Works matching DE "EXTREME ultraviolet lithography"

Results: 165

Motorola plans heavy NGL mask investment; EUV and e-beam capabilities in development.

Published in:: Solid State Technology, 1999, v. 42, n. 10, p. 26
Publication type:: Article

EUCLIDES: European EUV lithography milestones.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 43

By:

Benschop, Jos P.H.;
van Dijsseldonk, Anton J.J.

Publication type:

Article

Japan's ASET researches EUV litho.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 22

By:

DUNN, PETER N.

Publication type:

Article

New venture to commercialize EUV litho technology.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 58

By:

Dunn, Peter N.

Publication type:

Article

Can a Fast-Mode EUV Wave Generate a Stationary Front?

Published in:

Solar Physics, 2016, v. 291, n. 11, p. 3195, doi. 10.1007/s11207-016-0920-3

By:

Chen, P.;
Fang, C.;
Chandra, R.;
Srivastava, A.

Publication type:

Article

Measuring Solar Doppler Velocities in the He ii 30.38 nm Emission Using the EUV Variability Experiment (EVE).

Published in:

Solar Physics, 2016, v. 291, n. 6, p. 1665, doi. 10.1007/s11207-016-0931-0

By:

Chamberlin, P.

Publication type:

Article

Extreme Ultraviolet Late-Phase Flares: Before and During the Solar Dynamics Observatory Mission.

Published in:

Solar Physics, 2014, v. 289, n. 9, p. 3391, doi. 10.1007/s11207-014-0483-0

By:

Woods, Thomas

Publication type:

Article

Solar Dynamics Observatory and Hinode Observations of a Blowout Jet in a Coronal Hole.

Published in:

Solar Physics, 2014, v. 289, n. 9, p. 3313, doi. 10.1007/s11207-014-0484-z

By:

Young, P.;
Muglach, K.

Publication type:

Article

A New Sigmoid Catalog from Hinode and the Solar Dynamics Observatory: Statistical Properties and Evolutionary Histories.

Published in:

Solar Physics, 2014, v. 289, n. 9, p. 3297, doi. 10.1007/s11207-013-0469-3

By:

Savcheva, A.;
McKillop, S.;
McCauley, P.;
Hanson, E.;
DeLuca, E.

Publication type:

Article

Resolving Differences in Absolute Irradiance Measurements Between the SOHO/CELIAS/SEM and the SDO/EVE.

Published in:

Solar Physics, 2014, v. 289, n. 8, p. 2907, doi. 10.1007/s11207-014-0519-5

By:

Wieman, S.;
Didkovsky, L.;
Judge, D.

Publication type:

Article

Far- and Extreme-UV Solar Spectral Irradiance and Radiance from Simplified Atmospheric Physical Models.

Published in:

Solar Physics, 2014, v. 289, n. 2, p. 515, doi. 10.1007/s11207-013-0431-4

By:

Fontenla, J. M.;
Landi, E.;
Snow, M.;
Woods, T.

Publication type:

Article

Soft X-ray Fluxes of Major Flares Far Behind the Limb as Estimated Using STEREO EUV Images.

Published in:

Solar Physics, 2013, v. 288, n. 1, p. 241, doi. 10.1007/s11207-013-0307-7

By:

Nitta, N. V.;
Aschwanden, M. J.;
Boerner, P. F.;
Freeland, S. L.;
Lemen, J. R.;
Wuelser, J.-P.

Publication type:

Article

A Comparative Study of Clustering Methods for Active Region Detection in Solar EUV Images.

Published in:

Solar Physics, 2013, v. 283, n. 2, p. 691, doi. 10.1007/s11207-013-0239-2

By:

Caballero, C.;
Aranda, M.

Publication type:

Article

Alternating Twist Along an Erupting Prominence.

Published in:

Solar Physics, 2013, v. 283, n. 2, p. 489, doi. 10.1007/s11207-013-0228-5

By:

Thompson, W.

