Works by UTHANNA, S.

Results: 32

STRUCTURAL AND ELECTRICAL PROPERTIES OF RF MAGNETRON SPUTTERED TANTALUM OXIDE FILMS.

Published in:

International Journal of Nanoscience, 2011, v. 10, n. 4/5, p. 749, doi. 10.1142/S0219581X11008952

By:

CHANDRA, S. V. JAGADEESH;
PARK, D. S.;
UTHANNA, S.;
CHOI, CHEL-JONG;
REDDY, A. GURUVA

Publication type:

Article

OXYGEN PARTIAL PRESSURE AND SUBSTRATE BIAS VOLTAGE INFLUENCED STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED Ag2Cu2O3 FILMS.

Published in:

International Journal of Nanoscience, 2011, v. 10, n. 4/5, p. 653, doi. 10.1142/S0219581X11009209

By:

UTHANNA, S.;
REDDY, M. HARI PRASAD;
PIERSON, J. F.

Publication type:

Article

POST-DEPOSITION ANNEALING INFLUENCED STRUCTURAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED TiO2 FILMS.

Published in:

International Journal of Nanoscience, 2011, v. 10, n. 1/2, p. 279, doi. 10.1142/S0219581X11007922

By:

UTHANNA, S.;
KONDAIAH, P.;
SEKHAR, M. CHANDRA;
REDDY, R. SUBBA;
RAO, G. MOHAN

Publication type:

Article

Influence of sputtering power on the physical properties of magnetron sputtered molybdenum oxide films.

Published in:

Journal of Materials Science: Materials in Electronics, 2010, v. 21, n. 1, p. 45, doi. 10.1007/s10854-009-9867-6

By:

Nirupama, V.;
Uthanna, S.

Publication type:

Article

Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films.

Published in:

Journal of Materials Science: Materials in Electronics, 2009, v. 20, n. 4, p. 295, doi. 10.1007/s10854-008-9723-0

By:

Chandra, S. V. Jagadeesh;
Chandrasekhar, M.;
Rao, G. Mohan;
Uthanna, S.

Publication type:

Article

Copper nitride films deposited by dc reactive magnetron sputtering.

Published in:

Journal of Materials Science: Materials in Electronics, 2007, v. 18, n. 10, p. 1003, doi. 10.1007/s10854-007-9120-0

By:

Reddy, K. Venkata Subba;
Reddy, A. Sivasankar;
Reddy, P. Sreedhara;
Uthanna, S.

Publication type:

Article

Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films.

Published in:

Journal of Nanotechnology, 2011, p. 1, doi. 10.1155/2011/986021

By:

Reddy, P. Narayana;
Sreedhar, A.;
Reddy, M. Hari Prasad;
Uthanna, S.;
Pierson, J. F.

Publication type:

Article

Influence of substrate and selenization temperatures on the growth of CuSnSe films.

Published in:

Journal of Materials Science, 2011, v. 46, n. 21, p. 6952, doi. 10.1007/s10853-011-5661-y

By:

Hema Chandra, G.;
Lakshmana Kumar, O.;
Prasada Rao, R.;
Uthanna, S.

Publication type:

Article

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures.

Published in:

ISRN Otolaryngology, 2014, p. 1, doi. 10.1155/2014/684317

By:

Reddy, P. Narayana;
Reddy, M. Hari Prasad;
Pierson, J. F.;
Uthanna, S.

Publication type:

Article

Improving the grain size of Cu2ZnSnS4 thin films by annealing thermally evaporated Cu-ZnS-Sn-S precursors.

Published in:

Journal of Materials Science: Materials in Electronics, 2019, v. 30, n. 5, p. 4931, doi. 10.1007/s10854-019-00788-1

By:

Chalapathi, U.;
Scarpulla, M. A.;
Park, Si-Hyun;
Uthanna, S.;
Raja, V. Sundara

Publication type:

Article

Growth of $$\hbox {Cu}_{2}\hbox {ZnSnS}_{4}$$ thin films by co-evaporation-annealing route: effect of annealing temperature and duration.

Published in:

Journal of Materials Science: Materials in Electronics, 2018, v. 29, n. 2, p. 1048, doi. 10.1007/s10854-017-8005-0

By:

Chalapathi, U.;
Uthanna, S.;
Sundara Raja, V.

Publication type:

Article

Investigations on morphological and electrical studies of sputtered MoO films.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 4, p. 3668, doi. 10.1007/s10854-015-4206-6

By:

Nirupama, V.;
Uthanna, S.

Publication type:

Article

Effect of annealing temperature on the properties of spray deposited Cu2 Sn S3 thin films.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2013, v. 210, n. 11, p. 2384, doi. 10.1002/pssa.201329157

By:

Chalapathi, U.;
Jayasree, Y.;
Uthanna, S.;
Sundara Raja, V.

Publication type:

Article

Structural, surface morphological, and optical properties of nanocrystalline Cu2O and CuO films formed by RF magnetron sputtering: Oxygen partial pressure effect.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2012, v. 209, n. 7, p. 1279, doi. 10.1002/pssa.201127627

By:

Hari Prasad Reddy, M.;
Pierson, J. F.;
Uthanna, S.

