Works matching DE "HAFNIUM oxide films"

Results: 61

Enhanced mechanical properties of HfO 2 film by nitrogen doping.

Published in:

Surface Engineering, 2016, v. 32, n. 8, p. 585, doi. 10.1080/02670844.2015.1121342

By:

Lei, P.;
Guo, S.;
Zhu, J.;
Dai, B.;
Liu, G.;
Wang, Y.;
Han, J.

Publication type:

Article

Impact of post deposition annealing in N ambient on structural properties of nanocrystalline hafnium oxide thin film.

Published in:

Journal of Materials Science: Materials in Electronics, 2017, v. 28, n. 1, p. 760, doi. 10.1007/s10854-016-5587-x

By:

Pandey, Shilpi;
Kothari, Prateek;
Rangra, K.;
Verma, Seema

Publication type:

Article

Impact of post deposition annealing in O ambient on structural properties of nanocrystalline hafnium oxide thin film.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 7, p. 7055, doi. 10.1007/s10854-016-4663-6

By:

Pandey, Shilpi;
Kothari, Prateek;
Sharma, Sunil;
Verma, Seema;
Rangra, K.

Publication type:

Article

Complex impedance spectroscopy of high-k HfO thin films in Al/HfO/Si capacitor for gate oxide applications.

Published in:

Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 6, p. 3506, doi. 10.1007/s10854-015-2862-1

By:

Nath, Madhuchhanda;
Roy, Asim

Publication type:

Article

Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO gate dielectrics.

Published in:

Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 9, p. 4163, doi. 10.1007/s10854-014-2144-3

By:

Deng, B.;
He, G.;
Chen, X.;
Zhang, J.;
Liu, M.;
Lv, J.;
Sun, Z.

Publication type:

Article

Synthesis and properties of dielectric (HfO)(ScO) films.

Published in:

Inorganic Materials, 2013, v. 49, n. 2, p. 172, doi. 10.1134/S0020168513020234

By:

Yakovkina, L.;
Smirnova, T.;
Borisov, V.;
Kichai, V.;
Kaichev, V.

Publication type:

Article

Ferroelectric Hafnium Oxide Films for In‐Memory Computing Applications.

Published in:

Advanced Electronic Materials, 2022, v. 8, n. 12, p. 1, doi. 10.1002/aelm.202200951

By:

Li, Zhenhai;
Wang, Tianyu;
Yu, Jiajie;
Meng, Jialin;
Liu, Yongkai;
Zhu, Hao;
Sun, Qingqing;
Zhang, David Wei;
Chen, Lin

Publication type:

Article

Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles.

Published in:

Advanced Electronic Materials, 2020, v. 6, n. 3, p. 1, doi. 10.1002/aelm.201901015

By:

Mart, Clemens;
Kämpfe, Thomas;
Hoffmann, Raik;
Eßlinger, Sophia;
Kirbach, Sven;
Kühnel, Kati;
Czernohorsky, Malte;
Eng, Lukas M.;
Weinreich, Wenke

Publication type:

Article

Origin of Temperature‐Dependent Ferroelectricity in Si‐Doped HfO2.

Published in:

Advanced Electronic Materials, 2018, v. 4, n. 4, p. 1, doi. 10.1002/aelm.201700489

By:

Park, Min Hyuk;
Chung, Ching‐Chang;
Schenk, Tony;
Richter, Claudia;
Hoffmann, Michael;
Wirth, Steffen;
Jones, Jacob L.;
Mikolajick, Thomas;
Schroeder, Uwe

Publication type:

Article

The gas sensing properties of hafnium oxide thin films depending on the annealing environment.

Published in:

Modern Physics Letters B, 2017, v. 31, n. 30, p. -1, doi. 10.1142/S0217984917502840

By:

Karaduman, Irmak;
Acar, Selim

Publication type:

Article

Nanoscale Effects in One‐Dimensional Columnar Supramolecular Ferroelectrics.

Published in:

Chemistry - A European Journal, 2019, v. 25, n. 48, p. 11233, doi. 10.1002/chem.201902544

By:

Anetai, Hayato;
Sambe, Kohei;
Takeda, Takashi;
Hoshino, Norihisa;
Akutagawa, Tomoyuki

Publication type:

Article

INFLUENCE OF STRUCTURE OF HAFNIUM RODS ON THEIR MECHANICAL PROPERTIES, CORROSION AND RADIATION RESISTANCES.

