Works matching AU Ruddell, F. H.

Atomic layer deposition of hafnium oxide dielectrics on silicon and germanium substrates.

Published in:

Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 2, p. 119, doi. 10.1007/s10854-007-9337-y

By:

• McNeill, D. W.;
• Bhattacharya, S.;
• Wadsworth, H.;
• Ruddell, F. H.;
• Mitchell, S. J. N.;
• Armstrong, B. M.;
• Gamble, H. S.

Publication type:

Article