Works by Ma, Yao


Results: 397
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    Study of γ-ray radiation influence on SiO<sub>2</sub>/HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> memory capacitor by C–V and DLTS.

    Published in:
    Journal of Materials Science: Materials in Electronics, 2019, v. 30, n. 12, p. 11079, doi. 10.1007/s10854-019-01450-6
    By:
    • Ke, Xiao-yu;
    • Ming, Si-ting;
    • Wang, Duo-wei;
    • Li, Tong;
    • Liu, Bing-yan;
    • Cao, Shu-rui;
    • Ma, Yao;
    • Li, Yun;
    • Yang, Zhi-mei;
    • Gong, Min;
    • Huang, Ming-min;
    • Bi, Jin-shun;
    • Xu, Yan-nan;
    • Xi, Kai;
    • Xu, Gao-bo;
    • Majumdar, Sandip
    Publication type:
    Article
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