Published in:

Progress in Physics of Metals / Uspehi Fiziki Metallov, 2020, v. 21, n. 1, p. 46, doi. 10.15407/ufm.21.01.046

By:

ZUYOK, V. A.;
KRASNORUTSKYY, V. S.;
CHERNYAYEVA, T. P.;
TRETYAKOV, M. V.;
RUD, R. O.

Publication type:

Article

Electric field-induced crystallization of ferroelectric hafnium zirconium oxide.

Published in:

Scientific Reports, 2021, v. 11, n. 1, p. 1, doi. 10.1038/s41598-021-01724-2

By:

Lederer, Maximilian;
Abdulazhanov, Sukhrob;
Olivo, Ricardo;
Lehninger, David;
Kämpfe, Thomas;
Seidel, Konrad;
Eng, Lukas M.

Publication type:

Article

Light Emission in Nd Doped Si-Rich HfO2 Films Prepared by Magnetron Sputtering.

Published in:

Journal of Electronic Materials, 2020, v. 49, n. 6, p. 3441, doi. 10.1007/s11664-019-07847-7

By:

Torchynska, T.;
Vega Macotela, L. G.;
Khomenkova, L.;
Gourbilleau, F.

Publication type:

Article

Laser annealing of Au/HfO2 bi-layers to fabricate Au nanoparticles without altering the phase of HfO2 for applications in SERS and memory devices.

Published in:

Journal of Materials Science: Materials in Electronics, 2022, v. 33, n. 9, p. 6657, doi. 10.1007/s10854-022-07840-7

By:

Kumar, K. Vinod;
Goud, J. Pundareekam;
Kumar, Kanaka Ravi;
Raju, K. C. James;
Rao, S. V. S. Nageswara

Publication type:

Article

Solution-based hafnium oxide thin films as potential antireflection coating for silicon solar cells.

Published in:

Journal of Materials Science: Materials in Electronics, 2020, v. 31, n. 23, p. 21279, doi. 10.1007/s10854-020-04640-9

By:

Kanmaz, Imran;
Mandong, Al Montazer;
Uzum, Abdullah

Publication type:

Article

Structure of HfO films and binary oxides on its base.

Published in:

Journal of Structural Chemistry, 2012, v. 53, n. 4, p. 708, doi. 10.1134/S0022476612040130

By:

Smirnova, T.;
Yakovkina, L.;
Borisov, V.;
Kichai, V.;
Kaichev, V.;
Kriventsov, V.

Publication type:

Article

Deep learning potential model of displacement damage in hafnium oxide ferroelectric films.

Published in:

NPJ Computational Materials, 2024, v. 10, n. 1, p. 1, doi. 10.1038/s41524-024-01465-6

By:

Chen, Hua;
Zhang, Yanjun;
Zhou, Chao;
Zhou, Yichun

Publication type:

Article

Phase transformations in films deposited by laser ablation of Hf in an oxygen Atmosphere.

Published in:

Technical Physics, 2012, v. 57, n. 6, p. 856, doi. 10.1134/S1063784212060035

By:

Bagmut, A.;
Bagmut, I.;
Zhuchkov, V.;
Shevchenko, M.

Publication type:

Article

Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2020, v. 217, n. 8, p. 1, doi. 10.1002/pssa.201900840

By:

Lehninger, David;
Olivo, Ricardo;
Ali, Tarek;
Lederer, Maximilian;
Kämpfe, Thomas;
Mart, Clemens;
Biedermann, Kati;
Kühnel, Kati;
Roy, Lisa;
Kalkani, Mahsa;
Seidel, Konrad

Publication type:

Article

Atomic layer deposition of hafnium oxide on porous silicon to form a template for athermal SERS-active substrates.

Published in:

Applied Physics A: Materials Science & Processing, 2023, v. 129, n. 4, p. 1, doi. 10.1007/s00339-023-06592-3

By:

Girel, K.;
Burko, A.;
Zavatski, S.;
Barysiuk, A.;
Litvinova, K.;
Eganova, E.;
Tarasov, A.;
Novikov, D.;
Dubkov, S.;
Bandarenka, H.

