Found: 15
Select item for more details and to access through your institution.
Realizing the Heteromorphic Superlattice: Repeated Heterolayers of Amorphous Insulator and Polycrystalline Semiconductor with Minimal Interface Defects.
- Published in:
- Advanced Materials, 2023, v. 35, n. 19, p. 1, doi. 10.1002/adma.202207927
- By:
- Publication type:
- Article
Realizing the Heteromorphic Superlattice: Repeated Heterolayers of Amorphous Insulator and Polycrystalline Semiconductor with Minimal Interface Defects.
- Published in:
- Advanced Materials, 2023, v. 35, n. 19, p. 1, doi. 10.1002/adma.202207927
- By:
- Publication type:
- Article
Trap Reduction through O<sub>3</sub> Post‐Deposition Treatment of Y<sub>2</sub>O<sub>3</sub> Thin Films Grown by Atomic Layer Deposition on Ge Substrates.
- Published in:
- Advanced Electronic Materials, 2021, v. 7, n. 2, p. 1, doi. 10.1002/aelm.202000819
- By:
- Publication type:
- Article
Investigating the Reasons for the Difficult Erase Operation of a Charge‐Trap Flash Memory Device with Amorphous Oxide Semiconductor Thin‐Film Channel Layers.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2021, v. 15, n. 2, p. 1, doi. 10.1002/pssr.202000549
- By:
- Publication type:
- Article
Enhanced Brightness and Device Lifetime of Quantum Dot Light‐Emitting Diodes by Atomic Layer Deposition.
- Published in:
- Advanced Materials Interfaces, 2020, v. 7, n. 12, p. 1, doi. 10.1002/admi.202000343
- By:
- Publication type:
- Article
Light‐Emitting Diodes: Enhanced Brightness and Device Lifetime of Quantum Dot Light‐Emitting Diodes by Atomic Layer Deposition (Adv. Mater. Interfaces 12/2020).
- Published in:
- Advanced Materials Interfaces, 2020, v. 7, n. 12, p. 1, doi. 10.1002/admi.202070067
- By:
- Publication type:
- Article
CsPbBr<sub>3</sub> Perovskite Quantum Dot Light‐Emitting Diodes Using Atomic Layer Deposited Al<sub>2</sub>O<sub>3</sub> and ZnO Interlayers.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2020, v. 14, n. 1, p. N.PAG, doi. 10.1002/pssr.201900573
- By:
- Publication type:
- Article
CsPbBr<sub>3</sub> Perovskite Quantum Dot Light‐Emitting Diodes Using Atomic Layer Deposited Al<sub>2</sub>O<sub>3</sub> and ZnO Interlayers.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2020, v. 14, n. 1, p. N.PAG, doi. 10.1002/pssr.201900573
- By:
- Publication type:
- Article
Leakage Current Control of SrTiO<sub>3</sub> Thin Films through Al Doping at the Interface between Dielectric and Electrode Layers via Atomic Layer Deposition.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 11, p. N.PAG, doi. 10.1002/pssr.201900373
- By:
- Publication type:
- Article
Effect of the Annealing Temperature of the Seed Layer on the Following Main Layer in Atomic‐Layer‐Deposited SrTiO<sub>3</sub> Thin Films.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 5, p. N.PAG, doi. 10.1002/pssr.201800557
- By:
- Publication type:
- Article
Controlling the Electrical Characteristics of ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/ZrO<sub>2</sub> Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2019, v. 13, n. 3, p. N.PAG, doi. 10.1002/pssr.201800454
- By:
- Publication type:
- Article
Electrical Properties of ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/ZrO<sub>2</sub>‐Based Capacitors with TiN, Ru, and TiN/Ru Top Electrode Materials.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2018, v. 12, n. 10, p. N.PAG, doi. 10.1002/pssr.201800356
- By:
- Publication type:
- Article
Resistance switching behavior of atomic layer deposited SrTiO<sub>3</sub> film through possible formation of Sr<sub>2</sub>Ti<sub>6</sub>O<sub>13</sub> or Sr<sub>1</sub>Ti<sub>11</sub>O<sub>20</sub> phases.
- Published in:
- Scientific Reports, 2016, p. 20550, doi. 10.1038/srep20550
- By:
- Publication type:
- Article
Asymmetry in electrical properties of Al-doped TiO<sub>2</sub> film with respect to bias voltage.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2015, v. 9, n. 7, p. 410, doi. 10.1002/pssr.201510146
- By:
- Publication type:
- Article
Atomic layer deposition of TiO<sub>2</sub> and Al-doped TiO<sub>2</sub> films on Ir substrates for ultralow leakage currents.
- Published in:
- Physica Status Solidi - Rapid Research Letters, 2011, v. 5, n. 8, p. 262, doi. 10.1002/pssr.201105250
- By:
- Publication type:
- Article