Found: 4
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Chemistry and electronics of single layer MoS<sub>2</sub> domains from photoelectron spectromicroscopy using laboratory excitation sources.
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- Surface & Interface Analysis: SIA, 2016, v. 48, n. 7, p. 465, doi. 10.1002/sia.5992
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Study of ultrathin silicon oxide films by FTIR-ATR and ARXPS after wet chemical cleaning processes.
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- Surface & Interface Analysis: SIA, 2002, v. 34, n. 1, p. 445, doi. 10.1002/sia.1335
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- Article
Silicon wafer cleaning processes and ozone oxide growth as studied by angle-resolved x-ray photoelectron spectroscopy (ARXPS) and ellipsometry.
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- Surface & Interface Analysis: SIA, 2002, v. 33, n. 5, p. 433, doi. 10.1002/sia.1230
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- Article
XPS, Raman spectroscopy, X-ray diffraction, specular X-ray reflectivity, transmission electron microscopy and elastic recoil detection analysis of emissive carbon film characterization.
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- Surface & Interface Analysis: SIA, 2001, v. 31, n. 3, p. 185, doi. 10.1002/sia.955
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- Article