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Interfacial and electrical properties of radio frequency sputtered ultra-thin TiO film for gate oxide applications.
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- Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 11, p. 9107, doi. 10.1007/s10854-015-3598-7
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Complex impedance spectroscopy of high-k HfO thin films in Al/HfO/Si capacitor for gate oxide applications.
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- Journal of Materials Science: Materials in Electronics, 2015, v. 26, n. 6, p. 3506, doi. 10.1007/s10854-015-2862-1
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- Article