Works by Rogalla, Detlef

Results: 33

Magnetic properties of Gd-doped GaN.

Published in:

Physica Status Solidi (B), 2014, v. 251, n. 9, p. 1673, doi. 10.1002/pssb.201350205

By:

Shvarkov, Stepan;
Ludwig, Astrid;
Wieck, Andreas Dirk;
Cordier, Yvon;
Ney, Andreas;
Hardtdegen, Hilde;
Haab, Anna;
Trampert, Achim;
Ranchal, Rocío;
Herfort, Jens;
Becker, Hans‐Werner;
Rogalla, Detlef;
Reuter, Dirk

Publication type:

Article

CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications.

Published in:

Small, 2023, v. 19, n. 1, p. 1, doi. 10.1002/smll.202204636

By:

Wilken, Martin;
Ciftyürek, Engin;
Cwik, Stefan;
Mai, Lukas;
Mallick, Bert;
Rogalla, Detlef;
Schierbaum, Klaus;
Devi, Anjana

Publication type:

Article

Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020).

Published in:

Small, 2020, v. 16, n. 22, p. 1, doi. 10.1002/smll.202070122

By:

Mai, Lukas;
Mitschker, Felix;
Bock, Claudia;
Niesen, Alessia;
Ciftyurek, Engin;
Rogalla, Detlef;
Mickler, Johannes;
Erig, Matthias;
Li, Zheshen;
Awakowicz, Peter;
Schierbaum, Klaus;
Devi, Anjana

Publication type:

Article

From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications.

Published in:

Small, 2020, v. 16, n. 22, p. 1, doi. 10.1002/smll.201907506

By:

Mai, Lukas;
Mitschker, Felix;
Bock, Claudia;
Niesen, Alessia;
Ciftyurek, Engin;
Rogalla, Detlef;
Mickler, Johannes;
Erig, Matthias;
Li, Zheshen;
Awakowicz, Peter;
Schierbaum, Klaus;
Devi, Anjana

Publication type:

Article

Distributed Feedback Lasing in Thermally Imprinted Phase‐Stabilized CsPbI3 Thin Films.

Published in:

Advanced Functional Materials, 2024, v. 34, n. 45, p. 1, doi. 10.1002/adfm.202405976

By:

Kurahashi, Naho;
Runkel, Manuel;
Kreusel, Cedric;
Schiffer, Maximilian;
Maschwitz, Timo;
Kraus, Timo;
Brinkmann, Kai Oliver;
Heiderhoff, Ralf;
Buchmüller, Maximilian;
Schumacher, Sven Oliver;
Brunner, Julius;
Rogalla, Detlef;
Özen, Sercan;
Lang, Felix;
Vaynzof, Yana;
Görrn, Patrick;
Riedl, Thomas

Publication type:

Article

An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure.

Published in:

Angewandte Chemie International Edition, 2018, v. 57, n. 49, p. 16224, doi. 10.1002/anie.201808586

By:

Boysen, Nils;
Hasselmann, Tim;
Karle, Sarah;
Rogalla, Detlef;
Theirich, Detlef;
Winter, Manuela;
Riedl, Thomas;
Devi, Anjana

Publication type:

Article

The Influence of Annealing on the Compositional and Crystallographic Properties of Sputtered Li–Al–O Thin Films.

Published in:

Advanced Engineering Materials, 2024, v. 26, n. 16, p. 1, doi. 10.1002/adem.202400602

By:

Lourens, Florian;
Rogalla, Detlef;
Suhr, Ellen;
Ludwig, Alfred

Publication type:

Article

Unusual Phase Formation in Reactively Sputter‐Deposited La—Co—O Thin‐Film Libraries.

Published in:

Advanced Engineering Materials, 2023, v. 25, n. 3, p. 1, doi. 10.1002/adem.202201050

By:

Piotrowiak, Tobias Horst;
Zehl, Rico;
Suhr, Ellen;
Banko, Lars;
Kohnen, Benedikt;
Rogalla, Detlef;
Ludwig, Alfred

Publication type:

Article

Ein N‐heterocyclischer Carbenkomplex des Silbers für die plasmaunterstützte räumlich getrennte Atomlagenabscheidung dünner Silberschichten bei Atmosphärendruck.

