Works matching DE "HIGH-k dielectric thin films"

Results: 9

HIGH-k GATE DIELECTRIC: AMORPHOUS Ta/La2O3 FILMS GROWN ON Si AT LOW PRESSURE.
Published in:
Surface Review & Letters, 2014, v. 21, n. 6, p. 1450080-1, doi. 10.1142/S0218625X14500802
By:
- BAHARI, ALI;
- KHORSHIDI, ZAHRA
Publication type:
Article
Dielectric relaxation of high-k oxides.
Published in:
Nanoscale Research Letters, 2013, v. 8, n. 1, p. 1, doi. 10.1186/1556-276X-8-456
By:
- Zhao, Chun;
- Zhao, Ce Zhou;
- Werner, Matthew;
- Taylor, Steve;
- Chalker, Paul
Publication type:
Article
Direct Deposition of Uniform High-κ Dielectrics on Graphene.
Published in:
Scientific Reports, 2014, p. 1, doi. 10.1038/srep06448
By:
- Peng Zhou;
- Songbo Yang;
- Qingqing Sun;
- Lin Chen;
- Pengfei Wang;
- Shijin Ding;
- Zhang, David Wei
Publication type:
Article
Study of scattering parameters of RFMEMS shunt switch with high-K dielectrics.
Published in:
Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 12, p. 5546, doi. 10.1007/s10854-014-2342-z
By:
- Sharma, Updesh;
- Dutta, Shankar
Publication type:
Article
Use of high-k encapsulation to improve mobility in trap-limited metal-oxide semiconductors.
Published in:
Physica Status Solidi (B), 2017, v. 254, n. 10, p. 1, doi. 10.1002/pssb.201700124
By:
- Zeumault, Andre;
- Subramanian, Vivek
Publication type:
Article
Quasi-analytical model-based performance analysis of dual material gate stack strained GAA FinFET.
Published in:
International Journal of Electronics Letters, 2020, v. 8, n. 3, p. 304, doi. 10.1080/21681724.2019.1600729
By:
- Shora, Aadil T.;
- Khanday, Farooq A.
Publication type:
Article
Characterization of High-k Gate Dielectric with Amorphous Nanostructure.
Published in:
Journal of Electronic Materials, 2013, v. 42, n. 12, p. 3529, doi. 10.1007/s11664-013-2772-z
By:
- Bahari, Ali;
- Gholipur, Reza
Publication type:
Article
Gamma irradiation-induced effects on the electrical properties of HfO 2 -based MOS devices.
Published in:
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena, 2016, v. 171, n. 1/2, p. 77, doi. 10.1080/10420150.2015.1135152
By:
- Manikanthababu, N.;
- Arun, N.;
- Dhanunjaya, M.;
- Nageswara Rao, S.V.S.;
- Pathak, A. P.
Publication type:
Article
Depth profiling analysis of HfON on SiON ultrathin films by parallel angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering.
Published in:
Surface & Interface Analysis: SIA, 2016, v. 48, n. 7, p. 436, doi. 10.1002/sia.5917
By:
- Fauquier, Laurent;
- Pelissier, Bernard;
- Jalabert, Denis;
- Pierre, François;
- Doloy, Delphine;
- Beitia, Carlos;
- Baron, Thierry
Publication type:
Article

Works matching DE "HIGH-k dielectric thin films"

HIGH-k GATE DIELECTRIC: AMORPHOUS Ta/La<sub>2</sub>O<sub>3</sub> FILMS GROWN ON Si AT LOW PRESSURE.

Dielectric relaxation of high-<i>k</i> oxides.

Direct Deposition of Uniform High-κ Dielectrics on Graphene.

Study of scattering parameters of RFMEMS shunt switch with high-K dielectrics.

Use of high-k encapsulation to improve mobility in trap-limited metal-oxide semiconductors.

Quasi-analytical model-based performance analysis of dual material gate stack strained GAA FinFET.

Characterization of High-<i>k</i> Gate Dielectric with Amorphous Nanostructure.

Gamma irradiation-induced effects on the electrical properties of HfO 2 -based MOS devices.

Depth profiling analysis of HfON on SiON ultrathin films by parallel angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering.