Works matching DE "ETCHING reagents"

Results: 173

C4F6 Etching Characteristics for High‐Aspect‐Ratio Etching of SiO2 Films Using an Inductively Coupled Plasma Etching System With Low‐Frequency Bias Power.

Published in:

Plasma Processes & Polymers, 2025, v. 22, n. 6, p. 1, doi. 10.1002/ppap.70012

By:

Wei, Jiachen;
Woo, Byungjun;
Lee, DaeKug;
Jeong, Ki‐Hyeok;
Kwon, Kwang‐Ho

Publication type:

Article

Enhancing multi-crystalline silicon wafer performance through surface modification and AZO treatment.

Published in:

Surface Engineering, 2023, v. 39, n. 7-12, p. 823, doi. 10.1080/02670844.2023.2261675

By:

Krishnan, Akhil;
Guruswamy, Aravindan;
Bhargav, P. Balaji;
Ramasamy, P.

Publication type:

Article

Octahedral and Cubic Gold Nanoframes with Platinum Framework.

Published in:

Angewandte Chemie, 2015, v. 127, n. 31, p. 9153, doi. 10.1002/ange.201503996

By:

Ham, Songyi;
Jang, Hee-Jeong;
Song, Yookyung;
Shuford, Kevin L.;
Park, Sungho

Publication type:

Article

Dopant induced polarity inversion in polar ZnO nanorods.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 12, p. 12312, doi. 10.1007/s10854-016-5088-y

By:

Rathore, Neelam;
Sarkar, Shaibal

Publication type:

Article

A preliminary study on chemical micro-machining of complex three-dimensional patterns on silicon substrates.

Published in:

Journal of Solid State Electrochemistry, 2005, v. 9, n. 5, p. 398, doi. 10.1007/s10008-004-0636-4

By:

Kang Shi;
Jing Tang;
Li Zhang;
Yong-liang Zhou;
Dong-sheng Qu;
Li-Ning Sun;
Zhong-Qun Tian

Publication type:

Article

Morphology of pores produced in n-Si {100} by etching in hydrofluoric acid solutions.

Published in:

Inorganic Materials, 2016, v. 52, n. 10, p. 979, doi. 10.1134/S0020168516100010

By:

Abramova, E.;
Khort, A.;
Syrov, Yu.;
Yakovenko, A.;
Shvets, V.

Publication type:

Article

Etching behavior of CdTe, CdTe〈Ge〉, CdTe〈Sn〉, and CdTe〈Pb〉 single crystals in aqueous (NH)CrO-HBr-citric acid solutions.

Published in:

Inorganic Materials, 2012, v. 48, n. 2, p. 114, doi. 10.1134/S0020168512010153

By:

Tomashik, Z.;
Chukhnenko, P.;
Ivanits'ka, V.;
Tomashik, V.;
Okrepka, G.;
Stratiichuk, I.

Publication type:

Article

Etching behavior of CdTe in aqueous HO-HI-CHO solutions.

Published in:

Inorganic Materials, 2010, v. 46, n. 8, p. 812, doi. 10.1134/S0020168510080029

By:

Tomashik, Z. F.;
Ivanits'ka, V. G.;
Tomashik, V. N.;
Shcherbak, L. P.;
Franc, J.;
Moravec, P.;
Höschl, P.;
Walter, J.

Publication type:

Article

Effect of the Cd0.96Zn0.04Te substrate polishing procedure on Cd xHg1 − xTe liquid phase epitaxy.

Published in:

Inorganic Materials, 2010, v. 46, n. 7, p. 714, doi. 10.1134/S0020168510070058

By:

Eminov, Sh. O.;
Rajabli, A. A.;
Ibragimov, T. I.

Publication type:

Article

Etching of Zn xCd1 − xTe by solutions of the HNO3-HBr-citric acid system.

Published in:

Inorganic Materials, 2009, v. 45, n. 7, p. 731, doi. 10.1134/S002016850907005X

By:

Tomashik, Z.;
Okrepka, G.;
Tomashik, V.

Publication type:

Article

Liquid etching of metallization layers on GaAs/Al x Ga1 − x as heterostructures with HNO3 + HCl + glycerol mixture.

