Works matching DE "EXTREME ultraviolet lithography"

Results: 172

Winning the Defining Contest: The US-China Artificial Intelligence Race.

Published in:

Washington Quarterly, 2025, v. 48, n. 2, p. 153, doi. 10.1080/0163660X.2025.2517501

By:

Williams, Brandon Kirk

Publication type:

Article

Design and synthesis of radiation-sensitive monomer and polymers for potential application in extreme ultraviolet lithography.

Published in:

Journal of Polymer Research, 2025, v. 32, n. 6, p. 1, doi. 10.1007/s10965-025-04435-8

By:

Gan, Jingyi;
Li, Yuanzhuang;
Yang, Lei;
Wang, Rui;
Zheng, Chenyu;
Xiao, Guomin

Publication type:

Article

Dynamics of the ion energy spectrum in EUV-induced hydrogen plasma.

Published in:

Plasma Physics Reports, 2017, v. 43, n. 6, p. 614, doi. 10.1134/S1063780X17060010

By:

Abrikosov, A.;
Yakushev, O.;
Lopaev, D.;
Krivtsun, V.

Publication type:

Article

Loss of hydrogen atoms in H plasma on the surfaces of materials used in EUV lithography.

Published in:

Plasma Physics Reports, 2011, v. 37, n. 10, p. 881, doi. 10.1134/S1063780X11090157

By:

Zyryanov, S.;
Kovalev, A.;
Lopaev, D.;
Malykhin, E.;
Rakhimov, A.;
Rakhimova, T.;
Koshelev, K.;
Krivtsun, V.

Publication type:

Article

Study of the generation of the 13.5-nm EUV radiation from Sn ions in a CO<sub>2</sub> laser-produced plasma.

Published in:

Plasma Physics Reports, 2010, v. 36, n. 2, p. 129, doi. 10.1134/S1063780X10020042

By:

Volkov, G.;
Zaitsev, V.;
Makarov, K.;
Napartovich, A.;
Rerikh, V.;
Smakovskii, Yu.;
Stepanov, A.;
Cherkovets, V.;
Rupasov, A.;
Satov, Yu.

Publication type:

Article

Atomic Simulation of Wear and Slip Behavior Between Monocrystalline Silicon and 6H-SiC Friction Pair.

Published in:

Lubricants (2075-4442), 2025, v. 13, n. 4, p. 147, doi. 10.3390/lubricants13040147

By:

Pan, Jiansheng;
Wu, Jianwei;
Lei, Daiyi;
Liu, Huan;
Zhao, Pengyue;
Zhao, Bo;
Liu, Jiang;
Yang, Qingshan

Publication type:

Article

Nano-structuring of solid surface by extreme ultraviolet Ar8+ laser.

Published in:

Laser & Particle Beams, 2012, v. 30, n. 1, p. 57, doi. 10.1017/S0263034611000681

By:

Kolacek, K.;
Straus, J.;
Schmidt, J.;
Frolov, O.;
Prukner, V.;
Shukurov, A.;
Holy, V.;
Sobota, J.;
Fort, T.

Publication type:

Article

The output of a laser amplifier with simultaneous amplified spontaneous emission and an injected seed.

Published in:

Laser & Particle Beams, 2009, v. 27, n. 3, p. 393, doi. 10.1017/S0263034609000500

By:

Huang, H.;
Tallents, G. J.

Publication type:

Article

High-harmonic generation and parametric amplification in the soft X-rays from extended electron trajectories.

Published in:

Scientific Reports, 2014, p. 1, doi. 10.1038/srep04234

By:

Seres, J.;
Seres, E.;
Landgraf, B.;
Ecker, B.;
Aurand, B.;
Kuehl, T.;
Spielmann, C.

Publication type:

Article

Removal of Tin from Extreme Ultraviolet Collector Optics by In- Situ Hydrogen Plasma Etching.

Published in:

Plasma Chemistry & Plasma Processing, 2018, v. 38, n. 1, p. 223, doi. 10.1007/s11090-017-9852-4

By:

Elg, Daniel T.;
Panici, Gianluca A.;
Liu, Sumeng;
Girolami, Gregory;
Srivastava, Shailendra N.;
Ruzic, David N.