Published in:

Angewandte Chemie, 2018, v. 130, n. 49, p. 16458, doi. 10.1002/ange.201808586

By:

Boysen, Nils;
Hasselmann, Tim;
Karle, Sarah;
Rogalla, Detlef;
Theirich, Detlef;
Winter, Manuela;
Riedl, Thomas;
Devi, Anjana

Publication type:

Article

Tailored β‐Ketoiminato Complexes of Iron: Synthesis, Characterization, and Evaluation towards Solution‐Based Deposition of Iron Oxide Thin Films.

Published in:

European Journal of Inorganic Chemistry, 2018, v. 2018, n. 17, p. 1824, doi. 10.1002/ejic.201800094

By:

Sadlo, Alexander;
Beer, Sebastian M. J.;
Rahman, Shafiqur;
Grafen, Markus;
Rogalla, Detlef;
Winter, Manuela;
Ostendorf, Andreas;
Devi, Anjana

Publication type:

Article

Wafer‐Scale Demonstration of Polycrystalline MoS2 Growth on 200 mm Glass and SiO2/Si Substrates by Plasma‐Enhanced Atomic Layer Deposition.

Published in:

Advanced Materials Technologies, 2024, v. 9, n. 22, p. 1, doi. 10.1002/admt.202400492

By:

Jagosz, Julia;
Willeke, Leander;
Gerke, Nils;
Becher, Malte J. M. J.;
Plate, Paul;
Kostka, Aleksander;
Rogalla, Detlef;
Ostendorf, Andreas;
Bock, Claudia

Publication type:

Article

Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure.

Published in:

Advanced Materials Technologies, 2023, v. 8, n. 1, p. 1, doi. 10.1002/admt.202200796

By:

Hasselmann, Tim;
Misimi, Bujamin;
Boysen, Nils;
Zanders, David;
Wree, Jan‐Lucas;
Rogalla, Detlef;
Haeger, Tobias;
Zimmermann, Florian;
Brinkmann, Kai Oliver;
Schädler, Sebastian;
Theirich, Detlef;
Heiderhoff, Ralf;
Devi, Anjana;
Riedl, Thomas

Publication type:

Article

Avoiding Photoinduced Shunts in Organic Solar Cells by the Use of Tin Oxide (SnOx) as Electron Extraction Material Instead of ZnO.

Published in:

Advanced Energy Materials, 2016, v. 6, n. 15, p. n/a, doi. 10.1002/aenm.201600347

By:

Trost, Sara;
Becker, Tim;
Polywka, Andreas;
Görrn, Patrick;
Oszajca, Marek F.;
Luechinger, Norman A.;
Rogalla, Detlef;
Weidner, Mirko;
Reckers, Philip;
Mayer, Thomas;
Riedl, Thomas

Publication type:

Article

Lead diffusion in CaTiO3: A combined study using Rutherford backscattering and TOF-SIMS for depth profiling to reveal the role of lattice strain in diffusion processes.

Published in:

American Mineralogist, 2019, v. 104, n. 4, p. 557, doi. 10.2138/am-2019-6730

By:

BEYER, CHRISTOPHER;
DOHMEN, RALF;
ROGALLA, DETLEF;
BECKER, HANS-WERNER;
MARQUARDT, KATHARINA;
VOLLMER, CHRISTIAN;
HAGEMANN, ULRICH;
HARTMANN, NILS;
CHAKRABORTY, SUMIT

Publication type:

Article

Atomic/molecular layer deposition of hybrid inorganic-organic thin films from erbium guanidinate precursor.

Published in:

Journal of Materials Science, 2017, v. 52, n. 11, p. 6216, doi. 10.1007/s10853-017-0855-6

By:

Mai, Lukas;
Giedraityte, Zivile;
Schmidt, Marcel;
Rogalla, Detlef;
Scholz, Sven;
Wieck, Andreas;
Devi, Anjana;
Karppinen, Maarit

Publication type:

Article

Coherence of a charge stabilised tin-vacancy spin in diamond.