Publication type:

Article

Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition.

Published in:

Applied Physics A: Materials Science & Processing, 2022, v. 128, n. 12, p. 1, doi. 10.1007/s00339-022-06224-2

By:

Fang, Shaobo;
Ma, Chong;
Liu, Weiming;
He, Junbo;
Wang, Cheng;
Chen, Gang;
Liu, Dingquan;
Zhang, Rongjun

Publication type:

Article

Structural and electrical properties of high- k HfO films modified by CHF and CF/O plasmas.

Published in:

Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 2057, doi. 10.1007/s00339-014-8619-5

By:

Zhang, H.;
Jin, C.;
Yang, Y.;
Ye, C.;
Zhuge, L.;
Wu, X.

Publication type:

Article

Effect of High-Temperature Annealing in Oxygen on the Properties of Hafnium Oxide Films Grown by Atomic Layer Deposition.

Published in:

Inorganic Materials, 2024, v. 60, n. 5, p. 612, doi. 10.1134/S0020168524700821

By:

Bulyarskiy, S. V.;
Litvinova, K. I.;
Shibalova, A. A.

Publication type:

Article

Effect of Domain Structure and Dielectric Interlayer on Switching Speed of Ferroelectric Hf 0.5 Zr 0.5 O 2 Film.

Published in:

Nanomaterials (2079-4991), 2023, v. 13, n. 23, p. 3063, doi. 10.3390/nano13233063

By:

Chouprik, Anastasia;
Savelyeva, Ekaterina;
Korostylev, Evgeny;
Kondratyuk, Ekaterina;
Zarubin, Sergey;
Sizykh, Nikita;
Zhuk, Maksim;
Zenkevich, Andrei;
Markeev, Andrey M.;
Kondratev, Oleg;
Yakunin, Sergey

Publication type:

Article

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.

Published in:

Nanomaterials (2079-4991), 2023, v. 13, n. 10, p. 1607, doi. 10.3390/nano13101607

By:

Kull, Mikk;
Piirsoo, Helle-Mai;
Tarre, Aivar;
Mändar, Hugo;
Tamm, Aile;
Jõgiaas, Taivo

Publication type:

Article

Nanostructures Stacked on Hafnium Oxide Films Interfacing Graphene and Silicon Oxide Layers as Resistive Switching Media.

Published in:

Nanomaterials (2079-4991), 2023, v. 13, n. 8, p. 1323, doi. 10.3390/nano13081323

By:

Kahro, Tauno;
Raudonen, Kristina;
Merisalu, Joonas;
Tarre, Aivar;
Ritslaid, Peeter;
Kasikov, Aarne;
Jõgiaas, Taivo;
Käämbre, Tanel;
Otsus, Markus;
Kozlova, Jekaterina;
Alles, Harry;
Tamm, Aile;
Kukli, Kaupo

Publication type:

Article

Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 15, p. 2593, doi. 10.3390/nano12152593

By:

Kalam, Kristjan;
Otsus, Markus;
Kozlova, Jekaterina;
Tarre, Aivar;
Kasikov, Aarne;
Rammula, Raul;
Link, Joosep;
Stern, Raivo;
Vinuesa, Guillermo;
Lendínez, José Miguel;
Dueñas, Salvador;
Castán, Helena;
Tamm, Aile;
Kukli, Kaupo

Publication type:

Article

Tunable Microwave Filters Using HfO 2 -Based Ferroelectrics.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 10, p. 2057, doi. 10.3390/nano10102057

By:

Aldrigo, Martino;
Dragoman, Mircea;
Iordanescu, Sergiu;
Nastase, Florin;
Vulpe, Silviu

Publication type:

Article

Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction.

Published in:

Nanomaterials (2079-4991), 2020, v. 10, n. 2, p. 384, doi. 10.3390/nano10020384

By:

Lederer, Maximilian;
Kämpfe, Thomas;
Vogel, Norman;
Utess, Dirk;
Volkmann, Beate;
Ali, Tarek;
Olivo, Ricardo;
Müller, Johannes;
Beyer, Sven;
Trentzsch, Martin;
Seidel, Konrad;
Eng, Lukas M.

