Works matching DE "EXTREME ultraviolet lithography"
Results: 156
Single‐Component High‐Resolution Dual‐Tone EUV Photoresists Based on Precision Self‐Immolative Polymers.
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- Angewandte Chemie, 2025, v. 137, n. 3, p. 1, doi. 10.1002/ange.202415588
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- Article
Motorola plans heavy NGL mask investment; EUV and e-beam capabilities in development.
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- Solid State Technology, 1999, v. 42, n. 10, p. 26
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- Article
EUCLIDES: European EUV lithography milestones.
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- Solid State Technology, 1999, v. 42, n. 9, p. 43
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- Article
Japan's ASET researches EUV litho.
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- Solid State Technology, 1998, v. 41, n. 11, p. 22
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- Article
New venture to commercialize EUV litho technology.
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- Solid State Technology, 1998, v. 41, n. 7, p. 58
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- Article
Visibility and Origin of Compact Interplanetary Radio Type IV Bursts.
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- Solar Physics, 2018, v. 293, n. 11, p. 1, doi. 10.1007/s11207-018-1371-9
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- Article
Can a Fast-Mode EUV Wave Generate a Stationary Front?
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- Solar Physics, 2016, v. 291, n. 11, p. 3195, doi. 10.1007/s11207-016-0920-3
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- Article
Measuring Solar Doppler Velocities in the He ii 30.38 nm Emission Using the EUV Variability Experiment (EVE).
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- Solar Physics, 2016, v. 291, n. 6, p. 1665, doi. 10.1007/s11207-016-0931-0
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- Article
Extreme Ultraviolet Late-Phase Flares: Before and During the Solar Dynamics Observatory Mission.
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- Solar Physics, 2014, v. 289, n. 9, p. 3391, doi. 10.1007/s11207-014-0483-0
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- Article
Solar Dynamics Observatory and Hinode Observations of a Blowout Jet in a Coronal Hole.
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- Solar Physics, 2014, v. 289, n. 9, p. 3313, doi. 10.1007/s11207-014-0484-z
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- Article
A New Sigmoid Catalog from Hinode and the Solar Dynamics Observatory: Statistical Properties and Evolutionary Histories.
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- Solar Physics, 2014, v. 289, n. 9, p. 3297, doi. 10.1007/s11207-013-0469-3
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- Article
Resolving Differences in Absolute Irradiance Measurements Between the SOHO/CELIAS/SEM and the SDO/EVE.
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- Solar Physics, 2014, v. 289, n. 8, p. 2907, doi. 10.1007/s11207-014-0519-5
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- Article
Far- and Extreme-UV Solar Spectral Irradiance and Radiance from Simplified Atmospheric Physical Models.
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- Solar Physics, 2014, v. 289, n. 2, p. 515, doi. 10.1007/s11207-013-0431-4
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- Article
Soft X-ray Fluxes of Major Flares Far Behind the Limb as Estimated Using STEREO EUV Images.
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- Solar Physics, 2013, v. 288, n. 1, p. 241, doi. 10.1007/s11207-013-0307-7
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- Article
A Comparative Study of Clustering Methods for Active Region Detection in Solar EUV Images.
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- Solar Physics, 2013, v. 283, n. 2, p. 691, doi. 10.1007/s11207-013-0239-2
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- Article
Alternating Twist Along an Erupting Prominence.
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- Solar Physics, 2013, v. 283, n. 2, p. 489, doi. 10.1007/s11207-013-0228-5
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- Article
The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO).
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- Solar Physics, 2012, v. 275, n. 1/2, p. 17, doi. 10.1007/s11207-011-9776-8
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- Article
The EVE Doppler Sensitivity and Flare Observations.
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- Solar Physics, 2011, v. 273, n. 1, p. 69, doi. 10.1007/s11207-011-9862-y
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- Article
A study of hydrogen plasma-induced charging effect in EUV lithography systems.
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- Discover Nano, 2023, v. 18, n. 1, p. 1, doi. 10.1186/s11671-023-03799-4
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- Article
The 100 mm × 100 mm Extreme Ultraviolet Graphite Pellicle: Nano‐Pellicle Production Using the Lowest Free Energy at the Graphite–Water Interface.
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- Advanced Materials Interfaces, 2020, v. 7, n. 24, p. 1, doi. 10.1002/admi.202001141
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- Article
Enhancing Parameters Tuning of Overlay Models with Ridge Regression: Addressing Multicollinearity in High-Dimensional Data.
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- Mathematics (2227-7390), 2024, v. 12, n. 20, p. 3179, doi. 10.3390/math12203179
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- Article
Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens.
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- Shock & Vibration, 2024, v. 2024, p. 1, doi. 10.1155/2024/6168723
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- Article
Extreme ultraviolet tomography of multi-jet gas puff target for high-order harmonic generation.