Published in:

NPJ Quantum Information, 2022, v. 8, n. 1, p. 1, doi. 10.1038/s41534-022-00552-0

By:

Görlitz, Johannes;
Herrmann, Dennis;
Fuchs, Philipp;
Iwasaki, Takayuki;
Taniguchi, Takashi;
Rogalla, Detlef;
Hardeman, David;
Colard, Pierre-Olivier;
Markham, Matthew;
Hatano, Mutsuko;
Becher, Christoph

Publication type:

Article

Paleodiet characterisation of an Etrurian population of Pontecagnano (Italy) by Isotope Ratio Mass Spectrometry (IRMS) and Atomic Absorption Spectrometry (AAS) #.

Published in:

Isotopes in Environmental & Health Studies, 2006, v. 42, n. 2, p. 151, doi. 10.1080/10256010600672926

By:

Scarabino, Carla;
Lubritto, Carmine;
Proto, Antonio;
Rubino, Mauro;
Fiengo, Gilda;
Marzaioli, Fabio;
Passariello, Isabela;
Busiello, Gaetano;
Fortunatos, Antonietta;
Alfano, Davide;
Sabbarese, Carlo;
Rogalla, Detlef;
De Cesare, Nicola;
D'Onofrio, Antonio;
Terrasi, Filippo

Publication type:

Article

Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties.

Published in:

Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300244

By:

Preischel, Florian;
Zanders, David;
Berning, Thomas;
Kostka, Aleksander;
Rogalla, Detlef;
Bock, Claudia;
Devi, Anjana

Publication type:

Article

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction.

Published in:

Advanced Materials Interfaces, 2022, v. 9, n. 35, p. 1, doi. 10.1002/admi.202201709

By:

Zanders, David;
Obenlüneschloß, Jorit;
Wree, Jan‐Lucas;
Jagosz, Julia;
Kaur, Parmish;
Boysen, Nils;
Rogalla, Detlef;
Kostka, Aleksander;
Bock, Claudia;
Öhl, Denis;
Gock, Michael;
Schuhmann, Wolfgang;
Devi, Anjana

Publication type:

Article

Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties.

Published in:

Advanced Materials Interfaces, 2021, v. 8, n. 20, p. 1, doi. 10.1002/admi.202100949

By:

Zywitzki, Dennis;
Schaper, Raoul;
Ciftyürek, Engin;
Wree, Jan‐Lucas;
Taffa, Dereje H.;
Baier, Daniel M.;
Rogalla, Detlef;
Li, Yujiao;
Meischein, Michael;
Ludwig, Alfred;
Li, Zheshen;
Schierbaum, Klaus;
Wark, Michael;
Devi, Anjana

Publication type:

Article

Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.

Published in:

Advanced Materials Interfaces, 2019, v. 6, n. 1, p. N.PAG, doi. 10.1002/admi.201801540

By:

Zanders, David;
Ciftyurek, Engin;
Hoppe, Christian;
de los Arcos, Teresa;
Kostka, Aleksander;
Rogalla, Detlef;
Grundmeier, Guido;
Schierbaum, Klaus Dieter;
Devi, Anjana

Publication type:

Article

Direct Growth of MoS2 and WS2 Layers by Metal Organic Chemical Vapor Deposition.

Published in:

Advanced Materials Interfaces, 2018, v. 5, n. 16, p. 1, doi. 10.1002/admi.201800140

By:

Cwik, Stefan;
Mitoraj, Dariusz;
Mendoza Reyes, Oliver;
Rogalla, Detlef;
Peeters, Daniel;
Kim, Jiyeon;
Schütz, Hanno Maria;
Bock, Claudia;
Beranek, Radim;
Devi, Anjana

Publication type:

Article

Water Splitting: Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor (Adv. Mater. Interfaces 18/2017).

Published in:

Advanced Materials Interfaces, 2017, v. 4, n. 18, p. n/a, doi. 10.1002/admi.201770093

By:

Peeters, Daniel;
Sadlo, Alexander;
Lowjaga, Katarina;
Mendoza Reyes, Oliver;
Wang, Lidong;
Mai, Lukas;
Gebhard, Maximilian;
Rogalla, Detlef;
Becker, Hans‐Werner;
Giner, Ignacio;
Grundmeier, Guido;
Mitoraj, Dariusz;
Grafen, Markus;
Ostendorf, Andreas;
Beranek, Radim;
Devi, Anjana

Publication type:

Article

Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor.

