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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.
- Published in:
- Sensors (14248220), 2022, v. 22, n. 17, p. 6589, doi. 10.3390/s22176589
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- Article
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath.
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- Sensors (14248220), 2022, v. 22, n. 16, p. 6254, doi. 10.3390/s22166254
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- Article
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO 2.
- Published in:
- Sensors (14248220), 2022, v. 22, n. 16, p. 6029, doi. 10.3390/s22166029
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- Article
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma.
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- Nanomaterials (2079-4991), 2022, v. 12, n. 22, p. 3963, doi. 10.3390/nano12223963
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- Article
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma.
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- Materials (1996-1944), 2023, v. 16, n. 17, p. 5746, doi. 10.3390/ma16175746
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- Article
Characterization of SiO 2 Plasma Etching with Perfluorocarbon (C 4 F 8 and C 6 F 6) and Hydrofluorocarbon (CHF 3 and C 4 H 2 F 6) Precursors for the Greenhouse Gas Emissions Reduction.
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- Materials (1996-1944), 2023, v. 16, n. 16, p. 5624, doi. 10.3390/ma16165624
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- Article
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO 2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C 4 F 8 Plasma: Individual Ion Energy and Flux Controlled.
- Published in:
- Materials (1996-1944), 2023, v. 16, n. 10, p. 3820, doi. 10.3390/ma16103820
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- Article
On the Quenching of Electron Temperature in Inductively Coupled Plasma.
- Published in:
- Materials (1996-1944), 2023, v. 16, n. 8, p. 3219, doi. 10.3390/ma16083219
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- Article
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method.
- Published in:
- Materials (1996-1944), 2023, v. 16, n. 7, p. 2762, doi. 10.3390/ma16072762
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- Article