Works matching DE "CATHODE sputtering (Plating process)"
Results: 27
Mechanical Properties of Sputter-Deposited Titanium-Silicon-Carbon Films.
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- Journal of the American Ceramic Society, 2001, v. 84, n. 3, p. 672, doi. 10.1111/j.1151-2916.2001.tb00724.x
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- Article
Properties of the Barium-Strontium Titanate Films Deposited onto the Silicon Substrate by rf Cathode Sputtering.
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- Technical Physics Letters, 2018, v. 44, n. 12, p. 1157, doi. 10.1134/S1063785018120568
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- Article
Single crystal aluminum deposit formation on isotropic substrates by means of self-organized ion sputtering.
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- Technical Physics Letters, 2006, v. 32, n. 10, p. 868, doi. 10.1134/S1063785006100154
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- Article
Fabrication and characterisation of NiO:Na/ZnO pn junction by magnetron sputtering technique.
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- Materials Research Innovations, 2014, v. 18, n. S4, p. 680, doi. 10.1179/1432891714Z.000000000759
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- Article
Electrolyte-as-Cathode Glow Discharge Emission and the Processes of Solution-to-Plasma Transport of Neutral and Charged Species.
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- High Energy Chemistry, 2004, v. 38, n. 3, p. 196, doi. 10.1023/B:HIEC.0000027659.13545.fb
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- Article
Synthesis of Copper Nanoparticles by Cathode Sputtering in Radio-frequency Plasma.
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- Journal of Nano- & Electronic Physics, 2018, v. 10, n. 3, p. 03010-1, doi. 10.21272/jnep.10(3).03010
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- Article
Hybrid Functional Calculation of Defects in Pseudo-binary Indium Oxynitride.
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- Journal of the Chinese Chemical Society, 2016, v. 63, n. 6, p. 539, doi. 10.1002/jccs.201500356
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- Article
DEPOSITION AND CHARACTERIZATION OF TiN-COATED STEELS AT VARIOUS N<sub>2</sub> GAS FLOW RATES WITH CONSTANT ETCHING BY USING CAPVD TECHNIQUE.
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- Surface Review & Letters, 2007, v. 14, n. 1, p. 93, doi. 10.1142/S0218625X07009104
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- Article
NANO-PARTICLES AND FILMS OF CARBON NITRIDE PREPARED BY USING THE SIMPLE PLASMA SPUTTERING DEPOSITION TECHNIQUES.
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- Surface Review & Letters, 2006, v. 13, n. 6, p. 847, doi. 10.1142/S0218625X06008943
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- Article
Composition, structure, and properties of tantalum boride nanostructured films.
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- Technical Physics, 2006, v. 51, n. 10, p. 1340, doi. 10.1134/S1063784206100136
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- Article
SIMULATION STUDY OF THE PROPERTIES OF TITANIUM COATING DEPOSITED ONTO POLYMER SUBSTRATES.
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- Journal of the Balkan Tribological Association, 2018, v. 24, n. 1, p. 41
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- Article
Observation of phase separation in magnetron sputter-deposited Al–Cu thin films.
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- Philosophical Magazine Letters, 2005, v. 85, n. 8, p. 439, doi. 10.1080/09500830500256629
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- Article
Improved physical properties of spray pyrolysed Al:CdO nanocrystalline thin films.
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- Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 5, p. 4426, doi. 10.1007/s10854-016-4313-z
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- Article
Voluminous high-density plasma generator based on high-current pulsed magnetron discharge.
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- Russian Physics Journal, 2012, v. 55, n. 2, p. 195, doi. 10.1007/s11182-012-9795-4
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- Article
Electrophysical properties of dielectric films in MDM-structures.
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- Russian Physics Journal, 2010, v. 53, n. 4, p. 331, doi. 10.1007/s11182-010-9423-0
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- Article
WATER TREATMENT SYSTEMS WITH THE USE OF MAGNETRON NANOSTRUCTURED COATINGS I-RU-O.
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- Smart Nanocomposites, 2015, v. 6, n. 2, p. 262
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- Article
Hard amorphous nanocomposite coatings with oxidation resistance above 1000°C.
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- Advances in Applied Ceramics: Structural, Functional & Bioceramics, 2008, v. 107, n. 3, p. 148, doi. 10.1179/174367508X306460
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- Article
Surface microrelief obtained by composed target deposition for LC molecules alignment.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2006, v. 9, n. 4, p. 58, doi. 10.15407/spqeo9.04.058
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- Article
Surface modification of NiTi alloy with tantalum to improve its biocompatibility and radiopacity.
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- 2006
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- Publication type:
- Letter
Electroless deposition of Ag on Pd-activated TiN/p-Si(100) substrate.
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- Applied Physics A: Materials Science & Processing, 2005, v. 81, n. 1, p. 137, doi. 10.1007/s00339-004-3067-2
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- Article
On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements.
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- 2015
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- Publication type:
- Editorial
Characterization of quaternary Zn/Sn-codoped GaN films obtained with Zn<sub><italic>x</italic></sub>Sn<sub>0.04</sub>GaN targets at different Zn contents by the RF reactive magnetron sputtering technology.
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- Journal of Materials Science, 2018, v. 53, n. 12, p. 9099, doi. 10.1007/s10853-018-2202-y
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- Article
Structure and Polarization Relaxation of Ba<sub>0.5</sub>Sr<sub>0.5</sub>Nb<sub>2</sub>O<sub>6</sub>/(001)Si Films.
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- Technical Physics, 2018, v. 63, n. 3, p. 407, doi. 10.1134/S1063784218030179
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- Article
Preparation and Electrochemical Performance of ZnO Films as Anode Materials for Li-Ion Batteries.
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- Acta Physica Polonica: A, 2013, v. 123, n. 2, p. 355, doi. 10.12693/APhysPolA.123.355
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- Article
Influence of Thermal Oxidation Temperatures on the Structural and Morphological Properties of MoO<sub>3</sub> Thin Films.
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- Acta Physica Polonica: A, 2013, v. 123, n. 2, p. 307, doi. 10.12693/APhysPolA.123.307
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- Article
Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications.
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- Acta Physica Polonica: A, 2012, v. 121, n. 1, p. 172, doi. 10.12693/APhysPolA.121.172
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- Article
Effects of Sputtering Parameters on AlN Film Growth on Flexible Hastelloy Tapes by Two-Step Deposition Technique.
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- Materials (1996-1944), 2016, v. 9, n. 8, p. 686, doi. 10.3390/ma9080686
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- Article