Published in:

Advanced Materials Interfaces, 2017, v. 4, n. 18, p. n/a, doi. 10.1002/admi.201700155

By:

Peeters, Daniel;
Sadlo, Alexander;
Lowjaga, Katarina;
Mendoza Reyes, Oliver;
Wang, Lidong;
Mai, Lukas;
Gebhard, Maximilian;
Rogalla, Detlef;
Becker, Hans‐Werner;
Giner, Ignacio;
Grundmeier, Guido;
Mitoraj, Dariusz;
Grafen, Markus;
Ostendorf, Andreas;
Beranek, Radim;
Devi, Anjana

Publication type:

Article

Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon.

Published in:

Physica Status Solidi - Rapid Research Letters, 2016, v. 10, n. 11, p. 828, doi. 10.1002/pssr.201600303

By:

Gerke, Sebastian;
Becker, Hans ‐ Werner;
Rogalla, Detlef;
Job, Reinhart;
TerheidEN, Barbara

Publication type:

Article

Cover Feature: Role of Anionic Backbone in NHC‐Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition (Chem. Eur. J. 16/2022).

Published in:

Chemistry - A European Journal, 2022, v. 28, n. 16, p. 1, doi. 10.1002/chem.202200535

By:

Boysen, Nils;
Philip, Anish;
Rogalla, Detlef;
Karppinen, Maarit;
Devi, Anjana

Publication type:

Article

Role of Anionic Backbone in NHC‐Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition**.

Published in:

Chemistry - A European Journal, 2022, v. 28, n. 16, p. 1, doi. 10.1002/chem.202103798

By:

Boysen, Nils;
Philip, Anish;
Rogalla, Detlef;
Karppinen, Maarit;
Devi, Anjana

Publication type:

Article

MOCVD of TiO2 thin films from a modified titanium alkoxide precursor.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2015, v. 212, n. 7, p. 1563, doi. 10.1002/pssa.201532271

By:

Kim, Sun Ja;
Dang, Van‐Son;
Xu, Ke;
Barreca, Davide;
Maccato, Chiara;
Carraro, Giorgio;
Bhakta, Raghunandan K.;
Winter, Manuela;
Becker, Hans‐Werner;
Rogalla, Detlef;
Sada, Cinzia;
Fischer, Roland A.;
Devi, Anjana

Publication type:

Article

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 2, p. 260, doi. 10.1002/pssa.201330127

By:

Srinivasan, Nagendra B.;
Thiede, Tobias B.;
de los Arcos, Teresa;
Rogalla, Detlef;
Becker, Hans‐Werner;
Devi, Anjana;
Fischer, Roland A.

Publication type:

Article

Tailoring iron( III) oxide nanomorphology by chemical vapor deposition: Growth and characterization.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 2, p. 316, doi. 10.1002/pssa.201330079

By:

Peeters, Daniel;
Carraro, Giorgio;
Maccato, Chiara;
Parala, Harish;
Gasparotto, Alberto;
Barreca, Davide;
Sada, Cinzia;
Kartaschew, Konstantin;
Havenith, Martina;
Rogalla, Detlef;
Becker, Hans‐Werner;
Devi, Anjana

Publication type:

Article

Room‐Temperature Stimulated Emission and Lasing in Recrystallized Cesium Lead Bromide Perovskite Thin Films.

Published in:

Advanced Materials, 2019, v. 31, n. 39, p. N.PAG, doi. 10.1002/adma.201903717

By:

Pourdavoud, Neda;
Haeger, Tobias;
Mayer, Andre;
Cegielski, Piotr Jacek;
Giesecke, Anna Lena;
Heiderhoff, Ralf;
Olthof, Selina;
Zaefferer, Stefan;
Shutsko, Ivan;
Henkel, Andreas;
Becker‐Koch, David;
Stein, Markus;
Cehovski, Marko;
Charfi, Ouacef;
Johannes, Hans‐Hermann;
Rogalla, Detlef;
Lemme, Max Christian;
Koch, Martin;
Vaynzof, Yana;
Meerholz, Klaus

Publication type:

Article

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD.

