Found: 3

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  • 193 nm resists and lithography.

    Published in:
    Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 12, doi. 10.1002/pat.1994.220050103
    By:
    • Kunz, Roderick R.;
    • Allen, Robert D.;
    • Hartney, Mark A.;
    • Hinsberg, William D.;
    • Horn, Mark W.;
    • Keast, Craig L.;
    • Rothschild, Mordechai;
    • Shaver, David C.;
    • Wallraff, Gregory M.
    Publication type:
    Article

  • Acid-catalyzed single-layer resists for ArF lithography.

    Published in:
    Optical Engineering, 1993, v. 32, n. 10, p. 2363, doi. 10.1117/12.145955
    By:
    • Kunz, Roderick R.;
    • Allen, Robert D.;
    • Hinsberg, William D.;
    • Wallraff, Gregory M.
    Publication type:
    Article

  • Placement and orientation of individual DNA shapes on lithographically patterned surfaces.

    Published in:
    Nature Nanotechnology, 2009, v. 4, n. 9, p. 557, doi. 10.1038/nnano.2009.220
    By:
    • Kershner, Ryan J.;
    • Bozano, Luisa D.;
    • Micheel, Christine M.;
    • Hung, Albert M.;
    • Fornof, Ann R.;
    • Cha, Jennifer N.;
    • Rettner, Charles T.;
    • Bersani, Marco;
    • Frommer, Jane;
    • Rothemund, Paul W. K.;
    • Wallraff, Gregory M.
    Publication type:
    Article