Publication type:

Article

Influence of Sm Doping on the Structural, Optical, and Magnetic Properties of ZnO Nanopowders.

Published in:

Journal of Superconductivity & Novel Magnetism, 2017, v. 30, n. 7, p. 1937, doi. 10.1007/s10948-017-3992-x

By:

Sekhar, M.;
Chalapthi, U.;
Madhu Smitha, V.;
Poojitha, P.;
Uthanna, S.;
Poornaprakash, B.

Publication type:

Article

Influence of oxygen partial pressure on the structural, optical and electrical properties of magnetron sputtered Zr0.7Nb0.3O2 films.

Published in:

Applied Physics A: Materials Science & Processing, 2021, v. 127, n. 12, p. 1, doi. 10.1007/s00339-021-05136-x

By:

Naik, B. Gopal;
Chandra, S. V. Jagadeesh;
Uthanna, S.

Publication type:

Article

Structural, microstructural and optical properties of $$\hbox {Cu}_{2}\hbox {ZnSnS}_{4}$$ thin films prepared by thermal evaporation: effect of substrate temperature and annealing.

Published in:

Bulletin of Materials Science, 2017, v. 40, n. 5, p. 887, doi. 10.1007/s12034-017-1439-4

By:

Chalapathi, U;
Uthanna, S;
Raja, V

Publication type:

Article

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films.

Published in:

Crystal Research & Technology, 2012, v. 47, n. 10, p. 1095, doi. 10.1002/crat.201200150

By:

Reddy, R. Subba;
Reddy, A. Sivasankar;
Radhakrishna, B.;
Uthanna, S.

Publication type:

Article

Growth, electrical and optical behaviour of nanocrystalline Ag2Cu2O3 films produced by RF magnetron sputtering.

Published in:

Crystal Research & Technology, 2011, v. 46, n. 12, p. 1329, doi. 10.1002/crat.201100306

By:

Hari Prasad Reddy, M.;
Pierson, J. F.;
Uthanna, S.

Publication type:

Article

The effect of oxygen partial pressure on physical properties of nano-crystalline silver oxide thin films deposited by RF magnetron sputtering.

Published in:

Crystal Research & Technology, 2011, v. 46, n. 9, p. 961, doi. 10.1002/crat.201100206

By:

Narayana Reddy, P.;
Sreedhar, A.;
Hari Prasad Reddy, M.;
Uthanna, S.;
Pierson, J. F.

Publication type:

Article

Characteristics of Al/p-Cu.

Published in:

Crystal Research & Technology, 2001, v. 36, n. 6, p. 571, doi. 10.1002/1521-4079(200107)36:6<571::AID-CRAT571>3.0.CO;2-R

By:

Rao, G. Venkata;
Chandra, G. Hema;
Hussain, O.M.;
Uthanna, S.;
Srinivasulu Naidu, B.

Publication type:

Article

Physical Properties of Zinc Oxide Films Prepared by dc Reactive Magnetron Sputtering at Different Sputtering Pressures.

Published in:

Crystal Research & Technology, 2000, v. 35, n. 10, p. 1193, doi. 10.1002/1521-4079(200010)35:10<1193::AID-CRAT1193>3.0.CO;2-6

By:

Subramanyam, T.K.;
Srinivasulu Naidu, B.;
Uthanna, S.

Publication type:

Article

Structure and Optical Properties of dc Reactive Magnetron Sputtered Zinc Oxide Films.

Published in:

Crystal Research & Technology, 1999, v. 34, n. 8, p. 981, doi. 10.1002/(SICI)1521-4079(199909)34:8<981::AID-CRAT981>3.0.CO;2-G

By:

Subramanyam, T. K.;
Srinivasulu Naidu, B.;
Uthanna, S.

Publication type:

Article

Investigations on Compositional, Structural and Optical Properties of Thermally Oxidized HfO2 Films.

Published in:

Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ), 2022, v. 47, n. 6, p. 7541, doi. 10.1007/s13369-021-06218-x

By:

Venkataiah, S.;
Chandra, S. V. Jagadeesh;
Babu, M. Vasu;
Uthanna, S.

Publication type:

Article

Substrate temperature influenced ZrO2 films for MOS devices.

Published in:

Surface & Interface Analysis: SIA, 2020, v. 52, n. 9, p. 541, doi. 10.1002/sia.6775

By:

Kondaiah, Paruchuri;
Jagadeesh Chandra, S.V.;
Fortunato, Elvira;
Chel Jong, Choi;
Mohan Rao, G.;
Koti Reddy, D.V. Rama;
Uthanna, S.

Publication type:

Article

Influence of sputter power on structural and electrical properties of TiO2 films for Al/TiO2/Si gate capacitors.

Published in:

Surface & Interface Analysis: SIA, 2014, v. 46, n. 7, p. 465, doi. 10.1002/sia.5538

By:

Chandra Sekhar, M.;
Nanda Kumar Reddy, N.;
Venkata Rao, B.;
Mohan Rao, G.;
Uthanna, S.

Publication type:

Article

Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric.