Publication type:

Article

Work function change of Ni, HfO2 films and Ni/HfO2 interfaces as a function of external electric field.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2015, v. 29, n. 23, p. -1, doi. 10.1142/S0217979215501684

By:

Zhong, Kehua;
Xu, Guigui;
Zhang, Jianmin;
Liao, Renyuan;
Huang, Zhigao

Publication type:

Article

Enhanced ferroelectric switching speed of Si-doped HfO2 thin film tailored by oxygen deficiency.

Published in:

Scientific Reports, 2021, v. 11, n. 1, p. 1, doi. 10.1038/s41598-021-85773-7

By:

Lee, Kyoungjun;
Park, Kunwoo;
Lee, Hyun-Jae;
Song, Myeong Seop;
Lee, Kyu Cheol;
Namkung, Jin;
Lee, Jun Hee;
Park, Jungwon;
Chae, Seung Chul

Publication type:

Article

Study on the Duration of Laser-Induced Thin Film Plasma Flash.

Published in:

Coatings (2079-6412), 2023, v. 13, n. 8, p. 1323, doi. 10.3390/coatings13081323

By:

Wang, Guixia;
Su, Junhong;
Wang, Qingsong

Publication type:

Article

XPS and cathodoluminescence studies of HfO2, Sc2O3 and (HfO2)1-x(Sc2O3)x films.

Published in:

European Physical Journal - Applied Physics, 2013, v. 64, n. 1, p. 00, doi. 10.1051/epjap/2013130005

By:

Kaichev, Vasily V.;
Ivanova, Ekaterina V.;
Zamoryanskaya, Maria V.;
Smirnova, Tamara P.;
Yakovkina, Lubov V.;
Gritsenko, Vladimir A.

Publication type:

Article

EFFECT OF GATE ELECTRODES ON STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED 2 THIN FILMS.

Published in:

Modern Physics Letters B, 2012, v. 26, n. 25, p. -1, doi. 10.1142/S0217984912501618

By:

DONG, MING;
WANG, HAO;
SHEN, LIANGPING;
YE, CONG;
WEI, QINXIANG

Publication type:

Article

High-Mobility ZnO Thin Film Transistors Based on Solution-processed Hafnium Oxide Gate Dielectrics.

Published in:

Advanced Functional Materials, 2015, v. 25, n. 1, p. 134, doi. 10.1002/adfm.201402684

By:

Esro, Mazran;
Vourlias, George;
Somerton, Christopher;
Milne, William I.;
Adamopoulos, George

Publication type:

Article

Model approach to solving the inverse problem of X-ray reflectometry and its application to the study of the internal structure of hafnium oxide films.

Published in:

Crystallography Reports, 2013, v. 58, n. 1, p. 160, doi. 10.1134/S1063774513010148

By:

Volkov, Yu.;
Kozhevnikov, I.;
Roshchin, B.;
Filatova, E.;
Asadchikov, V.

Publication type:

Article

Electrical Properties and Interfacial Studies of HfxTi1-xO2 High Permittivity Gate Insulators Deposited on Germanium Substrates.

Published in:

Materials (1996-1944), 2015, v. 8, n. 12, p. 8169, doi. 10.3390/ma8125454

By:

Qifeng Lu;
Yifei Mu;
Roberts, Joseph W.;
Althobaiti, Mohammed;
Dhanak, Vinod R.;
Jingjin Wu;
Chun Zhao;
Ce Zhou Zhao;
Qian Zhang;
Li Yang;
Mitrovic, Ivona Z.;
Taylor, Stephen;
Chalker, Paul R.

Publication type:

Article

Oxygen partial pressure influenced stoichiometry, structural, electrical, and optical properties of DC reactive sputtered hafnium oxide films.

Published in:

Surface & Interface Analysis: SIA, 2021, v. 53, n. 2, p. 206, doi. 10.1002/sia.6902

By:

Venkataiah, Sunke;
Chandra, S.V. Jagadeesh;
Chalapathi, Uppala;
Ramana, Ch.V.V.;
Uthanna, Suda

Publication type:

Article

In-situ characterization of aqueous-based hafnium oxide hydroxide sulfate thin films.

