Found: 11
Select item for more details and to access through your institution.
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process.
- Published in:
- Sensors (14248220), 2023, v. 23, n. 5, p. 2521, doi. 10.3390/s23052521
- By:
- Publication type:
- Article
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation.
- Published in:
- Sensors (14248220), 2022, v. 22, n. 15, p. 5871, doi. 10.3390/s22155871
- By:
- Publication type:
- Article
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics.
- Published in:
- Sensors (14248220), 2022, v. 22, n. 15, p. 5487, doi. 10.3390/s22155487
- By:
- Publication type:
- Article
Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe.
- Published in:
- Sensors (14248220), 2022, v. 22, n. 3, p. 1291, doi. 10.3390/s22031291
- By:
- Publication type:
- Article
Impact of Plasma Electron Flux on Plasma Damage‐Free Sputtering of Ultrathin Tin‐Doped Indium Oxide Contact Layer on <italic>p</italic>‐GaN for InGaN/GaN Light‐Emitting Diodes.
- Published in:
- Advanced Science, 2018, v. 5, n. 2, p. 1, doi. 10.1002/advs.201700637
- By:
- Publication type:
- Article
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes.
- Published in:
- Applied Sciences (2076-3417), 2020, v. 10, n. 20, p. 7066, doi. 10.3390/app10207066
- By:
- Publication type:
- Article
Control of nanoparticle size and amount by using the mesh grid and applying DC-bias to the substrate in silane ICP-CVD process.
- Published in:
- Journal of Nanoparticle Research, 2017, v. 19, n. 11, p. 1, doi. 10.1007/s11051-017-4068-3
- By:
- Publication type:
- Article
Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis.
- Published in:
- Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-25550-2
- By:
- Publication type:
- Article
Investigation into SiO 2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
- Published in:
- Nanomaterials (2079-4991), 2022, v. 12, n. 24, p. 4457, doi. 10.3390/nano12244457
- By:
- Publication type:
- Article
Influence of Additive N 2 on O 2 Plasma Ashing Process in Inductively Coupled Plasma.
- Published in:
- Nanomaterials (2079-4991), 2022, v. 12, n. 21, p. 3798, doi. 10.3390/nano12213798
- By:
- Publication type:
- Article
On Encapsulated Dielectric Barrier Discharge Plasma Sources for Radar Cross Section Reduction in Mobile Environments.
- Published in:
- Sensors (14248220), 2023, v. 23, n. 22, p. 9170, doi. 10.3390/s23229170
- By:
- Publication type:
- Article