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Dynamics of oxide phases on the surface of single- and polycrystalline Pb<sub>1 − x</sub>Sn<sub>x</sub>Te films upon their investigation by the raman light scattering method.
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- Optics & Spectroscopy, 2013, v. 115, n. 5, p. 679, doi. 10.1134/S0030400X1311026X
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- Article
Morphology of Pb<sub>1− x </sub>Eu<sub>x</sub>Se epitaxial film surfaces after plasma treatment.
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- Russian Physics Journal, 2007, v. 50, n. 11, p. 1158, doi. 10.1007/s11182-007-0171-8
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- Article
Pore formation in aluminum films on macroporous silicon during high-temperature annealing.
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- Technical Physics Letters, 2008, v. 34, n. 2, p. 143, doi. 10.1134/S106378500802017X
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- Article
Formation of a Two-Sided Porous Structure during Electrochemical Silicon Etching by the Unno–Imai Method.
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- Technical Physics Letters, 2000, v. 26, n. 1, p. 12, doi. 10.1134/1.1262723
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- Article
Influence of short-term annealing on the conductivity of porous silicon and the transition resistivity of an aluminum-porous silicon contact.
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- Technical Physics Letters, 1998, v. 24, n. 3, p. 226, doi. 10.1134/1.1262063
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- Article
Some Results of Oceanological Video Monitoring.
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- Doklady Earth Sciences, 2018, v. 482, n. 1, p. 1244, doi. 10.1134/S1028334X18090283
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- Article
Specific Features of Vapor-Liquid-Solid Nanostructure Growth on the Surface of SnS Films during Plasma Treatment.
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- Semiconductors, 2017, v. 51, n. 13, p. 1728, doi. 10.1134/S1063782617130152
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- Article
Hopping conductivity in low-porosity mesoporous silicon formed on p <sup>+</sup>-Si:B.
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- Semiconductors, 2006, v. 40, n. 11, p. 1350, doi. 10.1134/S1063782606110170
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- Article
Tensoresistive Effect in Porous Silicon Layers with Different Morphology.
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- Semiconductors, 2004, v. 38, n. 5, p. 594, doi. 10.1134/1.1755898
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Classification of Electrical Properties of Porous Silicon.
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- Semiconductors, 2000, v. 34, n. 3, p. 353, doi. 10.1134/1.1187985
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- Article
Conductivity relaxation in coated porous silicon after annealing.
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- Semiconductors, 1999, v. 33, n. 4, p. 457, doi. 10.1134/1.1187710
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- Article
Formation of Metallic Droplets on the Surface of Indium Sulfide Films During Argon Plasma Treatment.
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- International Journal of Nanoscience, 2019, v. 18, n. 3/4, p. N.PAG, doi. 10.1142/S0219581X19400660
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- Article
Nanostructuring of the CIGS Films Surface by the Plasma Treatment with Low Ion Energy.
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- International Journal of Nanoscience, 2019, v. 18, n. 3/4, p. N.PAG, doi. 10.1142/S0219581X19400647
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- Article
Features of Raman Scattering in Lead Sulfide and Lead Sulfide-Selenide Epitaxial Films.
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- Optics & Spectroscopy, 2023, v. 131, n. 10, p. 975, doi. 10.1134/S0030400X23100065
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- Article
Modification of the Surface of Lead-Tin Telluride Films by Low-Energy Argon Ions.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2022, v. 16, n. 5, p. 876, doi. 10.1134/S1027451022050421
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- Article
Effect of Nanostructuring of the Surface of a Lead Sulfide Crystal in Plasma on the Optical Reflection Spectra.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2022, v. 16, n. 1, p. 134, doi. 10.1134/S1027451022010384
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- Article
Surface Modification of Pb1 –xSnxSe Films during Plasma Treatment Near the Sputtering Threshold.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2020, v. 14, n. 6, p. 1174, doi. 10.1134/S1027451020050213
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- Article
The Formation of Hollow Lead Structures on the Surface of PbSe Films Treated in Argon Plasma.
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- Technical Physics Letters, 2018, v. 44, n. 6, p. 518, doi. 10.1134/S1063785018060305
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- Article