Publication type:

Article

A study of hydrogen plasma-induced charging effect in EUV lithography systems.

Published in:

Discover Nano, 2023, v. 18, n. 1, p. 1, doi. 10.1186/s11671-023-03799-4

By:

Huang, Yao-Hung;
Lin, Chrong Jung;
King, Ya-Chin

Publication type:

Article

Conversion efficiency calculations for EUV radiation emitted from laser-produced Tin plasmas.

Published in:

Turkish Journal of Physics, 2009, v. 33, n. 6, p. 363, doi. 10.3906/fız-0903-5

By:

ATALAY, Betül;
KENAR, Necla;
DEMİR, Arif

Publication type:

Article

New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography.

Published in:

Doklady Chemistry, 2012, v. 442, n. 1, p. 7, doi. 10.1134/S0012500812010041

By:

Vainer, A.;
Dyumaev, K.;
Kovalenko, A.;
Davidovich, M.;
Zelikson, K.;
Pinchuk, E.

Publication type:

Article

In the Shadows of the American Century: The Rise and Decline of US Global Power: by Alfred W. McCoy, Haymarket Books. 2017. pp. 359, ISBN 978-1-60846-773-0.

Published in:

2021

By:

Pillay, Anton M.;
Landsberg, Chris

Publication type:

Book Review

Quantum Dot Channel (QDC) FETs with Wraparound II-VI Gate Insulators: Numerical Simulations.

Published in:

Journal of Electronic Materials, 2016, v. 45, n. 11, p. 5663, doi. 10.1007/s11664-016-4812-y

By:

Jain, F.;
Lingalugari, M.;
Kondo, J.;
Mirdha, P.;
Suarez, E.;
Chandy, J.;
Heller, E.

Publication type:

Article

Improvement of Quality Performance in Mask Production by Feature Selection and Machine Learning Methods and An Application.

Published in:

Journal of Defense Sciences / Savunma Bilmleri Dergisi, 2024, v. 20, n. 1, p. 167, doi. 10.17134/khosbd.1298163

By:

TEBRİZCİK, Semra;
ERSÖZ, Süleyman;
AKTEPE, Adnan

Publication type:

Article

The Institutional Challenge for China’s Semiconductor Chip Industry.

Published in:

Asia Policy, 2024, v. 19, n. 1, p. 51, doi. 10.1353/asp.2024.a918868

By:

Harjani, Manoj

Publication type:

Article

Accurate level energies in the EF1[image omitted], GK1[image omitted], H1[image omitted], B1[image omitted], [image omitted], B'1[image omitted], [image omitted], [image omitted], J1Δg states of H2.

Published in:

Molecular Physics, 2010, v. 108, n. 7-9, p. 827, doi. 10.1080/00268970903413350

By:

Bailly, D.;
Salumbides, E. J.;
Vervloet, M.;
Ubachs, W.

Publication type:

Article

The Influence of H<sub>2</sub> Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition.

Published in:

Plasma Processes & Polymers, 2015, v. 12, n. 7, p. 624, doi. 10.1002/ppap.201400157

By:

De Schepper, Peter;
el Otell, Ziad;
Vaglio Pret, Alessandro;
Altamirano‐Sanchez, Efrain;
De Gendt, Stefan

Publication type:

Article

Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method.

Published in:

European Journal of Inorganic Chemistry, 2019, v. 2019, n. 38, p. 4136, doi. 10.1002/ejic.201900745

By:

Wu, Lianjia;
Liu, Jeremy;
Vockenhuber, Michaela;
Ekinci, Yasin;
Castellanos, Sonia

Publication type:

Article

Motorola plans heavy NGL mask investment; EUV and e-beam capabilities in development.

Published in:: Solid State Technology, 1999, v. 42, n. 10, p. 26
Publication type:: Article

EUCLIDES: European EUV lithography milestones.

Published in:

Solid State Technology, 1999, v. 42, n. 9, p. 43

By:

Benschop, Jos P.H.;
van Dijsseldonk, Anton J.J.

Publication type:

Article

Japan's ASET researches EUV litho.

Published in:

Solid State Technology, 1998, v. 41, n. 11, p. 22

By:

DUNN, PETER N.

