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Superflexible and Stretchable Ferroelectric Memory on a Biocompatible Platform.
- Published in:
- Advanced Electronic Materials, 2024, v. 10, n. 5, p. 1, doi. 10.1002/aelm.202300449
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- Article
Effect of Domain Structure and Dielectric Interlayer on Switching Speed of Ferroelectric Hf 0.5 Zr 0.5 O 2 Film.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 23, p. 3063, doi. 10.3390/nano13233063
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- Article
Effect of Formation Conditions for Hafnium Oxide Films on Structural and Electrophysical Properties of Heterostructures.
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- Journal of Communications Technology & Electronics, 2023, v. 68, n. 10, p. 1191, doi. 10.1134/S1064226923100017
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- Article
Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing.
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- Nano Convergence, 2023, v. 10, n. 1, p. 1, doi. 10.1186/s40580-023-00392-4
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- Article
Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO 2 Thin Films Grown by DC Reactive Magnetron Sputtering.
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- Micromachines, 2023, v. 14, n. 9, p. 1800, doi. 10.3390/mi14091800
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- Publication type:
- Article
Study on the Duration of Laser-Induced Thin Film Plasma Flash.
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- Coatings (2079-6412), 2023, v. 13, n. 8, p. 1323, doi. 10.3390/coatings13081323
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- Publication type:
- Article
Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering.
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- Materials (1996-1944), 2023, v. 16, n. 15, p. 5331, doi. 10.3390/ma16155331
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- Publication type:
- Article
Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 10, p. 1607, doi. 10.3390/nano13101607
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- Publication type:
- Article
Nanostructures Stacked on Hafnium Oxide Films Interfacing Graphene and Silicon Oxide Layers as Resistive Switching Media.
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- Nanomaterials (2079-4991), 2023, v. 13, n. 8, p. 1323, doi. 10.3390/nano13081323
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- Article
Atomic layer deposition of hafnium oxide on porous silicon to form a template for athermal SERS-active substrates.
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- Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 4, p. 1, doi. 10.1007/s00339-023-06592-3
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- Publication type:
- Article
Impact of Ferroelectric Layer Thickness on Reliability of Back‐End‐of‐Line‐Compatible Hafnium Zirconium Oxide Films.
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- Advanced Engineering Materials, 2023, v. 25, n. 4, p. 1, doi. 10.1002/adem.202201124
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- Article
Ferroelectric Hafnium Oxide Films for In‐Memory Computing Applications.
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- Advanced Electronic Materials, 2022, v. 8, n. 12, p. 1, doi. 10.1002/aelm.202200951
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- Publication type:
- Article
Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition.
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- Applied Physics A: Materials Science & Processing, 2022, v. 128, n. 12, p. 1, doi. 10.1007/s00339-022-06224-2
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- Article
Review on the Microstructure of Ferroelectric Hafnium Oxides.
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- Physica Status Solidi - Rapid Research Letters, 2022, v. 16, n. 10, p. 1, doi. 10.1002/pssr.202200168
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- Publication type:
- Article
Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 15, p. 2593, doi. 10.3390/nano12152593
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- Article
Laser annealing of Au/HfO<sub>2</sub> bi-layers to fabricate Au nanoparticles without altering the phase of HfO<sub>2</sub> for applications in SERS and memory devices.
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- Journal of Materials Science: Materials in Electronics, 2022, v. 33, n. 9, p. 6657, doi. 10.1007/s10854-022-07840-7
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- Publication type:
- Article
Electric field-induced crystallization of ferroelectric hafnium zirconium oxide.
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- Scientific Reports, 2021, v. 11, n. 1, p. 1, doi. 10.1038/s41598-021-01724-2
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- Article
Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films.
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- Physica Status Solidi - Rapid Research Letters, 2021, v. 15, n. 5, p. 1, doi. 10.1002/pssr.202100023
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- Publication type:
- Article
In Situ Characterization of Ferroelectric HfO<sub>2</sub> During Rapid Thermal Annealing.
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- Physica Status Solidi - Rapid Research Letters, 2021, v. 15, n. 5, p. 1, doi. 10.1002/pssr.202000598
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- Publication type:
- Article
Enhanced ferroelectric switching speed of Si-doped HfO2 thin film tailored by oxygen deficiency.
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- Scientific Reports, 2021, v. 11, n. 1, p. 1, doi. 10.1038/s41598-021-85773-7
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- Publication type:
- Article
Oxygen partial pressure influenced stoichiometry, structural, electrical, and optical properties of DC reactive sputtered hafnium oxide films.
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- Surface & Interface Analysis: SIA, 2021, v. 53, n. 2, p. 206, doi. 10.1002/sia.6902
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- Article
Solution-based hafnium oxide thin films as potential antireflection coating for silicon solar cells.
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- Journal of Materials Science: Materials in Electronics, 2020, v. 31, n. 23, p. 21279, doi. 10.1007/s10854-020-04640-9
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- Article
Tunable Microwave Filters Using HfO 2 -Based Ferroelectrics.
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- Nanomaterials (2079-4991), 2020, v. 10, n. 10, p. 2057, doi. 10.3390/nano10102057
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- Publication type:
- Article
Light Emission in Nd Doped Si-Rich HfO2 Films Prepared by Magnetron Sputtering.
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- Journal of Electronic Materials, 2020, v. 49, n. 6, p. 3441, doi. 10.1007/s11664-019-07847-7
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- Publication type:
- Article
Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation.
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- Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 8, p. 1, doi. 10.1002/pssa.201900840
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- Article
Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles.
