Found: 9
Select item for more details and to access through your institution.
Novel Coating Systems and Surface Technologies for Continuous Processing of Steel Sheet.
- Published in:
- Advanced Engineering Materials, 2001, v. 3, n. 9, p. 681, doi. 10.1002/1527-2648(200109)3:9<681::AID-ADEM681>3.0.CO;2-C
- By:
- Publication type:
- Article
Abprodukte und Abgasentsorgung von Fluor- und Chlorverbindungen aus plasmachemischen Prozessen.
- Published in:
- Vakuum in Forschung und Praxis, 1992, v. 4, n. 1, p. 43, doi. 10.1002/vipr.2230040111
- By:
- Publication type:
- Article
Nb redeposition on Si during plasma etching of Nb/SiO.
- Published in:
- Crystal Research & Technology, 1987, v. 22, n. 8, p. 1009, doi. 10.1002/crat.2170220804
- By:
- Publication type:
- Article
Plasma Etching of Niobium-SiO.
- Published in:
- Crystal Research & Technology, 1986, v. 21, n. 4, p. 477, doi. 10.1002/crat.2170210409
- By:
- Publication type:
- Article
Dry Patterning of Al and Al Alloys.
- Published in:
- Crystal Research & Technology, 1986, v. 21, n. 3, p. 407, doi. 10.1002/crat.2170210315
- By:
- Publication type:
- Article
Reactivity of CCl.
- Published in:
- Crystal Research & Technology, 1983, v. 18, n. 6, p. 813, doi. 10.1002/crat.2170180616
- By:
- Publication type:
- Article
Problems of surface morphology and layer deposition during plasma etching processes (III) SiO.
- Published in:
- Crystal Research & Technology, 1982, v. 17, n. 9, p. K87, doi. 10.1002/crat.2170170918
- By:
- Publication type:
- Article
Problems of Surface Morphology and Layer Deposition during Plasma Etching Processes (II) Si-etching in CF.
- Published in:
- Crystal Research & Technology, 1982, v. 17, n. 7, p. 821, doi. 10.1002/crat.2170170706
- By:
- Publication type:
- Article
Emissionspectroscopic Investigations On SiCl<sub>4</sub> and Ccl<sub>4</sub>Si Plasmas for Etching Processes.
- Published in:
- Contributions to Plasma Physics, 1990, v. 30, n. 5, p. 703, doi. 10.1002/ctpp.2150300515
- By:
- Publication type:
- Article