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Works matching AU Wallraff, Gregory M.

Results: 3

1

193 nm resists and lithography.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 12, doi. 10.1002/pat.1994.220050103

By:

Kunz, Roderick R.;
Allen, Robert D.;
Hartney, Mark A.;
Hinsberg, William D.;
Horn, Mark W.;
Keast, Craig L.;
Rothschild, Mordechai;
Shaver, David C.;
Wallraff, Gregory M.

Publication type:

Article

2

Placement and orientation of individual DNA shapes on lithographically patterned surfaces.

Published in:

Nature Nanotechnology, 2009, v. 4, n. 9, p. 557, doi. 10.1038/nnano.2009.220

By:

Kershner, Ryan J.;
Bozano, Luisa D.;
Micheel, Christine M.;
Hung, Albert M.;
Fornof, Ann R.;
Cha, Jennifer N.;
Rettner, Charles T.;
Bersani, Marco;
Frommer, Jane;
Rothemund, Paul W. K.;
Wallraff, Gregory M.

Publication type:

Article

3

Acid-catalyzed single-layer resists for ArF lithography.

Published in:

Optical Engineering, 1993, v. 32, n. 10, p. 2363, doi. 10.1117/12.145955

By:

Kunz, Roderick R.;
Allen, Robert D.;
Hinsberg, William D.;
Wallraff, Gregory M.

Publication type:

Article