Publication type:

Article

The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO).

Published in:

Solar Physics, 2012, v. 275, n. 1/2, p. 17, doi. 10.1007/s11207-011-9776-8

By:

Lemen, James;
Title, Alan;
Akin, David;
Boerner, Paul;
Chou, Catherine;
Drake, Jerry;
Duncan, Dexter;
Edwards, Christopher;
Friedlaender, Frank;
Heyman, Gary;
Hurlburt, Neal;
Katz, Noah;
Kushner, Gary;
Levay, Michael;
Lindgren, Russell;
Mathur, Dnyanesh;
McFeaters, Edward;
Mitchell, Sarah;
Rehse, Roger;
Schrijver, Carolus

Publication type:

Article

The EVE Doppler Sensitivity and Flare Observations.

Published in:

Solar Physics, 2011, v. 273, n. 1, p. 69, doi. 10.1007/s11207-011-9862-y

By:

Hudson, H.;
Woods, T.;
Chamberlin, P.;
Fletcher, L.;
Zanna, G.;
Didkovsky, L.;
Labrosse, N.;
Graham, D.

Publication type:

Article

Conversion efficiency calculations for EUV radiation emitted from laser-produced Tin plasmas.

Published in:

Turkish Journal of Physics, 2009, v. 33, n. 6, p. 363, doi. 10.3906/fız-0903-5

By:

ATALAY, Betül;
KENAR, Necla;
DEMİR, Arif

Publication type:

Article

Observations of the Earth's Ionosphere and Plasmasphere from International Space Station.

Published in:

Transactions of the Japan Society of Aeronautical & Space Sciences, Aerospace Technology Japan, 2014, v. 12, n. ists 29, p. 47

By:

Kentaro UJI;
Ichiro YOSHIKAWA;
Kazuo YOSHIOKA;
Go MURAKAMI;
Atsushi YAMAZAKI

Publication type:

Article

Dynamics of the ion energy spectrum in EUV-induced hydrogen plasma.

Published in:

Plasma Physics Reports, 2017, v. 43, n. 6, p. 614, doi. 10.1134/S1063780X17060010

By:

Abrikosov, A.;
Yakushev, O.;
Lopaev, D.;
Krivtsun, V.

Publication type:

Article

Loss of hydrogen atoms in H plasma on the surfaces of materials used in EUV lithography.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 10, p. 881, doi. 10.1134/S1063780X11090157

By:

Zyryanov, S.;
Kovalev, A.;
Lopaev, D.;
Malykhin, E.;
Rakhimov, A.;
Rakhimova, T.;
Koshelev, K.;
Krivtsun, V.

Publication type:

Article

Study of the generation of the 13.5-nm EUV radiation from Sn ions in a CO<sub>2</sub> laser-produced plasma.

Published in:

Plasma Physics Reports, 2010, v. 36, n. 2, p. 129, doi. 10.1134/S1063780X10020042

By:

Volkov, G.;
Zaitsev, V.;
Makarov, K.;
Napartovich, A.;
Rerikh, V.;
Smakovskii, Yu.;
Stepanov, A.;
Cherkovets, V.;
Rupasov, A.;
Satov, Yu.

Publication type:

Article

Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types.

Published in:

Photonics, 2025, v. 12, n. 3, p. 266, doi. 10.3390/photonics12030266

By:

Moon, Seungchan;
Lee, Dong Gi;
Choi, Jinhyuk;
Hong, Junho;
Lee, Taeho;
Ekinci, Yasin;
Ahn, Jinho

Publication type:

Article

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source.

Published in:

Photonics, 2023, v. 10, n. 12, p. 1339, doi. 10.3390/photonics10121339

By:

Chen, Yiyi;
Zhao, Chongxiao;
Pan, Qikun;
Zhang, Ranran;
Gao, Yang;
Li, Xiaoxi;
Guo, Jin;
Chen, Fei

Publication type:

Article

Research on Tip Characterization Techniques Based on Two-Dimensional Self-Traceable Nano-Gratings.