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- Applied Physics B: Lasers & Optics, 2014, v. 117, n. 1, p. 253, doi. 10.1007/s00340-014-5829-7
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- Article
Laser-plasma extreme ultraviolet source at 6.7 nm using a rotating cryogenic Xe target.
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- Applied Physics B: Lasers & Optics, 2012, v. 108, n. 4, p. 743, doi. 10.1007/s00340-012-5215-2
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- Article
Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target.
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- Applied Physics B: Lasers & Optics, 2010, v. 101, n. 4, p. 773, doi. 10.1007/s00340-010-4327-9
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- Article
Toward single attosecond pulses using harmonic emission from solid-density plasmas.
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- Applied Physics B: Lasers & Optics, 2010, v. 101, n. 3, p. 511, doi. 10.1007/s00340-010-4281-6
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- Article
Laser–plasma–source debris-related investigations: an aspect of the ENEA micro-exposure tool.
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- Applied Physics B: Lasers & Optics, 2009, v. 96, n. 2/3, p. 479, doi. 10.1007/s00340-009-3583-z
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- Article
Measurement of the Imaginary Index of Refraction of UOx in the Extreme Ultraviolet.
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- Journal of the Utah Academy of Sciences, Arts & Letters, 2010, v. 87, p. 255
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- Article
Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations.
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- Journal of Synchrotron Radiation, 2024, v. 31, n. 3, p. 485, doi. 10.1107/S1600577524002534
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- Article
Analysis of partially coherent light propagation through the soft X‐ray interference lithography beamline at SSRF.
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- Journal of Synchrotron Radiation, 2021, v. 28, n. 3, p. 902, doi. 10.1107/S1600577521003398
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- Article
Depth‐resolved compositional analysis of W/B<sub>4</sub>C multilayers using resonant soft X‐ray reflectivity.
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- Journal of Synchrotron Radiation, 2019, v. 26, n. 3, p. 793, doi. 10.1107/S1600577519002339
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- Article
First observation of natural circular dichroism spectra in the extreme ultraviolet region using a polarizing undulator-based optical system and its polarization characteristics.
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- Journal of Synchrotron Radiation, 2009, v. 16, n. 4, p. 455, doi. 10.1107/S0909049509012291
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- Article
In the Shadows of the American Century: The Rise and Decline of US Global Power: by Alfred W. McCoy, Haymarket Books. 2017. pp. 359, ISBN 978-1-60846-773-0.
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- 2021
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- Publication type:
- Book Review
Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration.
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- Optical Engineering, 2016, v. 55, n. 9, p. 095108-1, doi. 10.1117/1.OE.55.9.095108
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- Article
Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.
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- Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102
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- Article
Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective.
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- Optical Engineering, 2013, v. 52, n. 12, p. 1, doi. 10.1117/1.OE.52.12.125102
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- Article
Effectiveness of Mo–Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics.
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- Optical Engineering, 2009, v. 48, n. 5, p. 056501, doi. 10.1117/1.3126002
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- Article
Accurate level energies in the EF1[image omitted], GK1[image omitted], H1[image omitted], B1[image omitted], [image omitted], B'1[image omitted], [image omitted], [image omitted], J1Δg states of H2.
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- Molecular Physics, 2010, v. 108, n. 7-9, p. 827, doi. 10.1080/00268970903413350
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- Article
ULE<sup>®</sup>Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates.
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- International Journal of Applied Glass Science, 2014, v. 5, n. 1, p. 82, doi. 10.1111/ijag.12041
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- Article
Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.
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- International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107
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- Article
A giant bid to etch tiny circuits.
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- Nature, 2012, v. 487, n. 7408, p. 419, doi. 10.1038/487419a
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- Article
Delayed response of the global total electron content to solar EUV variations.
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- Advances in Radio Science, 2016, v. 14, p. 175, doi. 10.5194/ars-14-175-2016
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- Article
Correction to: Investigation of recurrent EUV jets from highly dynamic magnetic field region.
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- 2017
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- Erratum
High-Power Lasers.
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- Encyclopedia, 2024, v. 4, n. 3, p. 1236, doi. 10.3390/encyclopedia4030080
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- Article
A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments.
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- IET Circuits, Devices & Systems (Wiley-Blackwell), 2021, v. 15, n. 4, p. 310, doi. 10.1049/cds2.12028
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- Article
Temporal response of silicon EUV and soft X-ray detectors.
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- Instruments & Experimental Techniques, 2015, v. 58, n. 1, p. 102, doi. 10.1134/S0020441215010017
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- Article
High-harmonic generation and parametric amplification in the soft X-rays from extended electron trajectories.
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- Scientific Reports, 2014, p. 1, doi. 10.1038/srep04234
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- Article
Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 11, p. 982, doi. 10.3390/nano14110982
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- Article
Evolution in Lithography Techniques: Microlithography to Nanolithography.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754
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- Article
High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results.
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- Nanomaterials (2079-4991), 2020, v. 10, n. 8, p. 1593, doi. 10.3390/nano10081593
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- Article