;
Kim, Junghwa;
Gilgenbach, Colin;
LeBeau, James

Publication type:

Article

Understanding Ion Implantation Defect Distributions in Silicon Induced by FIB and Other Ion Sources Using Advanced STEM.

Published in:

Microscopy & Microanalysis, 2024, v. 30, p. 1, doi. 10.1093/mam/ozae044.242

By:

Jauregui, Luis J;
Campbell, Deanna M;
Titze, Michael;
Scrymgeour, David;
Lu, Ping

Publication type:

Article

Co-Clustering Via Nanochannel-Membrane Modulated Ion Implantation into Si3N4 Observed By Plan-View Aberration-Corrected STEM And EELS.

Published in:

2012

By:

Guan, W.;
Bhatta, U.;
Ross, I.M.;
Ghatak, J.;
Moebus, G.;
Peng, N.

Publication type:

Abstract

Plasma Immersion Ion Implantation of Stainless Steel 316.

Published in:

2011

By:

Davis, J;
Short, K;
Wuhrer, R;
Phillips, M;
Whittle, K

Publication type:

Abstract

Formation and Characterization of Cobalt Nanoparticles in Silica by Ion Implantation.

Published in:

2011

By:

Malik, A;
Belay, K;
Llewellyn, D;
Hutchison, W;
Elliman, R

Publication type:

Abstract

Synthesis of Co, Ni and Their Alloy Nanoparticles in Silica by Ion Implantation.

Published in:

2010

By:

Malik, A. E.;
Belay, K.;
Llewellyn, D. J.;
Hutchison, W. D.;
Elliman, R.

Publication type:

Abstract

A novel approach to microbial breeding—low-energy ion implantation.

Published in:

Applied Microbiology & Biotechnology, 2008, v. 78, n. 2, p. 201, doi. 10.1007/s00253-007-1312-2

By:

Shao-bin Gu;
Shi-chang Li;
Hui-yun Feng;
Ying Wu;
Zeng-liang Yu

Publication type:

Article

Screening of high-yielding biocontrol bacterium Bs -916 mutant by ion implantation.

Published in:

Applied Microbiology & Biotechnology, 2007, v. 75, n. 6, p. 1401, doi. 10.1007/s00253-007-0951-7

By:

Dequan Li;
Fengya Nie;
Lihui Wei;
Benqiang Wei;
Zhiyi Chen

Publication type:

Article

OPTIKAI HULLÁMVEZETŐK KÉSZÍTÉSE IONIMPLANTÁCIÓ SEGÍTSÉGÉVEL.

Published in:

Multidiszciplináris Tudományok, 2024, v. 14, n. 1, p. 94, doi. 10.35925/j.multi.2024.1.9

By:

Pszota, Gábor;
Bányász, István

Publication type:

Article

Clostridium beijerinckii mutant with high inhibitor tolerance obtained by low-energy ion implantation.

Published in:

Journal of Industrial Microbiology & Biotechnology, 2012, v. 39, n. 3, p. 401, doi. 10.1007/s10295-011-1017-5

By:

Guo, Ting;
Tang, Yan;
Zhang, Qiu-yan;
Du, Teng-fei;
Liang, Da-feng;
Jiang, Min;
Ouyang, Ping-kai

Publication type:

Article

l(+)-Lactic acid production by co-fermentation of glucose and xylose with Rhizopus oryzae obtained by low-energy ion beam irradiation.

Published in:

Journal of Industrial Microbiology & Biotechnology, 2009, v. 36, n. 11, p. 1363, doi. 10.1007/s10295-009-0621-0

By:

Peng Wang;
Juan Li;
Li Wang;
Ming-li Tang;
Zeng-liang Yu;
Zhi-ming Zheng

Publication type:

Article

Aluminium Ion Implantation in Stainless Steel.

Published in:

Metallophysics & Advanced Technologies / Metallofizika i Novejsie Tehnologii, 2023, v. 45, n. 6, p. 757, doi. 10.15407/mfint.45.06.0757

By:

Honcharov, V.;
Zazhigalov, V.;
Honcharova, M.

Publication type:

Article

Formation of Self-Assembled Domain Structures in Lithium Niobate Modified by Ar Ions Implantation.

Published in:

Ferroelectrics, 2010, v. 399, n. 1, p. 35, doi. 10.1080/00150193.2010.489855

By:

Alikin, D. O.;
Shishkin, E. I.;
Nikolaeva, E. V.;
Shur, V. Ya.;
Sarmanova, M. F.;
Ievlev, A. V.;
Nebogatikov, M. S.;
Gavrilov, N. V.