Published in:

Photonics, 2023, v. 10, n. 11, p. 1272, doi. 10.3390/photonics10111272

By:

Xiong, Yingfan;
Gou, Jinming;
Tang, Zhaohui;
Xiao, Guangxu;
Lei, Lihua;
Song, Song;
Deng, Xiao;
Cheng, Xinbin

Publication type:

Article

XUV Transient Absorption Spectroscopy: Probing Laser-Perturbed Dipole Polarization in Single Atom, Macroscopic, and Molecular Regimes.

Published in:

Photonics, 2017, v. 4, n. 1, p. 17, doi. 10.3390/photonics4010017

By:

Chen-Ting Liao;
Sandhu, Arvinder

Publication type:

Article

Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration.

Published in:

Optical Engineering, 2016, v. 55, n. 9, p. 095108-1, doi. 10.1117/1.OE.55.9.095108

By:

Yan Liu;
Yanqiu Li

Publication type:

Article

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.

Published in:

Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102

By:

Yan Liu;
Yanqiu Li;
Zhen Cao

Publication type:

Article

Extrem‐ultraviolettes Licht für Mikrochips.

Published in:

Nachrichten aus der Chemie, 2025, v. 73, n. 3, p. 28, doi. 10.1002/nadc.20254146788

By:

Lohmann, Lars

Publication type:

Article

Accurate level energies in the EF1[image omitted], GK1[image omitted], H1[image omitted], B1[image omitted], [image omitted], B'1[image omitted], [image omitted], [image omitted], J1Δg states of H2.

Published in:

Molecular Physics, 2010, v. 108, n. 7-9, p. 827, doi. 10.1080/00268970903413350

By:

Bailly, D.;
Salumbides, E. J.;
Vervloet, M.;
Ubachs, W.

Publication type:

Article

Applications of Compact Laser-Driven EUV/XUV Plasma Sources.

Published in:

X-Rays Optics & Instrumentation, 2010, p. 1, doi. 10.1155/2010/687496

By:

Bayer, Armin;
Barkusky, Frank;
Döring, Stefan;
Großmann, Peter;
Mann, Klaus

Publication type:

Article

Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.

Published in:

International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107

By:

Kang, Soojin;
Yook, Se-Jin;
Lee, Kwan-Soo

Publication type:

Article

Chemical Consequences of XUV/X-ray Laser-Matter Interactions.

Published in:

Molecules, 2021, v. 26, n. 22, p. 6833, doi. 10.3390/molecules26226833

By:

Juha, Libor

Publication type:

Article

Visibility and Origin of Compact Interplanetary Radio Type IV Bursts.

Published in:

Solar Physics, 2018, v. 293, n. 11, p. 1, doi. 10.1007/s11207-018-1371-9

By:

Talebpour Sheshvan, Nasrin;
Pohjolainen, Silja

Publication type:

Article

Optical and EUV Lithography: A Modeling Perspective.

Published in:

2021

By:

Melvin, Lawrence S.

Publication type:

Book Review

Ptychographic imaging with partially coherent plasma EUV sources.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 6, p. 459, doi. 10.1515/aot-2017-0050

By:

Bußmann, Jan;
Odstrčil, Michal;
Yusuke Teramoto;
Juschkin, Larissa

Publication type:

Article

Coherent diffractive imaging methods for semiconductor manufacturing.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 6, p. 439, doi. 10.1515/aot-2017-0052

By:

Helfenstein, Patrick;
Mochi, Iacopo;
Rajeev, Rajendran;
Fernandez, Sara;
Ekinci, Yasin

Publication type:

Article

Special issue on ptychography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 6, p. 421, doi. 10.1515/aot-2017-0067

By:

Erdmann, Andreas;
Guohai Situ

Publication type:

Article

Interview: What's next in lithography?