Published in:

Inorganic Materials, 2008, v. 44, n. 12, p. 1278, doi. 10.1134/S0020168508120029

By:

Arbenina, V.;
Marmalyuk, A.;
Arbenin, D.;
Budkin, I.;
Govorkov, O.

Publication type:

Article

A model of the mechanism of the chemical interaction of the etchant ion (HF) with silicon during its electrochemical etching in hydrofluoric acid solutions.

Published in:

Doklady Chemistry, 2016, v. 470, n. 1, p. 252, doi. 10.1134/S0012500816090044

By:

Abramova, E.;
Khort, A.;
Gvelesiani, A.;
Yakovenko, A.;
Shvets, V.

Publication type:

Article

The role of the etchant ion in the formation and growth of pores in silicon during its etching in hydrofluoric acid solutions.

Published in:

Doklady Chemistry, 2016, v. 467, n. 1, p. 61, doi. 10.1134/S0012500816030010

By:

Abramova, E.;
Khort, A.;
Tsygankov, V.;
Yakovenko, A.;
Shvets, V.

Publication type:

Article

The effect of the hydrofluoric acid etchant-silicon system anisotropy on the shape of pores formed upon electrochemical etching of silicon.

Published in:

Doklady Chemistry, 2015, v. 464, n. 1, p. 224, doi. 10.1134/S0012500815090025

By:

Abramova, E.;
Khort, A.;
Syrov, Yu.;
Yakovenko, A.;
Shvets, V.

Publication type:

Article

57.2: Electrical Characterization of BCE-TFTs with a-IGZTO Oxide Semiconductor Compatible with Cu and Al interconnections.

Published in:

SID Symposium Digest of Technical Papers, 2015, v. 46, n. 1, p. 853, doi. 10.1002/sdtp.10359

By:

Ochi, Mototaka;
Morita, Shinya;
Takanashi, Yasuyuki;
Tao, Hiroaki;
Goto, Hiroshi;
Kugimiya, Toshihiro;
Kanamaru, Moriyoshi

Publication type:

Article

P-14: High Mobility BCE Al doped ZnSnInO TFT Fabricated Using Mixed Acid Mo/Al/Mo Etchant.

Published in:

SID Symposium Digest of Technical Papers, 2014, v. 45, n. 1, p. 994, doi. 10.1002/j.2168-0159.2014.tb00258.x

By:

Park, Sang‐Hee Ko;
Cho, Sung Haeng;
Ryu, Minki;
Kim, Heeok;
Kwon, OhSang;
Park, Eunsook;
Yang, Jong‐Heon;
Kim, Jong Woo;
Hwang, Chi‐Sun;
Lim, Sun Kwon

Publication type:

Article

Chemical interaction of the GaAs, GaSb, InAs, and InSb single crystals surface with I2 + DMF (methanol) etchants.

Published in:

Applied Nanoscience, 2023, v. 13, n. 10, p. 7047, doi. 10.1007/s13204-023-02870-x

By:

Malanych, Galyna;
Tomashyk, Vasyl;
Korchovyi, Andriy;
Sabov, Tomash

Publication type:

Article

Mechanical and chemical treatments of PbTe and Pb1-xSnxTe single crystals by (NH4)2Cr2O7 + HBr + ethylene glycol etchants.

Published in:

Applied Nanoscience, 2023, v. 13, n. 7, p. 5165, doi. 10.1007/s13204-022-02719-9

By:

Malanych, Galyna;
Tomashyk, Vasyl;
Korchovyi, Andriy;
Chayka, Mykola

Publication type:

Article

Formation of nanosized relief on the CdTe single crystals surface by bromine-emerging etchants.

Published in:

Applied Nanoscience, 2022, v. 12, n. 3, p. 603, doi. 10.1007/s13204-021-01716-8

By:

Chayka, Mykola;
Tomashyk, Zinaida;
Tomashyk, Vasyl;
Malanych, Galyna;
Korchovyi, Andriy

Publication type:

Article

Nanotextured multicrystalline Al-BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes.