Published in:

Plasma Processes & Polymers, 2018, v. 15, n. 5, p. 1, doi. 10.1002/ppap.201700209

By:

Gebhard, Maximilian;
Mitschker, Felix;
Hoppe, Christian;
Aghaee, Morteza;
Rogalla, Detlef;
Creatore, Mariadriana;
Grundmeier, Guido;
Awakowicz, Peter;
Devi, Anjana

Publication type:

Article

The Effect of the Degree of Fluorination on the MOCVD Growth of Cobalt Oxide Thin Films using Co(II) Acetylacetonate Complexes.

Published in:

European Journal of Inorganic Chemistry, 2021, v. 2021, n. 41, p. 4298, doi. 10.1002/ejic.202100662

By:

Stienen, Christian;
Rogalla, Detlef;
Prymak, Oleg;
Bendt, Georg

Publication type:

Article

Works by Rogalla, Detlef

Magnetic properties of Gd-doped GaN.

CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications.

Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020).

From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications.

Distributed Feedback Lasing in Thermally Imprinted Phase‐Stabilized CsPbI<sub>3</sub> Thin Films.

An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure.

The Influence of Annealing on the Compositional and Crystallographic Properties of Sputtered Li–Al–O Thin Films.

Unusual Phase Formation in Reactively Sputter‐Deposited La—Co—O Thin‐Film Libraries.

Ein N‐heterocyclischer Carbenkomplex des Silbers für die plasmaunterstützte räumlich getrennte Atomlagenabscheidung dünner Silberschichten bei Atmosphärendruck.

Tailored β‐Ketoiminato Complexes of Iron: Synthesis, Characterization, and Evaluation towards Solution‐Based Deposition of Iron Oxide Thin Films.

Wafer‐Scale Demonstration of Polycrystalline MoS<sub>2</sub> Growth on 200 mm Glass and SiO<sub>2</sub>/Si Substrates by Plasma‐Enhanced Atomic Layer Deposition.

Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure.

Avoiding Photoinduced Shunts in Organic Solar Cells by the Use of Tin Oxide (SnO<sub>x</sub>) as Electron Extraction Material Instead of ZnO.

Lead diffusion in CaTiO<sub>3</sub>: A combined study using Rutherford backscattering and TOF-SIMS for depth profiling to reveal the role of lattice strain in diffusion processes.

Atomic/molecular layer deposition of hybrid inorganic-organic thin films from erbium guanidinate precursor.

Coherence of a charge stabilised tin-vacancy spin in diamond.

Paleodiet characterisation of an Etrurian population of Pontecagnano (Italy) by Isotope Ratio Mass Spectrometry (IRMS) and Atomic Absorption Spectrometry (AAS) #.

Interplay of Precursor and Plasma for The Deposition of HfO<sub>2</sub> via PEALD: Film Growth and Dielectric Properties.

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction.

Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties.

Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO<sub>2</sub> Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.

Direct Growth of MoS<sub>2</sub> and WS<sub>2</sub> Layers by Metal Organic Chemical Vapor Deposition.

Water Splitting: Nanostructured Fe<sub>2</sub>O<sub>3</sub> Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor (Adv. Mater. Interfaces 18/2017).

Nanostructured Fe<sub>2</sub>O<sub>3</sub> Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor.

Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon.

Cover Feature: Role of Anionic Backbone in NHC‐Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition (Chem. Eur. J. 16/2022).

Role of Anionic Backbone in NHC‐Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition**.

MOCVD of TiO<sub>2</sub> thin films from a modified titanium alkoxide precursor.

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics.

Tailoring iron( III) oxide nanomorphology by chemical vapor deposition: Growth and characterization.

Room‐Temperature Stimulated Emission and Lasing in Recrystallized Cesium Lead Bromide Perovskite Thin Films.

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD.

The Effect of the Degree of Fluorination on the MOCVD Growth of Cobalt Oxide Thin Films using Co(II) Acetylacetonate Complexes.