Publication type:

Article

Abnormal Domain Evolution in Lithium Niobate with Surface Layer Modified by Cu Ion Implantation.

Published in:

Ferroelectrics, 2010, v. 399, n. 1, p. 49, doi. 10.1080/00150193.2010.489860

By:

Shishkin, E. I.;
Nikolaeva, E. V.;
Shur, V. Ya.;
Sarmanova, M. F.;
Dolbilov, M. A.;
Nebogatikov, M. S.;
Alikin, D. O.;
Plaksin, O. A.;
Gavrilov, N. V.

Publication type:

Article

Rearrangements on the Surface of Heavy-Ion-Implanted LiNbO3.

Published in:

Ferroelectrics, 2010, v. 398, n. 1, p. 42, doi. 10.1080/00150193.2010.489812

By:

Plaksin, O. A.;
Kono, K.;
Takeda, Y.;
Plaksin, S. O.;
Shur, V. Ya.;
Kishimoto, N.

Publication type:

Article

A Review of Proximity Gettering Technology for CMOS Image Sensors Using Hydrocarbon Molecular Ion Implantation.

Published in:

Sensors & Materials, 2019, v. 31, n. 6, Part 2, p. 1939, doi. 10.18494/SAM.2019.2313

By:

Kazunari Kurita;
Takeshi Kadono;
Ryousuke Okuyama;
Satoshi Shigematsu;
Ryo Hirose;
Ayumi Onaka-Masada;
Yoshihiro Koga;
Hidehiko Okuda

Publication type:

Article

Improved In Vitro and In Vivo Corrosion Resistance of Mg and Mg Alloys by Plasma Ion Implantation and Deposition Techniques—A Mini-Review.

Published in:

Lubricants (2075-4442), 2022, v. 10, n. 10, p. 255, doi. 10.3390/lubricants10100255

By:

Jamesh, MOHAMMED-IBRAHIM

Publication type:

Article

Analysis of Edge Termination Techniques for Gallium Nitride Pseudo-Vertical p-n Diodes: Modeling Based on Technology Computer-Aided Design and Review of Current Developments.

Published in:

Electronics (2079-9292), 2025, v. 14, n. 6, p. 1188, doi. 10.3390/electronics14061188

By:

El Amrani, Mohammed;
Buckley, Julien;
Alquier, Daniel;
Godignon, Philippe;
Charles, Matthew

Publication type:

Article

A Multiscale Simulation on Aluminum Ion Implantation-Induced Defects in 4H-SiC MOSFETs.

Published in:

Electronics (2079-9292), 2024, v. 13, n. 14, p. 2758, doi. 10.3390/electronics13142758

By:

Wang, Yawen;
Lan, Haipeng;
Shangguan, Qiwei;
Lv, Yawei;
Jiang, Changzhong

Publication type:

Article

p-GaN Selective Passivation via H Ion Implantation to Obtain a p-GaN Gate Normally off AlGaN/GaN HEMT.

Published in:

Electronics (2079-9292), 2023, v. 12, n. 6, p. 1424, doi. 10.3390/electronics12061424

By:

Ding, Xiaoyu;
Yuan, Xu;
Ju, Tao;
Yu, Guohao;
Zhang, Bingliang;
Du, Zhongkai;
Zeng, Zhongming;
Zhang, Baoshun;
Zhang, Xinping

Publication type:

Article

High Pressure Processing of Ion Implanted GaN.

Published in:

Electronics (2079-9292), 2020, v. 9, n. 9, p. 1380, doi. 10.3390/electronics9091380

By:

Sierakowski, Kacper;
Jakiela, Rafal;
Lucznik, Boleslaw;
Kwiatkowski, Pawel;
Iwinska, Malgorzata;
Turek, Marcin;
Sakurai, Hideki;
Kachi, Tetsu;
Bockowski, Michal

Publication type:

Article

Selective Epitaxial Growth of In Situ Doped SiGe on Bulk Ge for p+/n Junction Formation.

Published in:

Electronics (2079-9292), 2020, v. 9, n. 4, p. 578, doi. 10.3390/electronics9040578

By:

Garidis, Konstantinos;
Abedin, Ahmad;
Asadollahi, Ali;
Hellström, Per-Erik;
Östling, Mikael

Publication type:

Article

Influence of nitrogen ion implantation on deformation and fatigue properties of TiNi shape memory alloy wire.