Published in:

Physica Status Solidi - Rapid Research Letters, 2015, v. 9, n. 8, p. 448, doi. 10.1002/pssr.201510219

By:

Kafle, Bishal;
Mannan, Abdul;
Freund, Timo;
Clochard, LaurENt;
Duffy, Edward;
Hofmann, Marc;
RENtsch, JochEN;
Preu, Ralf

Publication type:

Article

Metallisation on ABS plastics using fine-bubbles low ozonated water complying with REACH regulations.

Published in:

Transactions of the Institute of Metal Finishing, 2016, v. 94, n. 6, p. 322, doi. 10.1080/00202967.2016.1223805

By:

Nomura, T.;
Nakagawa, H.;
Tashiro, K.;
Umeda, Y.;
Honma, H.;
Takai, O.

Publication type:

Article

Feasibility of regenerating etching acids as part of the metal-etching process.

Published in:

Metallurgist, 2007, v. 51, n. 3-4, p. 186, doi. 10.1007/s11015-007-0034-0

By:

Vanya, P.;
Mets, K.

Publication type:

Article

Evaluation and Comparison of Newly Developed Phosphoric Acid Gel (Exir) with Two Different Common Gels in Iran.

Published in:

Journal of Dental Materials & Techniques, 2021, v. 10, n. 1, p. 34

By:

Mohammadipour, Hamideh sadat;
Akbari, Majid;
Bagheri, Hossein;
Malekmohammadi, Mohammadtaghi;
Karimian, Elnaz;
Sekandari, Salehe

Publication type:

Article

In Vitro Comparison of the Effects of Two Different Acid Etchants on the Microleakage of Composite Restorations.

Published in:

Journal of Dental School, Shahid Beheshti University of Medical Sciences, 2014, v. 32, n. 1, p. 9

By:

Panahandeh, Narges;
Iravani, Maryam;
Halalizadeh, Zari

Publication type:

Article

Sacrificial etching of AlxGa1-xAs for III–V MEMS surface micromachining.

Published in:

Applied Physics A: Materials Science & Processing, 2007, v. 88, n. 4, p. 711, doi. 10.1007/s00339-007-4032-7

By:

Kumar, P.;
Kanakaraju, S.;
DeVoe, D.L.

Publication type:

Article

Exposure of defects in GaN by plasma etching.

Published in:

Applied Physics A: Materials Science & Processing, 2005, v. 80, n. 2, p. 405, doi. 10.1007/s00339-003-2372-5

By:

Choi, H. W.;
Liu, C.;
Cheong, M. G.;
Zhang, J.;
Chua, S. J.

Publication type:

Article

In Situ Electrochemical Synthesis of MXenes without Acid/Alkali Usage in/for an Aqueous Zinc Ion Battery.

Published in:

Advanced Energy Materials, 2020, v. 10, n. 36, p. 1, doi. 10.1002/aenm.202001791

By:

Li, Xinliang;
Li, Mian;
Yang, Qi;
Liang, Guojin;
Huang, Zhaodong;
Ma, Longtao;
Wang, Donghong;
Mo, Funian;
Dong, Binbin;
Huang, Qing;
Zhi, Chunyi

Publication type:

Article

Shear Bond Strength of Acidic Primer, Light-Cure Glass Ionomer, Light-Cure and Self Cure Composite Adhesive Systems - An In Vitro Study.

Published in:

Journal of International Oral Health, 2013, v. 5, n. 3, p. 73

By:

Krishnakanth Reddy, D.;
Kishore, M. S. V.;
Safeena, Safeena

Publication type:

Article

Effects of a fluoride etchant on resin bonding to titanium-aluminum-niobium alloy.

Published in:

European Journal of Oral Sciences, 2004, v. 112, n. 4, p. 384, doi. 10.1111/j.1600-0722.2004.00148.x

By:

Yanagida, Hiroaki;
Taira, Yohsuke;
Atsuta, Mitsuru

Publication type:

Article

Effects of a metal etchant and two primers on resin bonding durability to titanium.

Published in:

European Journal of Oral Sciences, 2004, v. 112, n. 1, p. 95, doi. 10.1111/j.0909-8836.2004.00090.x

By:

Taira, Yohsuke;
Yanagida, Hiroaki;
Matsumura, Hideo;
Atsuta, Mitsuru

Publication type:

Article

Plasma Processing and Polymers: A Personal Perspective.

