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On the Phase Transformations and Field-Emission Properties of Diamond and Graphite Structures upon the Ion Implantation of Nitrogen.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2019, v. 13, n. 4, p. 752, doi. 10.1134/S1027451019040189
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Influence of a Carbon-Modified Surface on the Field-Emission Properties of Silicon Crystals.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2018, v. 12, n. 5, p. 1013, doi. 10.1134/S1027451018050361
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Dissipative Transport and Field Emission of Electrons in 2D Carbon Heterostructures with a Quantum Barrier.
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- Journal of Communications Technology & Electronics, 2023, v. 68, n. 10, p. 1226, doi. 10.1134/S1064226923100200
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Field Emission of Electrons of Multi-Point Cathode Matrices in Strong Pulse Electric Fields.
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- Journal of Communications Technology & Electronics, 2022, v. 67, n. 2, p. 193, doi. 10.1134/S1064226922020152
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Microstructural Modifications of Diamond-Graphite Nanocomposites for High-Current Field Electron Sources.
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- Journal of Communications Technology & Electronics, 2019, v. 64, n. 12, p. 1431, doi. 10.1134/S1064226919120180
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- Article
Field Emission Properties of Surface-Modified Silicon Crystals of Different Types of Conduction.
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- Journal of Communications Technology & Electronics, 2019, v. 64, n. 3, p. 265, doi. 10.1134/S1064226919030203
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- Article
Effect of Plasma-Chemical Surface Modification on the Electron Transport and Work Function in Silicon Crystals.
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- Semiconductors, 2019, v. 53, n. 1, p. 14, doi. 10.1134/S106378261901024X
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- Article
Effect of High-Dose Carbon Implantation on the Phase Composition, Morphology, and Field-Emission Properties of Silicon Crystals.
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- Semiconductors, 2018, v. 52, n. 9, p. 1104, doi. 10.1134/S1063782618090245
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Use of the Atomic Structure of Silicon Crystals to Obtain Multi-Tip Field-Emission Sources of Electrons.
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- Semiconductors, 2018, v. 52, n. 2, p. 137, doi. 10.1134/S1063782618020239
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- Article
Surface nanostructuring in the carbon-silicon(100) system upon microwave plasma treatment.
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- Semiconductors, 2017, v. 51, n. 4, p. 531, doi. 10.1134/S1063782617040236
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Formation of field-emission emitters by microwave plasma-chemical synthesis of nanocarbon structures.
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- Semiconductors, 2016, v. 50, n. 13, p. 1726, doi. 10.1134/S106378261613011X
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- Article
Morphological stability of the atomically clean surface of silicon (100) crystals after microwave plasma-chemical processing.
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- Semiconductors, 2016, v. 50, n. 1, p. 54, doi. 10.1134/S106378261601022X
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- Article
On precursor self-organization upon the microwave vacuum-plasma deposition of submonolayer carbon coatings on silicon (100) crystals.
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- Semiconductors, 2015, v. 49, n. 3, p. 319, doi. 10.1134/S1063782615030239
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- Article
Formation of built-in potential in Si (100) crystals under microwave plasma treatment.
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- Semiconductors, 2014, v. 48, n. 4, p. 511, doi. 10.1134/S1063782614040277
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- Article
Relaxation-induced self-organization of a silicon crystal surface under microwave plasma micromachining.
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- Semiconductors, 2013, v. 47, n. 4, p. 469, doi. 10.1134/S1063782613040192
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Structurization of submonolayer carbon coatings deposited in a low-pressure microwave plasma on single-crystal silicon.
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- Semiconductors, 2011, v. 45, n. 11, p. 1483, doi. 10.1134/S1063782611110248
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Formation of atomically clean silicon surfaces in a low-energy low-pressure microwave plasma.
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- Technical Physics, 2009, v. 54, n. 12, p. 1795, doi. 10.1134/S1063784209120135
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Self-organization of diamond nanocrystallites in a low-pressure microwave plasma.
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- Technical Physics, 2007, v. 52, n. 1, p. 75, doi. 10.1134/S1063784207010136
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Production of nanodiamond composites in a low-pressure microwave gas-discharge plasma.
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- Technical Physics, 2006, v. 51, n. 1, p. 40, doi. 10.1134/S1063784206010063
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Effect of Technological Parameters on the Structure and Surface Morphology of Carbon Films.
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- Technical Physics, 2000, v. 45, n. 5, p. 656, doi. 10.1134/1.1259697
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Effect of temperature on the formation of silicon nanoislands on noncrystalline substrates in microwave low-pressure gas discharge plasma.
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- Technical Physics Letters, 2008, v. 34, n. 1, p. 72, doi. 10.1134/S1063785008010227
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Migration healing of surface relief during the formation of nanocrystals in a microwave low-pressure gas discharge.
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- Technical Physics Letters, 2007, v. 33, n. 11, p. 933, doi. 10.1134/S1063785007110120
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Effect of elastic interactions on the formation of silicon nanocrystals on noncrystalline substrates in microwave low-pressure gas discharge plasma.
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- Technical Physics Letters, 2007, v. 33, n. 4, p. 284, doi. 10.1134/S1063785007040049
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The Effect of Microtopography and Deposition Regime on the Field Emission Properties of Graphitelike Carbon Films.