Publication type:

Article

New venture to commercialize EUV litho technology.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 58

By:

Dunn, Peter N.

Publication type:

Article

Observations of solar X-ray and EUV jets and their related phenomena.

Published in:

Astronomische Nachrichten, 2016, v. 337, n. 10, p. 1024, doi. 10.1002/asna.201612428

By:

Innes, D. E.;
Bučík, R.;
Guo, L.-J.;
Nitta, N.

Publication type:

Article

Correction to: Investigation of recurrent EUV jets from highly dynamic magnetic field region.

Published in:

2017

By:

Joshi, Navin;
Chandra, Ramesh;
Guo, Yang;
Magara, Tetsuya;
Zhelyazkov, Ivan;
Moon, Yong-Jae;
Uddin, Wahab

Publication type:

Erratum

Digital, intelligent, and all-round optical manufacturing method-magnetorheological finishing (wheel type): a review.

Published in:

International Journal of Advanced Manufacturing Technology, 2025, v. 138, n. 11, p. 5057, doi. 10.1007/s00170-025-15810-6

By:

Wang, Bo;
Zhang, Wanli;
Wang, Zhanyang;
Song, Ci;
Shi, Feng;
Tie, Guipeng;
Peng, Xing;
Qiao, Shuo;
Hao, Qun

Publication type:

Article

High-Power Lasers.

Published in:

Encyclopedia, 2024, v. 4, n. 3, p. 1236, doi. 10.3390/encyclopedia4030080

By:

Chvykov, Vladimir

Publication type:

Article

ORSON WELLES, CINEASTA DE LA SIMULACIÓN.

Published in:

Tropelías: Revista de Teoría de la Literatura y Literatura Comparada, 2022, n. 37, p. 165, doi. 10.26754/ojs_tropelias/tropelias.2022376252

By:

MORALA GIRÓN, Alejandro

Publication type:

Article

Research progress on infrared laser driven extreme ultraviolet lithography source.

Published in:

Laser Technology, 2025, v. 49, n. 3, p. 328, doi. 10.7510/jgjs.issn.1001-3806.2025.03.003

By:

LYU Tianhao;
SONG Yanjie;
ZONG Nan;
ZHANG Shenjin;
BO Yong;
PENG Qinjun

Publication type:

Article

纳米流体通道的制备及其应用研究进展.

Published in:

Journal of Materials Engineering / Cailiao Gongcheng, 2022, v. 50, n. 12, p. 13, doi. 10.11868/j.issn.1001-4381.2022.000153

By:

宋光辉;
吴忠旋;
陈阁谷;
彭锋

Publication type:

Article

Radiative heating of thin Al foils by intense extreme ultraviolet radiation.

Published in:

JETP Letters, 2016, v. 103, n. 5, p. 350, doi. 10.1134/S0021364016050040

By:

Grabovski, E.;
Sasorov, P.;
Shevelko, A.;
Aleksandrov, V.;
Andreev, S.;
Basko, M.;
Branitski, A.;
Gritsuk, A.;
Volkov, G.;
Laukhin, Ya.;
Mitrofanov, K.;
Novikov, V.;
Oleinik, G.;
Samokhin, A.;
Smirnov, V.;
Tolstikhina, I.;
Frolov, I.;
Yakushev, O.

Publication type:

Article

Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration.

Published in:

Optical Engineering, 2016, v. 55, n. 9, p. 095108-1, doi. 10.1117/1.OE.55.9.095108

By:

Yan Liu;
Yanqiu Li

Publication type:

Article

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process.

Published in:

Optical Engineering, 2015, v. 54, n. 7, p. 1, doi. 10.1117/1.OE.54.7.075102

By:

Yan Liu;
Yanqiu Li;
Zhen Cao

Publication type:

Article

Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective.

Published in:

Optical Engineering, 2013, v. 52, n. 12, p. 1, doi. 10.1117/1.OE.52.12.125102

By:

Zhen Cao;
Yanqiu Li;
Fei Liu

Publication type:

Article

Effectiveness of Mo–Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics.

