Formation and investigation of cobalt silicide ultrathin layers in Ti/Co/Ti-, TiN/Ti/Co-, and TiN/Co-on-silicon structures.Published in:Technical Physics, 2012, v. 57, n. 2, p. 279, doi. 10.1134/S1063784212020235By:Rudakov, V.;Denisenko, Yu.;Naumov, V.;Simakin, S.Publication type:Article