Published in:

Surface & Interface Analysis: SIA, 2014, v. 46, n. 4, p. 210, doi. 10.1002/sia.5205

By:

Flynn, Brendan;
Kim, Daeho;
Clark, Benjamin L.;
Telecky, Alan;
Arnadottir, Liney;
Szanyi, Janos;
Keszler, Douglas A.;
Herman, Gregory S.

Publication type:

Article

Impact of Ferroelectric Layer Thickness on Reliability of Back‐End‐of‐Line‐Compatible Hafnium Zirconium Oxide Films.

Published in:

Advanced Engineering Materials, 2023, v. 25, n. 4, p. 1, doi. 10.1002/adem.202201124

By:

Sünbül, Ayse;
Lehninger, David;
Hoffmann, Raik;
Olivo, Ricardo;
Prabhu, Aditya;
Schöne, Fred;
Kühnel, Kati;
Döllgast, Moritz;
Haufe, Nora;
Roy, Lisa;
Kämpfe, Thomas;
Seidel, Konrad;
Eng, Lukas M.

Publication type:

Article

Structure of Hf0.9La0.1O2 Ferroelectric Films Obtained by the Atomic Layer Deposition.

Published in:

JETP Letters, 2019, v. 109, n. 2, p. 116, doi. 10.1134/S0021364019020115

By:

Perevalov, T. V.;
Gritsenko, V. A.;
Gutakovskii, A. K.;
Prosvirin, I. P.

Publication type:

Article

Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing.

Published in:

Nano Convergence, 2023, v. 10, n. 1, p. 1, doi. 10.1186/s40580-023-00392-4

By:

Hellenbrand, Markus;
MacManus-Driscoll, Judith

Publication type:

Article

Effect of Formation Conditions for Hafnium Oxide Films on Structural and Electrophysical Properties of Heterostructures.

Published in:

Journal of Communications Technology & Electronics, 2023, v. 68, n. 10, p. 1191, doi. 10.1134/S1064226923100017

By:

Afanasyev, M. S.;
Belorusov, D. A.;
Kiselev, D. A.;
Luzanov, V. A.;
Chucheva, G. V.

Publication type:

Article

Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO 2 Thin Films Grown by DC Reactive Magnetron Sputtering.

Published in:

Micromachines, 2023, v. 14, n. 9, p. 1800, doi. 10.3390/mi14091800

By:

Xi, Yingxue;
Qin, Xinghui;
Li, Wantong;
Luo, Xi;
Zhang, Jin;
Liu, Weiguo;
Yang, Pengfei

Publication type:

Article

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering.

Published in:

Materials (1996-1944), 2023, v. 16, n. 15, p. 5331, doi. 10.3390/ma16155331

By:

Araiza, José de Jesús;
Álvarez-Fraga, Leo;
Gago, Raúl;
Sánchez, Olga

Publication type:

Article

Gamma irradiation-induced effects on the electrical properties of HfO 2 -based MOS devices.

Published in:

Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena, 2016, v. 171, n. 1/2, p. 77, doi. 10.1080/10420150.2015.1135152

By:

Manikanthababu, N.;
Arun, N.;
Dhanunjaya, M.;
Nageswara Rao, S.V.S.;
Pathak, A. P.

Publication type:

Article

Synthesis, characterization and radiation damage studies of high-k dielectric (HfO 2 ) films for MOS device applications.

Published in:

Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena, 2015, v. 170, n. 3, p. 207, doi. 10.1080/10420150.2014.980259

By:

Manikanthababu, N.;
Arun, N.;
Dhanunjaya, M.;
Saikiran, V.;
Nageswara Rao, S.V.S.;
Pathak, A.P.

Publication type:

Article

Corrosion News.

Published in:: 2015
Publication type:: Other

Effects of Charge Imbalance on Field‐Induced Instability of HfO2‐Based Ferroelectric Tunnel Junctions.

Published in:

Advanced Electronic Materials, 2025, v. 11, n. 2, p. 1, doi. 10.1002/aelm.202400299

By:

Shin, Wonjun;
Han, Chang‐Hyeon;
Kim, Jangsaeng;
Koo, Ryun‐Han;
Min, Kyung Kyu;
Kwon, Daewoong

Publication type:

Article