Published in:

Optical Engineering, 2009, v. 48, n. 5, p. 056501, doi. 10.1117/1.3126002

By:

Huatan Qiu;
Shailendra N. Srivastava;
Keith C. Thompson;
Martin J. Neumann;
David N. Ruzic

Publication type:

Article

Research on Nanometer Precision Measurement Method of High Order Even Aspheres.

Published in:

Applied Sciences (2076-3417), 2024, v. 14, n. 21, p. 9969, doi. 10.3390/app14219969

By:

Xu, Hao;
Liu, Junfeng;
Chen, Shanyong

Publication type:

Article

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology.

Published in:

Applied Sciences (2076-3417), 2019, v. 9, n. 14, p. 2827, doi. 10.3390/app9142827

By:

Beckers, Job;
van de Ven, Tijn;
van der Horst, Ruud;
Astakhov, Dmitry;
Banine, Vadim

Publication type:

Article

Ni-Al Alloys as Alternative EUV Mask Absorber.

Published in:

Applied Sciences (2076-3417), 2018, v. 8, n. 4, p. 521, doi. 10.3390/app8040521

By:

Luong, Vu;
Philipsen, Vicky;
Hendrickx, Eric;
Opsomer, Karl;
Detavernier, Christophe;
Laubis, Christian;
Scholze, Frank;
Heyns, Marc

Publication type:

Article

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair.

Published in:

Applied Physics A: Materials Science & Processing, 2014, v. 117, n. 4, p. 1705, doi. 10.1007/s00339-014-8745-0

By:

Noh, J.;
Stanford, M.;
Lewis, B.;
Fowlkes, J.;
Plank, H.;
Rack, P.

Publication type:

Article

EUV damage threshold measurements of Mo/Si multilayer mirrors.

Published in:

Applied Physics A: Materials Science & Processing, 2012, v. 108, n. 2, p. 263, doi. 10.1007/s00339-012-7037-9

By:

Müller, Matthias;
Barkusky, Frank;
Feigl, Torsten;
Mann, Klaus

Publication type:

Article

EUV reflectometry for thickness and density determination of thin film coatings.

Published in:

Applied Physics A: Materials Science & Processing, 2012, v. 107, n. 4, p. 795, doi. 10.1007/s00339-012-6914-6

By:

Döring, S.;
Hertlein, F.;
Bayer, A.;
Mann, K.

Publication type:

Article

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source.

Published in:

Applied Physics A: Materials Science & Processing, 2011, v. 105, n. 1, p. 17, doi. 10.1007/s00339-011-6540-8

By:

Barkusky, Frank;
Bayer, Armin;
Mann, Klaus

Publication type:

Article

Extreme-ultraviolet emissivity from Xe to Xe by using a detailed line-by-line method.

Published in:

European Physical Journal D (EPJ D), 2010, v. 60, n. 2, p. 309, doi. 10.1140/epjd/e2010-00192-6

By:

Zeng, J.;
Gao, C.;
Yuan, J.

Publication type:

Article

Deposition Velocity onto an Inverted Flat Surface in a Laminar Parallel Flow.

Published in:

Aerosol Science & Technology, 2010, v. 44, n. 11, p. 919, doi. 10.1080/02786826.2010.501833

By:

Woo-Joo Choi;
Se-Jin Yook

Publication type:

Article

Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis.

Published in:

International Journal of Modern Physics C: Computational Physics & Physical Computation, 2014, v. 25, n. 6, p. -1, doi. 10.1142/S0129183114500107

By:

Kang, Soojin;
Yook, Se-Jin;
Lee, Kwan-Soo

Publication type:

Article

Cheating physics.

Published in:: Nature Photonics, 2010, v. 4, n. 1, p. 19, doi. 10.1038/nphoton.2009.248
Publication type:: Article

EUV lithography: Lithography gets extreme.

Published in:

Nature Photonics, 2010, v. 4, n. 1, p. 24, doi. 10.1038/nphoton.2009.251

By:

Wagner, Christian;
Harned, Noreen

Publication type:

Article

Lithography roadmap on track.

Published in:: Nature Photonics, 2010, v. 4, n. 1, p. 20, doi. 10.1038/nphoton.2009.253
Publication type:: Article

The shrinking chip.

Published in:: 2009
Publication type:: Editorial