Nitrogen doping of SiC thin films deposited by RF magnetron sputtering.
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- Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 8/9, p. 835, doi. 10.1007/s10854-007-9487-y
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- Article
Works matching AU Mansano, Ronaldo D.
Results: 3
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Electrical Conduction Mechanisms of Nitrogenated Amorphous Carbon Films Deposited by High-Density Plasma Chemical Vapor Deposition.
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- Plasma Processes & Polymers, 2005, v. 2, n. 6, p. 454, doi. 10.1002/ppap.200400090
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- Article
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Hydrogen influence on the electrical properties of sputtered In N thin films.
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- Physica Status Solidi. A: Applications & Materials Science, 2013, v. 210, n. 8, p. 1606, doi. 10.1002/pssa.201228477
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