Published in:

Plasma Chemistry & Plasma Processing, 2014, v. 34, n. 3, p. 363, doi. 10.1007/s11090-013-9491-3

By:

Wertheimer, Michael

Publication type:

Article

Precision Chemical Etching of GaP(NAs) Epitaxial Layers for the Formation of Monolithic Optoelectronic Devices.

Published in:

Semiconductors, 2018, v. 52, n. 13, p. 1775, doi. 10.1134/S1063782618130092

By:

Kudryashov, D. A.;
Gudovskikh, A. S.;
Baranov, A. I.

Publication type:

Article

Anisotropic shaping of macroporous silicon.

Published in:

Semiconductors, 2015, v. 49, n. 4, p. 551, doi. 10.1134/S1063782615040041

By:

Astrova, E.;
Parfeneva, A.;
Li, G.;
Zharova, Yu.

Publication type:

Article

Study of postgrowth processing in the fabrication of quantum-cascade lasers.

Published in:

Semiconductors, 2014, v. 48, n. 8, p. 1103, doi. 10.1134/S1063782614080181

By:

Mamutin, V.;
Ilyinskaya, N.;
Bedarev, D.;
Levin, R.;
Pushnyi, B.

Publication type:

Article

Passivation of InSb and HgCdTe Infrared Photodiodes by Polycrystalline CdTe.

Published in:

Journal of Electronic Materials, 2023, v. 52, n. 11, p. 7337, doi. 10.1007/s11664-023-10671-9

By:

Tetyorkin, V.;
Tsybrii, Z.;
Tkachuk, A.;
Vuichyk, M.;
Svezhentsova, K.;
Yevmenova, A.;
Dmytruk, N.

Publication type:

Article

Formation of Mosaic Silicon Oxide Structure during Metal-Assisted Electrochemical Etching of Silicon at High Current Density.

Published in:

Journal of Electronic Materials, 2016, v. 45, n. 5, p. 2615, doi. 10.1007/s11664-016-4434-4

By:

Cao, Dao;
Anh, Cao;
Ngan, Luong

Publication type:

Article

A Slightly Oxidizing Etchant for Polishing of CdTe and CdZnTe Surfaces.

Published in:

Journal of Electronic Materials, 2013, v. 42, n. 11, p. 3059, doi. 10.1007/s11664-013-2625-9

By:

Ivanits'ka, V.;
Moravec, P.;
Tomashik, V.;
Mašek, K.;
Tomashik, Z.;
Franc, J.;
Grill, R.;
Höschl, P.

Publication type:

Article

Study of Surface Treatments on InAs/GaSb Superlattice LWIR Detectors.

Published in:

Journal of Electronic Materials, 2010, v. 39, n. 10, p. 2203, doi. 10.1007/s11664-010-1242-0

By:

Kutty, M. N.;
Plis, E.;
Khoshakhlagh, A.;
Myers, S.;
Gautam, N.;
Smolev, S.;
Sharma, Y. D.;
Dawson, R.;
Krishna, S.;
Lee, S. J.;
Noh, S. K.

Publication type:

Article

Fabrication of Thermoelectric Devices by Applying Microsystems Technology.

Published in:

Journal of Electronic Materials, 2010, v. 39, n. 9, p. 1516, doi. 10.1007/s11664-010-1287-0

By:

Goncalves, L. M.;
Alpuim, P.;
Correia, J. H.

Publication type:

Article

Chemical–Mechanical Polishing of CdTe and Zn xCd1− xTe Single Crystals by H2O2(HNO3)–HBr–Organic Solvent Etchant Compositions.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 8, p. 1637, doi. 10.1007/s11664-009-0692-8

By:

Tomashik, Z. F.;
Tomashik, V. M.;
Stratiychuk, I. B.;
Okrepka, G. M.;
Hnativ, I. I.;
Moravec, P.;
Höschl, P.;
Bok, J.

Publication type:

Article

Chemical Interaction of CdTe and CdZnTe with Aqueous Solutions of H2O2-HI-Tartaric Acid.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 8, p. 1645, doi. 10.1007/s11664-009-0787-2

By:

Moravec, P.;
Ivanits'ka, V.G.;
Franc, J.;
Tomashik, Z. F.;
Tomashik, V. M.;
Mašek, K.;
Feychuk, P. I.;
Shcherbak, L. P.;
Höschl, P.;
Grill, R.;
Walter, J.

