Works by Zhilyaev, Yu. V.
Results: 28
Formation mechanism of contact resistance to III–N heterostructures with a high dislocation density.
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- Semiconductors, 2013, v. 47, n. 9, p. 1180, doi. 10.1134/S1063782613090212
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- Article
Sulfide passivation of III–V semiconductor surfaces: role of the sulfur ionic charge and of the reaction potential of the solution.
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- Technical Physics, 1998, v. 43, n. 8, p. 983, doi. 10.1134/1.1259113
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- Article
Photoluminescence of n-GaN: influence of chemical treatment of the surface using sulfide solutions.
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- Technical Physics Letters, 1998, v. 24, n. 12, p. 986, doi. 10.1134/1.1262343
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- Article
Behavior of epitaxial GaAs layers as α particle detectors.
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- Technical Physics Letters, 1998, v. 24, n. 4, p. 250, doi. 10.1134/1.1262073
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- Article
Effect of microwave radiation on I-V curves and contact resistivity of ohmic contacts to n-GaN and n-AlN.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2013, v. 16, n. 3, p. 289
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- Article
Investigation of resistance formation mechanisms for contacts to n-AlN and n-GaN with a high dislocation density.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2012, v. 15, n. 4, p. 351
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- Article
Nanorelief of a GaN Surface: the Effect of Sulfide Treatment.
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- Semiconductors, 2000, v. 34, n. 11, p. 1301, doi. 10.1134/1.1325427
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- Article
The Dislocation Origin and Model of Excess Tunnel Current in GaP p–n Structures.
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- Semiconductors, 2000, v. 34, n. 11, p. 1305, doi. 10.1134/1.1325428
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- Article
Study of the polarization photoluminescence of thick epitaxial GaN layers.
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- Semiconductors, 1999, v. 33, n. 7, p. 716, doi. 10.1134/1.1187767
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- Article
Sulfide passivation of GaAs power diodes.
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- Semiconductors, 1999, v. 33, n. 6, p. 662, doi. 10.1134/1.1187751
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- Article
Oscillations in the induced photopleochroism of In(Au)/Si thin-film structures.
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- Semiconductors, 1999, v. 33, n. 4, p. 412, doi. 10.1134/1.1187705
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- Article
Polarization photosensitivity of GaN/Si heterojunctions.
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- Semiconductors, 1999, v. 33, n. 3, p. 301, doi. 10.1134/1.1187683
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- Article
Photoelectric properties of GaN/GaP heterostructures.
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- Semiconductors, 1998, v. 32, n. 10, p. 1077, doi. 10.1134/1.1187571
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- Article
Tunnel excess current in nondegenerate barrier (p–n and m–s) silicon-containing III–V structures.
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- Semiconductors, 1997, v. 31, n. 2, p. 115, doi. 10.1134/1.1187092
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- Article
Generating broadband random Gaussian signals.
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- Technical Physics Letters, 2010, v. 36, n. 8, p. 733, doi. 10.1134/S106378501008016X
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- Article
Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy technology.
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- Technical Physics Letters, 2010, v. 36, n. 6, p. 496, doi. 10.1134/S1063785010060039
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- Article
High-temperature gallium phosphide dynistors.
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- Technical Physics Letters, 2009, v. 35, n. 9, p. 808, doi. 10.1134/S1063785009090077
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- Article
Binary acceptor doping of epitaxial gallium phosphide for high-temperature electronic devices.
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- Technical Physics Letters, 2008, v. 34, n. 10, p. 898, doi. 10.1134/S106378500810026X
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- Article
Chloride vapor-phase epitaxy of gallium nitride on silicon: Effect of a silicon carbide interlayer.
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- Technical Physics Letters, 2008, v. 34, n. 6, p. 479, doi. 10.1134/S1063785008060084
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- Article
Determination of the free carrier concentration in ultra-pure GaAs epilayers by a photoreflectance technique.
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- Technical Physics Letters, 2008, v. 34, n. 1, p. 37, doi. 10.1134/S1063785008010112
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- Article
Chloride vapor-phase epitaxy of gallium nitride on silicon: Structural and luminescent characteristics of epilayers.
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- Technical Physics Letters, 2006, v. 32, n. 8, p. 674, doi. 10.1134/S1063785006080116
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- Article
GaN Films Grown by Vapor-Phase Epitaxy in a Hydride–Chloride System on Si(111) Substrates with AlN Buffer Sublayers.
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- Technical Physics Letters, 2005, v. 31, n. 11, p. 915, doi. 10.1134/1.2136951
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- Article
Bulk GaN Layers Grown on Oxidized Silicon by Vapor-Phase Epitaxy in a Hydride–Chloride System.
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- Technical Physics Letters, 2005, v. 31, n. 5, p. 367, doi. 10.1134/1.1931770
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- Article
Correlation between the Electrical and Luminescent Properties of High-Purity Gallium Arsenide.
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- Technical Physics Letters, 2004, v. 30, n. 10, p. 810, doi. 10.1134/1.1813717
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- Article
Application of the Holographic Interferometer for Modeling of Processes in a Vapor Phase Epitaxy Reactor.
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- Technical Physics Letters, 2003, v. 29, n. 6, p. 521, doi. 10.1134/1.1589578
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- Article
Bulk Large-Area GaN Layers.
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- Technical Physics Letters, 2003, v. 29, n. 5, p. 400, doi. 10.1134/1.1579807
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- Article
High-Temperature Annealing of Bulk GaN Layers.
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- Technical Physics Letters, 2002, v. 28, n. 12, p. 994, doi. 10.1134/1.1535513
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- Article
Initial Stages of the GaN Growth on Oxidized Silicon.
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- Technical Physics Letters, 2001, v. 27, n. 12, p. 1010, doi. 10.1134/1.1432331
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- Article