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A Review of Simulation Modeling of the State Evaluation and Process Prediction of Plasma Processing under Atmospheric Pressure.
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- Nanomanufacturing & Metrology, 2024, v. 7, n. 1, p. 1, doi. 10.1007/s41871-024-00234-9
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- Article
Properties of ScAlMgO 4 as Substrate for Nitride Semiconductors.
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- Crystals (2073-4352), 2023, v. 13, n. 3, p. 449, doi. 10.3390/cryst13030449
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- Article
Adhesive-Free Adhesion between Plasma-Treated Glass-Cloth-Containing Polytetrafluoroethylene (GC–PTFE) and Stainless Steel: Comparison between GC–PTFE and Pure PTFE.
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- Polymers (20734360), 2022, v. 14, n. 3, p. 394, doi. 10.3390/polym14030394
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Effects of He and Ar Heat-Assisted Plasma Treatments on the Adhesion Properties of Polytetrafluoroethylene (PTFE).
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- Polymers (20734360), 2021, v. 13, n. 23, p. 4266, doi. 10.3390/polym13234266
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- Article
Special Issue on Advanced Precision Engineering for Digital Transformation.
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- International Journal of Automation Technology, 2021, v. 15, n. 6, p. 753, doi. 10.20965/ijat.2021.p0753
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- Article
Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate.
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- Scientific Reports, 2020, v. 10, n. 1, p. N.PAG, doi. 10.1038/s41598-020-76430-6
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- Article
Strong Biomimetic Immobilization of Pt-Particle Catalyst on ABS Substrate Using Polydopamine and Its Application for Contact-Lens Cleaning with H2O2.
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- Nanomaterials (2079-4991), 2020, v. 10, n. 1, p. 114, doi. 10.3390/nano10010114
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- Article
Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing.
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- Nanomanufacturing & Metrology, 2019, v. 2, n. 3, p. 140, doi. 10.1007/s41871-019-00043-5
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- Article
Etching Characteristics of Quartz Crystal Wafers Using Argon-Based Atmospheric Pressure CF<sub>4</sub> Plasma Stabilized by Ethanol Addition.
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- Nanomanufacturing & Metrology, 2019, v. 2, n. 3, p. 168, doi. 10.1007/s41871-019-00044-4
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- Article
Improved Catalytic Durability of Pt-Particle/ABS for H2O2 Decomposition in Contact Lens Cleaning.
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- Nanomaterials (2079-4991), 2019, v. 9, n. 3, p. 342, doi. 10.3390/nano9030342
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- Article
Adhesive-free adhesion between heat-assisted plasma-treated fluoropolymers (PTFE, PFA) and plasma-jet-treated polydimethylsiloxane (PDMS) and its application.
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- Scientific Reports, 2018, v. 8, n. 1, p. 1, doi. 10.1038/s41598-018-36469-y
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- Article
Radiolytic Synthesis of Pt-Particle/ABS Catalysts for H<sub>2</sub>O<sub>2</sub> Decomposition in Contact Lens Cleaning.
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- Nanomaterials (2079-4991), 2017, v. 7, n. 9, p. 235, doi. 10.3390/nano7090235
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- Article
Preliminary study on atmosphericpressure plasma-based chemical dry figuring and finishing of reactionsintered silicon carbide.
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- Optical Engineering, 2016, v. 55, n. 10, p. 105102-1, doi. 10.1117/1.OE.55.10.105102
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Efficient processing of reaction-sintered silicon carbide by anodically oxidation-assisted polishing.
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- Optical Engineering, 2015, v. 54, n. 10, p. 105113-1, doi. 10.1117/1.OE.54.10.105113
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Mechanism analysis on finishing of reaction-sintered silicon carbide by combination of water vapor plasma oxidation and ceria slurry polishing.
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- Optical Engineering, 2015, v. 54, n. 5, p. 1, doi. 10.1117/1.OE.54.5.055106
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- Article
Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001).
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- Scientific Reports, 2015, p. 8947, doi. 10.1038/srep08947
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- Article
Characterization of 4H-SiC (0001) surface processed by plasma-assisted polishing.
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- International Journal of Advanced Manufacturing Technology, 2014, v. 72, n. 1-4, p. 1, doi. 10.1007/s00170-012-4430-7
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Fundamental research on the label-free detection of protein adsorption using near-infrared light-responsive plasmonic metal nanoshell arrays with controlled nanogap.
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- Nanoscale Research Letters, 2013, n. 6, p. 1, doi. 10.1186/1556-276X-8-274
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- Article
Breaking the 10 nm barrier in hard-X-ray focusing.
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- Nature Physics, 2010, v. 6, n. 2, p. 122, doi. 10.1038/nphys1457
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Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics.
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- Journal of Synchrotron Radiation, 2004, v. 11, n. 4, p. 343, doi. 10.1107/S090904950401283X
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Nearly diffraction-limited line focusing of a hard X-ray beam with an elliptically figured mirror.
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- Journal of Synchrotron Radiation, 2002, v. 9, n. 5, p. 313, doi. 10.1107/S0909049502012578
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- Article