Published in:

Archives of Mechanics, 2013, v. 65, n. 5, p. 391

By:

K. TAKEDA;
K. MITSUI;
H. TOBUSHI;
LEVINTANT-ZAYONTS, N.;
KUCHARSKI, S.

Publication type:

Article

ABSTRACT AND REFERENCES.

Published in:: 2013
Publication type:: Abstract

A comparative study of target fabrication strategies for microgram muonic atom spectroscopy.

Published in:

Scientific Reports, 2025, v. 15, n. 1, p. 1, doi. 10.1038/s41598-025-90958-5

By:

Antwis, L.;
Bara, S.;
Bruhn, C.;
Cocolios, T. E.;
Deseyn, M.;
Doinaki, A.;
Düllmann, Ch. E.;
Fletcher, J.;
Heines, M.;
Heller, R.;
Indelicato, P.;
Kentsch, U.;
Kieck, T.;
Kirch, K.;
Knecht, A.;
Maugeri, E. A.;
Niikura, M.;
Ouf, A.;
Pereira, L. M. C.;
Phyo, W. W. M. M.

Publication type:

Article

Equivalent Circuit Model to Reach Complicated Surface Photovoltage Transient Shapes in ZnO Thin Films.

Published in:

Journal of Nano- & Electronic Physics, 2024, v. 16, n. 2, p. 1, doi. 10.21272/jnep.16(2).02023

By:

Nadtochiy, A.;
Podolian, A.;
Korotchenkov, O.;
Oberemok, O.;
Kosulya, O.;
Romanyuk, B.

Publication type:

Article

Effect of Deuterium Ion Implantation Dose on Microstructure and Nanomechanical Properties of Silicon.

Published in:

Journal of Nano- & Electronic Physics, 2022, v. 14, n. 1, p. 01001-1, doi. 10.21272/jnep.14(1).01001

By:

Kuprin, A. S.;
Dub, S. N.;
Nikolenko, A. S.;
Strelchuk, V. V.;
Morozov, O.;
Tolmachova, G. N.;
Pudov, A. O.

Publication type:

Article

Influence of Order of Double Step Implantation of 64Zn+ and 16O+ Ions into Si on Formation of Zinc-containing Nanoparticles.

Published in:

Journal of Nano- & Electronic Physics, 2015, v. 7, n. 4, p. 04028-1

By:

Eidelman, K. B.;
Shcherbachev, K. D.;
Tabachkova, N. Yu.;
Goryachev, A. V.;
Migunov, D. M.;
Dronova, D. A.

Publication type:

Article

Behavior of Zr1 %Nb Alloy Under Swift Kr Ion and Intense Electron Irradiation.

Published in:

Journal of Nano- & Electronic Physics, 2015, v. 7, n. 4, p. 04016-1

By:

Klepikov, V. F.;
Lytvynenko, V. V.;
Lonin, Yu. F.;
Ponomarev, A. G.;
Startsev, O. A.;
Uvarov, V. T.

Publication type:

Article

The Influence of the Ion Implantation of Au- to the Microstructure of the Amorphous-nanocrystaline AlN-TiB2-TiSi2.

Published in:

Journal of Nano- & Electronic Physics, 2015, v. 7, n. 1, p. 01040-1

By:

Smyrnova, K. V.;
Demianenko, A. A.;
Radko, A. S.;
Pshyk, A. V.;
Kuzovlev, O. V.;
Amekura, H.;
Oyoshi, K.;
Takeda, Y.

Publication type:

Article

Projected Range, Straggling and Sputtering Yield of the Ion-Impingement of Inert Gases in Group IV, InP and GaAs Semiconductors.

Published in:

Journal of Nano- & Electronic Physics, 2015, v. 7, n. 1, p. 01002-1

By:

Femi-Oyetoro, J. D.;
Oyewande, O. E.

Publication type:

Article

Effect of Implantation Temperature on the Layer Exfoliation of H-implanted Germanium.

Published in:

Journal of Nano- & Electronic Physics, 2013, v. 5, n. 2, p. 02002-1

By:

Dadwal, U.;
Kumar, Praveen;
Singh, R.

Publication type:

Article

High Dose Ion Implantation Into NiTi for Improvement of Pseudoplasticity and Shape Memory Effect.

Published in:

Journal of Nano- & Electronic Physics, 2013, v. 5, n. 1, p. 01016-1

By:

Pogrebnjak, A.;
Bratushka, S.;
Levintant-Zayonts, N.

Publication type:

Article