Publication type:

Article

Effect of Atmosphere on n-Type Hg1-xCdxTe Surface after Different Wet Etching Treatments: An Electrical and Structural Study.

Published in:

Journal of Electronic Materials, 2008, v. 37, n. 9, p. 1471, doi. 10.1007/s11664-008-0494-4

By:

KIRAN, R.;
SPORKEN, R.;
CASSELMAN, T. N.;
EMELIE, P. Y.;
KODAMA, R.;
CHANG, Y.;
AQARIDEN, F.;
VELICU, S.;
ZHAO, J.;
SIVANANTHAN, S.

Publication type:

Article

Traces of HgCdTe Defects as Revealed by Etch Pits.

Published in:

Journal of Electronic Materials, 2008, v. 37, n. 9, p. 1241, doi. 10.1007/s11664-008-0465-9

By:

YANG, J. R.;
CAO, X. L.;
WEI, Y. F.;
HE, L.

Publication type:

Article

Plasma-Cleaned InSb (112)B for Large-Area Epitaxy of HgCdTe Sensors.

Published in:

Journal of Electronic Materials, 2008, v. 37, n. 9, p. 1247, doi. 10.1007/s11664-008-0460-1

By:

JAIME-VASQUEZ, M.;
MARTINKA, M.;
STOLTZ, A. J.;
JACOBS, R. N.;
BENSON, J. D.;
ALMEIDA, L. A.;
MARKUNAS, J. K.

Publication type:

Article

Morphology of Inductively Coupled Plasma Processed HgCdTe Surfaces.

Published in:

Journal of Electronic Materials, 2008, v. 37, n. 9, p. 1225, doi. 10.1007/s11664-008-0467-7

By:

STOLTZ, A. J.;
BENSON, J. D.;
SMITH, P. J.

Publication type:

Article

Fast Detection of Precipitates and Oxides on CdZnTe Surfaces by Spectroscopic Ellipsometry.

Published in:

Journal of Electronic Materials, 2007, v. 36, n. 8, p. 1077, doi. 10.1007/s11664-007-0176-7

By:

Badano, G.;
Million, A.;
Canava, B.;
Tran-Van, P.;
Etcheberry, A.

Publication type:

Article

Comparative Study of HgCdTe Etchants: An Electrical Characterization.

Published in:

Journal of Electronic Materials, 2007, v. 36, n. 8, p. 993, doi. 10.1007/s11664-007-0159-8

By:

Mallick, Shubhrangshu;
Kiran, Rajni;
Ghosh, Siddhartha;
Velicu, Silviu;
Sivananthan, Sivalingam

Publication type:

Article

Preparation and Unique Electrical Behaviors of Monodispersed Hybrid Nanorattles of Metal Nanocores with Hairy Electroactive Polymer Shells.

Published in:

Chemistry - A European Journal, 2014, v. 20, n. 10, p. 2723, doi. 10.1002/chem.201303970

By:

Cai, Tao;
Zhang, Bin;
Chen, Yu;
Wang, Cheng;
Zhu, Chun Xiang;
Neoh, Koon‐Gee;
Kang, En‐Tang

Publication type:

Article

Effect of cavity preparation method on microtensile bond strength of a self-etching primer vs phosphoric acid etchant to enamel.

Published in:

Journal of Materials Science: Materials in Medicine, 2007, v. 18, n. 10, p. 2003, doi. 10.1007/s10856-007-3121-7

By:

de Souza-Zaroni, Wanessa Christine;
Delfino, Carina Sinclér;
Ciccone-Nogueira, Juliane Cristina;
Palma-Dibb, Regina Guenka;
Corona, Silmara Aparecida Milori

Publication type:

Article

Closed-loop quality control system for laser chemical machining in metal micro-production.

Published in:

International Journal of Advanced Manufacturing Technology, 2017, v. 93, n. 9-12, p. 3693, doi. 10.1007/s00170-017-0436-5

By:

Zhang, P.;
Freyberg, A.;
Fischer, A.

Publication type:

Article