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- Technical Physics Letters, 2002, v. 28, n. 12, p. 975, doi. 10.1134/1.1535506
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Photoelectric Properties of Planar Structures with Double Schottky Barrier Treated in a High-Vacuum Microwave Discharge.
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- Technical Physics Letters, 2002, v. 28, n. 8, p. 625, doi. 10.1134/1.1505531
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The Effect of Doping on the Electron Properties of Carbon Films.
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- Technical Physics Letters, 2002, v. 28, n. 7, p. 602, doi. 10.1134/1.1498799
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The Kinetics of a Diamond-Like Film Growth in a Microwave Gas Discharge Plasma.
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- Technical Physics Letters, 2001, v. 27, n. 8, p. 656, doi. 10.1134/1.1398959
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- Article
The Formation of a Nondiamond Carbon Phase in a Microwave Gas Discharge Plasma under Electron Cyclotron Resonance Conditions.
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- Technical Physics Letters, 2000, v. 26, n. 9, p. 841, doi. 10.1134/1.1315514
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Formation of a diamond-like phase under conditions of preferential deposition of nondiamond carbon in a microwave gas discharge plasma with electron cyclotron resonance.
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- Technical Physics Letters, 1998, v. 24, n. 2, p. 135, doi. 10.1134/1.1262024
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Pulsed and Static Field Emission VAC of Carbon Nanocluster Structures: Experiment and Its Interpretation.
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- Technical Physics, 2019, v. 64, n. 8, p. 1210, doi. 10.1134/S106378421908005X
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Tunnel Emission from Nanostructured Field-Emission Array Cathodes with a Fluorine–Carbon Coating.
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- Technical Physics, 2019, v. 64, n. 6, p. 897, doi. 10.1134/S1063784219060240
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- Article
Field-Emission Staggered Structure Based on Diamond-Graphite Clusters.
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- Technical Physics, 2018, v. 63, n. 2, p. 274, doi. 10.1134/S106378421802010X
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- Article
Ion Modification of the Field-Emission Properties of Diamond–Graphite Film Structures.
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- Technical Physics, 2018, v. 63, n. 1, p. 126, doi. 10.1134/S1063784218010292
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Influence of electron saturation of Tamm levels on the field-emission properties of silicon crystals.
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- Technical Physics, 2017, v. 62, n. 10, p. 1585, doi. 10.1134/S1063784217100243
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- Article
Kinetics of structuring of submonolayer carbon coatings on silicon (100) crystals during microwave vacuum-plasma deposition.
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- Technical Physics, 2015, v. 60, n. 6, p. 848, doi. 10.1134/S1063784215060286
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Influence of microwave plasma microprocessing on the electronic properties of the (100)Si surface.
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- Technical Physics, 2014, v. 59, n. 3, p. 411, doi. 10.1134/S1063784214030281
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Nanomorphological characteristics of the single-crystal Si(100) surface subjected to microwave plasma processing at weak adsorption.
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- Technical Physics, 2013, v. 58, n. 4, p. 557, doi. 10.1134/S1063784213040221
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Nanostructuring of the submonolayer carbon coatings deposited onto the surface of silicon single crystals in a low-pressure microwave discharge plasma.
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- Technical Physics, 2012, v. 57, n. 8, p. 1115, doi. 10.1134/S1063784212080233
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Mechanism of Field Electron Emission by a Field Cathode Coated with a Tunnel-Thin Diamond Film.
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- Technical Physics Letters, 2020, v. 46, n. 5, p. 501, doi. 10.1134/S1063785020050302
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- Article
Autoemission of Multipointed Cathode Matrices Based on p-Type Silicon in Strong Pulsed Electric Fields.
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- Technical Physics Letters, 2019, v. 45, n. 5, p. 423, doi. 10.1134/S106378501905016X
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The Influence of Dipole Polarization of an Emitting Surface on Autoemission Thresholds of a Multitip Silicon Cathode Matrices.
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- Technical Physics Letters, 2018, v. 44, n. 7, p. 585, doi. 10.1134/S1063785018070143
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The Influence of the Surface Neutralization of Active Impurities on the Field-Electron Emission Properties of p-Type Silicon Crystals.
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- Technical Physics Letters, 2017, v. 43, n. 12, p. 1132, doi. 10.1134/S1063785017120288
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Fabrication and diagnostics of planar cellular carbon structures.
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- Technical Physics Letters, 2015, v. 41, n. 7, p. 658, doi. 10.1134/S1063785015070159
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Influence of the microwave plasma deposition regime on the field-electron emission characteristics of nanodiamond-graphite composite films.
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- Technical Physics Letters, 2015, v. 41, n. 5, p. 489, doi. 10.1134/S1063785015050223
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- Article
Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma.
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- Technical Physics Letters, 2014, v. 40, n. 4, p. 280, doi. 10.1134/S1063785014040130
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Features of surface structuring of silicon (100) crystals by microwave plasma treatment in different gas environments.
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- Technical Physics Letters, 2013, v. 39, n. 5, p. 405, doi. 10.1134/S1063785013050106
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Field-emission diode with tangential current takeoff from thin-film nanodiamond/graphite emitter.
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- Technical Physics Letters, 2011, v. 37, n. 6, p. 534, doi. 10.1134/S1063785011060137
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- Article