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- Advanced Electronic Materials, 2020, v. 6, n. 3, p. 1, doi. 10.1002/aelm.201901015
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- Publication type:
- Article
Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction.
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- Nanomaterials (2079-4991), 2020, v. 10, n. 2, p. 384, doi. 10.3390/nano10020384
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- Article
INFLUENCE OF STRUCTURE OF HAFNIUM RODS ON THEIR MECHANICAL PROPERTIES, CORROSION AND RADIATION RESISTANCES.
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- Progress in Physics of Metals / Uspehi Fiziki Metallov, 2020, v. 21, n. 1, p. 46, doi. 10.15407/ufm.21.01.046
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- Article
Nanoscale Effects in One‐Dimensional Columnar Supramolecular Ferroelectrics.
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- Chemistry - A European Journal, 2019, v. 25, n. 48, p. 11233, doi. 10.1002/chem.201902544
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- Article
Structure of Hf<sub>0.9</sub>La<sub>0.1</sub>O<sub>2</sub> Ferroelectric Films Obtained by the Atomic Layer Deposition.
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- JETP Letters, 2019, v. 109, n. 2, p. 116, doi. 10.1134/S0021364019020115
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- Article
Origin of Temperature‐Dependent Ferroelectricity in Si‐Doped HfO<sub>2</sub>.
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- Advanced Electronic Materials, 2018, v. 4, n. 4, p. 1, doi. 10.1002/aelm.201700489
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- Article
The gas sensing properties of hafnium oxide thin films depending on the annealing environment.
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- Modern Physics Letters B, 2017, v. 31, n. 30, p. -1, doi. 10.1142/S0217984917502840
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- Article
Tunable white light emission from hafnium oxide films co-doped with trivalent terbium and europium ions deposited by Pyrosol technique.
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- Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 10, p. n/a, doi. 10.1002/pssa.201700269
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- Article
Ferroelectric HfO<sub>2</sub> thin film testing and whole wafer mapping with non-contact corona-Kelvin metrology (Phys. Status Solidi A 7∕2017).
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- Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 7, p. n/a, doi. 10.1002/pssa.201700249
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- Publication type:
- Article
Ferroelectric HfO<sub>2</sub> thin film testing and whole wafer mapping with non-contact corona-Kelvin metrology.
- Published in:
- Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 7, p. n/a, doi. 10.1002/pssa.201700249
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- Publication type:
- Article
Impact of post deposition annealing in N ambient on structural properties of nanocrystalline hafnium oxide thin film.
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- Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 1, p. 760, doi. 10.1007/s10854-016-5587-x
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- Article
Impact of post deposition annealing in O ambient on structural properties of nanocrystalline hafnium oxide thin film.
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- Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 7, p. 7055, doi. 10.1007/s10854-016-4663-6
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- Article
Electrical Properties and Interfacial Studies of Hf<sub>x</sub>Ti<sub>1-x</sub>O<sub>2</sub> High Permittivity Gate Insulators Deposited on Germanium Substrates.
- Published in:
- Materials (1996-1944), 2015, v. 8, n. 12, p. 8169, doi. 10.3390/ma8125454
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- Article
Corrosion News.
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- 2015
- Publication type:
- Other
Work function change of Ni, HfO<sub>2</sub> films and Ni/HfO<sub>2</sub> interfaces as a function of external electric field.
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- International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2015, v. 29, n. 23, p. -1, doi. 10.1142/S0217979215501684
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- Publication type:
- Article
Complex impedance spectroscopy of high-k HfO thin films in Al/HfO/Si capacitor for gate oxide applications.
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- Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 6, p. 3506, doi. 10.1007/s10854-015-2862-1
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- Publication type:
- Article
High-Mobility ZnO Thin Film Transistors Based on Solution-processed Hafnium Oxide Gate Dielectrics.
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- Advanced Functional Materials, 2015, v. 25, n. 1, p. 134, doi. 10.1002/adfm.201402684
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- Article
Structural and electrical properties of high- k HfO films modified by CHF and CF/O plasmas.
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- Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 2057, doi. 10.1007/s00339-014-8619-5
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- Publication type:
- Article
Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO gate dielectrics.
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- Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 9, p. 4163, doi. 10.1007/s10854-014-2144-3
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- Publication type:
- Article
In-situ characterization of aqueous-based hafnium oxide hydroxide sulfate thin films.
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- Surface & Interface Analysis: SIA, 2014, v. 46, n. 4, p. 210, doi. 10.1002/sia.5205
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- Article
XPS and cathodoluminescence studies of HfO2, Sc2O3 and (HfO2)1-x(Sc2O3)x films.
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- European Physical Journal - Applied Physics, 2013, v. 64, n. 1, p. 00, doi. 10.1051/epjap/2013130005
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- Article
Micromachined catalytic combustion type gas sensor for hydrogen detection.
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- Micro & Nano Letters (Wiley-Blackwell), 2013, v. 8, n. 10, p. 688, doi. 10.1049/mnl.2013.0468
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- Article
Synthesis and properties of dielectric (HfO)(ScO) films.
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- Inorganic Materials, 2013, v. 49, n. 2, p. 172, doi. 10.1134/S0020168513020234
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- Article
Model approach to solving the inverse problem of X-ray reflectometry and its application to the study of the internal structure of hafnium oxide films.
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- Crystallography Reports, 2013, v. 58, n. 1, p. 160, doi. 10.1134/S1063774513010148
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- Publication type:
- Article
EFFECT OF GATE ELECTRODES ON STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED <sub>2</sub> THIN FILMS.
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- Modern Physics Letters B, 2012, v. 26, n. 25, p. -1, doi. 10.1142/S0217984912501618
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- Article