Works matching DE "HOLOGRAPHIC lithography"
1
- Advanced Functional Materials, 2014, v. 24, n. 16, p. 2361, doi. 10.1002/adfm.201302826
- Li, Jie;
- Cho, Yigil;
- Choi, In‐Suk;
- Yang, Shu
- Article
2
- Lithuanian Journal of Physics, 2013, v. 53, n. 4, p. 227, doi. 10.3952/physics.v53i4.2765
- Stankevičius, E.;
- Gedvilas, M.;
- Voisiat, B.;
- Malinauskas, M.;
- Račiukaitis, G.
- Article
3
- Optical Engineering, 2013, v. 52, n. 9, p. 1, doi. 10.1117/1.OE.52.9.091706
- Quan Liu;
- Jianhong Wu;
- Minghui Chen
- Article
4
- Plasmonics, 2017, v. 12, n. 4, p. 1015, doi. 10.1007/s11468-016-0353-8
- Armas, Luis;
- Menezes, Jacson;
- Huila, M.;
- Araki, K.;
- Toma, H.
- Article
5
- Script & Print, 2016, v. 40, n. 4, p. 222
- Article
6
- Sensors (14248220), 2019, v. 19, n. 5, p. 1026, doi. 10.3390/s19051026
- Gul, Sabad-E;
- O'Neill, Luke;
- Cassidy, John;
- Naydenova, Izabela
- Article
7
- Advanced Materials Interfaces, 2018, v. 5, n. 18, p. N.PAG, doi. 10.1002/admi.201870091
- Jeon, Taeyoon;
- Kim, Dong‐Ho;
- Park, Sung‐Gyu
- Article
8
- Journal of High Energy Physics, 2017, v. 2017, n. 8, p. 1, doi. 10.1007/JHEP08(2017)075
- Article
9
- Micromachines, 2016, v. 7, n. 7, p. 128, doi. 10.3390/mi7070128
- Lowell, David;
- George, David;
- Lutkenhaus, Jeffrey;
- Tian, Chris;
- Adewole, Murthada;
- Philipose, Usha;
- Hualiang Zhang;
- Yuankun Lin
- Article
10
- Micromachines, 2016, v. 7, n. 4, p. 59, doi. 10.3390/mi7040059
- Lutkenhaus, Jeffrey;
- Lowell, David;
- George, David;
- Hualiang Zhang;
- Yuankun Lin
- Article