Published in:

2017

By:

Thoss, Andreas

Publication type:

Interview

A full-process chain assessment for nanoimprint technology on 200-mm industrial platform.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 277, doi. 10.1515/aot-2017-0018

By:

Teyssedre, Hubert;
Landis, Stefan;
Thanner, Christine;
Laure, Maria;
Khan, Jonas;
Bos, Sandra;
Eibelhuber, Martin;
Chouiki, Mustapha;
May, Michael;
Brianceau, Pierre;
Pollet, Olivier;
Hazart, Jerome;
Laviron, Cyrille;
Pain, Laurent;
Wimplinger, Markus

Publication type:

Article

A review of nanoimprint lithography for high-volume semiconductor device manufacturing.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 229, doi. 10.1515/aot-2017-0020

By:

Resnick, Douglas J.;
Jin Choi

Publication type:

Article

Development and performance of EUV pellicles.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 221, doi. 10.1515/aot-2017-0023

By:

Brouns, Derk

Publication type:

Article

EUV mask defectivity – a process of increasing control toward HVM.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 203, doi. 10.1515/aot-2017-0017

By:

Jonckheere, Rik

Publication type:

Article

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 187, doi. 10.1515/aot-2017-0019

By:

Erdmann, Andreas;
Dongbo Xu;
Evanschitzky, Peter;
Philipsen, Vicky;
Vu Luong;
Hendrickx, Eric

Publication type:

Article

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 173, doi. 10.1515/aot-2017-0029

By:

Fomenkov, Igor;
Brandt, David;
Ershov, Alex;
Schafgans, Alexander;
Yezheng Tao;
Vaschenko, Georgiy;
Rokitski, Slava;
Kats, Michael;
Vargas, Michael;
Purvis, Michael;
Rafac, Rob;
La Fontaine, Bruno;
De Dea, Silvia;
LaForge, Andrew;
Stewart, Jayson;
Chang, Steven;
Graham, Matthew;
Riggs, Daniel;
Taylor, Ted;
Abraham, Mathew

Publication type:

Article

Photoresists in extreme ultraviolet lithography (EUVL).

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 163, doi. 10.1515/aot-2017-0021

By:

De Simone, Danilo;
Vesters, Yannick;
Vandenberghe, Geert

Publication type:

Article

Next-generation lithography – an outlook on EUV projection and nanoimprint.

Published in:

2017

By:

van Schoot, Jan;
Schift, Helmut

Publication type:

Editorial

Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks.

Published in:

Journal of Adhesion Science & Technology, 2011, v. 25, n. 8, p. 781, doi. 10.1163/016942410X511123

By:

Jaiswal, Ravi P.;
Beaudoin, Stephen P.

Publication type:

Article

Particle Cleaning of EUV Reticles.

Published in:

Journal of Adhesion Science & Technology, 2009, v. 23, n. 12, p. 1603, doi. 10.1163/156856109X440975

By:

Scaccabarozzi, Luigi;
Lammers, Niels A.;
Moors, Roel;
Banine, Vadim

Publication type:

Article

Displacement Analysis of Solar Magnetic Field Images in EUV Wavelengths of Space Solar Telescope.

Published in:

International Journal of Pattern Recognition & Artificial Intelligence, 2019, v. 33, n. 3, p. N.PAG, doi. 10.1142/S0218001419500058

By:

Liu, Yang;
Song, Kefei;
Wang, Xiaodong;
Chen, Bo;
Ma, Junlin;
Han, Zhenwei

Publication type:

Article

Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning.

Published in:

Journal of Applied Polymer Science, 2025, v. 142, n. 12, p. 1, doi. 10.1002/app.56622

By:

Zhuang, Changchang;
Chen, Jiao;
Wang, Tao;
Zhao, Jun;
Li, Haoyuan;
Xin, Hanshen;
Zhang, Jianhua

Publication type:

Article