Soft X‐ray varied‐line‐spacing gratings fabricated by near‐field holography using an electron beam lithography‐written phase mask.

Published in:

Journal of Synchrotron Radiation, 2019, v. 26, n. 5, p. 1782, doi. 10.1107/S1600577519008245

By:

• Lin, Dakui;
• Liu, Zhengkun;
• Dietrich, Kay;
• Sokolov, Andréy;
• Sertsu, Mewael Giday;
• Zhou, Hongjun;
• Huo, Tonglin;
• Kroker, Stefanie;
• Chen, Huoyao;
• Qiu, Keqiang;
• Xu, Xiangdong;
• Schäfers, Franz;
• Liu, Ying;
• Kley, Ernst-Bernhard;
• Hong, Yilin

Publication type:

Article