Published in:

Surface & Interface Analysis: SIA, 2012, v. 44, n. 9, p. 1299, doi. 10.1002/sia.5024

By:

Chandra Sekhar, M.;
Kondaiah, P.;
Jagadeesh Chandra, S. V.;
Mohan Rao, G.;
Uthanna, S.

Publication type:

Article

Growth of MoO3 Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties.

Published in:

ISRN Condensed Matter Physics, 2013, p. 1, doi. 10.1155/2013/806374

By:

Subbarayudu, S.;
Madhavi, V.;
Uthanna, S.

Publication type:

Article

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering.

Published in:

ISRN Condensed Matter Physics, 2013, p. 1, doi. 10.1155/2013/527341

By:

Sreedhar, A.;
Reddy, M. Hari Prasad;
Uthanna, S.;
Pierson, J. F.

Publication type:

Article

Structural, Electrical, and Optical Properties of Reactively Sputtered Ag-Cu-O Films.

Published in:

ISRN Condensed Matter Physics, 2012, p. 1, doi. 10.5402/2012/293032

By:

Reddy, P. Narayana;
Sreedhar, A.;
Reddy, M. Hari Prasad;
Uthanna, S.

Publication type:

Article

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures.

Published in:

ISRN Optics, 2014, p. 1, doi. 10.1155/2014/684317

By:

Reddy, P. Narayana;
Reddy, M. Hari Prasad;
Pierson, J. F.;
Uthanna, S.

Publication type:

Article

Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films.

Published in:

ISRN Optics, 2012, p. 1, doi. 10.5402/2012/801468

By:

Madhavi, V.;
Kondaiah, P.;
Hussain, O. M.;
Uthanna, S.

Publication type:

Article

Works by UTHANNA, S.

STRUCTURAL AND ELECTRICAL PROPERTIES OF RF MAGNETRON SPUTTERED TANTALUM OXIDE FILMS.

OXYGEN PARTIAL PRESSURE AND SUBSTRATE BIAS VOLTAGE INFLUENCED STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED Ag<sub>2</sub>Cu<sub>2</sub>O<sub>3</sub> FILMS.

POST-DEPOSITION ANNEALING INFLUENCED STRUCTURAL AND OPTICAL PROPERTIES OF RF MAGNETRON SPUTTERED TiO<sub>2</sub> FILMS.

Influence of sputtering power on the physical properties of magnetron sputtered molybdenum oxide films.

Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta<sub>2</sub>O<sub>5</sub> films.

Copper nitride films deposited by dc reactive magnetron sputtering.

Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films.

Influence of substrate and selenization temperatures on the growth of CuSnSe films.

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures.

Improving the grain size of Cu2ZnSnS4 thin films by annealing thermally evaporated Cu-ZnS-Sn-S precursors.

Growth of $$\hbox {Cu}_{2}\hbox {ZnSnS}_{4}$$ thin films by co-evaporation-annealing route: effect of annealing temperature and duration.

Investigations on morphological and electrical studies of sputtered MoO films.

Effect of annealing temperature on the properties of spray deposited Cu<sub>2</sub> Sn S<sub>3</sub> thin films.

Structural, surface morphological, and optical properties of nanocrystalline Cu<sub>2</sub>O and CuO films formed by RF magnetron sputtering: Oxygen partial pressure effect.

Influence of Sm Doping on the Structural, Optical, and Magnetic Properties of ZnO Nanopowders.

Influence of oxygen partial pressure on the structural, optical and electrical properties of magnetron sputtered Zr<sub>0.7</sub>Nb<sub>0.3</sub>O<sub>2</sub> films.

Structural, microstructural and optical properties of $$\hbox {Cu}_{2}\hbox {ZnSnS}_{4}$$ thin films prepared by thermal evaporation: effect of substrate temperature and annealing.

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films.

Growth, electrical and optical behaviour of nanocrystalline Ag<sub>2</sub>Cu<sub>2</sub>O<sub>3</sub> films produced by RF magnetron sputtering.

The effect of oxygen partial pressure on physical properties of nano-crystalline silver oxide thin films deposited by RF magnetron sputtering.

Characteristics of Al/p-Cu.

Physical Properties of Zinc Oxide Films Prepared by dc Reactive Magnetron Sputtering at Different Sputtering Pressures.

Structure and Optical Properties of dc Reactive Magnetron Sputtered Zinc Oxide Films.

Investigations on Compositional, Structural and Optical Properties of Thermally Oxidized HfO<sub>2</sub> Films.

Substrate temperature influenced ZrO<sub>2</sub> films for MOS devices.

Influence of sputter power on structural and electrical properties of TiO<sub>2</sub> films for Al/TiO<sub>2</sub>/Si gate capacitors.

Substrate temperature influenced physical properties of silicon MOS devices with TiO<sub>2</sub> gate dielectric.

Growth of MoO<sub>3</sub> Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties.

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO<sub>2</sub> Films Formed by RF Magnetron Sputtering.

Structural, Electrical, and Optical Properties of Reactively Sputtered Ag-Cu-O Films.

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures.

Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films.