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Electron-beam-deposited Mo/Si and Mo<sub>x</sub>Si<sub>y</sub>/Si multilayer x-ray mirrors and gratings.
Published in:
Optical Engineering, 1994, v. 33, n. 4, p. 1314, doi. 10.1117/12.163207
By:
- Schmiedeskamp, Bernt;
- Kloidt, Andreas;
- Stock, Hans-Jürgen;
- Kleineberg, Ulf;
- Döhring, Thorsten;
- Pröpper, Michael;
- Rahn, Steffen;
- Hilgers, Kerstin;
- Heidemann, Bernhard;
- Tappe, Thorsten;
- Heinzmann, Ulrich;
- Krumrey, Michael K.;
- Müller, Peter;
- Schoize, Frank;
- Heidemann, Klaus F.
Publication type:
Article