Works matching DE "FOCUSED ion beam etching"
1
- Journal of Nanotechnology, 2014, p. 1, doi. 10.1155/2014/102404
- Shojiro Miyake;
- Mei Wang;
- Jongduk Kim
- Article
2
- Microscopy, 2017, v. 66, n. 5, p. 337, doi. 10.1093/jmicro/dfx022
- Takahiro Sato;
- Yoshihisa Orai;
- Yuya Suzuki;
- Hiroyuki Ito;
- Toshiyuki Isshiki;
- Munetoshi Fukui;
- Kuniyasu Nakamura;
- Schamp, C. T.
- Article
3
- Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 10, p. 2421, doi. 10.1002/pssa.201431328
- Geiss, Reinhard;
- Diziain, Séverine;
- Steinert, Michael;
- Schrempel, Frank;
- Kley, Ernst‐Bernhard;
- Tünnermann, Andreas;
- Pertsch, Thomas
- Article
4
- Semiconductors, 2018, v. 52, n. 7, p. 954, doi. 10.1134/S1063782618070151
- Mitrofanov, M. I.;
- Levitskii, I. V.;
- Voznyuk, G. V.;
- Tatarinov, E. E.;
- Rodin, S. N.;
- Kaliteevski, M. A.;
- Evtikhiev, V. P.
- Article
5
- Electronic Device Failure Analysis, 2016, v. 18, n. 1, p. 14, doi. 10.31399/asm.edfa.2016-1.p014
- Article
6
- Electronic Device Failure Analysis, 2014, v. 16, n. 4, p. 44, doi. 10.31399/asm.edfa.2014-4.p044
- Hamilton, Doug;
- Phoumra Tan
- Article