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Investigation of PEALD ZrO<sub>2</sub>/La<sub>2</sub>O<sub>3</sub>-based high-k nanolaminates sandwiched between Al and Ti electrodes for MIM capacitors.
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- Journal of Materials Science: Materials in Electronics, 2023, v. 34, n. 16, p. 1, doi. 10.1007/s10854-023-10655-9
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The effect of post-deposition annealing on the chemical, structural and electrical properties of Al/ZrO<sub>2</sub>/La<sub>2</sub>O<sub>3</sub>/ZrO<sub>2</sub>/Al high-k nanolaminated MIM capacitors.
- Published in:
- Journal of Materials Science: Materials in Electronics, 2022, v. 33, n. 14, p. 11227, doi. 10.1007/s10854-022-08097-w
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- Article
Synthesis of SiOF nanoporous ultra low-k thin film.
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- Journal of Materials Science: Materials in Electronics, 2013, v. 24, n. 12, p. 4964, doi. 10.1007/s10854-013-1508-4
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- Article